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Neuroimaging as a Marketing Tool
Neuroimaging as a means for validating whether a stimulus such as advertisement, communication, or product evokes a certain mental response such as emotion, preference, or memory, or to predict the consequences of the stimulus on later behavior such as consumption or purchasing.
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| Number | Title | Issue Date |
| 7367873 | Substrate processing apparatus A substrate processing apparatus has a polishing tape and a polishing head for pressing the polishing tape against a peripheral portion of a semiconductor wafer. The substrate processing apparatus polishes the wafer due to sliding contact of the polishing tape and t... | 05/06/2008 |
| 7338558 | Fixing material delivery system for a blocking apparatus Blocking apparatus and a blocking method allow precise alignment of an axis of a button with an axis of a block for blocking process of lens manufacturing. According to another aspect, the invention provides a blocking apparatus and a blocking method for automatical... | 03/04/2008 |
| 7303599 | Manufacture of lapping board A method for manufacturing a lapping board having abrasive grains fixed on its surface, which is performed by the steps of: preparing a rotatable metal board having a surface of soft metal, an abrasive slurry-supplying tool arranged over the surface of the metal boa... | 12/04/2007 |
| 7229343 | Orbiting indexable belt polishing station for chemical mechanical polishing An apparatus for planarizing a workpiece has a web with a face which is positioned adjacent the workpiece during planarization. At least one tension assembly is configured to maintain tension of the web. An orbiting assembly is configured to orbit the web relative t... | 06/12/2007 |
| 7223160 | System for replacement of sheet abrasive A system for rapid replacement of abrasive in machinery which uses the abrasive to finish the surfaces of workpieces that pass through the machinery on a belt, such as so-called widebelt sanders. One preferred embodiment of the system employs an abrasive material th... | 05/29/2007 |
| 7115023 | Process tape for cleaning or processing the edge of a semiconductor wafer A wafer bevel processing apparatus comprises a plurality of rollers for rotatably supporting a wafer, first process roller, a second process roller, and a process tape extending between the first process roller and the second process roller. The first and second pro... | 10/03/2006 |
| 7077733 | Subpad support with a releasable subpad securing element and polishing apparatus including the subpad support A subpad support for use in a web format or belt format polishing apparatus for polishing one or more layers of semiconductor device structures. The subpad support includes a subpad retention element for non-adhesively securing the subpad thereto. The subpad support... | 07/18/2006 |
| 7008294 | Method and device for grinding a rotating roller using an elastic steady-rest support The invention relates to a device for grinding rollers, also for grinding hollow rollers. As the rollers tend to vibrate transversally as a result of the contact with the grinding disc, a cushioned body is applied to the opposite side of the roller from the grinding... | 03/07/2006 |
| 6997789 | Method and apparatus for planarizing a microelectronic substrate with a tilted planarizing surface A method and apparatus for planarizing a microelectronic substrate. In one embodiment, the apparatus can include an elongated, non-continuous polishing pad oriented at an angle relative to the horizontal to allow planarizing liquids and materials removed from the mi... | 02/14/2006 |
| 6926595 | Oscillatory drive An oscillatory drive comprising a rotating drive shaft is disclosed. The oscillatory drive is driven by an eccentric element that is coupled via a pivot element to a tool drive shaft arranged at an angle to the drive shaft for oscillatingly driving the tool drive sh... | 08/09/2005 |
| 6922313 | Magnetic head slider with resistance to debris accumulation A magnetic recording head for reading and writing information with respect to a rotating disk medium includes a pad having a working surface which contacts the recording medium. The pad has a leading edge and a trailing edge with the leading edge facing in the gener... | 07/26/2005 |
| 6918816 | Apparatus and method for polishing a fiber optic connector A fiber optic polishing apparatus including a support system, a polishing sub-assembly coupled to the support system including a plurality of pads, and a fixture to hold a plurality of fiber optic connectors. The fixture is positioned adjacent to the plurality of pa... | 07/19/2005 |
