Bizarre Patents
User-operated amusement apparatus for kicking the user's buttocks
An apparatus including a user-operated and controlled apparatus for self-infliction of repetitive blows to the user's buttocks by a plurality of elongated arms bearing flexible extensions that rotate under the user's control.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Application No. | Application Title | Issue Date |
| 20120129357 | TWO-DIMENSIONAL PATTERNING EMPLOYING SELF-ASSEMBLED MATERIAL A first nanoscale self-aligned self-assembled nested line structure having a sublithographic width and a sublithographic spacing and running along a first direction is formed from first self-assembling block copolymers within a first layer. The first layer is filled wit... | 05/24/2012 |
| 20120128891 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM FOR NANOIMPRINT There is provided a composition for curing a resist underlayer film used as an underlayer of a resist for nanoimprint in nanoimprint lithography of a pattern forming process by heat-baking, light-irradiation or both of them to form the resist underlayer film. A composit... | 05/24/2012 |
| 20120038085 | DYNAMIC NANO-INSCRIBING FOR CONTINUOUS AND SEAMLESS METAL AND POLYMER NANOGRATINGS Nanoscale grating structure can be utilized in many practical applications in optics, flat-panel displays and bio-sensors. A Dynamic Nano-Inscribing (Dynamic Nano-Inscribing) technique is disclosed for directly creating large-area, truly continuous nano-grating patterns... | 02/16/2012 |
| 20120015069 | NANO PATTERN WRITER A nano pattern writer includes an array of nano needles extending from a groove in a substrate. A first portion of each nano needle is located in a respective groove of the first layer and the second portion extends from the groove. The nano pattern writer includes a se... | 01/19/2012 |
| 20120003348 | NANO-IMPRINT MOLD A nano-imprint mold includes a mold base; mold body having a first surface and a second surface opposite the first surface; and an elastic body disposed between a surface of the mold base and the first surface of the mold body, the elastic body being composed of resin. ... | 01/05/2012 |
| 20110318535 | THREE-DIMENSIONAL NANOSTRUCTURES AND METHOD FOR FABRICATING THE SAME A three-dimensional nanostructures and a method for fabricating the same, and more particularly to three-dimensional structures of various shapes having high aspect ratio and uniformity in large area and a method of fabricating the same by attaching a target material to... | 12/29/2011 |
| 20110303640 | NANOIMPRINT METHOD A nanoimprint method is provided. A substrate and a master stamp are first provided. The substrate has a first resist layer, a transition layer, and a second resist layer orderly formed thereon. The master stamp has a nanopattern defined therein. The second resist layer... | 12/15/2011 |
| 20110294073 | PREPARING METHOD OF METAL POWDER AND METHOD OF MANUFACTURING INNER ELECTRODE OF MULTILAYER CERAMIC CAPACITOR USING THE SAME The present invention provides a method for preparing metal powder, which includes the steps of: providing a base substrate; forming a pattern layer, having a concave-convex pattern of a predetermined shape, on the base substrate; forming a metal film separated from the... | 12/01/2011 |
| 20110244571 | CELL GROWTH Methods of preparing pre-engineered surfaces using various nanolithography techniques to generate, isolate, and multiply homogeneous cell populations. Surfaces can be treated by etching before exposure to biological systems like cells. Stem cell applications are describ... | 10/06/2011 |
| 20110212556 | PROCESS TO FORM A MOLD OF NANOIMPRINT TECHNIQUE FOR MAKING DIFFRACTION GRATING FOR DFB-LD A process using the nanoimprint technique to form the diffraction grating for the DFB-LD is disclosed. The process includes (a) coating a resist for the EB exposure on a dummy substrate, (b) irradiating the resist as varying the acceleration voltage, (c) forming a resis... | 09/01/2011 |
| 20110111012 | Nanomaterial wound dressing assembly Wound dressing assemblies and methods of producing the wound dressing assemblies. The wound dressing assemblies various comprise individual layers of nanomaterials that have been formed according to an electrospinning process. Each of the l... | 05/12/2011 |
| 20110085939 | NODE POLYPEPTIDES FOR NANOSTRUCTURE ASSEMBLY Engineered proteins are used in the assembly of two-dimensional and three-dimensional nanostructure assemblies, based on systematic design and production of protein node structures that can be interconnected, for example, with streptavidin or streptavidin-incorporating ... | 04/14/2011 |
| 20110043823 | OPTICAL FILTER AND METHOD FOR THE PRODUCTION OF THE SAME, AND DEVICE FOR THE EXAMINATION OF ELECTROMAGNETIC RADIATION The invention relates to an optical filter and a method for its production, and to a device for the examination of the spectral and spatial distribution of an electromagnetic radiation irradiated from an object. The invention is based on the task of providing an optical... | 02/24/2011 |
