U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Icon_funbox Bizarre Patents

Patent No. 6725510

Inclining coffin

A coffin, for allowing inclination for display of a deceased person in a natural position.

Newsletter  PatentStorm News

Make the Most of Our Site

See this month's Top Inventors and Most Cited Patents.

Stay on top of the latest innovations by subscribing to an RSS feed.

Registered users: Manage your profile.

 

Class 977/854 - Semiconductor sample


Subclass of Class 977 - Nanotechnology
Definition: Subject matter wherein the sample is a semiconductor material.
No. of patents: 5
Last issue date: 09/30/2008


NumberTitleIssue Date
7429732Scanning probe microscopy method and apparatus utilizing sample pitch
The preferred embodiments are directed to a method and apparatus of operating a scanning probe microscope (SPM) to perform sample measurements using a survey scan that is less than five lines, and more preferably two lines, to accurately locate a field of features o...
09/30/2008
7420106Scanning probe characterization of surfaces
Characterizing dielectric surfaces by detecting electron tunneling. An apparatus includes an atomic force probe. A mechanical actuator is connected to the atomic force probe. A mechanical modulator is connected to the mechanical actuator. The mechanical modulator mo...
09/02/2008
7414250Cryogenic variable temperature vacuum scanning tunneling microscope
A cryogenic variable temperature scanning tunneling microscope of novel design and component configuration, for use in conjunction with a variety of low temperature methodologies. ...
08/19/2008
7279046Method and apparatus for aligning patterns on a substrate
A system and method for aligning prior patterning positions formed by a first SPM tip with a second SPM tip in combination with an SPM system includes identifying first location information that includes a location of the first SPM tip and a sample reference locatio...
10/09/2007
6620563Lithography method for forming semiconductor devices on a wafer utilizing atomic force microscopy
A semiconductor device on a wafer is formed by lithography with the following steps of: coating (13) a lithography resist onto said wafer in a coating means (5), exposing (14) said wafer to an irradiation through a reticle in an exposure tool (4), stabili...
09/16/2003
 
Sign InRegister
Username  
Password   
forgot password?