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| Number | Title | Issue Date |
| 7372541 | Lithographic apparatus and device manufacturing method In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. Gas is used between the structure and the surface of the substrate to contain liquid in the space.... | 05/13/2008 |
| 7365827 | Lithographic apparatus and device manufacturing method A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts. ... | 04/29/2008 |
| 7357830 | Device for dehumidifying room air A device for dehumidifying room air has a chamber consisting of at least one first cavity (1) and at least one second cavity (2). The cavities are separated by at least one water-permeable and/or water-vapor-permeable structure (3), these struct... | 04/15/2008 |
| 7359030 | Lithographic apparatus and device manufacturing method A flowcell including a plurality of separate chambers is provided on the substrate table so that a fluid can be brought into contact with exposed areas of the substrate to interact therewith. A series of exposures and chemical processes can thereby be carried out wi... | 04/15/2008 |
| 7355674 | Lithographic apparatus, device manufacturing method and computer program product Additional vibrations are added during the exposure of a substrate so that vibrations occurring during exposure of a plurality of areas on the substrate are substantially uniform. This may improve CD uniformity. ... | 04/08/2008 |
| 7352433 | Lithographic apparatus and device manufacturing method Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of t... | 04/01/2008 |
| 7352440 | Substrate placement in immersion lithography A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position o... | 04/01/2008 |
| 7352435 | Lithographic apparatus and device manufacturing method In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithogr... | 04/01/2008 |
| 7352434 | Lithographic apparatus and device manufacturing method In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedba... | 04/01/2008 |
| 7330238 | Lithographic apparatus, immersion projection apparatus and device manufacturing method A lithographic apparatus comprises a substrate table to hold a substrate and a projection system to project a patterned radiation beam onto a target portion of the substrate. The lithographic apparatus further comprises a fluid supply system to supply a fluid betwee... | 02/12/2008 |
| 7326522 | Device manufacturing method and a substrate A method of reducing the effect of bubbles on the imaging quality of an immersion lithography apparatus, in which a top coating is applied to a substrate to keep bubbles away from a radiation sensitive layer of the substrate. ... | 02/05/2008 |
| 7324185 | Lithographic apparatus and device manufacturing method In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under th... | 01/29/2008 |
| 7318854 | System and method for selective separation of gaseous mixtures using hollow fibers A system and method for separation of a gas, e.g., carbon dioxide, from a gaseous mixture using a hollow fiber membrane module. The module contains an absorbent solution that is effective in absorbing the gas for an extended period, e.g., eight hours, without regene... | 01/15/2008 |
| 7317504 | Lithographic apparatus and device manufacturing method A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element of the projection lens and the substrate. Bubbles forming in th... | 01/08/2008 |
| 7317507 | Lithographic apparatus and device manufacturing method A lithographic projection apparatus uses a volume of a second liquid to confine a first liquid to a space between the projection system and the substrate. In an embodiment, the first and second liquids are substantially immiscible and may be a cycloalkane, such as c... | 01/08/2008 |
| 7303607 | Liquid media containing Lewis acidic reactive compounds for storage and delivery of Lewis basic gases This invention relates to an improvement in a low-pressure storage and delivery system for gases having Lewis basicity, particularly hazardous specialty gases such as phosphine and arsine, which are utilized in the electronics industry. The improvement resides in st... | 12/04/2007 |
| 7304715 | Lithographic apparatus and device manufacturing method A lithographic apparatus is disclosed. The apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern i... | 12/04/2007 |
| 7295283 | Lithographic apparatus and device manufacturing method A lithographic apparatus for immersion lithography is described in which a compensation controller controls actuators to apply forces to the substrate equal in magnitude and opposite in direction to forces which are applied to the substrate by a liquid supply system... | 11/13/2007 |
| 7291850 | Lithographic apparatus and device manufacturing method A method and apparatus for monitoring a level of silicon dioxide in a liquid and removing the silicon dioxide using polishers is disclosed. In an embodiment, two polishers that absorb carbon dioxide and silicon dioxide, but which have a greater affinity for carbon d... | 11/06/2007 |
| 7253874 | Lithographic apparatus and device manufacturing method A lithographic apparatus and device manufacturing method makes use of a high refractive index liquid confined in a reservoir 13 at least partly filling the imaging field between the final element of the projection lens and the substrate. Bubbles forming in th... | 08/07/2007 |
| 7253876 | Lithographic apparatus and device manufacturing method A liquid supply system for an immersion lithographic projection apparatus is disclosed in which a space is defined between the projection system, a barrier member and a substrate. The barrier member is not sealed such that, during use, immersion liquid is allowed to... | 08/07/2007 |