| 20110042850 | Method of manufacturing plastic surface with superhydrophobicity and high transparency A method of manufacturing a plastic surface with superhydrophobicity and high transparency is disclosed. In this method, a thermal nanoimprinting mold method is used to form a plurality of sub-20 nm nanograss structure on a surface of a cyclic-olefin copolymer (COC) mat... | 02/24/2011 |
| 20110008577 | PROCESS FOR PRODUCTION OF FINE STRUCTURE Disclosed is a process for the production of a fine structure through nanoimprinting a photocurable resin composition. The process includes the steps of (1) forming a photocurable resin composition for nanoimprint into a film on a support and transferring a pattern to t... | 01/13/2011 |
| 20100320645 | DUAL ZONE TEMPLATE CHUCK A template chuck includes multiple zones to provide 1) an imprint bend optimized to provide high curvature and provide contact at middle radius of substrate and/or, 2) separation bend zone with an increased free span zone and high crack angle.... | 12/23/2010 |
| 20100308009 | NANOIMPRINT RESIST, NANOIMPRINT MOLD AND NANOIMPRINT LITHOGRAPHY A nanoimprint resist that includes a hyperbranched polyurethane oligomer (HP), a perfluoropolyether (PFPE), a methylmethacrylate (MMA), a diluent solvent and a photo initiator. A method of a nanoimprint lithography is also provided.... | 12/09/2010 |
| 20100311613 | PATTERNED NANOSUBSTRATES MADE BY DIRECTED SELF ASSEMBLY OF AMPHIPHILIC MOLECULES Nanoscale patterns prepared by lithography are used to direct the self-assembly of amphiphilic molecules to form patterned nanosubstrates having a desired distribution of chemical functional moieties. These patterns can be fabricated over a large area and require no spe... | 12/09/2010 |
| 20100308008 | NANOIMPRINT RESIST, NANOIMPRINT MOLD AND NANOIMPRINT LITHOGRAPHY A nanoimprint resist includes a hyperbranched polyurethane oligomer (HP), a perfluoropolyether (PFPE), a methylmethacrylate (MMA), and a diluent solvent. A method of a nanoimprint lithography is also provided.... | 12/09/2010 |
| 20100279228 | ORGANO-METALLIC HYBRID MATERIALS FOR MICRO- AND NANOFABRICATION One embodiment of the present invention provides a photosensitive organo-metallic hybrid material which functions as both a structural material and a photoresist material. More specifically, this photosensitive organo-metallic hybrid material includes an organo-metallic... | 11/04/2010 |
| 20100230864 | Nanoimprint Lithography Template and Method of Fabricating Semiconductor Device Using the Same Nanoimprint lithography templates and methods of fabricating semiconductor devices using the nanoimprint lithography templates are provided. The nanoimprint lithography template includes a transparent substrate having a first refractive index, a stamp pattern on a surfa... | 09/16/2010 |
| 20100208762 | LASER DIODE HAVING NANO PATTERNS AND METHOD OF FABRICATING THE SAME A laser diode having nano patterns is disposed on a substrate. A first conductive-type clad layer is disposed on the substrate, and a second conductive-type clad layer is disposed on the first conductive-type clad layer. An active layer is interposed between the first c... | 08/19/2010 |
| 20100165512 | SYSTEM, METHOD AND APPARATUS FOR MASTER PATTERN GENERATION, INCLUDING SERVO PATTERNS, FOR ULTRA-HIGH DENSITY DISCRETE TRACK MEDIA USING E-BEAM AND SELF-ASSEMBLY OF BLOCK COPOLYMER MICRODOMAINS A system, method, and apparatus for forming a high quality master pattern for patterned media, including features to support servo patterns, is disclosed. Block copolymer self-assembly is used to facilitate the formation of a track pattern with narrower tracks. E-beam l... | 07/01/2010 |
| 20100159229 | REMOVAL OF BULGE EFFECTS IN NANOPATTERNING A nanostructure without bulges and a method of fabricating the nanostructure are provided. The method includes forming a nanopattern on a surface of a polymer, allowing the surface of the polymer with the nanopattern to come into contact with a predetermined solvent, an... | 06/24/2010 |
| 20100109203 | FLEXIBLE NANOIMPRINT MOLD, METHOD FOR FABRICATING THE SAME, AND MOLD USAGE ON PLANAR AND CURVED SUBSTRATE The present invention provides a flexible nanoimprint mold which can fabricate sub-15 nm ultra fine structures on either planar or curved substrates. The mold comprises a top ultra-thin rigid layer of imprint patterning features and a bottom thick flexible layer of poly... | 05/06/2010 |
| 20100055620 | NANOSTRUCTURE FABRICATION Techniques for fabricating nanostructures are provided. In one embodiment a method includes forming a multilayer stack including at least one pair of a structural layer and a sacrificial layer on a substrate, patterning the multilayer stack in order to fabricate a nanos... | 03/04/2010 |
