Quotables
"Man will not fly for 50 years."
Wilbur Wright ; 1901
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 6716082 | Pinwheel A pinwheel has a rod, a shaft and multiple blade elements. The blade elements are rotatably attached to the shaft, and each blade element has a cutout so as to define a passage for wind passing therethrough in the blade element. In such a pinwheel, the blade element... | 04/06/2004 |
| 6126520 | Fixture and methodology for coupling an optical component to a machine The present invention provides a fixture (10) for coupling an optical component (12) to a machining apparatus through the use of a vacuum. The fixture includes a base (34) having means for coupling the fixture (10) to a machine and defining an aperture (5... | 10/03/2000 |
| 6110025 | Containment ring for substrate carrier apparatus This invention involves a containment ring that may be used in conjunction with a substrate carrier used for polishing a substrate to give the substrate a smooth and planar surface. The containment ring is generally constructed such that it tilts independ... | 08/29/2000 |
| 6102781 | Automatically securable travel limiting stops for pressure shoes used in an abrasive finishing machine An improved method and device for performing setup and adjustment of pressure shoes used in an abrasive finishing machine. The setup of the pressure shoe stop limit device is performed automatically and remotely. The stop limit is hydraulically locked in ... | 08/15/2000 |
| 6074286 | Wafer processing apparatus and method of processing a wafer utilizing a processing slurry A wafer processing apparatus and method of processing a wafer utilizing a processing slurry are provided. The wafer processing disk comprises a processing disk body and a plurality of processing teeth secured to the processing disk body. The plurality of ... | 06/13/2000 |
| 6074288 | Modified carrier films to produce more uniformly polished substrate surfaces A substrate holder assembly for forming a substantially uniformly polished substrate surface during chemical-mechanical polishing is described. The substrate holder assembly includes a carrier film having: (A) a porous layer with (i) a first surface with ... | 06/13/2000 |
| 6062957 | Dry abrasive blasting head having rotating nozzles The useful life of a dry abrasive blasting head is greatly extended by two design features. First, the tube on which the rotating nozzles are mounted is protected from abrasion by an easily-replaced wear tube which is a sleeve-like liner. Secondly, the re... | 05/16/2000 |
| 6062963 | Retainer ring design for polishing head of chemical-mechanical polishing machine A chemical-mechanical polishing machine having an improved wafer retainer ring design for the polishing head, comprising a polishing table, a polishing pad, a polishing head and a wafer retainer ring, wherein the polishing pad is above the polishing table... | 05/16/2000 |
| 6053803 | Apparatus and method for generating a pressurized fluid stream having abrasive particles An abrasive nozzle assembly comprises a casing, a nozzle head and an abrasive nozzle mounted coaxially to generate a high-velocity abrasive airstream. The nozzle head has a cavity with a nozzle orifice. The casing includes an air passage, which communicat... | 04/25/2000 |
| 6045437 | Method and apparatus for polishing a hard disk substrate Substrates to be used in manufacturing hard disks are polished in a two-step process entailing a coarse and fine polishing in a single polishing machine. The use of this method and apparatus eliminates the need for two separate polishing machines and for ... | 04/04/2000 |
| 6033294 | Turntable of nylon fiber grinding wheel An improved turntable of a nylon fiber grinding wheel, which is integrally made of plastic by injection has a predetermined amount of flexibility. The turntable has a locking hole provided at a center portion therethrough, and a ring groove encircling the... | 03/07/2000 |
| 6027398 | Wafer polishing apparatus A wafer is polished while it is pressed against a polishing cloth through a pressure air layer, and a polished surface adjustment ring as well as the wafer are pressed against the polishing cloth. The wafer is polished in the state wherein a collapsing po... | 02/22/2000 |
| 6024634 | Grinding product and method of making same A grinding product and a method of making same. The grinding product comprises a woven or knitted cloth of multifilament threads (1) whose fibers (2) form projecting loops (3), and separate agglomerates (4) of grinding material applied to the loops. Durin... | 02/15/2000 |
