| Patent No. | Patent Title: |
| 6960488 | Method of fabricating a microfabricated high aspect ratio device ... |
| 6936897 | Intermediate structure having a silicon barrier layer encapsulati... |
| 6933228 | Method of manufacturing of contact plug in a contact hole on a si... |
| 6884631 | Method of forming a ferroelectric film by direct annealing of the... |
| 6881687 | Method for laser cleaning of a substrate surface using a solid sa... |
| 6815827 | Electrical connection between two faces of a substrate and manufa... |
| 6790741 | Process for producing a semiconductor device |
| 6784062 | Transistor formation for semiconductor devices |
| 6784076 | Process for making a silicon-on-insulator ledge by implanting ion... |
| 6781216 | Semiconductor device having wiring patterns with insulating layer |
| 6781201 | Semiconductor device including power MOSFET and peripheral MOSFET... |
| 6780727 | Method for forming a MIM (metal-insulator-metal) capacitor |
| 6774408 | Trench gate power device having a concentration at channel layer ... |
| 6770552 | Method of forming a semiconductor device having T-shaped gate str... |
| 6762470 | Fingerprint sensor having a portion of the fluorocarbon polymer p... |
| 6753565 | Container capacitor array having a common top capacitor plate |
| 6753579 | SOI MOSFET device having second gate electrode for threshold volt... |
| 6747333 | Method and apparatus for STI using passivation material for trenc... |
| 6743668 | Process for forming a metal oxy-nitride dielectric layer by varyi... |
| 6737362 | Method for manufacturing a thin gate dielectric layer for integra... |
| 6734081 | Shallow trench isolation structure for laser thermal processing |
| 6734094 | Method of forming an air gap within a structure by exposing an ul... |
| 6730962 | Method of manufacturing and structure of semiconductor device wit... |
| 6730579 | Method of manufacturing a semiconductor dice by partially dicing ... |
| 6727160 | Method of forming a shallow trench isolation structure |
| 6727190 | Method of forming fluorine doped boron-phosphorous silicate glass... |
| 6727558 | Channel isolation using dielectric isolation structures |
| 6720238 | Method for manufacturing buried areas |
| 6713372 | Method for manufacturing synchronous DRAM device |
| 6713847 | Method of fabricating semiconductor device, and semiconductor dev... |
| 6710420 | Semiconductor construction of a trench |
| 6696329 | Method of manufacturing semiconductor device |
| 6686244 | Power semiconductor device having a voltage sustaining region tha... |
| 6680538 | Semiconductor device for suppressing detachment of conductive lay... |
| 6677679 | Use of SiO2/Sin for preventing copper contamination of low-k diel... |
| 6677252 | Methods for planarization of non-planar surfaces in device fabric... |
| 6670690 | Method of making an improved field oxide isolation structure for ... |
| 6660613 | Method and device for forming an STI type isolation in a semicond... |
| 6653178 | Thin film transistor and method for manufacturing the same |
| 6649487 | Method of manufacturing semiconductor integrated circuit device |