U.S. patents available from 1976 to present.
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Pham, Long


Primary examiner statistics: 2120 patents; average approval time: 2119 days
Assistant examiner statistics: 698 patents; average approval time: 698 days

Patents as Primary Examiner

1                      
NumberTitleIssue Date
8188463Organic light emitting diode with magnetic structure for improved current adaptability
An organic light emitting device includes a cathode and an optional substrate external to the device. The device further includes at least one film layer disposed on at least one of the cathode or the substrate. The at least one film layer includes at least one of a...
05/29/2012
8188483Silicon carbide devices having smooth channels
Power devices are provided including a p-type conductivity well region and a buried p+ conductivity region in the p-type conductivity well region. An n+ conductivity region is provided on the buried p+ conductivity region. A channel ...
05/29/2012
8183570Thin film transistor array panel
A thin film transistor array panel, in which a middle storage electrode and a storage electrode overlapping a drain electrode of a thin film transistor thereby forming a storage capacitance are formed. Accordingly, sufficient storage capacitance may be formed withou...
05/22/2012
8183611Spin transistor using N-type and P-type double carrier supply layer structure
A spin transistor that includes: a semiconductor substrate including an upper cladding layer and a lower cladding layer, and a channel layer interposed between the upper and lower cladding layers; a ferromagnetic source and a ferromagnetic drain formed on the semico...
05/22/2012
8183117Device layout in integrated circuits to reduce stress from embedded silicon-germanium
An integrated circuit including one or more transistors in which source and drain regions are formed as embedded silicon-germanium (eSiGe). Guard ring structures in the integrated circuit are formed in single-crystal silicon, rather than in eSiGe. In one example, p-...
05/22/2012
8178413Low-temperature grown high quality ultra-thin CoTiOgate dielectrics
A gate oxide and method of fabricating a gate oxide that produces a more reliable and thinner equivalent oxide thickness than conventional SiO2 gate oxides are provided. Gate oxides formed from alloys such as cobalt-titanium are thermodynamically stable s...
05/15/2012
8178431Process for producing a PN homojunction in a nanostructure
The invention relates to a process for producing a p-n junction in a nanostructure, in which the nanostructure has one or more nanoconstituents made of a semiconductor material with a single type of doping having one conductivity type, characterized in that it inclu...
05/15/2012
8178915Unitary floating-gate electrode with both N-type and P-type gates
An analog floating-gate electrode in an integrated circuit, and method of fabricating the same, in which trapped charge can be stored for long durations. The analog floating-gate electrode is formed in a polycrystalline silicon gate level, and includes n-type and p-...
05/15/2012
8168976Display panel and method for manufacturing the same
A display panel includes a substrate having a display area and a blank area. The blank area includes at least one of a non-metal line region and a metal-line region. The non-metal line region includes a plurality of insulating patterns and a first conductive pattern...
05/01/2012
8158998High-reflectivity and low-defect density LED structure
The present invention discloses a high-reflectivity and low-defect density LED structure. A patterned dielectric layer is embedded in a sapphire substrate via semiconductor processes, such as etching and deposition. The dielectric layer is formed of two materials wh...
04/17/2012
8159023Semiconductor device
A semiconductor device includes a semiconductor substrate of a first conductivity type, a first semiconductor region of the first conductivity type on the semiconductor substrate, and a plurality of second semiconductor regions of a second conductivity type disposed...
04/17/2012
8159009Semiconductor device having strain material
A semiconductor device having strain material is disclosed. In a particular embodiment, the semiconductor device includes a first cell including a first gate between a first drain and a first source. The semiconductor device also includes a second cell adjacent to t...
04/17/2012
8160271Variable noise masking during periods of substantial silence
Methods and systems for masking audio noise are disclosed. One apparatus includes a silence detector configured to detect a period of substantial silence in an audio signal; a masking noise source operably coupled to the silence detector, the masking noise source co...
04/17/2012
8158997Optical element package and method of manufacturing the same
An optical element package includes: an optical element in a form of a chip, and a lens resin having a convex lens surface covering an optical functional surface of the optical element. The convex lens surface is formed as a rough surface having a plurality of minut...
04/17/2012
8154113Interconnect and test assembly including an interconnect
An interconnect includes an elastic body, an electric conductor and a spacer. The elastic body has a first surface, a second surface, a first hole extending from the first surface to the second surface, and a second hole extending from the first surface to the secon...
04/10/2012
8154092Silicon carbide MEMS structures and methods of forming the same
MEMS structures that include silicon carbide micromechanical components, as well as methods of forming and using the same, are provided. The silicon carbide micromechanical components may be integrated on the same structure with electronic components that control or...
04/10/2012
8154091Integrated electronic circuit including a thin film portion based on hafnium oxide
An integrated electronic circuit has a thin layer portion based on hafnium oxide. This portion additionally contains magnesium atoms, so that the portion is in the form of a hafnium-and-magnesium mixed oxide. Such a portion has a high dielectric constant and a very ...
04/10/2012
8148711Nonvolatile memory element, manufacturing method thereof, and nonvolatile semiconductor apparatus using nonvolatile memory element
A nonvolatile semiconductor apparatus of the present invention comprises (103), a second electrode (105), and a resistance variable layer (104) disposed between the first electrode (103) and the second electrode (105), a resistance...
04/03/2012
8148186Long-wavelength resonant-cavity light-emitting diode
An efficient long-wavelength light-emitting diode has a resonant-cavity design. The light-emitting diode preferably has self-organized (In,Ga)As or (In,Ga)(As,N) quantum dots in the light-emitting active region, deposited on a GaAs substrate. The light-emitting diod...
04/03/2012
8148763Three-dimensional semiconductor devices
