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U.S. patent applications available from 2005 to present.

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Examiner: Alejandro, Luz L.


Primary examiner statistics: 50 patents; average approval time: 94 days
Assistant examiner statistics: 0 patents; average approval time: N/A

Patents as Primary Examiner (view all)

Patent No. Patent Title:
8187416 Interior antenna for substrate processing chamber
8177992 Plasma etching apparatus
8163128 Plasma processing apparatus
8157976 Apparatus for cathodic vacuum-arc coating deposition
8142607 High density helicon plasma source for wide ribbon ion beam gener...
8123902 Gas flow diffuser
8123903 Plasma reactor having multiple antenna structure
8119532 Inductively coupled dual zone processing chamber with single plan...
8114246 Vacuum plasma processor having a chamber with electrodes and a co...
8105953 Method of manufacturing a semiconductor device
8092600 Plasma apparatus and plasma processing method
8083892 Apparatus for generating gas plasma, gas composition for generati...
8075734 Remote inductively coupled plasma source for CVD chamber cleaning
8062473 Plasma processing apparatus and method
8062472 Method of correcting baseline skew by a novel motorized source co...
8062470 Method and apparatus for application of thin coatings from plasma...
8048260 Magnetic neutral line discharge plasma processing system
8043471 Plasma processing apparatus
8021515 Inductively coupled plasma processing apparatus
8012306 Plasma processing reactor with multiple capacitive and inductive ...
8007632 Semiconductor manufacturing apparatus and manufacturing method of...
7993488 Microwave plasma processing device and gate valve for microwave p...
7988815 Plasma reactor with reduced electrical skew using electrical bypa...
7976674 Embedded multi-inductive large area plasma source
7972471 Inductively coupled dual zone processing chamber with single plan...
7972470 Asymmetric grounding of rectangular susceptor
7967945 RF antenna assembly for treatment of inner surfaces of tubes with...
7905982 Antenna for plasma processor apparatus
7906033 Plasma etching method and apparatus
7879187 Plasma etching apparatus
7871490 Inductively coupled plasma generation system with a parallel ante...
7862681 Plasma processing system and method of contolling the same
7842159 Inductively coupled plasma processing apparatus for very large ar...
7837826 Hybrid RF capacitively and inductively coupled plasma source usin...
7815767 Plasma processing apparatus
7811941 Device and method for etching a substrate using an inductively co...
7811411 Thermal management of inductively coupled plasma reactors
7807019 Radial antenna and plasma processing apparatus comprising the sam...
7789993 Internal balanced coil for inductively coupled high density plasm...
7740739 Plasma processing apparatus and method

Patents as Assistant Examiner

Patent No. Patent Title:
No patents.
 
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