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| Number | Title | Issue Date |
| 8431449 | Manufacturing method of semiconductor device An embodiment is a manufacturing method of a semiconductor device including the steps of forming a first insulating film; forming a first mask over the first insulating film; performing a slimming process on the first mask to form a second mask; performing an etchin... | 04/30/2013 |
| 8420466 | Method of forming TFT floating gate memory cell structures A device having thin-film transistor (TFT) floating gate memory cell structures is provided. The device includes a substrate, a dielectric layer on the substrate, and one or more source or drain regions being embedded in the dielectric layer. the dielectric layer be... | 04/16/2013 |
| 8383470 | Thin film transistor (TFT) having a protective layer and manufacturing method thereof One of factors that increase the contact resistance at the interface between a first semiconductor layer where a channel is formed and source and drain electrode layers is a film with high electric resistance formed by dust or impurity contamination of a surface of ... | 02/26/2013 |
| 8349673 | Method of producing plurality of organic transistors using laser patterning A method of producing a plurality of transistors each including a source/drain electrode pair comprising a conductor material and a channel comprising semiconductor material between the source and drain electrodes of said source/drain electrode pair; the method comp... | 01/08/2013 |
| 8343822 | Flexible semiconductor device and method for manufacturing same A method for manufacturing a flexible semiconductor device includes (i) forming an insulating film on the upper surface of metal foil, (ii) forming an extraction electrode pattern on the upper surface of the metal foil, (iii) forming a semiconductor layer on the ins... | 01/01/2013 |
| 8202771 | Manufacturing method of organic semiconductor device A manufacturing method of an organic semiconductor device including an organic semiconductor transistor formation process, wherein the process includes: an organic semiconductor layer formation step of using a substrate to form an organic semiconductor layer made of... | 06/19/2012 |
| 8163606 | Method of manufacturing liquid crystal display device A method of manufacturing an LCD device is disclosed. The LCD device manufacturing method includes: forming first and second active patterns on P-channel and N-channel thin film transistor formation regions of a substrate using a first masking process, respectively;... | 04/24/2012 |
| 8058116 | Method of fabricating an amorphous zinc-oxide based thin film transistor (TFT) including source/drain electrodes formed between two oxide semiconductor layers A method for fabricating a liquid crystal display (LCD) device include: forming a gate electrode on a substrate; forming a gate insulating layer on the substrate; forming a primary active layer having a tapered portion to a side of a channel region of the primary ac... | 11/15/2011 |
| 7833850 | Method of fabricating a thin film transistor A method of fabricating a thin film transistor includes forming a gate electrode on a substrate, forming a semiconductor layer on the gate electrode, forming a source electrode on the semiconductor layer, forming a drain electrode on the semiconductor layer spaced a... | 11/16/2010 |
| 7759180 | Display substrate and method of manufacturing the same In a manufacturing method of a display substrate according to one or more embodiments, a plurality of thin films are patterned by using a photoresist film pattern having different thicknesses in each area on a substrate as etch masks. The photoresist film pattern ma... | 07/20/2010 |
| 7754548 | Thin film transistor, method of fabricating the same, and method of fabricating liquid crystal display device having the same A thin film transistor includes a gate electrode, a gate insulation layer on the gate electrode, source and drain electrodes formed on the gate insulation layer, a polysilicon channel layer overlapping the ohmic contact layers and on the gate insulation layer betwee... | 07/13/2010 |
| 7682886 | Flat panel display and manufacturing method of flat panel display The present disclosure relates to a display device comprising an insulating substrate; a source electrode and a drain electrode on the insulating substrate and separated by a channel area; an organic semiconductor layer formed in the channel area and on at least a p... | 03/23/2010 |
| 7615423 | Method for producing insulated gate thin film semiconductor device An amorphous semiconductor film is etched so that a width of a narrowest portion thereof is 100 μm or less, thereby forming island semiconductor regions. By irradiating an intense light such as a laser into the island semiconductor regions, photo-annealing is perfo... | 11/10/2009 |
