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Patent No. 5205055

Pneumatic Shoe Lacing Apparatus

This invention provides a pneumatic shoe lacing apparatus for the pneumatic lacing of shoe.

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Class 438/936 - GRADED ENERGY GAP


Subclass of Class 438 - Semiconductor device manufacturing: process
Definition: Art collection involving sequential formation of layers
No. of patents: 80
Last issue date: 09/25/2007


1    
NumberTitleIssue Date
7273809Method of fabricating a conductive path in a semiconductor device
A method for fabricating an ultra-small electrode or plug contact for use in chalcogenide memory cells specifically, and in semiconductor devices generally, in which disposable spacers are utilized to fabricate ultra-small pores into which the electrodes are formed....
09/25/2007
7176075Field effect transistor and method of fabrication
The present invention is a novel field effect transistor having a channel region formed from a narrow bandgap semiconductor film formed on an insulating substrate. A gate dielectric layer is formed on the narrow bandgap semiconductor film. A gate electrode is then f...
02/13/2007
6939772Bipolar transistor and fabrication method thereof
A SiGe spacer layer 151, a graded SiGe base layer 152 including boron, and an Si-cap layer 153 are sequentially grown through epitaxial growth over a collector layer 102 on an Si substrate. A second deposited oxide film 112 having ...
09/06/2005
68065023-5 Group compound semiconductor and light emitting device
Provide is a 3-5 group compound semiconductor having a concentration of a p-type dopant of 1×1017 cm− or more and 1×1021 cm−3 or less, which can be laminated to control the carrier concentration of an InGaAlN-type mi...
10/19/2004
6794211Light emitting diode and method of fabricating thereof
The light emitting diode includes an intermediate layer made of non-single crystalline material between single crystalline layers. By the intermediate layer, the boundary characteristic between the single crystalline layers may be improved and the defect caused by t...
09/21/2004
6756325Method for producing a long wavelength indium gallium arsenide nitride(InGaAsN) active region
Several methods for producing an active region for a long wavelength light emitting device are disclosed. In one embodiment, the method comprises placing a substrate in an organometallic vapor phase epitaxy (OMVPE) reactor, the substrate for supporting growth of an ...
06/29/2004
6703300Method for making multilayer electronic devices
There is a method for forming a multilayer electronic device. The method has the following steps: a) depositing a thin molecular layer on an electrically conductive substrate and b) depositing metal atoms or ions on the thin molecular layer at an angle of...
03/09/2004
6699778Masking method for producing semiconductor components, particularly a BH laser diode
A method produces structures for semiconductor components, particularly BH laser diodes, in which a mask material is applied to a sample in a masking step. The etch rate in an etching step depends upon the composition and/or nature of the mask material. T...
03/02/2004
6686281Method for fabricating a semiconductor device and a substrate processing apparatus
A substrate processing apparatus for forming a boron doped silicon-germanium film on one or more substrates in a reaction furnace of a low pressure CVD apparatus uses a mixture gas of GeH4 and SiH4 as a reaction gas, and BCl3
02/03/2004
6482672Using a critical composition grading technique to deposit InGaAs epitaxial layers on InP substrates
A method for growing Inx Ga1-x As epitaxial layer on a lattice mismatched InP substrate calls for depositing by organo-metallic vapor phase epitaxy, or other epitaxial layer growth technique, a plurality of discreet layers of InAs
11/19/2002
6468818Method for producing a high-luminance semiconductor light-emitting device capable of operating at a low voltage
A semiconductor light-emitting device has a light-emitting section comprised of at least a lower clad layer, an active layer and an upper clad layer which are formed on a compound semiconductor substrate and a layer grown on the upper clad layer of the li...
10/22/2002
6033945Multiple equilibration circuits for a single bit line
According to one embodiment, a memory device comprises a bit line operable to access a memory cell. The bit line has a first end and a second end. A first equilibration circuit is coupled to the first end of the bit line, and a second equilibration circui...
03/07/2000
6033926Method for making multiple wavelength semiconductor lasers on a single wafer
