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| Number | Title | Issue Date |
| 4954421 | Photoflashing a liquid polymer layer on a phototool surface exposed to air A liquid photopolymer layer covering a phototool image surface with one surface exposed to air is exposed by radiation through the phototool to partially harden in a pattern defined by the image the photopolymer layer through a part of its thickness. The ... | 09/04/1990 |
| 4845014 | Method of forming a channel A method of forming a variable width channel in a body comprises the steps of forming a surface grating having a photoresist layer thereon. The photoresist layer has a plurality of depressions and a planar photomask is then positioned over the photoresist... | 07/04/1989 |
| 4772540 | Manufacture of microsieves and the resulting microsieves An ordinarily delicate microsieve is provided with greater resistance to mechanical distortion by being formed integrally with a rigid frame or by having its thickness built up to an extent where it is significantly more capable of withstanding flex.... | 09/20/1988 |
| 4762768 | Thermally stabilized photoresist images Photo resist image layers, particularly those used for high resolution geometries in microelectronic applications, are stabilized against distortion or degradation by the heat generated during subsequent etching, ion implantation processes and the like, b... | 08/09/1988 |
| 4760014 | Method for treating mixtures containing photopolymeric resin and compositions therefor A process for treating an aqueous alkaline spent mixture produced during preparation of circuit boards and comprising a photopolymer resin. According to the method, first, an acid, a polyvalent cation and a coagulation aid are mixed with the spent mixture... | 07/26/1988 |
| 4758485 | Slides and recording method for audiovisual slide show An audiovisual slide show is recorded by collecting a set of slides having pictures dealing with a broad topic. A strip of laser recording material is disposed on each slide. A laser writes a data pattern corresponding to spoken words on the strip. The wo... | 07/19/1988 |
| 4758502 | Photographic contrast masking with a photochromic body A contrast mask for a transparent photographic original may be formed by illuminating a photochromic body (11,41) through the original with white light. Preferably the photochromic body (11,41) is optically neutral (grey) and contains a silver halide as a... | 07/19/1988 |
| 4755442 | Pattern developing process and apparatus therefor A resist is coated on a photomask and a predetermined pattern is exposed on the resist. The photomask is dipped in a developing solution together with an electrode which exhibits a stable potential in the developing solution, so that a change in current f... | 07/05/1988 |
| 4752553 | High resolution solder mask photopolymers for screen coating over circuit traces High photo resolution of over 100 lines is obtained for solder masks of thicknesses greater than 0.002 in. (0.005 cm) with liquid photopolymers of special compositions deposited from mesh screens over printed wiring board traces and photoexposed with a ph... | 06/21/1988 |
| 4752555 | Method of manufacturing multilayer circuit board A first conductor layer made of a thick film conductor is formed with a predetermined pattern on a substrate. A thick film resistor is then formed to be connected to the first conductor layer. An insulating layer made of a polyimide resin is formed over t... | 06/21/1988 |
| 4751169 | Method for repairing lithographic transmission masks The invention concerns a method for repairing transmission masks. After the mask has been inspected and the position coordinates of the mask openings have been stored, these position coordinates are compared with the position coordinates of the desired ma... | 06/14/1988 |
| 4751172 | Process for forming metal images A method for coating a conductive surface with an organic coating where one discrete area of the organic coating is coated onto the surface in an image pattern by conventional means and another discrete area of the organic coating is electrophoretically d... | 06/14/1988 |
| 4749640 | Integrated circuit manufacturing process A process is disclosed for manufacturing an integrated circuit in which multiple patterned layers of thin film materials are provided on a silicon wafer. The wafer is conditioned between the providing of layers, after each etching step, by rinsing the ite... | 06/07/1988 |
| 4748103 | Mask-surrogate semiconductor process employing dopant protective region A mask-defect-immune process for making MOS semiconductor devices. The process features the creation of a surrogate mask in semiconductor wafer material per se, thus to eliminate the requirement that plural masks be used, and that plural mask alignments b... | 05/31/1988 |
| 4748104 | Selective metallization process and additive method for manufactured printed circuit boards A process for selective metallization of a substrate in a predetermined desired pattern, and particularly for the manufacture of printed circuit boards, in which a substrate patterned in desired manner with resist material is treated with conditioning age... | 05/31/1988 |
| 4746588 | Method for preparing a photosensitive film on a glass surface A photosensitive film on a glass surface is prepared by: dispensing a quantity of aqueous emulsion containing the film constituents on the surface, distributing the emulsion as a layer over the surface, leveling the distributed layer and then drying the l... | 05/24/1988 |
| 4746587 | Electron emissive mask for an electron beam image projector, its manufacture, and the manufacture of a solid state device using such a mask The mask part 41 includes a substrate 1, a patterning means 40 and a photoemissive layer 6. The patterning means 40 includes a mask pattern 2, 3 of apertures 3 and masking areas 2 and a modifying layer 4. Ultraviolet radiation 56 is patterned by patternin... | 05/24/1988 |
| 4738910 | Method of applying a resist A photoresist process which comprises a process for spin-coating a substrate with a resist, a process for transferring a mask pattern onto the coated resist film followed by exposure, and a developing process for forming a pattern on the substrate after t... | 04/19/1988 |
| 4738907 | Process for manufacturing a photomask A photomask manufacturing process including step of forming on a transparent silica glass substrate a silicide film in which an alloy comprising two or more metal elements is silicidized. A resist is applied onto the silicide film and then a patterning ma... | 04/19/1988 |
| 4738916 | Intermediate layer material of three-layer resist system An intermediate layer material of a three-layer resist system for use in processing of a semiconductor substrate, comprising an organopolysiloxane. The organopolysiloxane is expressed by a general formula (R3 SiO1/2)m.(R | 04/19/1988 |