| 7514304 | MOSFET having channel in bulk semiconductor and source/drain on insulator, and method of fabrication A MOSFET device (100) in a mono-crystalline semiconductor material (101) of a first conductivity type, which comprises a source and a drain of the opposite conductivity type, each having regions of polycrystalline semiconductor (110, 120) and re... | 04/07/2009 |
| 7439193 | Patterning method for fabricating high resolution structures Provided is a patterning method capable of fabricating high resolution structures without using a high resolution patterning step. The method comprises the steps of: (i) pre-patterning a layer of material (12) on a substrate (10), (ii) spin-coating a s... | 10/21/2008 |
| 7422984 | Method of manufacturing a semiconductor device A semiconductor device is provided which is constituted by semiconductor devices including a thin film transistor with a GOLD structure, the GOLD structure thin film transistor being such that: a semiconductor layer, a gate insulating film, and a gate electrode are ... | 09/09/2008 |
| 7413922 | Fabricating method of a pixel structure A method of fabricating a pixel structure is disclosed. A substrate having a color filter layer thereon and a leveling layer further covers the color filter layer is provided. A first metal layer is formed over the leveling layer. The first metal layer is patterned ... | 08/19/2008 |
| 7411209 | Field-effect transistor and method for manufacturing the same A method for manufacturing a field-effect transistor includes the steps of forming a source electrode and a drain electrode each containing hydrogen or deuterium; forming an oxide semiconductor layer in which the electrical resistance is decreased if hydrogen or deu... | 08/12/2008 |
| 7411572 | Organic electroluminescence display Embodiments of an organic electroluminescence display capable of preventing line mura generated due to manufacturing differences in driving transistors are disclosed. The manufacturing differences may be due to deviations of irradiated energy beam density generated ... | 08/12/2008 |
| 7396705 | Method for manufacturing a thin film transistor A method for manufacturing a thin film transistor (TFT) includes the steps of: providing a substrate (1); and forming a TFT circuit on the substrate using laser-induced chemical vapor deposition (LCVD). Detailedly, the method includes providing the bare subst... | 07/08/2008 |
| 7390694 | Method for manufacturing an organic semiconductor device, as well as organic semiconductor device, electronic device, and electronic apparatus A method for manufacturing an organic semiconductor device having a gate electrode, a source electrode, a drain electrode, an organic semiconductor layer, a gate insulation layer, and a substrate, including: forming, on the substrate, an underlayer that contains an ... | 06/24/2008 |
| 7387971 | Fabricating method for flat panel display device A fabricating method for a flat panel display device having a thin film pattern over a substrate is disclosed. The fabricating method includes depositing a hydrophilic resin over a substrate and patterning the hydrophilic resin to form hydrophilic resin patterns ove... | 06/17/2008 |
| 7361580 | Semiconductor device and manufacturing method thereof A semiconductor device and a manufacturing method thereof are provided. The semiconductor device includes a substrate, a gate insulating layer, a gate electrode, an oxide layer, and sidewalls. The gate insulating layer is formed on the substrate. The gate electrode ... | 04/22/2008 |
| 7351615 | Method of fabricating a MIS transistor A method of fabricating MIS transistors starts with formation of gate electrode portions. Then, high-speed ions are irradiated through an insulating film to implant impurity ions into a semiconductor region by a self-aligning process, followed by total removal of th... | 04/01/2008 |
| 7335570 | Method of forming insulating films, capacitances, and semiconductor devices Insulating metal oxide or nitride films are deposited by RF magnetron sputtering. During sputtering, the atmospheric gas comprises an oxygen or nitride compound gas and an inert gas. The proportion of the inert gas is decreased to 25 atom % or lower. By this sputter... | 02/26/2008 |
| 7329897 | Organic thin film transistor and method of manufacturing the same An organic thin film transistor and a method of manufacturing the same are provided. The transistor has a threshold voltage that can be easily controlled without changing the material forming an organic semiconductor film. The organic thin film transistor includes a... | 02/12/2008 |
| 7329924 | Integrated circuits and methods of forming a field effect transistor Integrated circuits and methods of forming field effect transistors are disclosed. In one aspect, an integrated circuit includes a semiconductor substrate comprising bulk semiconductive material. Electrically insulative material is received within the bulk semicondu... | 02/12/2008 |
