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Class 438/11 - Utilizing integral test element


Subclass of Class 438 - Semiconductor device manufacturing: process
Definition: Process wherein the electrical property is sensed utilizing
No. of patents: 236
Last issue date: 04/16/2013


1            
NumberTitleIssue Date
8420411Method for aligning wafer stack
A method for aligning a wafer stack includes providing a wafer stack including a top wafer with a top mark and a bottom wafer with a bottom mark in particular the top mark and the bottom mark capable of corresponding to each other; adjusting a relative position betw...
04/16/2013
8378698Integrated circuit testing apparatus and method
A testing apparatus includes a test controller configured to output a plurality of chip selection signals for selecting chips to be tested from among a plurality of chips, a plurality of first control signals for controlling supply of a power supply voltage to the c...
02/19/2013
7807480Test cells for semiconductor yield improvement
A test cell for localizing defects includes a first active region, a second active region formed substantially parallel to the first active region, a third active region formed substantially parallel to the first and second active regions, a fourth active region for...
10/05/2010
7799583System for separation of an electrically conductive connection
An integrated component includes a semiconductor substrate; at least one interconnect applied on the semiconductor substrate; an insulating layer applied on the at least one interconnect; and at least one opening through the insulating layer which interrupts the at ...
09/21/2010
7745235Method for manufacturing semiconductor sensor
A semiconductor sensor is disclosed that includes a substrate including at least a semiconductor layer. The substrate includes a weight arranging part in the vicinity of the center of the substrate, a flexible part around the weight arranging part, and supporting pa...
06/29/2010
7736916System and apparatus for using test structures inside of a chip during the fabrication of the chip
The fabrication of the wafer may be analyzed starting from when the wafer is in a partially fabricated state. The value of a specified performance parameter may be determined at a plurality of locations on an active area of a die of the wafer. The specified performa...
06/15/2010
7662647Method for manufacturing semiconductor device
A burn-in input signal input to a burn-in circuit is delivered to an internal circuit through a selector. In response to a control signal from the burn-in circuit, the selector selects either the burn-in input signal or an input signal for operating the internal cir...
02/16/2010
7648847In-situ monitoring and method to determine accumulated printed wiring board thermal and/or vibration stress fatigue using a mirrored monitor chip and continuity circuit
A monitoring system includes a monitor chip or chips soldered to a printed wiring board. By mirroring a function IC chip interface with the monitor chip, the consumed and remaining thermal/and or vibration-fatigue life of the function IC chip based on the life-envir...
01/19/2010
7510884Semiconductor production system and semiconductor production process
A semiconductor manufacturing apparatus according to the present invention comprises: a treating unit that treats a substrate to manufacture thereon a semiconductor device; a fluid supplying channel for supplying a fluid required for a treatment of the substrate to ...
03/31/2009
7498180Method for manufacturing semiconductor device
A burn-in input signal input to a burn-in circuit is delivered to an internal circuit through a selector. In response to a control signal from the burn-in circuit, the selector selects either the burn-in input signal or an input signal for operating the internal cir...
03/03/2009
7425458Selectable decoupling capacitors for integrated circuits and associated methods
Selectable capacitors are used to modify performance characteristics of functional circuit elements of an integrated circuit (IC). In an embodiment, the decoupling capacitors are implemented as additional or alternative mounting pads on a surface of the IC. At least...
09/16/2008
7423288Technique for evaluating a fabrication of a die and wafer
The fabrication of the wafer may be analyzed starting from when the wafer is in a partially fabricated state. The value of a specified performance parameter may be determined at a plurality of locations on an active area of a die of the wafer. The specified performa...
09/09/2008
7422913Method for checking a condition of a heat treatment
A method for connecting terminals is provided. The method includes steps of a) providing a board having a first terminal thereon; b) performing a check of a heat treatment by using a thermal sensitive paper in order to determine a optimal condition of the heat treat...
09/09/2008
7405414Method and apparatus for patterning a workpiece
The present invention relates to a method for creating a pattern on a workpiece sensitive to electromagnetic radiation. Electromagnetic radiation is emitted onto a computer controlled reticle having a multitude of modulating elements (pixels). The pixels are arrange...
07/29/2008
7402801Inspecting method of a defect inspection device
An inspecting method comprises the following steps. A plurality of defect inspection devices is formed on a wafer. Each defect inspection device comprises an insulating layer and a conductive layer stacked over the insulating layer. A defect inspection parameter is ...
07/22/2008
7393703Method for reducing within chip device parameter variations
A method of reducing parametric variation in an integrated circuit (IC) chip and an IC chip with reduced parametric variation. The method includes: on a first wafer having a first arrangement of chips, each IC chip divided into a second arrangement of regions, measu...
07/01/2008
7395518Back end of line clone test vehicle
A test vehicle comprises at least one product layer having a east one product circuit pattern on the product layer, and one or more clone layers formed over the product layer (1902). The one or more clone layers include a plurality of structures, which may in...
07/01/2008
7391023Lithography tool image quality evaluating and correcting
Electron beam lithography tool image quality evaluating and correcting including a test pattern with a repeated test pattern cell, an evaluation method and correction program product are disclosed. The test pattern cell includes a set of at least three elongated spa...
06/24/2008
7390682Method for testing metal-insulator-metal capacitor structures under high temperature at wafer level
A test methodology is provided for testing metal-insulator-metal (MIM) capacitor structures under high temperatures at the wafer level. A resistor is formed on a region of dielectric isolation material formed in a semiconductor substrate. The MIM capacitor is formed...