A plurality of different wavelength semiconductor lasers are fabricated on a single semiconductor substrate by establishing a thermal gradient across the substrate during epitaxial growth. The result is a variation in composition which produces a correspo...
03/07/2000
5985689Method of fabricating photoelectric conversion device having at least one step-back layer
A photoelectric conversion device includes a plurality of photoelectric conversion units and a signal output unit. The signal output unit has at least one storage device for storing electrical signals generated by the photoelectric conversion device. A sc...
11/16/1999
5714777Si/SiGe vertical junction field effect transistor
A junction field effect transistor and method for making is described incorporating horizontal semiconductor layers within an opening to form a channel and a semiconductor layer through which the opening was made which forms a gate electrode surrounding t...
02/03/1998
5670414Graded-gap process for growing a SiC/Si heterojunction structure
The present invention relates to a graded-gap process for forming a SiC/Si heterojunction electrical element and includes steps of a) provide a Si substrate; b) introduce a hydrogen containing gas stream to the Si substrate; c) introduce a silane-containi...
09/23/1997
5656514Method for making heterojunction bipolar transistor with self-aligned retrograde emitter profile
A high gain, high frequency transistor is formed having a combination of a moderately doped retrograde emitter and a collector which is formed by self-aligned implantation through an emitter opening window. This combination allows continued base width sca...
08/12/1997
5631173Method for forming collector up heterojunction bipolar transistor having insulative extrinsic emitter
A process and structure for an improved collector-up bipolar transistor. The base is formed after the emitter is implanted to eliminate base damage during oxygen implantation typical in prior art collector-up bipolar transistors. In a preferred embodiment...
05/20/1997
5571732Method for fabricating a bipolar transistor
In one form of the invention, a bipolar transistor is disclosed, the transistor comprising a GaAs substrate in the (111) orientation 100, and an InGaAs region 106 over the substrate 100, the InGaAs region 106 having a first surface and a second surface, w...
11/05/1996
5525541Method of making an electronic and/or photonic component
A method of making a component presenting at least one integrated electro-optical and/or photonic function, in which at least one dielectric layer of doped SiOx is deposited on a quantum well layer based on III/V materials, and in which the res...
06/11/1996
5525539Method for forming a light emitting diode for use as an efficient emitter or detector of light at a common wavelength
An infrared LED can function efficiently as both an emitter and a detector at a common wavelength without undesirable characteristics found in avalanche diodes. The LED comprises a graded-bandgap Ga1-x Alx As semiconductor material w...
06/11/1996
5429957Method of manufacturing an heterojunction bipolar transistor
A base layer interposed between an n-type GaAs collector layer and an n-type AlGaAs emitter layer is composed of a p-type InAlGaAs. From a collector/base interface to an emitter/base interface, an InAs composition of the base layer is decreased and a conc...
07/04/1995
5400352Semiconductor laser and method therefor
A semiconductor laser (10) utilizes a material having a first band gap (26) for an active layer (13) of the laser (10). Monolayers (14) of a material having a smaller band gap are positioned in the active layer (13) without substantially altering the firs...
03/21/1995
5389554Method for fabricating microwave heterojunction bipolar transistors with emitters designed for high power applications
In one form of the invention, an emitter structure for a bipolar transistor is disclosed. The structure is comprised of an emitter layer 6 of Alx Ga1-x As, where x>0.4, abutting a base layer 8....
02/14/1995
5378640Method of fabricating a transmission mode InGaAs photocathode for night vision system
An improved photocathode for use in a night vision system, comprising a glass face plate, an AlInAs window layer having an anti-reflection and protective coating bonded to the face plate, an InGaAs active layer epitaxially grown to the window layer, and a...
01/03/1995
5372658Disordered crystalline semiconductor
A semiconductor material having a disordered structure consists of a semiconductor material on which epitaxial growth is possible. The semiconductor material has an energy band structure constituted by one of the indirect band structure, the direct band s...
12/13/1994
