Pneumatic Shoe Lacing Apparatus
This invention provides a pneumatic shoe lacing apparatus for the pneumatic lacing of shoe.
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| Number | Title | Issue Date |
| 7273809 | Method of fabricating a conductive path in a semiconductor device A method for fabricating an ultra-small electrode or plug contact for use in chalcogenide memory cells specifically, and in semiconductor devices generally, in which disposable spacers are utilized to fabricate ultra-small pores into which the electrodes are formed.... | 09/25/2007 |
| 7176075 | Field effect transistor and method of fabrication The present invention is a novel field effect transistor having a channel region formed from a narrow bandgap semiconductor film formed on an insulating substrate. A gate dielectric layer is formed on the narrow bandgap semiconductor film. A gate electrode is then f... | 02/13/2007 |
| 6939772 | Bipolar transistor and fabrication method thereof A SiGe spacer layer 151, a graded SiGe base layer 152 including boron, and an Si-cap layer 153 are sequentially grown through epitaxial growth over a collector layer 102 on an Si substrate. A second deposited oxide film 112 having ... | 09/06/2005 |
| 6806502 | 3-5 Group compound semiconductor and light emitting device Provide is a 3-5 group compound semiconductor having a concentration of a p-type dopant of 1×1017 cm− or more and 1×1021 cm−3 or less, which can be laminated to control the carrier concentration of an InGaAlN-type mi... | 10/19/2004 |
| 6794211 | Light emitting diode and method of fabricating thereof The light emitting diode includes an intermediate layer made of non-single crystalline material between single crystalline layers. By the intermediate layer, the boundary characteristic between the single crystalline layers may be improved and the defect caused by t... | 09/21/2004 |
| 6756325 | Method for producing a long wavelength indium gallium arsenide nitride(InGaAsN) active region Several methods for producing an active region for a long wavelength light emitting device are disclosed. In one embodiment, the method comprises placing a substrate in an organometallic vapor phase epitaxy (OMVPE) reactor, the substrate for supporting growth of an ... | 06/29/2004 |
| 6703300 | Method for making multilayer electronic devices There is a method for forming a multilayer electronic device. The method has the following steps: a) depositing a thin molecular layer on an electrically conductive substrate and b) depositing metal atoms or ions on the thin molecular layer at an angle of... | 03/09/2004 |
| 6699778 | Masking method for producing semiconductor components, particularly a BH laser diode A method produces structures for semiconductor components, particularly BH laser diodes, in which a mask material is applied to a sample in a masking step. The etch rate in an etching step depends upon the composition and/or nature of the mask material. T... | 03/02/2004 |
| 6686281 | Method for fabricating a semiconductor device and a substrate processing apparatus A substrate processing apparatus for forming a boron doped silicon-germanium film on one or more substrates in a reaction furnace of a low pressure CVD apparatus uses a mixture gas of GeH4 and SiH4 as a reaction gas, and BCl3 | 02/03/2004 |
| 6482672 | Using a critical composition grading technique to deposit InGaAs epitaxial layers on InP substrates A method for growing Inx Ga1-x As epitaxial layer on a lattice mismatched InP substrate calls for depositing by organo-metallic vapor phase epitaxy, or other epitaxial layer growth technique, a plurality of discreet layers of InAs | 11/19/2002 |
| 6468818 | Method for producing a high-luminance semiconductor light-emitting device capable of operating at a low voltage A semiconductor light-emitting device has a light-emitting section comprised of at least a lower clad layer, an active layer and an upper clad layer which are formed on a compound semiconductor substrate and a layer grown on the upper clad layer of the li... | 10/22/2002 |
| 6033945 | Multiple equilibration circuits for a single bit line According to one embodiment, a memory device comprises a bit line operable to access a memory cell. The bit line has a first end and a second end. A first equilibration circuit is coupled to the first end of the bit line, and a second equilibration circui... | 03/07/2000 |
| 6033926 | Method for making multiple wavelength semiconductor lasers on a single wafer A plurality of different wavelength semiconductor lasers are fabricated on a single semiconductor substrate by establishing a thermal gradient across the substrate during epitaxial growth. The result is a variation in composition which produces a correspo... | 03/07/2000 |