06/24/2008
7378289Method for forming photomask having test patterns in blading areas
A photomask and a method for forming a photomask are disclosed in which die regions that define features for a process step of a semiconductor fabrication process are formed on a photomask and a test pattern for a different process step is formed in a blading area o...
05/27/2008
7378290Isolation circuit
An isolation circuit includes a first pad adapted to receive a control signal and a second pad adapted to receive another signal. A third pad is coupled to a microelectronic die and a device is provided to transfer the other signal from the second pad to the third p...
05/27/2008
7372072Semiconductor wafer with test structure
The invention relates to a semiconductor wafer (1) having a plurality of first sawing regions (201-211) running parallel to one another in a first direction (X) and a plurality of second sawing regions (301-311) running parallel to...
05/13/2008
7373216Method and apparatus for verifying a site-dependent wafer
The present invention includes a method of verifying a Site-Dependent (S-D) wafer that includes receiving a first set of S-D wafers by one or more S-D processing elements in one or more processing subsystems, creating a first set of unverified S-D wafers by performi...
05/13/2008
7368304Fabricating die with separate test pads selectively coupled to cores
Timely testing of die on wafer reduces the cost to manufacture ICs. This disclosure describes a die test structure and process to reduce test time by adding test pads on the top surface of the die. The added test pads allow a tester to probe and test more circuits w...
05/06/2008
7353481Computer implemented method for designing a semiconductor integrated circuit and a semiconductor integrated circuit
A computer implemented method for designing a semiconductor integrated circuit includes placing dummy pattern on a second interconnection layer positioned just above the first power line based on a placement result of the first power line, the dummy pattern having a...
04/01/2008
7339963High speed data channel including a CMOS VCSEL driver and a high performance photodetector and CMOS photoreceiver
A high speed optical channel including an optical driver and a photodetector in a CMOS photoreceiver. The optical channel driver includes a FET driver circuit driving a passive element (e.g., an integrated loop inductor) and a vertical cavity surface emitting laser ...
03/04/2008
7339388Intra-clip power and test signal generation for use with test structures on wafers
The fabrication of the wafer may be analyzed starting from when the wafer is in a partially fabricated state. The value of a specified performance parameter may be determined at a plurality of locations on an active area of a die of the wafer. The specified performa...
03/04/2008
7335518Method for manufacturing semiconductor device
In a manufacturing method for a semiconductor device, a main body wafer is formed, and a monitor wafer on which a monitor element is formed is provided. Characteristics of the main body wafer are copied onto the monitor element by simultaneously processing the main ...
02/26/2008
7332360Early detection of metal wiring reliability using a noise spectrum
The present invention generally provides an apparatus and a method for inspecting a substrate in a substrate processing system. In one aspect, a voltage or current source is used in conjunction with a power density receiving device, such as a spectrometer, to inspec...
02/19/2008
7316935Reticle for layout modification of wafer test structure areas
Techniques are provided for forming die on wafers with large area test structures between primary die. A reticle is used to pattern each die. The pattern on the reticle forms a primary die and test structures in scribelines that abut edges of the die. A reticle can ...
01/08/2008
7309920Chip structure and process for forming the same
A chip or wafer comprises a semiconductor substrate, first and second transistors on the semiconductor substrate, first and second metal layers over the semiconductor substrate, an insulating layer on the first and second metal layers, a third and fourth metal layer...
12/18/2007
7301239Wiring structure to minimize stress induced void formation
A wiring structure with improved resistance to void formation and a method of making the same are described. The wiring structure has a first conducting layer that includes a large area portion which is connected to an end of a protrusion with a plurality of ā€œnā€...
11/27/2007
7301225Multi-row lead frame
A lead frame (10) for a semiconductor device includes a first row of terminals (12) surrounding a die receiving area (14) and a second row of terminals (16) spaced from and surrounding the first row of terminals (12). The first and...
11/27/2007
7299818Integrated microvalve and method for manufacturing a microvalve
An integrated microvalve has a substrate, a first function layer applied to the substrate, and a second function layer applied to the first function layer, the first function layer being designed as a diaphragm in at least one valve area, the second function layer b...
11/27/2007
7294911Ultrathin leadframe BGA circuit package
A circuit package is formed using a leadframe. The leadframe is formed or etched to align a plurality of bond pad structures above a reference plane while supporting leadframe fingers are positioned below the reference plane. Jumper wires are wirebonded between term...
11/13/2007
7292335Optical measurements of patterned structures
A method and a system for optical measuring in a structure having a pattern in the form of spaced-apart parallel elongated regions of optical properties different from that of spaces between said regions. The system comprises a broadband illuminator (8) for g...
11/06/2007
7290190Semiconductor integrated circuit with a test circuit
A shift scan chain includes logic circuit blocks 11-18 and scan registers 21-28 connected at stages succeeding them. The shift chain is divided into divisional chains including the scan registers 21-24 and the scan registers...
10/30/2007
7285849Semiconductor die package using leadframe and clip and method of manufacturing
A clip structure for a semiconductor package is disclosed. The clip structure includes a major portion, at least one pedestal extending from the major portion, a downset portion, and a lead portion. The downset portion is between the lead portion and the major porti...
10/23/2007
7282374Method and apparatus for comparing device and non-device structures
The present invention provides a method and apparatus for comparing device and non-device structures. The method includes determining at least one characteristic parameter associated with at least one non-device structure on at least one workpiece and determining at...
10/16/2007
7282376System, method, and apparatus for electrically testing lead-to-lead shorting during magnetoresistive sensor fabrication
Built-in electrical test structures are measured for lead-to-lead shorting during the fabrication of MR elements on a wafer. The test structures are fabricated in the same fashion as the MR elements, however, the active sensor region or track width is omitted from t...
10/16/2007
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