Bizarre Patents
Cloaking System Using Optoelectronically Controlled Camouflage
A Cloaking System designed to operate in the visible light spectrum, utilizes optoelectronics and/or photonic components to conceal an object within it.
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| Number | Title | Issue Date |
| 7196009 | Lapping carrier, apparatus for lapping a wafer and method of fabricating a lapping carrier A method of fabricating a lapping carrier is provided that includes the steps of defining at least one opening extending through a workpiece that is sized to receive a wafer, and cryogenically tempering the workpiece to produce a lapping carrier. By cryogenically te... | 03/27/2007 |
| 7179397 | Plasma processing methods and apparatus To move an article in and out of plasma during plasma processing, the article is rotated by a first drive around a first axis, and the first drive is itself rotated by a second drive. As a result, the article enters the plasma at different angles for different posit... | 02/20/2007 |
| 7179157 | Bench grinder The present invention discloses a workshop unit for use as a grinding center that includes a support frame having a drive motor and a multi-station tool mounted thereto. Particularly, the grinding center may be used for operations including but not limited to grindi... | 02/20/2007 |
| 7146248 | Automated mineral processing systems and methods Mineral processing system performs product movement and processing within a secured room using robotics and computerized automation. A heated chemical processing well provides a hot bath wherein raw mineral is submersed into a separating agent. Used separating agent... | 12/05/2006 |
| 7115026 | Polishing apparatus An upper polishing plate is moved downward until facing a lower polishing plate to polish a work piece. The upper polishing plate is rotated in a horizontal plane together with a first elastic member, a second elastic member, an outer member and a connecting member.... | 10/03/2006 |
| 7022001 | Polishing apparatus The small polishing apparatus is capable of simultaneously polishing both side faces of a work piece, and a lower polishing plate, an internal gear and a sun gear are respectively driven by direct drive (DD) motors. The polishing apparatus comprises: an upper and a ... | 04/04/2006 |
| 7008308 | Wafer carrier A wafer carrier for retaining at least one semiconductor wafer in a processing apparatus during a processing operation which removes wafer material by at least one of abrading and chemical reaction. The processing apparatus is adapted for removing wafer material fro... | 03/07/2006 |
| 6986703 | Apparatus for processing substantially planar workpieces Described is an apparatus for the processing of substantially planar workpieces, which can be moved in a transport plane relatively to the apparatus. The apparatus contains at least one grinding head with a tool carrier rotatable around a carrier axis which is ortho... | 01/17/2006 |
| 6976903 | Apparatus for controlling retaining ring and wafer head tilt for chemical mechanical polishing A CMP system accurately measures eccentric forces applied to carriers for wafer or polishing pad conditioning pucks. An initial coaxial relationship between wafer axis of rotation and a carrier axis is maintained during application of the eccentric force, such that ... | 12/20/2005 |
| 6966821 | Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device A polishing apparatus includes an arrangement of a plurality of units to deal with various operations and a robot having at least one arm. The plurality of units are disposed around the robot and include a loading unit for receiving thereon a, e.g. dry, workpiece to... | 11/22/2005 |
| 6875086 | Surface planarization Embodiments of methods and apparatus in accordance with the present invention provide a chemical mechanical planarization (CMP) process that provides single or multiple polishing pads to have a different rotational velocity, applied pressure and oscillation frequenc... | 04/05/2005 |
| 6840847 | Device for polishing digital storage discs A device for polishing digital storage discs including a polishing plate rotatably driven about a vertical axis, the upper side of which has a polishing cloth, wherein the polishing cloth is interrupted by a ring-shaped recess concentric with the axis of the polishi... | 01/11/2005 |
| 6712674 | Polishing apparatus and polishing method A polishing apparatus includes a polishing pad rotated by a surface plate rotating shaft about a surface plate axis, a slurry conduit supplying slurry to an upper surface of the polishing pad, a substrate holding mechanism holding a substrate, a substrate rotating s... | 03/30/2004 |
