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| Number | Title | Issue Date |
| 8082525 | Technique for correcting hotspots in mask patterns and write patterns Embodiments of a method for determining a mask pattern to be used on a photo-mask in a lithography process are described. This method may be performed by a computer system. During operation, this computer system receives at least a portion of a first mask pattern in... | 12/20/2011 |
| 8006202 | Systems and methods for UV lithography A method of designing a lithographic mask for use in lithographic processing of a substrate is disclosed. The lithographic processing comprises irradiating mask features of a lithographic mask using a predetermined irradiation configuration. In one aspect, the metho... | 08/23/2011 |
| 7778723 | Polymer object optical fabrication process High-volume mass-production and customization of complex three-dimensional polymer and polymer-derived-ceramic microstructures are manufactured in a single step directly from three-dimensional computer models. A projection based non-degenerate two-photon induced pho... | 08/17/2010 |
| 7706910 | Imager assembly and method for solid imaging Solid imaging apparatus and methods for use are disclosed that reduce the amount of uncured solid imaging build material remaining on a completed build object following the completion of the solid imaging build process. The amount of uncured build material is reduce... | 04/27/2010 |
| 7613538 | Compensation for distortion in contact lithography A method of contact lithography includes predicting distortions likely to occur in transferring a pattern from a mold to a substrate during a contact lithography process; and modifying the mold to compensate for the distortions. A contact lithography system includes... | 11/03/2009 |
| 7551977 | Method and apparatus associated with anisotropic shrink in sintered ceramic items A manufacturing method for producing ceramic item from a photocurable ceramic filled material by stereolithography. The method compensates for the anisotropic shrinkage of the item during firing to produce a dimensionally accurate item. ... | 06/23/2009 |
| 7418694 | Method for generating test patterns utilized in manufacturing semiconductor device A method for generating test patterns utilized in manufacturing a semiconductor device includes creating mini-data concerning a partial area pattern used in designing the semiconductor device, subjecting the mini-data to data processing in accordance with a conditio... | 08/26/2008 |
| 7416276 | Digitally active 3-D object creation system A method of printing a three-dimensional object is provided. The method comprises providing a plurality of stationary printhead layer groups, each layer group comprising at least one printhead for printing a respective layer of the object; conveying a partially-form... | 08/26/2008 |
| 7409258 | Method and system for measuring customer delivery service Disclosed is a method and a system for measuring customer delivery service. A projected customer delivery date is generated. At least one projected output volume is determined based on the projected customer delivery date. At least one actual output volume is determ... | 08/05/2008 |
| 7404167 | Method for improving design window A method of forming photo masks having rectangular patterns and a method for forming a semiconductor structure using the photo masks is provided. The method for forming the photo masks includes determining a minimum spacing and identifying vertical conductive featur... | 07/22/2008 |
| 7401319 | Method and system for reticle-wide hierarchy management for representational and computational reuse in integrated circuit layout design A hierarchical representation encapsulates the detailed internal composition of a sub-circuit using the notion of a cell definition (a CellDef). The CellDef serves as a natural unit for operational reuse. If the computation required for the analysis or manipulation ... | 07/15/2008 |
| 7361594 | Method of manufacturing a thin film transistor, thin film transistor, thin film transistor circuit, electronic device, and electronic apparatus Aspects of the invention can provide a method of manufacturing a thin film transistor capable of manufacturing a high-performance thin film transistor with a simple process, a thin film transistor manufactured using the method of manufacturing a thin film transistor... | 04/22/2008 |
| 7315999 | Method and apparatus for identifying assist feature placement problems One embodiment of the present invention provides a system that identifies an area in a mask layout which is likely to cause manufacturing problems due to a missing or an improperly placed assist feature. During operation, the system receives an uncorrected or correc... | 01/01/2008 |
| 7290242 | Pattern generation on a semiconductor surface A method of forming a pattern of elements is shown. In one embodiment, the method is used to create a reticle. In another embodiment, the method is used to further form a number of elements on a surface of a semiconductor wafer. A pattern on a reticle is first gener... | 10/30/2007 |
| 7287240 | Designing method and device for phase shift mask A planar pattern (11), having a plurality of apertures of the same size (Wx×Wy), is determined by a two-dimensional layout determination tool (10), and a three-dimensional structure, having a depth d and an undercut amount Uc for making the phase of t... | 10/23/2007 |
| 7275925 | Apparatus for stereolithographic processing of components and assemblies An apparatus for providing gross location, planarization, and mechanical restraint to one or more electronic components such as semiconductor dice to be subjected to stereolithographic processing. A double platen assembly including a first platen and a second platen... | 10/02/2007 |
| 7260803 | Incremental dummy metal insertions A method and system for performing dummy metal insertion in design data for an integrated circuit is disclosed, wherein the design data includes dummy metal objects inserted by a dummy fill tool. After a portion of the design data is changed, a check is performed to... | 08/21/2007 |
| 7259744 | Dielectrophoretic displays A dielectrophoretic display comprises a substrate having walls defining at least one cavity, the cavity having a viewing surface and a side wall inclined to the viewing surface; a suspending fluid contained within the cavity; a plurality of at least one type of part... | 08/21/2007 |
| 7253021 | Transfer molding apparatus and method for manufacturing semiconductor devices A method of transfer molding, wherein a top-half mold and a bottom-half mold of an apparatus form a plurality of cavities interconnected, and wherein a pressure adjuster reduces the pressure of the cavities every time a specified amount of resin is supplied into any... | 08/07/2007 |
