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| Number | Title | Issue Date |
| 8183082 | Fabrication of organic solar array for applications in microelectromechanical systems and others A method of fabricating organic solar arrays for application in DC power supplies for electrostatic microelectromechanical systems (MEMS) devices. A solar array with 20 miniature cells (as small as 1 mm2) interconnected in series is fabricated and charact... | 05/22/2012 |
| 8173479 | Solid-state imaging device, production method of the same, and imaging apparatus In a solid-state imaging device, the pixel circuit formed on the first surface side of the semiconductor substrate is shared by a plurality of light reception regions. The second surface side of the semiconductor substrate is made the light incident side of the ligh... | 05/08/2012 |
| 8168465 | Three-dimensional semiconductor template for making high efficiency thin-film solar cells A semiconductor template having a top surface aligned along a (100) crystallographic orientation plane and an inverted pyramidal cavity defined by a plurality of walls aligned along a (111) crystallographic orientation plane. A method for manufacturing a semiconduct... | 05/01/2012 |
| 8158453 | Methods of forming silicide strapping in imager transfer gate device A CMOS active pixel sensor (APS) cell structure having dual workfunction transfer gate device and method of fabrication. The transfer gate device comprises a dielectric layer formed on a substrate and a dual workfunction gate conductor layer formed on the dielectric... | 04/17/2012 |
| 8105863 | Method for etching a see-through thin film solar module This invention discloses a method for etching a see-through thin film solar module, comprising: printing ink paste which resists the etching of etching solutions in the protected area of the thin film solar module which is placed under a screen; drying and solidifyi... | 01/31/2012 |
| 8097486 | Method for producing a solid-state imaging element There is provided a solid-state imaging element having a light receiving part generating charges by light irradiation, and a source/drain region of a transistor, both formed in a semiconductor layer. The solid-state imaging element includes a non-silicided region in... | 01/17/2012 |
| 8084290 | Method for fabricating CMOS image sensor A method of forming a CMOS image sensor and a CMOS image sensor. A method of forming a CMOS image sensor may include forming a plurality of photodiodes on and/or over a semiconductor substrate at regular intervals, forming an interlayer insulating film on and/or ove... | 12/27/2011 |
| 8071417 | Image sensor and fabrication method thereof An image sensor is provided. The image sensor comprises a semiconductor substrate, a dielectric interlayer, an interconnection, an image sensing unit, a via hole piercing the image sensing unit and the dielectric layer, and a bottom electrode. The semiconductor subs... | 12/06/2011 |
| 8048711 | Method for forming deep isolation in imagers An image sensor having an imaging area that includes a substrate layer and a plurality of pixels formed therein. Multiple pixels each include a photodetector formed in the substrate layer. Isolation layers are formed in the substrate layer by performing a series of ... | 11/01/2011 |
| 8043884 | Methods of seamless gap filling A method for seamless gap filling is provided, including providing a semiconductor structure with a device layer having a gap therein, wherein the gap has an aspect ratio greater than 4. A liner layer is formed over the device layer exposed by the gap. A first un-do... | 10/25/2011 |
| 8030119 | Integrated method and system for manufacturing monolithic panels of crystalline solar cells A method for fabricating a photovoltaic (PV) cell panel wherein all PV cells are formed simultaneously on a two-dimensional array of monocrystalline silicon mother wafers affixed to a susceptor is disclosed. Porous silicon separation layers are anodized in the surfa... | 10/04/2011 |
| 8030118 | Method for producing single crystal silicon solar cell and single crystal silicon solar cell A method for producing a single crystal silicon solar cell including the steps of: implanting ions into a single crystal silicon substrate through an ion implanting surface thereof; closely contacting the single crystal silicon substrate and a transparent insulator ... | 10/04/2011 |
| 8021910 | Method for producing single crystal silicon solar cell and single crystal silicon solar cell A method for producing a single crystal silicon solar cell including the steps of: implanting ions into a single crystal silicon substrate through an ion implanting surface thereof to form an ion implanted layer in the single crystal silicon substrate; forming a tra... | 09/20/2011 |
