| Patent No. | Patent Title: |
| 7939224 | Mask with registration marks and method of fabricating integrated... |
| 7491422 | Direct-write nanolithography method of transporting ink with an e... |
| 7459265 | Pattern forming method, semiconductor device manufacturing method... |
| 7459244 | Mask, method for forming a pattern, and method for evaluating pat... |
| 7452639 | Photomask with photoresist test patterns and pattern inspection m... |
| 7452659 | Methods of patterning a surface using single and multilayer molec... |
| 7449284 | Method and structure for fabricating mechanical mirror structures... |
| 7447559 | Apparatus and method of forming a photoresist pattern, and repair... |
| 7445874 | Method to resolve line end distortion for alternating phase shift... |
| 7445877 | Charge transport materials having a central disulfane linkage |
| 7442472 | Methods of forming reticles |
| 7438997 | Imaging and devices in lithography |
| 7436423 | Apparatus and method of making a grayscale photo mask and an opti... |
| 7435534 | Method for manufacturing semiconductor device |
| 7432038 | Dielectric line and production method therefor |
| 7432023 | Method for producing a pellicle for lithography |
| 7432039 | Method for simultaneous patterning of features with nanometer sca... |
| 7432025 | Methods of forming reticles |
| 7427461 | Toner for developing electrostatic latent image, image forming ap... |
| 7427462 | Photoreceptor layer having rhodamine additive |
| 7422828 | Mask CD measurement monitor outside of the pellicle area |
| 7422841 | Exposure control for phase shifting photolithographic masks |
| 7419767 | Phase-shifting mask and method of forming pattern using the same |
| 7413832 | Method of producing a glass substrate for a mask blank, method of... |
| 7413831 | Reflective exposure mask, and method for producing and using the ... |
| 7413845 | Elimination of write head plating defects using high activation c... |
| 7413846 | Fabrication methods and structures for micro-reservoir devices |
| 7410740 | Magnetic toner for two component developer and image forming meth... |
| 7407738 | Fabrication and use of superlattice |
| 7405024 | Lithographic mask, and method for covering a mask layer |
| 7405031 | Lithographic apparatus and device manufacturing method |
| 7405033 | Method for manufacturing resist pattern and method for manufactur... |
| 7402366 | Organic photoreceptor, process cartridge, image forming method, a... |
| 7402362 | Method and system for reducing and monitoring precipitated defect... |
| 7399564 | Electrophotographic photoconductor |
| 7396636 | Segmented resist islands for photolithography on single sliders |
| 7396621 | Exposure control method and method of manufacturing a semiconduct... |
| 7396635 | Producing method of wired circuit board |
| 7393613 | Set of at least two masks for the projection of structure pattern... |
| 7393614 | Set of masks including a first mask and a second trimming mask wi... |
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