Bizarre Patents
A fork with timer for providing a cue to a user after an elapsed period of time for indicating that another bite of food using the fork may be taken.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 7364501 | Sanding block and method of making same A sanding block includes a compressible core having at least one pair of sides characterized such that an abrasive material is adhered to said sides substantially along the surface thereof and having a juncture area defined between said two sides which does not have... | 04/29/2008 |
| 7354334 | Reducing polishing pad deformation A polishing system can have a polishing pad with a polishing surface and a bottom surface that includes a recess with a thickness less than the thickness of the polishing pad. An in-situ monitoring module can be positioned in a cavity formed in part by the recess. A... | 04/08/2008 |
| 7303662 | Contacts for electrochemical processing Systems and methods for electrochemically processing. A contact element defines a substrate contact surface positionable in contact a substrate during processing. In one embodiment, the contact element comprises a wire element. In another embodiment the contact elem... | 12/04/2007 |
| 7291063 | Polyurethane urea polishing pad The present invention relates to an article for altering a surface of a workpiece, or a polishing pad having a window. In particular, the polishing pad includes a polyurethane urea material wherein the polyurethane urea material contains cells which are at least par... | 11/06/2007 |
| 7264641 | Polishing pad comprising biodegradable polymer The invention is directed to a polishing pad for use in chemical-mechanical polishing comprising a biodegradable polymer. The biodegradable polymer comprises a repeat unit selected from the group consisting of glycolic acid, lactic acid, hydroxyalkanoic acids, hydro... | 09/04/2007 |
| 7125477 | Contacts for electrochemical processing Systems and methods for electrochemically processing. A contact element defines a substrate contact surface positionable in contact a substrate during processing. In one embodiment, the contact element comprises a wire element. In another embodiment the contact elem... | 10/24/2006 |
| 7077721 | Pad assembly for electrochemical mechanical processing Embodiments of a processing pad assembly for processing a substrate are provided. The processing pad assembly includes an upper layer having a processing surface and an electrode having a top side coupled to the upper layer and a bottom side opposite the top side. A... | 07/18/2006 |
| 6986706 | Polishing pad and method of producing the same A polishing pad has a working layer provided with an abrasive powder, an attaching layer for attaching a pad to a polishing head of a power tool, and a connection layer which connects the working layer with the attaching layer, the connection layer being located bet... | 01/17/2006 |
| 6949018 | Apparatus for finishing surfaces A method is described for surface finishing complex and simple surface shapes by abrasion of selected zones of surface, leaving contiguous zones unfinished. ... | 09/27/2005 |
| 6929539 | Flexible abrasive product and method of making and using the same The present invention provides a flexible abrasive product comprised of an open cell foam backing, a foraminous barrier coating and a shaped foraminous abrasive coating. The flexible abrasive article of the invention is made by applying a curable barrier coating ove... | 08/16/2005 |
| 6843711 | Chemical mechanical polishing pad having a process-dependent groove configuration A polishing body, e.g., pad (200, 230, 260, 300) or belt (400, 500) having a polishing layer (214, 404) that includes a backmixing region (202, 232, 262, 308, 416, 508) wherein backmixing can occur within a slurry (116) between a w... | 01/18/2005 |
| 6780096 | Spiral wound abrasive belt and method A spiral wound abrasive belt is formed from an abrasive media including a plurality of webs. The webs of the abrasive media may include coated abrasives joined by splicing media or other suitable joining material. Alternatively, the webs may include individual singl... | 08/24/2004 |
| 6719818 | Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations An apparatus and method of chemical mechanical polishing (CMP) of a wafer employing a device for determining, in-situ, during the CMP process, an endpoint where the process is to be terminated. This device includes a laser interferometer capable of generating a lase... | 04/13/2004 |
| 6699104 | Elimination of trapped air under polishing pads A polishing pad includes a polishing layer and an adhesive layer. An adhesive bottom surface of the adhesive layer has an air transmitting pathway to collect air that is expelled from under the adhesive bottom surface, which avoids entrapment of air under... | 03/02/2004 |
| 6676717 | Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations An apparatus and method of chemical mechanical polishing (CMP) of a wafer employing a device for determining, in-situ, during the CMP process, an endpoint where the process is to be terminated. This device includes a laser interferometer capable of genera... | 01/13/2004 |
| 6666752 | Wafer retainer and method for attaching/detaching the wafer retainer to/from polishing machine base plate A wafer retainer includes: a foam layer capable of adsorbing a wafer on a surface thereof in a detachable manner; a first pressure-sensitive adhesive layer formed on a back face of the foam layer; a support formed on a back face of the first pressure-sens... | 12/23/2003 |
| 6620036 | Stacked polishing pad having sealed edge A stacked polishing pad includes an upper polishing layer and a lower sub-layer having major faces which are in contact with each other. The polishing layer is substantially impermeable to liquid while the sub-layer is liquid absorbent. The sub-layer has ... | 09/16/2003 |
| 6616520 | Polishing cloth and method for attaching/detaching the polishing cloth to/from polishing machine base plate A polishing cloth includes: a polishing cloth substrate; a first-pressure adhesive layer formed on a back face of the polishing cloth substrate; as support formed on a back face of the first pressure-sensitive adhesive layer; a second pressure-sensitive a... | 09/09/2003 |
| 6595842 | Abrasive pad and method of making same An abrasive pad removably attachable to a driven rotatable shaft and including a plurality of angularly offset abrasive members. Each abrasive member includes an outwardly facing surface having an abrasive disposed thereon. A first abrasive member is part... | 07/22/2003 |