| 8021911 | Method for producing a photovoltaic module For producing a photovoltaic module (1), the front electrode layer (3), the semi-conductor layer (4) and the back electrode layer (5) are patterned by separating lines (6, 7, 8) to form series-connected cells (C1, C... | 09/20/2011 |
| 7998782 | Fabrication of image sensor with improved signal to noise ratio For fabricating an image sensor, an isolation structure is formed to define a first active region of a semiconductor substrate. A first transistor and a second transistor of a unit pixel are formed in the first active region. In addition, a threshold voltage lowerin... | 08/16/2011 |
| 7947527 | Method for metallization of a semiconductor device A method for metallization of a semiconductor device. This method includes a) metallizing a set of collection fingers with a low-temperature serigraphy paste on at least a front surface of the semiconductor device, b) sintering, at a temperature below a temperature ... | 05/24/2011 |
| 7932124 | Methods of preparing photovoltaic modules Methods of preparing photovoltaic modules, as well as related components, systems, and devices, are disclosed. ... | 04/26/2011 |
| 7932123 | Release strategies for making transferable semiconductor structures, devices and device components Provided are methods for making a device or device component by providing a multilayer structure having a plurality of functional layers and a plurality of release layers and releasing the functional layers from the multilayer structure by separating one or more of ... | 04/26/2011 |
| 7915069 | Solid-state imaging device comprising an N-type layer divided into a lower and upper layer by forming a P-type region An n/p semiconductor substrate is formed in such a manner that an n type semiconductor layer is deposited on a p+ semiconductor substrate. An imaging area including a plurality of n type semiconductor regions making photoelectric conversion and a pluralit... | 03/29/2011 |
| 7906365 | Method of manufacturing solar cell panel A method of manufacturing a solar cell panel, includes steps (a) to (e). The step (a) is a step of forming a solar cell module by laminating solar cell films on a transparency substrate. The step (b) is a step of performing an inspection of electric power generation... | 03/15/2011 |
| 7901974 | Masked laser anneal during fabrication of backside illuminated image sensors A technique for fabricating an array of imaging pixels includes fabricating front side components on a front side of the array. After fabricating the front side components, a dopant layer is implanted on a backside of the array. A mask is formed over the dopant laye... | 03/08/2011 |
| 7892877 | Method of manufacturing image sensor Provided is a method of manufacturing an image sensor which may include forming a plurality of photoelectric converters on a semiconductor substrate, forming a silicon nitride (SiN) film on the plurality of photoelectric converters, supplying plasma gas including hy... | 02/22/2011 |
| 7875490 | Image sensor and method for manufacturing the same An image sensor includes a semiconductor substrate including circuitry, an interlayer dielectric including metal lines arranged on the semiconductor substrate, crystalline photodiode patterns arranged on the interlayer dielectric such that the photodiode patterns ar... | 01/25/2011 |
| 7863080 | Process for making multi-crystalline silicon thin-film solar cells Dichlorosilane and diborane are deposited on the titanium-based alloy film to grow a p+ type back surface field film. The temperature is raised to grow a p− type light-soaking film on the p+ type back surface field film. Phosphine ... | 01/04/2011 |
| 7846762 | Integrated emitter formation and passivation Embodiments of the present invention provide a method for forming an emitter region in a crystalline silicon substrate and passivating the surface thereof by depositing a doped amorphous silicon layer onto the crystalline silicon substrate and thermally annealing th... | 12/07/2010 |
| 7820472 | Method of forming front contacts to a silicon solar cell without patterning A method for forming front contacts on a silicon solar cell which includes texture etching the front surface of the solar cell, forming an antireflective layer over the face, diffusing a doping material into the face to form a heavily doped region in valleys formed ... | 10/26/2010 |
| 7790496 | Method of improving solid-state image sensor sensitivity An imaging apparatus includes (a) a full-frame, charge-coupled device having (i) a conductive layer of a first dopant type; (ii) a plurality of pixels arranged as a charge-coupled device in the conductive layer that collects charge in response to incident light and ... | 09/07/2010 |