| 7251013 | Lithographic apparatus and device manufacturing method In an immersion lithography apparatus in which, for example, immersion liquid is supplied to a localized space, a plate is provided to divide the space into two parts. Such a division of the space may facilitate reduction of stray radiation, a temperature gradient, ... | 07/31/2007 |
| 7248334 | Sensor shield The lithographic apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table configure... | 07/24/2007 |
| 7227619 | Lithographic apparatus and device manufacturing method A burl plate for use in immersion lithography has a higher burl density in a peripheral portion than in a medial portion so that when a higher pressure differential is applied in the peripheral portion the compression of the burls in the peripheral portion is substa... | 06/05/2007 |
| 7224431 | Lithographic apparatus and device manufacturing method In, for example, an immersion lithography apparatus, a sensor that would normally be provided on the substrate table is replaced by a retro-reflector on the substrate table and a sensor at, for example, patterning device level. This may avoid the need to make the se... | 05/29/2007 |
| 7224436 | Lithographic apparatus and device manufacturing method In a lithographic projection apparatus, a liquid supply system provides liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member is provided to contain liquid in the liquid supp... | 05/29/2007 |
| 7213963 | Lithographic apparatus and device manufacturing method A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid. ... | 05/08/2007 |
| 7209213 | Lithographic apparatus and device manufacturing method A final element of a projection system of an immersion lithographic apparatus is configured for a liquid having a refractive index greater than a refractive index of the final element. In an embodiment, the final element comprises a convex meniscus shaped lens. Such... | 04/24/2007 |
| 7199858 | Lithographic apparatus and device manufacturing method A lithographic projection apparatus is disclosed in which a space between the projection system and the substrate is filled with a liquid. An edge seal member at least partly surrounds the substrate or other object on a substrate table to prevent liquid loss when ed... | 04/03/2007 |
| 7196770 | Prewetting of substrate before immersion exposure A lithographic projection apparatus includes a support structure configured to hold a patterning device. The patterning device is configured to pattern a beam of radiation according to a desired pattern. The lithographic apparatus further includes a substrate table ... | 03/27/2007 |
| 7193681 | Lithographic apparatus and device manufacturing method A lithographic projection apparatus is disclosed in which a liquid confinement system, which at least partly confines liquid to a space between the projection system and the substrate, is restricted in its movement in the direction of the optical axis of the apparat... | 03/20/2007 |
| 7193232 | Lithographic apparatus and device manufacturing method with substrate measurement not through liquid A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor... | 03/20/2007 |
| 7184122 | Lithographic apparatus and device manufacturing method In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be ... | 02/27/2007 |
| 7175968 | Lithographic apparatus, device manufacturing method and a substrate A substrate is provided with a coating of material which is substantially transparent to the wavelength of the projection beam. The coating may be thicker than the wavelength of the projection beam and have a refractive index of the coating such that the wavelength ... | 02/13/2007 |
| 7160715 | Radiation-resistant microorganism An isolated and purified bacterium is provided which was isolated from a high-level radioactive waste site of mixed waste. The isolate has the ability to degrade a wide variety of organic contaminants while demonstrating high tolerance to ionizing radiation. The org... | 01/09/2007 |
| 7161654 | Lithographic apparatus and device manufacturing method An immersion lithographic apparatus is disclosed which includes a liquid supply system having an inlet configured to supply a liquid to a space between a projection system of the lithographic apparatus and a substrate and an outlet configured to remove at least part... | 01/09/2007 |
| 7161663 | Lithographic apparatus In an immersion-type lithographic apparatus, in which a surface of a substrate is immersed in liquid during an exposure operation, the substrate is held against a substrate table. On completion of the exposure operation, the substrate is lifted clear of the substrat... | 01/09/2007 |
| 7158211 | Lithographic apparatus and device manufacturing method A table configured to support a substrate has one or more projections which support the substrate. In an embodiment, the table also has a raised perimeter defining a space which is configured to be filled with a liquid. A pump is configured to remove liquid from the... | 01/02/2007 |
| 7145630 | Lithographic apparatus and device manufacturing method A method and lithographic apparatus in which a surface of a sensor is protected from dissolution in a liquid through application of a bias voltage to the surface with respect to one or more parts which are also exposed to the liquid. ... | 12/05/2006 |
| 7133114 | Lithographic apparatus and device manufacturing method In a scanning immersion lithographic apparatus, immersion liquid is supplied on one side of the space between the projection system and the substrate and drained on the other side so that the flow of liquid is substantially perpendicular to the scan direction. ... | 11/07/2006 |