| 6918814 | Polishing apparatus This invention pertains to a polishing apparatus for polishing a semiconductor wafer. The apparatus comprises a storage section that is capable of receiving a workpiece to be polished and a polished workpiece. The polishing unit that polishes the workpiece includes ... | 07/19/2005 |
| 6916230 | Abrasive belt and machining process associated therewith A process and device for machining by abrasive belt, on a part 1 with an axis of rotation, of a non-cylindrical bearing surface 2, two portions of the same running abrasive belt 14, which are spaced apart from each other in the longitudinal dire... | 07/12/2005 |
| 6902466 | Oscillating chemical mechanical planarization apparatus A chemical mechanical polishing (CMP) apparatus is provided. The CMP apparatus includes a first roller situated at a first point and a second roller situated at a second point. The first point is separate from the second point. Also included in the apparatus is a po... | 06/07/2005 |
| 6875085 | Polishing system including a hydrostatic fluid bearing support A polishing system such as a chemical mechanical belt polisher includes a hydrostatic fluid bearing that supports polishing pads and incorporates one or more of the following novel aspects. One aspect uses compliant surfaces surrounding fluid inlets in an array of i... | 04/05/2005 |
| 6793565 | Orbiting indexable belt polishing station for chemical mechanical polishing An apparatus for planarizing a workpiece has a web with a face which is positioned adjacent the workpiece during planarization. At least one tension assembly is configured to maintain tension of the web. An orbiting assembly is configured to orbit the web relative t... | 09/21/2004 |
| 6783440 | Polishing apparatus A polishing apparatus has a top ring for holding a workpiece to be polished and a polishing table movable relative to the top ring. The polishing table has a polishing surface for polishing the workpiece held by the top ring. The polishing apparatus further has a po... | 08/31/2004 |
| 6726544 | Method and apparatus for superfinishing tapered roller bearing A superfinishing method of a tapered roller bearing, including the steps of: rotating an outer ring of the tapered roller bearing about a center axis thereof; inserting a straight-shaped superfinishing stone from a front face of outer ring; and slidingly contacting ... | 04/27/2004 |
| 6722957 | Method and apparatus for planarizing a microelectronic substrate with a tilted planarizing surface A method and apparatus for planarizing a microelectronic substrate. In one embodiment, the apparatus can include an elongated, non-continuous polishing pad oriented at an angle relative to the horizontal to allow planarizing liquids and materials removed from the mi... | 04/20/2004 |
| 6682396 | Apparatus and method for linear polishing A linear polisher for polishing a substrate that always provides a fresh abrasive surface for polishing and a method for linear polishing a substrate are described. In the linear polisher, a length of a polishing pad is supported on a pair of rollers whic... | 01/27/2004 |
| 6679755 | Chemical mechanical planarization system A processing system and method for processing a workpiece is generally provided. In one embodiment, the system includes a processing module and a substrate transfer shuttle. The processing module includes a polishing surface and at least one polishing hea... | 01/20/2004 |
| 6626744 | Planarization system with multiple polishing pads An apparatus for simultaneously polishing wafers including at least a first and a second web of polishing media. At least two polishing heads are provided on a carrier coupled to a drive system such that one polishing head positions a wafer against the fi... | 09/30/2003 |
| 6620033 | Thrustwall polishing assembly A thrustwall surface polishing tool for use with a power means for rotating a workpiece about an axis for treating a workpiece thrustwall surface.... | 09/16/2003 |
| 6612914 | Platen with lateral web tensioner Generally, a method and apparatus for retaining a web of polishing material is provided. In one embodiment, an apparatus for retaining a web of polishing material includes a platen that has a first clamp and a second clamp disposed on opposite sides of th... | 09/02/2003 |
| 6609958 | Apparatus and method for edging a contact lens Apparatus and method for edging an ophthalmic lens comprises a spindle on which a lens is removably positioned and set rotating to engage with a web of abrasive material which is secured at only one end thereof. The free end of the web is allowed to dangl... | 08/26/2003 |