| 6024631 | Method and apparatus to hold integrated circuit chips onto a chuck and to simultaneously remove multiple integrated circuit chips from a cutting chuck A cutting chuck for use with a cutting blade and for holding a semiconductor wafer in place during a dicing process and a die pick for picking the segmented semiconductor wafer from the chuck. The chuck includes a surface for supporting the wafer and seve... | 02/15/2000 |
| 6014965 | Apparatus for recognizing the shape of a semiconductor wafer The present invention provides an apparatus for recognizing the shape of a semiconductor wafer, capable of stably achieving accurate shape recognition without being affected by either a circuit pattern formed on the semiconductor wafer or the color of an ... | 01/18/2000 |
| 6015337 | Polishing apparatus A polishing apparatus for polishing for example a semiconductor wafer to a high degree of flatness includes a turntable to the upper surface of which is affixed a polishing cloth and a top ring. A surface of the workpiece interposed between the polishing ... | 01/18/2000 |
| 6012969 | Abrasive member for very high return loss optical connector ferrules An abrasive member for a very high return loss optical connector ferrule is used in abrading an end of an optical connector ferrule having a ferrule hole, in which an optical fiber has been inserted and secured, into a convex spherical surface. The abrasi... | 01/11/2000 |
| 5997392 | Slurry injection technique for chemical-mechanical polishing An apparatus for polishing a semiconductor wafer is provided comprising a wafer carrier to provide a force against a wafer and a rotating polishing pad during the polishing operation and a polishing slurry distributor device disposed to provide a spray of... | 12/07/1999 |
| 5997386 | Automated deburring assembly An apparatus for abrading or deburring a workpiece is provided and includes in combination a conveyor for moving the workpiece from a first position to a second position and at least two assemblies intermediate the first and second positions and opposite ... | 12/07/1999 |
| 5992404 | Process and device for clearing out joints in masonry A process and a device for clearing out joints in masonry is disclosed. The clearing out is effected by producing a groove by high-pressure water jets that are so oriented and guided relative to one another and relative to the desired groove. Further, a g... | 11/30/1999 |
| 5989102 | Apparatus for facetting ophthalmic lenses The description relates to a device for facetting ophthalmic lenses with at least one facetting tool which can be engaged with a ophthalmic lens held in a clamp and with a control unit for the facetting tool in which the reference data for the radius r of... | 11/23/1999 |
| 5989104 | Workpiece carrier with monopiece pressure plate and low gimbal point A carrier for semiconductor wafers to be polished comprises a rigid upper housing, a rigid pressure plate and a gimbal mechanism connecting the plate and housing which permits the plate to gimbal or wobble relative to the housing. The pressure plate is a ... | 11/23/1999 |
| 5989107 | Method for polishing workpieces and apparatus therefor A polishing method and a compact apparatus for the method are presented for efficient production of a polished workpiece for manufacturing high technology devices. The polishing method comprises a first and second steps for polishing a work surface. In th... | 11/23/1999 |
| 5989109 | Seal protecting method for use with spiral-flow barrel finishing machine and spiral-flow barrel finishing machine with seal protecting apparatus Any part of an abrasive media in a solid particle or liquid form is prevented from entering a seal and/or the area where a rotary shaft bearing for a rotating barrel is sealed, thereby protecting the bearing and/or its seal against any possible damage tha... | 11/23/1999 |
| 5989113 | Tool for mechanical surface treatment A tool for a mechanical surface treatment of an object by friction is disclosed. The tool is cut to a desired shape and size from a processed fleece of fibers. The fleece is produced by exclusively mechanical processes as a flexible random-fiber fleece wh... | 11/23/1999 |
| 5984764 | Method of dressing an abrasive cloth and apparatus therefor The present invention relates to a method of discovering optimal conditions such as the rotational speed ratio of an abrasive cloth and a dresser, to improve the flatness of the abrasive cloth after it has been dressed. A narrow annular dresser having an ... | 11/16/1999 |
| 5980369 | Level flying burnishing head with circular burnishing pads A burnishing head for burnishing the surface of magnetic or magneto-optical memory disks is described. The burnishing head comprises a plurality of curved burnishing pads symmetrically arranged on the bottom surface of the head. In one embodiment, there a... | 11/09/1999 |
