| Patent No. | Patent Title: |
| 5470799 | Method for pretreating semiconductor substrate by photochemically... |
| 5443997 | Method for transferring heat to or from a semiconductor wafer usi... |
| 5431772 | Selective silicon nitride plasma etching process |
| 5426073 | Method of fabricating semiconductor devices using an intermediate... |
| 5405489 | Method for fabricating an interlayer-dielectric film of a semicon... |
| 5393710 | Method for manufacturing a micro light valve |
| 5380683 | Ionized cluster beam deposition of sapphire and silicon layers |
| 5380398 | Method for selectively etching AlGaAs |
| 5380682 | Wafer processing cluster tool batch preheating and degassing meth... |
| 5374318 | Process for the deposition of diamond films using low energy, ... |
| 5368647 | Photo-excited processing apparatus for manufacturing a semiconduc... |
| 5366588 | Method of manufacturing an electrically conductive pattern of tin... |
| 5354387 | Boron phosphorus silicate glass composite layer on semiconductor ... |
| 5354715 | Thermal chemical vapor deposition of silicon dioxide and in-situ ... |
| 5354710 | Method of manufacturing semiconductor devices using an adsorption... |
| 5354386 | Method for plasma etching tapered and stepped vias |
| 5352248 | Pyrometer temperature measurement of plural wafers stacked on a ... |
| 5352328 | Control of time-dependent haze in the manufacture of integrated c... |
| 5352636 | In situ method for cleaning silicon surface and forming layer the... |
| 5350492 | Oxide removal method for improvement of subsequently grown oxides |
| 5350491 | Oxide removal method for improvement of subsequently grown oxides... |
| 5346853 | Microwave energized deposition process with substrate temperature... |
| 5336371 | Semiconductor wafer cleaning and rinsing techniques using re-ioni... |
| 5336363 | Low temperature dry etch of copper |
| 5334555 | Method of determining conditions for plasma silicon nitride film ... |
| 5334539 | Fabrication of poly(p-phenyleneacetylene) light-emitting diodes |
| 5332441 | Apparatus for gettering of particles during plasma processing |
| 5332468 | Method for structuring a layer using a ring electrode and multipl... |
| 5330936 | Method of producing a silicon nitride film and method of fabricat... |
| 5326427 | Method of selectively etching titanium-containing materials on a ... |
| 5326490 | Surface tension sulfuric acid composition |
| 5322806 | Method of producing a semiconductor device using electron cyclotr... |
| 5320984 | Method for forming a semiconductor film by sputter deposition in ... |
| 5318928 | Method for the surface passivation of sensors using an in situ sp... |
| 5316974 | Integrated circuit copper metallization process using a lift-off ... |
| 5314848 | Method for manufacturing a semiconductor device using a heat trea... |
| 5314845 | Two step process for forming void-free oxide layer over stepped s... |
| 5312778 | Method for plasma processing using magnetically enhanced plasma c... |
| 5312781 | Flash EEPROM fabrication process that uses a selective wet chemic... |
| 5312783 | Process for the preparation of a high dielectric thin film using ... |
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