| 6607425 | Pressurized membrane platen design for improving performance in CMP applications An invention is disclosed for improved performance in a CMP process using a pressurized membrane as a replacement for a platen air bearing. In one embodiment, a platen for improving performance in CMP applications is disclosed. The platen includes a membr... | 08/19/2003 |
| 6572459 | Machine for machining in particular superfinishing, cylindrical surfaces of circular cylindrical workpieces, using an abrasive belt moving tangentially Machine for machining using abrasive belts circular workpieces supported by at least one pair of parallel rollers. To pass the workpieces under the machining station(s) 6, the support rollers 16 driven in rotation are moved in translation parallel to their ... | 06/03/2003 |
| 6520833 | Oscillating fixed abrasive CMP system and methods for implementing the same A chemical mechanical polishing (CMP) apparatus is provided. A first roller is situated at a first point and a second roller situated at a second point, such that the first point is separate from the second point. A polishing pad strip is also included an... | 02/18/2003 |
| 6413146 | Polishing apparatus This invention pertains to a polishing apparatus for polishing a semiconductor wafer. The apparatus comprises a storage section that is capable of receiving a workpiece to be polished and a polished workpiece. The polishing unit that polishes the workpiec... | 07/02/2002 |
| 6394883 | Method and apparatus for planarizing and cleaning microelectronic substrates A method and apparatus for mechanically and/or chemical-mechanically planarizing and cleaning microelectronic substrates. In one embodiment, a processing medium for planarizing and finishing a microelectronic substrate has a planarizing section with a fir... | 05/28/2002 |
| 6368193 | Method and apparatus for planarizing and cleaning microelectronic substrates A method and apparatus for mechanically and/or chemical-mechanically planarizing and cleaning microelectronic substrates. In one embodiment, a processing medium for planarizing and finishing a microelectronic substrate has a planarizing section with a fir... | 04/09/2002 |
| 6332826 | Polishing apparatus This invention pertains to a polishing apparatus for polishing a semiconductor wafer. The apparatus comprises a storage section that is capable of receiving a workpiece to be polished and a polished workpiece. The polishing unit that polishes the workpiec... | 12/25/2001 |
| 6319103 | Chemical mechanical polishing apparatus Disclosed is a chemical mechanical polishing("CMP") apparatus. The present invention provides a CMP apparatus having a rotatable wafer holder in which a wafer is fixed. At a bottom of the wafer holder, a pair of driving roller is arranged and the respecti... | 11/20/2001 |
| 6283838 | Burnishing tape handling apparatus and method A burnishing tape apparatus includes pads that press the burnishing tape against the surfaces of the disk to be burnished. The pads are mounted on pad holders that are biased to press the pads against both sides of the disk. Tape guides are used to apply ... | 09/04/2001 |
| 6277005 | Apparatus for the application of an advanced texture process Apparatus for removing random scratches formed during the polishing of magnetic recording media, and for disposing on the surface of the media a near-circumferential texture which increases the recording reliability of the media while simultaneously reduc... | 08/21/2001 |
| 6248003 | Method of truing grinding wheel and device used in performing such method A method of truing a grinding wheel includes the steps of providing a material containing a metallic material selected from the group consisting of metals in groups IVA, VA and VIA of the periodic table and alloys thereof, rotating a grinding wheel having... | 06/19/2001 |
| 6193588 | Method and apparatus for planarizing and cleaning microelectronic substrates A method and apparatus for mechanically and/or chemical-mechanically planarizing and cleaning microelectronic substrates. In one embodiment, a processing medium for planarizing and finishing a microelectronic substrate has a planarizing section with a fir... | 02/27/2001 |
| 6155914 | Apparatus for the application of an advanced texture process Apparatus for removing random scratches formed during the polishing of magnetic recording media, and for disposing on the surface of the media a near-circumferential texture which increases the recording reliability of the media while simultaneously reduc... | 12/05/2000 |
| 6139402 | Method and apparatus for mechanical and chemical-mechanical planarization of microelectronic substrates A method and apparatus for mechanically and/or chemical-mechanically planarizing microelectronic substrates. In one embodiment in accordance with the principles of the present invention, a microelectronic substrate is planarized or polished on a planarizi... | 10/31/2000 |