| 5985689 | Method of fabricating photoelectric conversion device having at least one step-back layer A photoelectric conversion device includes a plurality of photoelectric conversion units and a signal output unit. The signal output unit has at least one storage device for storing electrical signals generated by the photoelectric conversion device. A sc... | 11/16/1999 |
| 5714777 | Si/SiGe vertical junction field effect transistor A junction field effect transistor and method for making is described incorporating horizontal semiconductor layers within an opening to form a channel and a semiconductor layer through which the opening was made which forms a gate electrode surrounding t... | 02/03/1998 |
| 5670414 | Graded-gap process for growing a SiC/Si heterojunction structure The present invention relates to a graded-gap process for forming a SiC/Si heterojunction electrical element and includes steps of a) provide a Si substrate; b) introduce a hydrogen containing gas stream to the Si substrate; c) introduce a silane-containi... | 09/23/1997 |
| 5656514 | Method for making heterojunction bipolar transistor with self-aligned retrograde emitter profile A high gain, high frequency transistor is formed having a combination of a moderately doped retrograde emitter and a collector which is formed by self-aligned implantation through an emitter opening window. This combination allows continued base width sca... | 08/12/1997 |
| 5631173 | Method for forming collector up heterojunction bipolar transistor having insulative extrinsic emitter A process and structure for an improved collector-up bipolar transistor. The base is formed after the emitter is implanted to eliminate base damage during oxygen implantation typical in prior art collector-up bipolar transistors. In a preferred embodiment... | 05/20/1997 |
| 5571732 | Method for fabricating a bipolar transistor In one form of the invention, a bipolar transistor is disclosed, the transistor comprising a GaAs substrate in the (111) orientation 100, and an InGaAs region 106 over the substrate 100, the InGaAs region 106 having a first surface and a second surface, w... | 11/05/1996 |
| 5525541 | Method of making an electronic and/or photonic component A method of making a component presenting at least one integrated electro-optical and/or photonic function, in which at least one dielectric layer of doped SiOx is deposited on a quantum well layer based on III/V materials, and in which the res... | 06/11/1996 |
| 5525539 | Method for forming a light emitting diode for use as an efficient emitter or detector of light at a common wavelength An infrared LED can function efficiently as both an emitter and a detector at a common wavelength without undesirable characteristics found in avalanche diodes. The LED comprises a graded-bandgap Ga1-x Alx As semiconductor material w... | 06/11/1996 |
| 5429957 | Method of manufacturing an heterojunction bipolar transistor A base layer interposed between an n-type GaAs collector layer and an n-type AlGaAs emitter layer is composed of a p-type InAlGaAs. From a collector/base interface to an emitter/base interface, an InAs composition of the base layer is decreased and a conc... | 07/04/1995 |
| 5400352 | Semiconductor laser and method therefor A semiconductor laser (10) utilizes a material having a first band gap (26) for an active layer (13) of the laser (10). Monolayers (14) of a material having a smaller band gap are positioned in the active layer (13) without substantially altering the firs... | 03/21/1995 |
| 5389554 | Method for fabricating microwave heterojunction bipolar transistors with emitters designed for high power applications In one form of the invention, an emitter structure for a bipolar transistor is disclosed. The structure is comprised of an emitter layer 6 of Alx Ga1-x As, where x>0.4, abutting a base layer 8.... | 02/14/1995 |
| 5378640 | Method of fabricating a transmission mode InGaAs photocathode for night vision system An improved photocathode for use in a night vision system, comprising a glass face plate, an AlInAs window layer having an anti-reflection and protective coating bonded to the face plate, an InGaAs active layer epitaxially grown to the window layer, and a... | 01/03/1995 |
| 5372658 | Disordered crystalline semiconductor A semiconductor material having a disordered structure consists of a semiconductor material on which epitaxial growth is possible. The semiconductor material has an energy band structure constituted by one of the indirect band structure, the direct band s... | 12/13/1994 |
