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| Number | Title | Issue Date |
| 8053350 | Methods of forming a conductive transparent oxide film layer for use in a cadmium telluride based thin film photovoltaic device Methods are generally provided for forming a conductive oxide layer on a substrate. In one particular embodiment, the method can include sputtering a transparent conductive oxide layer on a substrate at a sputtering temperature from about 50° C. to about 250° C., ... | 11/08/2011 |
| 8043955 | Methods of forming a conductive transparent oxide film layer for use in a cadmium telluride based thin film photovoltaic device Methods are generally provided for forming a conductive oxide layer on a substrate. In one particular embodiment, the method can include sputtering a transparent conductive oxide layer (e.g., including cadmium stannate) on a substrate from a target in a sputtering a... | 10/25/2011 |
| 8043954 | Methods of forming a conductive transparent oxide film layer for use in a cadmium telluride based thin film photovoltaic device Methods are generally provided for forming a conductive oxide layer on a substrate. In one particular embodiment, the method can include sputtering a transparent conductive oxide layer on a substrate from a target (e.g., including cadmium stannate) in a sputtering a... | 10/25/2011 |
| 8021972 | Method of manufacturing array substrate A method of manufacturing an array substrate includes the following steps. A substrate having a thin film transistor disposed thereon is provided. The thin film transistor includes a gate electrode, a gate insulating layer, a source electrode, and a drain electrode.... | 09/20/2011 |
| 8017514 | Optically transparent wires for secure circuits and methods of making same A structure and a method. The method includes: forming a dielectric layer on a substrate; forming electrically conductive first and second wires in the dielectric layer, top surfaces of the first and second wires coplanar with a top surface of the dielectric layer; ... | 09/13/2011 |
| 7972952 | Compound semiconductor light-emitting device and method for manufacturing the same A compound semiconductor light-emitting device which includes an n-type semiconductor layer, a light-emitting layer and a p-type semiconductor layer, that are made of a compound semiconductor, formed on a substrate, the n-type semiconductor layer and the p-type semi... | 07/05/2011 |
| 7939444 | Manufacturing methods of thin film solar cell and thin film solar cell module A manufacturing method of a thin film solar cell comprises performing dry cleaning of an insulation substrate on which a transparent electrode is formed, patterning the transparent electrodes to be spaced apart from each other, performing dry cleaning of the pattern... | 05/10/2011 |
| 7927996 | Tungsten-doped indium oxide structures and methods Methods of forming transparent conducting oxides and devices formed by these methods are shown. Monolayers that contain tungsten and monolayers that contain indium are deposited onto a substrate and subsequently processed to form tungsten-doped indium oxide. The res... | 04/19/2011 |
| 7879712 | Method for patterning polycrystalline indium tin oxide A method for patterning polycrystalline indium tin oxide by using a Gaussian laser beam focused on an amorphous indium tin oxide layer is disclosed to pattern the non-crystalline amorphous indium tin oxide layer and transfer part of the amorphous indium tin oxide la... | 02/01/2011 |
| 7696079 | Methods for patterning films, fabricating organic electroluminescence display and fabricating thin film transistor array substrate A method for fabricating a thin film transistor array substrate is provided. Wherein, a plurality of contact holes and recesses are formed in a protection layer disposed upon thin film transistors. Each recess comprises an under-cut profile while each contact hole e... | 04/13/2010 |
| 7687390 | Manufacturing method of a transparent conductive film, a manufacturing method of a transparent electrode of an organic electroluminescence device, an organic electroluminescence device and the manufacturing method In one embodiment of a manufacturing method of a transparent conductive film of the present invention, a grid having a magnet is placed between a target and a substrate, and a pattern shaped transparent conductive film comprising the target material is formed over t... | 03/30/2010 |
| 7642183 | High power, high luminous flux light emitting diode and method of making same A high power, high luminous flux light emitting diode (LED) comprises a substrate, a light-emitting structure, a first electrode and a second electrode. The LED has a top surface layout design in which the first electrode has a number of legs extending in one direct... | 01/05/2010 |