| 20090201722 | METHOD INCLUDING MAGNETIC DOMAIN PATTERNING USING PLASMA ION IMPLANTATION FOR MRAM FABRICATION A method for defining magnetic domains in a magnetic thin film on a substrate, includes: coating the magnetic thin film with a resist; patterning the resist, wherein areas of the magnetic thin film are substantially uncovered; and exposing the magnetic thin film to a pl... | 08/13/2009 |
| 20090174118 | Method and device for nano-imprinting A nanoimprint system according to one embodiment of the present invention is a system for performing a pattern transfer onto an object to be molded by pressing a mold against the object to be molded using a head, characterized in that the head has a flat pressing surfac... | 07/09/2009 |
| 20090136583 | Sol-Gel phase-reversible hydrogel templates and uses thereof Discrete microstructures of predefined size and shape are prepared using sol-gel phase-reversible hydrogel templates. An aqueous solution of hydrogel-forming material is covered onto a microfabricated silicon wafer master template having predefined microfeatures, such a... | 05/28/2009 |
| 20090131858 | Ultrafiltration Membrane, Device, Bioartificial Organ, And Related Methods The present invention relates to ultrafiltration. In particular, the present invention provides nanoporous membranes having pores for generating in vitro and in vivo ultrafiltrate, devices and bioartificial organs utilizing such nanoporous membranes, and related methods... | 05/21/2009 |
| 20080272516 | Successive Shrinking of Elastomers - a Simple Miniaturization Protocol to Produce Micro- and Nano-Structures A stepwise contraction and adsorption nanolithography (SCAN) patterning process can shrink complex microstructures (produced by current microfabrication technology) into the nanometer region. The basis of SCAN is to transfer a pre-engineered microstructure onto a extend... | 11/06/2008 |
| 20080143019 | RELEASE SURFACES, PARTICULARLY FOR USE IN NANOIMPRINT LITHOGRAPHY The addition of thin coatings (less than and approaching monomolecular coatings) of persistent release materials comprising preferred compounds of the formula:
06/19/2008 | |
| 20080131705 | METHOD AND SYSTEM FOR NANOSTRUCTURE PLACEMENT USING IMPRINT LITHOGRAPHY A method (and system) of nanostructure placement using imprint lithography, includes applying a mixture containing an additive exhibiting predetermined properties, to a substrate, bringing one of the substrate and a template containing a relief structure into contact wi... | 06/05/2008 |
| 20080090052 | Nanoimprint Mold, Method of Forming a Nonopattern, and a Resin-Molded Product Releasability of a mold and a resin layer during nanoimprinting is improved, thereby improving the durability of the mold. A nanoimprint mold for resin molding comprising a carbon nanowall layer provided on the surface thereof, a method of forming a nanopattern using th... | 04/17/2008 |
| 20080083926 | Printing device structures using nanoparticles The specification and drawings present a new apparatus and method for printing transistor or diode structures using nanoparticles (e.g., silicon nanoparticles). Si-based electronic structures (e.g., transistors, diodes) can be printed in a simple low cost process and th... | 04/10/2008 |
| 20070269924 | Patterning nanowires on surfaces for fabricating nanoscale electronic devices The present invention relates to a method of depositing nanowires on the surface of a substrate, comprising the steps of:
| |
| 20070243655 | Self-Aligned Process for Fabricating Imprint Templates Containing Variously Etched Features A process that enables coplanarization of the structures that have been created in multiple independent etch steps. The various etches are performed independently by selectively exposing only certain patterns to particular etching conditions. After these structures have... | 10/18/2007 |
| 20070228608 | Preserving Filled Features when Vacuum Wiping A method/process for curing imprint on a template prior to contact with a substrate. A curing process is used to adhere the imprint to a wafer or substrate. Monomer is deposited on a template and then partially cured using a UV exposure. The exposure is controlled so th... | 10/04/2007 |
| 20070210460 | Substrate processing and alignment A substrate can efficiently be manufactured by separating the alignment and the actual processing when an alignment mark is provided, which is fixed with respect to the substrate and when position information on a position of a process area on the substrate is retrieved... | 09/13/2007 |
| 20070200187 | Nanowire device and method of making A method (40) for fabricating a nanoscale device, includes nano-imprinting (44) a one dimensional nanostructure (20) on a material (12), forming (46) a patterning layer (22, 26) over the one dimensional nanostructure (20)... | 08/30/2007 |