| 4737447 | Process for producing micro Fresnel lens A process for producing a micro Fresnel lens comprising the following steps: applying a photoresist coat to a smooth-surfaced substrate such as a glass, plastic or metal plate; exposing the resist cost to actinic radiation such as an electron beam, laser ... | 04/12/1988 |
| 4737425 | Patterned resist and process A patterned image including on a substrate, a patterned image of a first resist polymeric material and patterned image of a second and different resist material on the first resist polymeric material. The polymeric material contains reactive hydrogen func... | 04/12/1988 |
| 4735890 | Photomasks for photolithographic fine patterning A photomask, used for the photolithographic fine patterning of a photoresist film in the preparation of semiconductors, is provided with a thin film of a polymeric material having resilient elasticity to cover the patterned masking layer and the surface o... | 04/05/1988 |
| 4735881 | Method for forming patterns by using a high-current-density electron beam A method incorporated in a high throughput EB lithography suitable to the fabrication of VLSI semiconductor circuit. The method comprises a step of providing patterns which are delineated to join together with an overlap determined in accordance with the ... | 04/05/1988 |
| 4735892 | Product and process for producing an image on a substrate A photosensitive element suitable for manufacture of an external nameplate comprises a substrate carrying a cured non-etchable background surface, an etchable curable polymeric layer that can be etched imagewise to provide an image viewable against a back... | 04/05/1988 |
| 4734345 | Semiconductor IC and method of making the same A method and apparatus for making a semiconductor device involves placing a semiconductor wafer in a position where two coherent light beams can interfere thereon. One of the coherent light beams is modulated by a hologram inserted in the path of the beam... | 03/29/1988 |
| 4732829 | Polymer printing Improved printing with polymers is achieved by interposing a liquid layer conforming to rough substrate surfaces and possibly exhibiting different characteristics from an outer surface polymer layer. This is particularly advantageous in printed wiring boa... | 03/22/1988 |
| 4732830 | Electrophoretic display panels and associated methods There is disclosed an electrophorectic display apparatus which includes a planar transparent member having disposed on a surface a plurality of vertical conductive lines to form a grid of lines in the Y direction. On top of the grid of vertical lines ther... | 03/22/1988 |
| 4732842 | Exposure method of semiconductor wafer by rare gas-mercury discharge lamp A semiconductor wafer one side of which has been coated with an ultraviolet sensitive material is exposed to light radiated from a rare gas-mercury discharge lamp. A rare gas-mercury discharge lamp filled with a rare gas such as xenon and mercury as princ... | 03/22/1988 |
| 4732838 | Method of forming a patterned glass layer over the surface of a substrate Patterned glass layers which are defect-free and have smooth surfaces are formed by a method wherein a mixture of glass frit and a photoresist composition is applied to the surface of the substrate; the layer is photolithographically patterned by exposing... | 03/22/1988 |
| 4732844 | Method for manufacturing optical disk with address and guide grooves A method for manufacturing an optical disk having both address pits and guide grooves having accurately controlled depths and widths. Two different types of sensitive materials of different characteristics are applied to a recording original board to form... | 03/22/1988 |
| 4729940 | Method of manufacturing master for optical information carrier For manufacturing a master for the replication of optical discs a plate of fine-grained copper is coated with a photoresist and exposed by a laser beam which is turned on and off in accordance with information to be recorded on the disc. After developing ... | 03/08/1988 |
| 4727012 | Method of manufacture for print heads of ink jet printers A print head of an ink jet printer is formed by a multilayer structure composed of a plurality of individual photoplastic films, segments of such films having a prescribed contour being removed by a photo-chemical treatment being defined on the individual... | 02/23/1988 |
| 4725517 | Method of manufacturing a liquid crystal display device A method of manufacturing a liquid crystal display device includes the steps of forming a transparent electrode on a surface of a substrate, patterning the transparent electrode, coating a photosensitive layer of resin on the patterned transparent electro... | 02/16/1988 |
| 4725528 | Production of non-tacky, smooth surfaces of photopolymer relief printing plates for flexographic printing Non-tacky, smooth, structureless surfaces of photopolymer relief printing plates for flexographic printing, whose relief layers are prepared in a conventional manner by exposing the photopolymerizable relief-forming layers of flexographic printing plates ... | 02/16/1988 |
| 4722882 | Method of manufacturing a semiconductor device A method of manufacturing a semiconductor device, in which method a pattern is etched by a dry etching process, for example, in a substrate protected by a resist pattern which is the negative of the pattern to be etched. In order to obtain a resist patter... | 02/02/1988 |
| 4720442 | Photomask blank and photomask A photomask blank comprising a transparent substrate and at least two layers including a masking layer and an antireflection layer, formed thereon, wherein said masking layer is a chromium masking layer containing more than 25% by atomic ratio of nitrogen... | 01/19/1988 |
| 4719160 | Method and apparatus for making white light holograms A method of making a white light hologram is disclosed. A diffraction grating is placed in contact with a film emulsion to provide a reference and object beam from the same light source.... | 01/12/1988 |
| 4719161 | Mask for X-ray lithography and process for producing the same There is disclosed a mask for X-ray lithography wherein a peroxopolytungsten compound is used as an absorber, and a process for producing the same. Since this compound has a sensitivity for electron beams and light and serves as an absorber for X-rays, a ... | 01/12/1988 |
| 4717645 | Method and apparatus for forming resist pattern A method for forming a highly precise resist pattern with good reproducibility has the steps of: applying a resist material to a substrate to form a resist film; baking the resist film; cooling the resist film in a controlled manner; selectively irradiati... | 01/05/1988 |
