U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

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Patent No. 5571247

Self Containing Enclosure for Protection from Killer Bees

A self contained protective enclosure with an opening for entry and egress and a screen for ventilation and viewing.

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Examiner: Duda, Kathleen


Primary examiner statistics: 940 patents; average approval time: 939 days
Assistant examiner statistics: 134 patents; average approval time: 671 days

Patents as Primary Examiner (view all)

Patent No. Patent Title:
8187797 Method of manufacturing semiconductor device
8187798 Method of forming fine patterns
8182981 Pattern forming method
8178286 Double patterning method
8178289 System and method for photolithography in semiconductor manufactu...
8168373 Method for fabricating 3D microstructure
8168374 Method of forming a contact hole
8163468 Method of reducing photoresist defects during fabrication of a se...
8158334 Methods for forming a composite pattern including printed resolut...
8158335 High etch resistant material for double patterning
8153356 Method for forming film pattern
8153350 Method and material for forming high etch resistant double exposu...
8153348 Process sequence for formation of patterned hard mask film (RFP) ...
8153355 Immersion supporting plate cleaning method and a pattern forming ...
8148054 Immersion multiple-exposure method and immersion exposure system ...
8148051 Method and system for manufacturing openings on semiconductor dev...
8148052 Double patterning for lithography to increase feature spatial den...
8142986 Method of forming fine patterns of semiconductor device
8142985 Method for manufacturing semiconductor device
8137898 Method for manufacturing semiconductor device
8137902 Method of manufacturing mechanical and micromechanical parts
8133661 Superimpose photomask and method of patterning
8133663 Pattern forming method and apparatus
8133664 Methods of forming patterns
8129097 Immersion lithography
8129093 Prevention of photoresist scumming
8129096 Method for manufacturing conductive member pattern
8129101 Method for increasing the removal rate of photoresist layer
8129094 Method for manufacturing a semiconductor device
8124322 Method for manufacturing semiconductor device, and method for pro...
8124323 Method for patterning a photosensitive layer
8124325 Methods and apparatus for the manufacture of microstructures
8124321 Etching method for use in deep-ultraviolet lithography
8125034 Graded ARC for high NA and immersion lithography
8124326 Methods of patterning positive photoresist
8119333 Lithographic method
8119334 Method of making a semiconductor device using negative photoresis...
8114576 Method for fabricating electrical circuitry on ultra-thin plastic...
8110342 Method for forming an opening
8110345 High resolution lithography system and method

Patents as Assistant Examiner (view all)

Patent No. Patent Title:
5443932 Exposure method
5427895 Semi-subtractive circuitization
5427878 Semiconductor wafer processing with across-wafer critical dimensi...
5422228 Method of producing thin film multi-layered substrate
5407787 Process to fabricate thick coplanar microwave electrode structure...
5389497 Method for forming patterned solder mask
5387495 Sequential multilayer process for using fluorinated hydrocarbons ...
5366851 Device fabrication process
5366848 Method of producing submicron contacts with unique etched slopes
5366847 Method and apparatus for optimizing semiconductor exposure proces...
5362585 Seimconductor integrated circuit fabrication utilizing latent ima...
5362608 Microlithographic substrate cleaning and compositions therefor
5361121 Periphery exposing method and apparatus therefor
5360697 Forming self-aligned diffusion barriers in solid state devices us...
5358826 Method of fabricating metallized chip carries from wafer-shaped ...
5358810 Method of manufacturing liquid crystal display device
5358825 Manufacture of printed circuit conductors by a partially additive...
5358827 Phase-shifting lithographic masks with improved resolution
5350662 Maskless process for forming refractory metal layer in via holes ...
5330878 Method and apparatus for patterning an imaging member
5328808 Method for manufacturing edge emission type electroluminescent de...
5328807 Method of forming a pattern
5322764 Method for forming a patterned resist
5320932 Method of forming contact holes
5316900 Optical recording medium having a constant birefringent property ...
5316893 Method of producing electronic switching element
5316895 Photolithographic method using non-photoactive resins
5314772 High resolution, multi-layer resist for microlithography and meth...
5312717 Residue free vertical pattern transfer with top surface imaging r...
5310621 Semiconductor photolithography with superficial plasma etch
5310622 Method of patterning a reflective surface in an integrated circui...
5306602 Method of producing longitudinally fine striped type heat seal co...
5306601 Fine pattern forming material and pattern forming method
5302495 Method for the photolithographic production of structures on a su...
5302492 Method of manufacturing printing circuit boards
5298365 Process for fabricating semiconductor integrated circuit device, ...
5298363 Photolithographically patterned fluorescent coating
5296341 Green light laser imaging method
5296321 Photorecording element, method for production thereof, and the li...
5296333 Photoresist adhesion promoter
 
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