| 7553749 | Method of hiding transparent electrodes on a transparent substrate A method of hiding transparent electrodes on a transparent substrate coats a solution of non-conductive nanoparticles onto the transparent substrate and the transparent electrodes after forming a plurality of transparent electrodes on the transparent substrate, and ... | 06/30/2009 |
| 7528060 | Branched nanostructures and method of synthesizing the same A branched nanostructure is synthesized. A porous material, with pores having a diameter of approximately 1 μm or less, is placed in a vacuum. It is irradiated with an electron beam. This causes a trunk to grow from the porous material and further causes branches t... | 05/05/2009 |
| 7517784 | Method for producing high carrier concentration p-Type transparent conducting oxides A method for producing transparent p-type conducting oxide films without co-doping plasma enhancement or high temperature comprising: a) introducing a dialkyl metal at ambient temperature and a saturated pressure in a carrier gas into a low pressure deposition chamb... | 04/14/2009 |
| 7476607 | Semiconductor electrode, production process thereof and photovoltaic cell using semiconductor electrode An object of the present invention is to provide a photovoltaic cell that demonstrates a superior photoelectric conversion function. The present invention relates to a photovoltaic cell comprising a semiconductor electrode, an electrolyte and a counter electrode, wh... | 01/13/2009 |
| 7470607 | Transparent oxide semiconductor thin film transistor This invention relates to novel, transparent oxide semiconductor thin film transistors (TFT's) and a process for making them. ... | 12/30/2008 |
| 7470608 | Semiconductor light emitting device and fabrication method thereof The present invention relates to a semiconductor light emitting device comprising a sapphire substrate 11; a u-GaN layer 12 that is formed on top of the substrate 11 and that comprises a plurality of concave portions 121 formed into band-... | 12/30/2008 |
| 7432187 | Method for improving current distribution of a transparent electrode A method for improving current distribution of a transparent electrode includes forming a transparent electrode over a substrate; and forming a first mask. First openings are formed in the first mask. The first mask is also located over the transparent electrode. A ... | 10/07/2008 |
| 7416907 | Semiconductor device and method for forming the same A low temperature process for fabricating a high-performance and reliable semiconductor device in high yield, comprising forming a silicon oxide film as a gate insulator by chemical vapor deposition using TEOS as a starting material under an oxygen, ozone, or a nitr... | 08/26/2008 |
| 7413922 | Fabricating method of a pixel structure A method of fabricating a pixel structure is disclosed. A substrate having a color filter layer thereon and a leveling layer further covers the color filter layer is provided. A first metal layer is formed over the leveling layer. The first metal layer is patterned ... | 08/19/2008 |
| 7410893 | System and method for depositing a seed layer A method for depositing a seed layer for a controllable electric pathway on a substrate includes selectively dispensing a seed material from an inkjet material dispenser onto said substrate. ... | 08/12/2008 |
| 7390731 | Method of depositing an oxide layer on a substrate and a photovoltaic cell using said substrate The process according to the invention makes it possible to deposit a transparent conductive oxide film on a toughened glass substrate placed inside a chamber. It consists in providing sources containing an oxygen-based liquid compound, a liquid compound of the meta... | 06/24/2008 |
| 7388277 | Chip and wafer integration process using vertical connections A process is described for semiconductor device integration at chip level or wafer level, in which vertical connections are formed through a substrate. A metallized feature is formed in the top surface of a substrate, and a handling plate is attached to the substrat... | 06/17/2008 |
| 7338824 | Method for manufacturing FFS mode LCD In the present invention, a method for manufacturing a liquid crystal display is provided. The method includes steps of providing a substrate, forming a first metal layer on the substrate, etching the first metal layer to form a plurality of gate lines on the substr... | 03/04/2008 |
| 7285342 | Indium-tin oxide (ITO) film and process for its production A process for the deposition of transparent and conductive indium-tin oxide (ITO) films with a particularly low resistance of preferably less than 200 μΩcm and a small surface roughness of preferably less than 1 nm on a substrate, wherein combined BF/DC sputtering... | 10/23/2007 |