5372970Method for epitaxially growing a II-VI compound semiconductor
A method for epitaxially growing a II-VI compound semiconductor according to this invention comprises the steps of epitaxially growing a GaAsx Se1-x layer on a GaAs substrate and epitaxially growing a ZnSe layer or a compound semicon...
12/13/1994
5366927Method of fabricating epitaxially deposited ohmic contacts using group II-V I
An ohmic contact to a p-type zinc selenide (ZnSe) layer in a Group II-VI semiconductor device, includes a zinc telluride selenide (ZnTex Se1-x) layer on the zinc selenide layer, a mercury selenide (HgSe) layer on the zinc telluride s...
11/22/1994
5352912Graded bandgap single-crystal emitter heterojunction bipolar transistor
A heterojunction bipolar transistor having a single-crystal emitter with reduced charge storage and acceptable current gain is described herein. The heterojunction transistor comprises a collector region, a base region formed on the collector region, and ...
10/04/1994
5284783Method of fabricating a heterojunction bipolar transistor
A method of fabricating a semiconductor device having an epitaxial layer of a group III-V semiconductor material provided on an underlying crystal layer with a lattice matching therewith, the semiconductor material being doped to the p-type by addition of...
02/08/1994
5281299Method for manufacturing a crystal with a lattice parameter gradient
A method for manufacturing a crystal comprising at least two elements wherein the proportion of at least one of the elements varies in the direction of the thickness. A CVD process is used. The proportion of the gas components from which is formed the dep...
01/25/1994
5225371Laser formation of graded junction devices
A method for fabricating graded heterojunction electronic devices uses laser melting and recrystallization of layered films to create an epitaxial alloy heterojunction. Layering an appropriately doped polysilicon film over a germanium film that has been d...
07/06/1993
5204284Method of making a high band-gap opto-electronic device
A high band-gap opto-electronic device is formed by epitaxially growing the device section in a lattice-matched (Alx Ga1-x)y In1-y P-GaAs system. The band-gap of the epitaxial layer increases with x. Instead of ...
04/20/1993
5192695Method of making an infrared detector
HgCdTe semiconductor material having an n-type epitaxial layer is grown on a substrate. A graded p-type epitaxial layer is grown on the n-type layer. The p-type layer is graded such that the large bandgap region is adjacent the heterojunction with the nar...
03/09/1993
5192711Method for producing a semiconductor laser device
A visible light semiconductor laser device has a double heterojunction structure comprising AlGaInP series semiconductors which is produced on a substrate having an electrode on its rear surface. A a p type GaInP buffer layer is provided between a p type ...
03/09/1993
5177025Method of fabricating an ultra-thin active region for high speed semiconductor devices
A method of fabricating a semiconductor device to retard diffusion of a dopant from a center active region into adjacent regions. The center active region is epitaxially formed by selectively increasing and decreasing an introduction of diffusion-suppress...
01/05/1993
5162243Method of producing high reliability heterojunction bipolar transistors
A technique for producing high reliability GaAsAlGaAs heterojunction bipolar transistors by Molecular Beam Epitaxy with beryllium base doping. Beryllium incorporation and diffusion, during base-layer deposition, is controlled through a combination of redu...
11/10/1992
5147817Method for forming programmable resistive element
A programmable resistive element is provided which includes a channel 16 comprising a layer of gallium arsenide. A programming barrier 18 is disposed outwardly from channel 16. A storage gate 20 comprising a layer of intrinsic gallium arsenide is disposed...
09/15/1992
5034342Method of forming semiconductor stalk structure by epitaxial growth in trench
A moat having a flat bottom and tapered side walls is formed in a monocrystalline silicon body (substrate) and extends from a top surface of the substrate into the substrate. An oxide layer is grown over side walls and a bottom of the moat and then is sel...
07/23/1991
5021360Method of farbicating highly lattice mismatched quantum well structures
A method of fabricating a semiconductor heterostructure includes the growth of a quantum well active region that is highly lattice-mismatched relative to a substrate. A buffer layer having a thickness above a critical value is grown on the substrate where...
06/04/1991
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