| 6702657 | Continuous polisher machine The frame of a polishing machine has a disc-shaped polishing table mounted thereon for rotation coaxially about a vertical axis, the table having thereon an upper, generally planar polishing surface for removably supporting thereon a plurality of annular ... | 03/09/2004 |
| 6648765 | Supporting device for a plurality of adapter chucks A supporting device for a plurality of adapter chucks for the precision grinding or polishing of optical components comprises a spindle shaft having a central bore for supplying one of a gas and a vacuum, at least one arm adjustably supported by a head of... | 11/18/2003 |
| 6585572 | Subaperture chemical mechanical polishing system A chemical mechanical polishing (CMP) system is provided. A carrier has a top surface and a bottom region. The top surface of the carrier is designed to hold and rotate a wafer having a one or more formed layers to be prepared. A preparation head is also ... | 07/01/2003 |
| 6579160 | Holder for polished work and manufacturing method thereof The inner circumferential surface of through holes in a metal plate is chamfered or put to anchor fabrication and a thermoplastic resin is injection molding to the inner circumferential surface of the through hole thereby forming a resin portion over the ... | 06/17/2003 |
| 6514129 | Multi-action chemical mechanical planarization device and method Specific embodiments of the present invention provide a chemical-mechanical planarization apparatus for planarizing an object comprising a shaft having a shaft axis and being connected with a polishing head which is coupled to a polishing pad. The polishi... | 02/04/2003 |
| 6500055 | Oscillating orbital polisher and method A method and apparatus for improving uniformity of the rate of removal of material from the surface of a semiconductor substrate by chemical mechanical polishing. In accordance with the invention, the semiconductor substrate is subjected to a combination ... | 12/31/2002 |
| 6450859 | Method and apparatus for abrading a substrate An apparatus for abrading a substrate including a moveable abrading tool having a bur for abrading the substrate, a stage for supporting the substrate, and a height sensing device in communication with the abrading tool to determine a vertical position of... | 09/17/2002 |
| 6350187 | Abrasive machine An abrasive machine includes a rotatably driven tool, chucking equipment for holding the work pieces and a feeding device for effecting relative displacement between the work piece and the rotatably driven tool. The machine further includes a tubular cyli... | 02/26/2002 |
| 6338672 | Dressing wheel system An apparatus for providing a flat to stepped convex facing for grinding wheels used for the finished machining of parts, the apparatus including dressing wheels located only at the outer diameter of the Cubic-Boron-Nitride wheels to be dressed.... | 01/15/2002 |
| 6296554 | Non-circular workpiece carrier A non-circular workpiece carrier, which includes a wheel-like carrier body, and at least one carriage, wherein the wheel-like carrier body has a transmission unit disposed around the periphery thereof, which receives a transmission power for causing the w... | 10/02/2001 |
| 6280296 | Surface polishing method and apparatus wherein axis of autorotation of workpiece is revolved about an axis within circumscribed circle of the workpiece Surface polishing system adapted to polish, lap or grind a surface of a workpiece in a plane such that the workpiece is held in sliding contact with a polishing face of a rotating polishing plate, wherein the workpiece is rotated by a work rotating device... | 08/28/2001 |
| 6241585 | Apparatus and method for chemical mechanical polishing A chemical mechanical polishing apparatus includes a rotatable carousel and multiple carrier head assemblies coupled to the carousel. Each carrier head assembly includes multiple carrier heads each of which can hold a single substrate. The apparatus inclu... | 06/05/2001 |
| 6206767 | Planetary gear system parallel planer A planetry-gear-type parallel-surface processing machine of the present invention improves the ability of an upper surface plate to follow matrials to be processed. A rotation preventing pin projects from the upper surface of the upper surface plate at a ... | 03/27/2001 |