| 5372970 | Method for epitaxially growing a II-VI compound semiconductor A method for epitaxially growing a II-VI compound semiconductor according to this invention comprises the steps of epitaxially growing a GaAsx Se1-x layer on a GaAs substrate and epitaxially growing a ZnSe layer or a compound semicon... | 12/13/1994 |
| 5366927 | Method of fabricating epitaxially deposited ohmic contacts using group II-V I An ohmic contact to a p-type zinc selenide (ZnSe) layer in a Group II-VI semiconductor device, includes a zinc telluride selenide (ZnTex Se1-x) layer on the zinc selenide layer, a mercury selenide (HgSe) layer on the zinc telluride s... | 11/22/1994 |
| 5352912 | Graded bandgap single-crystal emitter heterojunction bipolar transistor A heterojunction bipolar transistor having a single-crystal emitter with reduced charge storage and acceptable current gain is described herein. The heterojunction transistor comprises a collector region, a base region formed on the collector region, and ... | 10/04/1994 |
| 5284783 | Method of fabricating a heterojunction bipolar transistor A method of fabricating a semiconductor device having an epitaxial layer of a group III-V semiconductor material provided on an underlying crystal layer with a lattice matching therewith, the semiconductor material being doped to the p-type by addition of... | 02/08/1994 |
| 5281299 | Method for manufacturing a crystal with a lattice parameter gradient A method for manufacturing a crystal comprising at least two elements wherein the proportion of at least one of the elements varies in the direction of the thickness. A CVD process is used. The proportion of the gas components from which is formed the dep... | 01/25/1994 |
| 5225371 | Laser formation of graded junction devices A method for fabricating graded heterojunction electronic devices uses laser melting and recrystallization of layered films to create an epitaxial alloy heterojunction. Layering an appropriately doped polysilicon film over a germanium film that has been d... | 07/06/1993 |
| 5204284 | Method of making a high band-gap opto-electronic device A high band-gap opto-electronic device is formed by epitaxially growing the device section in a lattice-matched (Alx Ga1-x)y In1-y P-GaAs system. The band-gap of the epitaxial layer increases with x. Instead of ... | 04/20/1993 |
| 5192695 | Method of making an infrared detector HgCdTe semiconductor material having an n-type epitaxial layer is grown on a substrate. A graded p-type epitaxial layer is grown on the n-type layer. The p-type layer is graded such that the large bandgap region is adjacent the heterojunction with the nar... | 03/09/1993 |
| 5192711 | Method for producing a semiconductor laser device A visible light semiconductor laser device has a double heterojunction structure comprising AlGaInP series semiconductors which is produced on a substrate having an electrode on its rear surface. A a p type GaInP buffer layer is provided between a p type ... | 03/09/1993 |
| 5177025 | Method of fabricating an ultra-thin active region for high speed semiconductor devices A method of fabricating a semiconductor device to retard diffusion of a dopant from a center active region into adjacent regions. The center active region is epitaxially formed by selectively increasing and decreasing an introduction of diffusion-suppress... | 01/05/1993 |
| 5162243 | Method of producing high reliability heterojunction bipolar transistors A technique for producing high reliability GaAsAlGaAs heterojunction bipolar transistors by Molecular Beam Epitaxy with beryllium base doping. Beryllium incorporation and diffusion, during base-layer deposition, is controlled through a combination of redu... | 11/10/1992 |
| 5147817 | Method for forming programmable resistive element A programmable resistive element is provided which includes a channel 16 comprising a layer of gallium arsenide. A programming barrier 18 is disposed outwardly from channel 16. A storage gate 20 comprising a layer of intrinsic gallium arsenide is disposed... | 09/15/1992 |
| 5034342 | Method of forming semiconductor stalk structure by epitaxial growth in trench A moat having a flat bottom and tapered side walls is formed in a monocrystalline silicon body (substrate) and extends from a top surface of the substrate into the substrate. An oxide layer is grown over side walls and a bottom of the moat and then is sel... | 07/23/1991 |
| 5021360 | Method of farbicating highly lattice mismatched quantum well structures A method of fabricating a semiconductor heterostructure includes the growth of a quantum well active region that is highly lattice-mismatched relative to a substrate. A buffer layer having a thickness above a critical value is grown on the substrate where... | 06/04/1991 |