| 7326600 | Method for manufacturing a thin-film transistor structure The present invention provides a thin film transistor structure in which at least a trench is formed in an insulating polymer film formed on a substrate. In the thin film transistor structure, a trench formed in the insulating polymer film accommodates a gate wiring... | 02/05/2008 |
| 7323369 | Fabrication method for thin film transistor array substrate Scan lines are formed on a substrate. A patterned dielectric layer and a patterned semiconductor layer are formed to cover portions of the scan lines. A patterned transparent conductive layer and a patterned metal layer are sequentially formed to define data lines, ... | 01/29/2008 |
| 7320905 | Semiconductor device provided with semiconductor circuit made of semiconductor element and method of fabricating the same This invention improves TFT characteristics by making an interface between an active layer, especially a region forming a channel formation region and an insulating film excellent, and provides a semiconductor device provided with a semiconductor circuit made of a s... | 01/22/2008 |
| 7304629 | Video information display system and display apparatus applicable to the same A display apparatus includes a plurality of display systems each having a light source, a reflection type liquid crystal panel and an optical system, a screen displaying superimposingly the images obtained from the plurality of display systems, and a selector for se... | 12/04/2007 |
| 7292302 | Fringe field switching liquid crystal display and method for manufacturing the same Disclosed are a fringe field switching liquid crystal display (FFS-LCD) and a method for manufacturing the same. The FFS-LCD comprises upper and lower substrates opposed to each other at a predetermined distance; a liquid crystal layer intervened between the upper a... | 11/06/2007 |
| 7291439 | Photoresist composition, method for forming film pattern using the same, and method for manufacturing thin film transistor array panel using the same A photoresist composition, a method for forming a film pattern using the photoresist composition, and a method for manufacturing a thin film transistor array panel using the photoresist composition are provided. In one embodiment, a photoresist composition includes ... | 11/06/2007 |
| 7288444 | Thin film transistor and method of manufacturing the same A method of manufacturing a thin film transistor that provides high electric field mobility is disclosed. In one embodiment, the method includes: a) forming an amorphous silicon layer and a blocking layer on an insulating substrate; b) forming a photoresist layer ha... | 10/30/2007 |
| 7241705 | Methods of forming conductive contacts to source/drain regions and methods of forming local interconnects The invention comprises methods of forming a conductive contact to a source/drain region of a field effect transistor, and methods of forming local interconnects. In one implementation, a method of forming a conductive contact to a source/drain region of a field eff... | 07/10/2007 |
| 7238557 | Semiconductor device and method of fabricating the same To provide a thin film transistor having a high field effect mobility and a small variation in characteristics thereof, a second amorphous semiconductor layer patterned in a predetermined shape is formed on a first crystalline semiconductor layer 17 for const... | 07/03/2007 |
| 7226820 | Transistor fabrication using double etch/refill process A semiconductor fabrication process includes forming a gate electrode (120) overlying a gate dielectric (110) overlying a semiconductor substrate (102). First spacers (124) are formed on sidewalls of the gate electrode (120). First... | 06/05/2007 |
| 7227228 | Silicon on insulator device and method of manufacturing the same An isolated semiconductor device and method for producing the isolated semiconductor device in which the device includes a silicon-on-insulator (SOI) device formed on a substrate. A dielectric film is formed on the insulator and covers the SOI device. The dielectric... | 06/05/2007 |
| 7217604 | Structure and method for thin box SOI device A method of forming a semiconductor device, including providing a substrate having a first insulative layer on a surface of the substrate, and a device layer on a surface of the first insulative layer, forming a spacer around the first insulative layer and the devic... | 05/15/2007 |
| 7215387 | Liquid crystal display device and method of fabricating the same A method of fabricating a liquid crystal display device includes forming an active pattern and a data line on a substrate, forming a first insulating layer on the data line, forming a second insulating layer on the substrate, forming a gate electrode on the second i... | 05/08/2007 |