Provided are a three-dimensional semiconductor device and a method of operating the same. The three-dimensional semiconductor device includes: a plurality of word line structures on a substrate; active semiconductor patterns between the plurality of word line struct...
04/03/2012
8150118Image recording apparatus, image recording method and image recording program stored on a computer readable medium
There is provided an image recording apparatus for assisting an observer who observes an observed person. The image recording apparatus includes an image-capturing section that captures an image of the observed person, an observation result input section that inputs...
04/03/2012
8143622Display panel
A display panel including a first substrate, a second substrate opposite to the first substrate and a display medium between the first substrate and the second substrate is provided. The first substrate has a scan line, a data line and an active device electrically ...
03/27/2012
8143667Semiconductor device having non-volatile memory and method of fabricating the same
A memory cell of a non-volatile memory device, comprises: a select transistor gate of a select transistor on a substrate, the select transistor gate comprising: a gate dielectric pattern; and a select gate on the gate dielectric pattern; first and second memory cell...
03/27/2012
8134150Hydrazine-free solution deposition of chalcogenide films
A method of depositing a film of a metal chalcogenide including the steps of: contacting an isolated hydrazinium-based precursor of a metal chalcogenide and a solvent having therein a solubilizing additive to form a solution of a complex thereof; applying the soluti...
03/13/2012
8133821Method of manufacturing porous insulating film, method of manufacturing semiconductor device, and semiconductor device
A method includes forming an insulating film over a substrate by introducing a cyclic siloxane compound having a cyclic siloxane as a skeleton and having at least one volatile hydrocarbon group bonded to a side chain, and a silicon-containing compound into a plasma,...
03/13/2012
8129796Semiconductor device
There is provided a high-integrated complementary metal-oxide semiconductor static random-access memory including an inverter. The inverter includes: a first pillar that is formed by integrating a first-conductivity-type semiconductor, a second-conductivity-type sem...
03/06/2012
8129226Power lead-on-chip ball grid array package
A packaging assembly (30), such as a ball grid array package, is formed which distributes power across an interior region of an integrated circuit die (52) by using an encapsulated patterned leadframe conductor (59) that is disposed over the die...
03/06/2012
8130978Dynamic switching of microphone inputs for identification of a direction of a source of speech sounds
This disclosure describes techniques of automatically identifying a direction of a speech source relative to an array of directional microphones using audio streams from some or all of the directional microphones. Whether the direction of the speech source is identi...
03/06/2012
8125035CMOS fabrication process
Ultra high temperature (UHT) anneals above 1200 C for less than 100 milliseconds for PMOS transistors reduce end of range dislocations, but are incompatible with stress memorization technique (SMT) layers used to enhance NMOS on-state current. This invention reverse...
02/28/2012
8125082Reduction of silicide formation temperature on SiGe containing substrates
A method that solves the increased nucleation temperature that is exhibited during the formation of cobalt disilicides in the presence of Ge atoms is provided. The reduction in silicide formation temperature is achieved by first providing a structure including a Co ...
02/28/2012
8124475Integrated circuit arrangement with capacitor and fabrication method
An integrated circuit arrangement contains an insulating region, which is part of a planar insulating layer, and a capacitor which contains: near and far electrode regions near and remote from the insulating region and a dielectric region. The capacitor and an activ...
02/28/2012
8124956Phase change memory devices
A phase change material including a high adhesion phase change material formed on a dielectric material and a low adhesion phase change material formed on the high adhesion phase change material. The high adhesion phase change material includes a greater amount of a...
02/28/2012
8126160Use of non-audible band to relay information for echo cancellation in a distributed media system
Particular embodiments provide for attenuating one or more microphone signals in a teleconferencing system upon detecting a non-audible signal. A far end voice signal is received from a sound source. A non-audible signal is added to the far end voice signal to creat...
02/28/2012
8124955Memory devices and methods of forming the same
Memory devices having a plurality of memory cells, with each memory cell including a phase change material having a laterally constricted portion thereof. The laterally constricted portions of adjacent memory cells are vertically offset and positioned on opposite si...
02/28/2012
8120082Ferroelectric memory device and method for manufacturing the same
Disclosed relates to a ferroelectric memory device that is manufactured easily, operates at low voltage and has excellent data preservation period, and a method of manufacturing the same. In the present invention, a ferroelectric layer 60 is formed on a part ...
02/21/2012
8120079Light-sensing device for multi-spectral imaging
A method of fabricating multi-spectral photo-sensors including photo-diodes incorporating stacked epitaxial superlattices monolithically integrated with CMOS devices on a common semiconductor substrate. ...
02/21/2012
8120102Semiconductor device
A semiconductor device includes a gate electrode GE electrically connected to a gate portion which is made of a polysilicon film provided in the inside of a plurality of grooves formed in a striped form along the direction of T of a chip region CA wherein the gate e...
02/21/2012
8120158Laminate electronic device
A laminate electronic device comprises a first semiconductor chip, the first semiconductor chip defining a first main face and a second main face opposite to the first main face, and having at least one electrode pad on the first main face. The laminate electronic d...
02/21/2012
8119496Semiconductor device and manufacturing method thereof
A thin semiconductor wafer, on which a top surface structure and a bottom surface structure that form a semiconductor chip are formed, is affixed to a supporting substrate by a double-sided adhesive tape. Then, on the thin semiconductor wafer, a trench to become a s...
02/21/2012
8120020Organic light emitting device
An organic light emitting device (OLED) including: a substrate; a first electrode; a second electrode facing the first electrode; a first blue light emitting layer, a green light emitting layer, a red light emitting layer, and a second blue light emitting layer all ...
02/21/2012
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