| Patent No. | Patent Title: |
| 6884725 | Methods of forming materials within openings, and methods of form... |
| 6805615 | Planarizing solutions, planarizing machines and methods for mecha... |
| 6787408 | Method for forming an electrical insulating layer on bit lines of... |
| 6787472 | Utilization of disappearing silicon hard mask for fabrication of ... |
| 6779247 | Method of producing suspended elements for electrical connection ... |
| 6759343 | Method and composition for selectively etching against cobalt sil... |
| 6753261 | In-situ chemical composition monitor on wafer during plasma etchi... |
| 6752844 | Ceric-ion slurry for use in chemical-mechanical polishing |
| 6748959 | Carbon layer forming method |
| 6750153 | Process for producing macroscopic cavities beneath the surface of... |
| 6746961 | Plasma etching of dielectric layer with etch profile control |
| 6743698 | Semiconductor wafer, method for producing the same, and wafer chu... |
| 6743683 | Polysilicon opening polish |
| 6740596 | Manufacturing method of active matrix substrate |
| 6740597 | Methods of removing at least some of a material from a semiconduc... |
| 6740590 | AQUEOUS DISPERSION, AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL PO... |
| 6737326 | Method of integrating a thin film resistor in a multi-level metal... |
| 6734097 | Liner with poor step coverage to improve contact resistance in W ... |
| 6730608 | Full image exposure of field with alignment marks |
| 6723144 | Semiconductor device fabricating method |
| 6720268 | Method for anisotropic plasma etching of semiconductors |
| 6716755 | Composition and method for planarizing surfaces |
| 6709547 | Moveable barrier for multiple etch processes |
| 6706591 | Method of forming a stacked capacitor structure with increased su... |
| 6703286 | Metal bond pad for low-k inter metal dielectric |
| 6693038 | Method for forming electrical contacts through multi-level dielec... |
| 6689692 | Composition for oxide CMP |
| 6689693 | Methods for utilization of disappearing silicon hard mask for fab... |
| 6680256 | Process for planarization of flash memory cell |
| 6677242 | Integrated shallow trench isolation approach |
| 6670281 | HF etching and oxide scale removal |
| 6667218 | Enhancing semiconductor structure surface area using HSG and etch... |
| 6653227 | Method of cobalt silicidation using an oxide-Titanium interlayer |
| 6642149 | Plasma processing method |
| 6638867 | Method for forming a top interconnection level and bonding pads o... |
| 6617255 | Plasma processing method for working the surface of semiconductor... |
| 6617251 | Method of shallow trench isolation formation and planarization |
| 6613679 | Method for fabricating a semiconductor device |
| 6613678 | Process for manufacturing a semiconductor substrate as well as a ... |
| 6613693 | Etchant used in the manufacture of semiconductor devices and etch... |