| 6517426 | Composite polishing pad for chemical-mechanical polishing A composite polishing pad for use in a linear chemical-mechanical polishing apparatus is provided. The pad comprises a hard polishing pad having a polishing surface and an attachment surface opposite the polishing surface, the attachment surface comprisin... | 02/11/2003 |
| 6506277 | Abrasive sheet dispenser and method of use A dispenser and method for attaching abrasive sheets to a backup pad. The dispenser conveniently centers on the backup pad an abrasive sheet that is larger than the backup pad. In a preferred embodiment, the dispenser comprises: a holder configured to rec... | 01/14/2003 |
| 6458023 | Multi characterized chemical mechanical polishing pad and method for fabricating the same A multi characterized CMP (Chemical Mechanical Polishing) pad structure includes a lower pad and an upper pad. The lower pad includes a lower central soft pad region and a lower peripheral soft pad region formed outwardly of the lower central soft pad reg... | 10/01/2002 |
| 6379238 | Finishing and abrasive tool A finishing star or spinner abrasive tool is formed of inner and outer packs of square sheets of abrasive cloth or sandpaper with the inner packs angularly offset from the outer packs on the mandrel axis. Each sheet is formed with discontinuous radial sli... | 04/30/2002 |
| 6354930 | Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates A method and apparatus for mechanically and/or chemical-mechanically planarizing microelectronic substrates. In one embodiment in accordance with the principles of the present invention, a microelectronic substrate is planarized or polished on a planarizi... | 03/12/2002 |
| 6315645 | Patterned polishing pad for use in chemical mechanical polishing of semiconductor wafers A patterned polishing pad adapted for use in a wafer polishing machine. The patterned polishing pad has a polishing surface adapted to contact frictionally a semiconductor wafer being polished in a chemical mechanical polishing machine. The polishing surf... | 11/13/2001 |
| 6254456 | Modifying contact areas of a polishing pad to promote uniform removal rates A polishing pad surface having a surface designed for chemical mechanical polishing of a substrate surface is described. The polishing pad surface includes a first area on the surface exposed to and capable of contacting a first amount of the substrate su... | 07/03/2001 |
| 6231427 | Linear polisher and method for semiconductor wafer planarization A wafer polisher and method for the chemical mechanical planarization of semiconductor wafers. The polisher includes a wafer holder for supporting the semiconductor wafer and a linear polishing assembly having a polishing member positioned to engage the s... | 05/15/2001 |
| 6220942 | CMP platen with patterned surface A chemical mechanical polishing system is provided having one more polishing stations. The polishing stations include a platen and pad mounted to an upper surface of the platen. The upper surface of the platen is patterned to define a raised area and a re... | 04/24/2001 |
| 6068540 | Polishing device and polishing cloth for semiconductor substrates The polishing device grinds or polishes semiconductor substrates. The device includes a polishing table, into which a measuring device is integrated and a through opening. A polishing cloth covers the polishing table. The polishing cloth has at least one ... | 05/30/2000 |
| 5752876 | Flap disc abrasive tool A flap disc for use with a rotary surface finishing tool, the flap disc includes a backing plate which attaches to and is rotated by the finishing tool. The backing plate has a mounting flange on which a plurality of abrasive flaps are radially disposed. ... | 05/19/1998 |
| 5554068 | Abrasive flap brush and method and apparatus for making same An abrasive flap brush including a central core, a layer of adhesive disposed on the peripheral surface of the core by a coater, and a plurality of abrasive flaps adhered to the core by the adhesive. The adhesive is uniformly distributed around the core b... | 09/10/1996 |
| 5489233 | Polishing pads and methods for their use An improved polishing pad is provided comprising a solid uniform polymer sheet having no intrinsic ability to absorb or transport slurry particles having during use a surface texture or pattern which has both large and small flow channels present simultan... | 02/06/1996 |
| 5369916 | Polishing element The invention relates to a polishing element for use in a system and apparatus and a method for finishing and polishing a dental composite restorative material in a tooth. The system of the invention uses an elastomeric polymer disc which is impregnated w... | 12/06/1994 |
| 5142829 | Abrasive article The present invention relates to an abrasive article comprising an aligned row of connected abrasive sheet members each having a main portion, an aperture formed in the main portion, and a plurality of arm portions perimetrically spaced about the main por... | 09/01/1992 |
| 4962618 | Lens lapping pad A lens lapping pad comprising a zinc alloy foil having a thickness of about 0.1 mm, and a backing of cloth impregnated with a pressure sensitive adhesive, to give an overall pad thickness of about 0.5 mm. A peelable cover may protect the cloth backing.... | 10/16/1990 |
| 4631220 | Coated abrasive back-up pad with metal reinforcing plate A coated abrasive back up pad comprising a layer of resiliently compressible foam, a generally rigid fiber reinformced polymeric backing plate, a circular array of openings in the backing plate through which the backing plate is attached by screws to a dr... | 12/23/1986 |
| 4255164 | Fining sheet and method of making and using the same A glass fining sheet particularly suited for finishing rough ground vitreous surfaces to provide a surface finish which may be readily polished comprises a flexible, conformable backing sheet bearing a microcellular abrasive granule-resin matrix which, un... | 03/10/1981 |
| 4086068 | Lens grinding and polishing lap cover and method of making same A lap cover for a curved surface lens grinding tool or lap comprises an elongate body portion having a leading end and a terminal end and a plurality of spaced integral elongate appendage portions projecting from the edges of the body portion. The shape o... | 04/25/1978 |
| 3991527 | Coated abrasive disc A coated abrasive disc is prepared for use in power driven abrading, grinding, buffing tools and the like, by coating a substrate disc or sheet of fibrous paperboard, or like material, as by means of a patterned adhesive transfer roll, embossing or the li... | 11/16/1976 |