| 7239933 | Substrate supports for use with programmable material consolidation apparatus and systems A programmed material consolidation apparatus includes at least one fabrication site and a material consolidation system associated with the at least one fabrication site. The at least one fabrication site may be configured to receive one or more fabrication substra... | 07/03/2007 |
| 7239932 | Methods and apparatus for calibrating programmable material consolidation apparatus A programmed material consolidation apparatus includes at least one fabrication site and a material consolidation system associated with the at least one fabrication site. The at least one fabrication site may be configured to receive one or more fabrication substra... | 07/03/2007 |
| 7235195 | Method for making opthalmic devices The present invention provides a method for producing an ophthalmic device by means of stereolithography. The method comprises the steps of: depositing (i) an essentially solvent-free liquid or melt of a device-forming material, or (ii) a solution of said device-for... | 06/26/2007 |
| 7236292 | Components and methods for use in electro-optic displays A front plane laminate useful in the manufacture of electro-optic displays comprises, in order, a light-transmissive electrically-conductive layer, a layer of an electro-optic medium in electrical contact with the electrically-conductive layer, an adhesive layer and... | 06/26/2007 |
| 7211763 | Photon energy material processing using liquid core waveguide and a computer program for controlling the same A liquid core waveguide photon energy material processing system is provided. The system includes a photon energy source configured to generate a high intensity photon beam for material processing. The system also includes a liquid core waveguide configured to trans... | 05/01/2007 |
| 7203565 | Temperature abnormality detection method and semiconductor manufacturing apparatus A semiconductor manufacturing apparatus includes: a hot plate that heats an article to be processed; a temperature control section that controls temperature of the hot plate; a main body control section that controls the entirety of the apparatus based on a process ... | 04/10/2007 |
| 7191101 | Method of semiautomatic segmentation for the estimation of three-dimensional volumes Method of estimation and segmentation of the volume of a three-dimensional object in medical imagery, in which: one defines a given number of base points constituting a first three-dimensional shape defined by facets; ... | 03/13/2007 |
| 7176253 | Phase change support material composition A jettable non-curable support material composition useful for three-dimensional ink jet printing comprising at least one fatty alcohol and at least one abietic rosin ester alcohol, wherein the support material has a melting point between about 50° C. to about 65°... | 02/13/2007 |
| 7175940 | Method of two dimensional feature model calibration and optimization A method for generating a photolithography mask for optically transferring a pattern formed in the mask onto a substrate utilizing an imaging system. The method includes the steps of: (a) defining a set of calibration patterns, which are represented in a data format... | 02/13/2007 |
| 7174520 | Characterization and verification for integrated circuit designs Variations are characterized in feature dimensions of an integrated circuit that is to be fabricated in accordance with a design by a process that produces topographical variation in the integrated circuit, the variations in feature dimension being caused by the top... | 02/06/2007 |
| 7158896 | Real time immersion medium control using scatterometry Systems and/or methods are disclosed for measuring and/or controlling an amount of impurity that is dissolved within an immersion medium employed with immersion lithography. The impurity can be photoresist from a photoresist layer coated upon a substrate surface. A ... | 01/02/2007 |
| 7143390 | Method for creating alternating phase masks A method is provided for creating a phase mask for lithographic exposure operations. In this case, phase-shifting regions (10) with a different phase are defined on both sides of critical structures (6), which fall below an extent limit. At least one p... | 11/28/2006 |
| 7137801 | Three-dimensional stereolithographic apparatus A stereolithographic method which comprises irradiating the surface of a photohardenable resin composition with light through an image drawing mask capable of changing its mask image with the image drawing mask being moved in parallel to the surface of the photohard... | 11/21/2006 |
| 7128551 | Surface smoothing of stereolithographically formed 3-D objects A stereolithographic method and apparatus for forming polymeric structures comprising a plurality of overlying layers, each layer formed by polymerizing a thin layer of liquid photopolymer on a prior layer. Crevices formed at the layer interfaces are filled by a ste... | 10/31/2006 |
| 7126537 | Cylindrical conformable antenna on a planar substrate A cylindrically conformable antenna is formed on a flexible substrate and preferably comprises a complex pattern coupled to a first feedline and, spaced-apart from the complex pattern, a patch that floats electrically. The complex pattern preferably is a fractal pat... | 10/24/2006 |
| 7125742 | Multi-passivation layer structure for organic thin-film transistors and method for fabricating the same The present invention discloses a multi-passivation layer structure for organic thin-film transistors and a method for fabricating the same by spin coating, inject printing, screen printing and micro-contact on organic thin-film transistors. The multi-passivation la... | 10/24/2006 |
| 7120895 | System and method for lithography simulation There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/o... | 10/10/2006 |
| 7117478 | System and method for lithography simulation There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/o... | 10/03/2006 |
| 7117477 | System and method for lithography simulation There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/o... | 10/03/2006 |
| 7114145 | System and method for lithography simulation There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/o... | 09/26/2006 |
| 7111277 | System and method for lithography simulation There are many inventions described and illustrated herein. In one aspect, the present invention is directed to a technique of, and system for simulating, verifying, inspecting, characterizing, determining and/or evaluating the lithographic designs, techniques and/o... | 09/19/2006 |