| 6196907 | Slurry delivery system for a metal polisher A slurry delivery system for use with a polishing machine wherein the slurry delivery system is designed to reduce the incidence of oxidized metals or rust from flowing into a slurry compound used to polish substrates used in the manufacture of disk drive... | 03/06/2001 |
| 6152804 | Grinding method and grinding apparatus A work W is rotated on a lower grinding wheel 13 provided on a work support base 11. Both surfaces of the work W are simultaneously subjected to grinding process by an upper grinding wheel 24 provided on a grinding shaft 22 of a grinding head 21 and the l... | 11/28/2000 |
| 6146245 | Method of and device for machining flat parts A method of machining flat parts, includes the use of two permanent magnets which are located opposite to and spaced from one another so as to form a magnetic field with a magnetic flux extending perpendicular to the magnets, placing a flat part in the ma... | 11/14/2000 |
| 6145849 | Disk processing chuck A memory disk having a central opening and planar sides for receiving magnetic media on both of the sides is bounded by a cylindrical outside diameter peripheral edge and chamfered edges extending between each of the planar sides. The peripheral edge is c... | 11/14/2000 |
| 6135854 | Automatic workpiece transport apparatus for double-side polishing machine An automatic workpiece transport apparatus for a double-side polishing machine is disclosed. A carrier is positioned at a predetermined position by a positioning unit, and an image of the top surface of the carrier is captured by use of a visual sensor. A... | 10/24/2000 |
| 6080042 | Flatness and throughput of single side polishing of wafers A wafer polishing apparatus includes one or more wafer carriers each containing one or more wafers mounted on both sides of the carrier. Upper and lower turntables having upper and lower polishing surfaces, rotate to polish the wafers attached to the carr... | 06/27/2000 |
| 6042459 | Surface machining method and apparatus A wafer is rotated on its axis, which is biased with regard to an axis of a grinding wheel, and revolves around an axis which is biased with regard to the axis of the wafer and the axis of the grinding wheel. In this state, the grinding wheel is abutted a... | 03/28/2000 |
| 6030278 | Surface machining method and apparatus A wafer is rotated on its axis, which is biased with regard to an axis of a grinding wheel, and revolves around an axis which is biased with regard to the axis of the wafer and the axis of the grinding wheel. In this state, the grinding wheel is abutted a... | 02/29/2000 |
| 6030280 | Apparatus for holding workpieces during lapping, honing, and polishing The present invention relates generally to a device used to process workpieces. In particular, the invention relates to a carrier that is used to support a workpiece during workpiece honing, grinding, or polishing. The carrier includes a rigid core coated... | 02/29/2000 |
| 5964651 | Apparatus for polishing planar substrates through rotating plates An apparatus for polishing one or more planar substrates, such as magnetic disks, between rotating polishing plates is described. The apparatus is designed to optimize uniformity and flatness of the substrates by maintaining a substantially constant paral... | 10/12/1999 |
| 5944591 | Sure-seal rolling pin assembly A sure-seal rolling pin assembly of a lapping and polishing machine for substantially eliminating friction between the sure-seal rolling pin assembly and a work carrier and for substantially reducing particle contamination between the sure-seal rolling pi... | 08/31/1999 |
| 5899800 | Chemical mechanical polishing apparatus with orbital polishing A chemical mechanical polishing apparatus polishes the surface of a substrate to remove material therefrom, The apparatus includes a carrier, which positions the substrate against the rotating polishing pad. The carrier includes an integral loading member... | 05/04/1999 |
| 5800253 | Disc streak pattern forming method and apparatus A disc streak pattern forming method and apparatus are provided which are capable of not only forming fine streak patterns on a disc in a single step, but also arbitrarily adjusting an angle of intersection of streak patterns in a precise manner to thereb... | 09/01/1998 |
| 5791976 | Surface machining method and apparatus A wafer is rotated on its axis, which is biased with regard to an axis of a grinding wheel, and revolves around an axis which is biased with regard to the axis of the wafer and the axis of the grinding wheel. In this state, the grinding wheel is abutted a... | 08/11/1998 |