| 5975992 | Method and apparatus for edge finishing glass A method and apparatus for edge finishing glass sheets. Glass sheets are separated into desired sizes, after which the edges of the glass sheets are finished using edge polishing methods, such as, for example, by contacting and moving the edges of the gla... | 11/02/1999 |
| 5975994 | Method and apparatus for selectively conditioning a polished pad used in planarizng substrates A method and apparatus for selectively conditioning a planarizing surface of a polishing pad. In one embodiment, a conditioning system has a carrier assembly with an arm that may be positioned over a polishing pad, a conditioning element coupled to the ar... | 11/02/1999 |
| 5971841 | Flexible, open-pored cleaning body A flexible, open-pored cleaning body having at least one scouring surface (2) provided in at least one subregion with continuously formed, raised projecting ridges (3), wherein the ridges (3) have regions C,D of different heights in the direction of their... | 10/26/1999 |
| 5971838 | Rail-scraper devices and installations An abrasive block 1 used for scraping wet leaves, snow or ice from a rail R of a railway track in order to enhance traction, is urged onto the rail R by a piston 2 under oil-pressure within a cylinder 3. The pressure is created via a diaphragm 11 which se... | 10/26/1999 |
| 5967885 | Method of manufacturing an integrated circuit using chemical mechanical polishing A method of manufacturing integrated circuits using a carrier fixture. The carrier fixture does not include transport channels or openings for directing a slurry to a substrate being polished and, as a result, damage to the substrate is reduced because th... | 10/19/1999 |
| 5967880 | Method and apparatus for ultrasonically texturing ABS of magnetic head of hard disk drive A method and apparatus for texturing the air bearing surface (ABS) of a magnetic head of a hard disk drive includes juxtaposing the ABS with an ultrasonically-driven sonitrode having a diamond die end. An alumina slurry is disposed between the sonitrode a... | 10/19/1999 |
| 5964643 | Apparatus and method for in-situ monitoring of chemical mechanical polishing operations An in-situ method of measuring uniformity of a layer on a substrate during polishing of said layer, where the method includes the steps of directing a light beam toward the layer during polishing; monitoring an interference signal produced by the light be... | 10/12/1999 |
| 5964652 | Apparatus for the chemical-mechanical polishing of wafers An apparatus for the chemical-mechanical polishing of wafers has a rotating disk provided with a polishing body, a supply device for a polishing fluid and a holding device for the wafer. An axis of the disk runs parallel to the surface of the wafer. A cyl... | 10/12/1999 |
| 5964644 | Abrasive jet stream polishing Abrasive jet stream polishing, wherein an abrasive is suspended in a flowable jet medium and projected at high velocity and pressure at a workpiece is provide, where the jet is projected at the surface to be polished at an oblique angle. The method is sub... | 10/12/1999 |
| 5964648 | Chipper knife grinding method and apparatus A method and apparatus for sharpening the knives of a chipper, with the knives remaining in a knife basket during sharpening, and the knife basket being removed from the chipper and placed in a knife basket carrier in which it is rotatably mounted. The kn... | 10/12/1999 |
| 5957757 | Conditioning CMP polishing pad using a high pressure fluid The present invention advantageously provides a method for conditioning a polishing pad used for chemical mechanical polishing of a semiconductor wafer surface. The method involves directing a fluid at a relatively high pressure toward the surface of the ... | 09/28/1999 |
| 5957764 | Modular wafer polishing apparatus and method A wafer polishing apparatus includes a module frame; a continuous belt rotatable with respect to the frame, the belt having at least one vertically-oriented belt transverse portion including a polishing pad assembly; and at least one pivotable wafer-holdi... | 09/28/1999 |
| 5957759 | Slurry distribution system that continuously circulates slurry through a distribution loop A slurry distribution system for distributing slurry to a polishing machine that polishes a semiconductor wafer is disclosed. The slurry distribution system includes a storage tank for storing the slurry, a mixing device for mixing the slurry in the stora... | 09/28/1999 |