| 7772027 | Barrier regions for image sensors Embodiments of the invention provide a barrier region for isolating devices of an image sensor. The barrier region comprises a charge accumulation region of a particular conductivity type in a substrate electrically connected to a voltage source terminal. The charge... | 08/10/2010 |
| 7745251 | Method of fabricating CMOS image sensor A method of manufacturing a complimentary metal oxide semiconductor (CMOS) image sensor. The method includes a step of performing a silicide process relative to a plug for transferring electrons generated from a photodiode. The silicide of the plug blocks light irra... | 06/29/2010 |
| 7732245 | Photodiode of CMOS image sensor and method for manufacturing the same A photodiode of a CMOS image sensor and a method for manufacturing the same are provided, in which ions implanted in the vicinity of a device isolation film are prevented from being diffused into a photodiode region to reduce a dark current. The photodiode of a CMOS... | 06/08/2010 |
| 7704782 | Method of forming pixel cells with color specific characteristics Imager devices having an array of photosensors, each photosensor having at least two doped regions. The two doped regions are each independently tailored to a particular wavelength. ... | 04/27/2010 |
| 7659136 | Solid-state imaging device and method of manufacturing said solid-state imaging device It is an object to provide solid-state imaging device, which can easily be manufactured and has a high reliability, and a method of manufacturing the solid-state imaging device. In the present invention, a manufacturing method comprises the steps of forming a plural... | 02/09/2010 |
| 7632700 | Photonic crystal-based filter for use in an image sensor The invention, in various exemplary embodiments, incorporates a photonic crystal filter into an image sensor. The photonic crystal filter comprises a substrate and a plurality of pillars forming a photonic crystal structure over the substrate. The pillars are spaced... | 12/15/2009 |
| 7605016 | CMOS image sensor and method of manufacturing the same Disclosed are a CMOS sensor and a method of fabricating the CMOS sensor. The method includes the steps of: forming a first USG layer on an entire surface of a semiconductor substrate including a cell area and a scribe area; masking the cell area, and then removing t... | 10/20/2009 |
| 7592199 | Method for forming pinned photodiode resistant to electrical leakage A method is provided for reducing or eliminating leakage between a pinned photodiode and shallow trench isolation structure fabricated therewith while optimizing the sensitivity of the photodiode. An N+ region is implanted in a P-type substrate and a P-type well sep... | 09/22/2009 |
| 7470560 | Image sensor having a charge storage region provided within an implant region A deep implanted region of a first conductivity type located below a transistor array of a pixel sensor cell and adjacent a doped region of a second conductivity type of a photodiode of the pixel sensor cell is disclosed. The deep implanted region reduces surface le... | 12/30/2008 |
| 7459335 | Solid-state imaging apparatus and method for producing the same A solid-state imaging apparatus includes a plurality of photosensitive cells, and a driving unit provided for driving the plurality of photosensitive cells. Each photosensitive cell includes a photodiode formed to be exposed on a surface of a semiconductor substrate... | 12/02/2008 |
| 7442572 | CMOS image sensor and method for manufacturing the same A CMOS image sensor and a method for manufacturing the same improves photosensitivity and prevent loss of light by forming a photo-sensing unit under a color filter. The CMOS image sensor may include a plurality of transistors formed on a semiconductor substrate, a ... | 10/28/2008 |
| 7432125 | CMOS image sensor and manufacturing method thereof A CMOS image sensor-manufacturing method includes forming a photodiode on a substrate, forming an insulating layer over the substrate, forming a contact hole in the insulating layer, and forming a gate terminal over the insulating layer. The gate terminal is connect... | 10/07/2008 |
| 7427530 | Method of manufacturing photo diodes having a conductive plug contact to a buried layer Methods of manufacturing a photo diode include sequentially forming a buried layer of a first conductivity type, a first epitaxial layer of the first conductivity type, and a second epitaxial layer of a second conductivity type on a substrate. The second and first e... | 09/23/2008 |