| 7286195 | Interconnect structure for TFT-array substrate and method for fabricating the same An interconnect structure connecting two isolated metal lines in a non-display area of a TFT-array substrate. A first metal line is disposed on the substrate, covered with a first insulating layer. A second metal line is disposed on the first insulating layer and co... | 10/23/2007 |
| 7282430 | Melt-based patterning for electronic devices The present invention provides methods and apparatus for melt-based patterning for electronic devices. It employs and provides processes and apparatus for fabricating an electronic device having a pattern formed on a surface by a deposition material. Further, the in... | 10/16/2007 |
| 7282132 | Zinc oxide film treatment method and method of manufacturing photovoltaic device utilizing the same A film of zinc oxide electrochemically deposited from an aqueous solution is subjected to heat treatment at a temperature equal to or higher than 150° C. and equal to or lower than 400° C. in a nitrogen or inert gas atmosphere that contains oxygen, thereby obtaini... | 10/16/2007 |
| 7279792 | Semiconductor device and method of manufacturing same According to this invention, a semiconductor device has an upper surface on which an external connection electrode is formed and a lower surface which opposes the upper surface and is in a mirror surface state. A roughened region roughened by laser marking is formed... | 10/09/2007 |
| 7250326 | Substrate with an electrode and method of producing the same The present invention provides a method of forming a transparent conductive film at a low temperature that is suitable for use with a synthetic resin substrate. According to the production method of a substrate with an electrode of the present invention, an oxide co... | 07/31/2007 |
| 7241691 | Conducting metal oxide with additive as p-MOS device electrode Methods for fabricating high work function p-MOS device metal electrodes are provided. In one embodiment, a method is provided for producing a metal electrode including the steps of: providing a high k dielectric stack with an exposed surface; contacting the exposed... | 07/10/2007 |
| 7229859 | Thin film device provided with coating film, liquid crystal panel and electronic device, and method for making the thin film device Any one of an insulating film forming a TFT, a silicon film and a conductive film is formed by applying a solution and annealing it. In a spin coater (102), a coating solution containing a thin film component which is supplied from a solution storage section ... | 06/12/2007 |
| 7208401 | Method for forming a thin film Embodiments of methods, apparatuses, devices, and/or systems for forming a thin film are described. ... | 04/24/2007 |
| 7193249 | Nitride-based light emitting device and method of manufacturing the same Provided are a nitride-based light emitting device using a p-type conductive transparent thin film electrode layer and a method of manufacturing the same. The nitride-based light emitting device includes a substrate, and an n-cladding layer, an active layer, a p-cla... | 03/20/2007 |
| 7163868 | Method for forming a lightly doped drain in a thin film transistor In accordance with the present invention, a gate electrode structure with inclined planes is used as a mask when performing an ion implantation process. The inclined planes are used to define the lightly doped drain (LDD) region in the active area. Therefore, the wi... | 01/16/2007 |
| 7156717 | situ finishing aid control A method of using finishing aids for advanced finishing control is described. A finishing surface is used generally to induce frictional wear. The finishing aids with preferred in situ control can improve control of the coefficient of friction, the tangential force ... | 01/02/2007 |
| 7131890 | In situ finishing control An apparatus and method of using a in situ finishing information for finishing semiconductor wafers is described. The method uses operative sensors such as friction sensors for detecting and improving control during finishing. The method can aid control of finishing... | 11/07/2006 |
| 7132319 | Transparent double-injection field-effect transistor A double-injection field-effect transistor has an anode, a cathode, a substantially transparent channel, a substantially transparent gate insulator, and at least one substantially transparent gate electrode. The transistor may also have a substantially transparent a... | 11/07/2006 |
| 7129556 | Method for fabricating array substrate for X-ray detector An array substrate for use in an X-ray sensing device is fabricated using an etching stopper that enables good control of the etching process and that prevents over-etch of drain electrodes and second capacitor electrodes while forming contact holes and a cutting fu... | 10/31/2006 |
