Did You Know...
...that a workman who left the soap mixing machine on too long was responsible for making Ivory Soap? He was so embarrassed by his mistake that he threw the mess in a stream. Imagine his dismay when the evidence of his error floated to the surface! Result: Ivory soap, the soap that floats.
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| Number | Title | Issue Date |
| 7264467 | Convection oven with turbo flow air nozzle to increase air flow and method of using same A convection oven that achieves a substantially enhanced degree of air flow through the use of a special nozzle design. Turbo flow air nozzles create an air flow pattern to provide higher velocity airflow with a smaller fan size and ductwork. The turbo flow air nozz... | 09/04/2007 |
| 7225095 | Thermal processing equipment calibration method The invention relates to a method for calibrating thermal processing equipment used for heat treatment of a multilayer substrate, in particular a multilayer semiconductor substrate. A calibration test profile is determined by processing a calibration test substrate ... | 05/29/2007 |
| 7189293 | Method of producing annealed wafer and annealed wafer The present invention is a method of producing an annealed wafer wherein a silicon single crystal wafer having a diameter of 200 mm or more produced by the Czochralski (CZ) method is subjected to a high temperature heat treatment in an atmosphere of an argon gas, a ... | 03/13/2007 |
| 7153785 | Method of producing annealed wafer and annealed wafer The present invention provides method of producing an annealed wafer wherein a silicon single crystal wafer produced by the Czochralski (CZ) method is subjected to a high temperature annealing in an atmosphere of an argon gas, a hydrogen gas, or a mixture gas thereo... | 12/26/2006 |
| 7022192 | Semiconductor wafer susceptor A semiconductor wafer susceptor for batch substrate processing. The susceptor includes a central region in a primary plane and a plurality of flat annular extensions extending below the central region in a secondary plane. The primary and secondary planes are parall... | 04/04/2006 |
| 6937030 | Testing electrical integrity of electrically heated subsea pipelines Method is provided for testing electrically heated subsea pipelines that are “electrical-ready,” that is, equipped for applying electrical power when it is needed for heating the pipeline at any time during the life of the pipeline. Time domain reflectometer app... | 08/30/2005 |
| 6936108 | Heat treatment device A film-forming unit of the invention includes: a processing furnace, gas-supplying means that supplies a process gas into the processing furnace, heating means that heats an inside of the processing furnace to a predetermined process-temperature, and a normal-pressu... | 08/30/2005 |
| 6919271 | Method for rapidly heating and cooling semiconductor wafers The present invention is directed to an apparatus and process for heating and cooling semiconductor wafers in thermal processing chambers. In particular, the apparatus of the present invention includes a cooling device for actively cooling the wafers after the wafer... | 07/19/2005 |
| 6902891 | Process for labeling a nucleic acid A process of fragmenting and labeling a synthetic or natural nucleic acid, comprising the steps of providing a mixture containing a nucleic acid, a labeling agent containing a detectable label, and at least one multivalent metal cation in a substantially aqueous sol... | 06/07/2005 |
| 6729875 | Susceptor pocket profile to improve process performance An apparatus and method to position a wafer onto a wafer holder and to maintain a uniform wafer temperature is disclosed. The wafer holder or susceptor comprises a recess or pocket whose surface is concave and includes a grid containing a plurality of grid grooves s... | 05/04/2004 |
| 6524650 | Substrate processing apparatus and method Substrate processing apparatus and method, by which an outside air and a gas-phase backward flow are restrained from entering the inside of a reaction chamber during the inside of a reaction chamber is opened to the outside through a substrate carrying-in... | 02/25/2003 |
| 6511315 | Substrate processing apparatus In a substrate processing apparatus, processing units are stacked in a multistage manner around a transport robot arranged at the center of a processing area for forming a processing part. In a second hierarchy, rotary coating units are arranged through a... | 01/28/2003 |
| 6171982 | Method and apparatus for heat-treating an SOI substrate and method of preparing an SOI substrate by using the same An SOI substrate having on the surface thereof a single crystal silicon film formed on an insulator is heat-treated in a hydrogen-containing reducing atmosphere in order to smooth the surface and reduce the boron concentration without damaging the film th... | 01/09/2001 |
| 6033215 | Heat treatment apparatus and heat treatment boat A heat treatment boat houses a plurality of semiconductor wafers in a manner separated at intervals for heat-treating the wafers in a heat treatment furnace. The heat treatment boat includes a bottom plate, a first support rod erected on the outer periphe... | 03/07/2000 |
| 5931662 | Silicon single crystal wafer annealing method and equipment and silicon single crystal wafer and manufacturing method related thereto The present invention is designed to provide an annealing method for silicon single crystal wafers, which makes it possible to increase the number of silicon single crystal wafers processed during a single annealing process under a variety of annealing pe... | 08/03/1999 |
| 5904478 | Semiconductor processing furnace heating subassembly A vertically oriented thermal processor for processing batches of semiconductor wafers held within a processing chamber. The processing chamber is contained within a processing vessel. A furnace liner surrounds the processing vessel in spaced relationship... | 05/18/1999 |
| 5816798 | Conveying apparatus and continuous furnace equipped therewith A conveying apparatus for a continuous furnace comprises at least one conveying-beam pair and at least one retaining-beam pair, which are located opposite one another in each case with the conveyable object between them, and which makes it possible to cho... | 10/06/1998 |
| 5813851 | Heat treatment method When a wafer boat having wafers, objects to be treated, placed thereon is loaded into a reaction tube, which is then raised in temperature by a heating section at a speed of 50° C./min or more, a pressure reduction degree of the reaction tube is lowered ... | 09/29/1998 |
| 5775889 | Heat treatment process for preventing slips in semiconductor wafers A heat treatment apparatus comprising a reaction vessel located in a vertical furnace, and a ladder boat for mounting a plurality of semiconductor wafers one above another in parallel with each other. A vertical mounting pitch of mounting the wafers on th... | 07/07/1998 |
| 5752819 | Exhaust system for high temperature furnace An exhaust system for use with a high temperature furnace used to perform oxidation and/or annealing operations of the type used in semiconductor fabrication. The exhaust system is designed to permit the furnace to be used with a controlled environment ch... | 05/19/1998 |
| 5716207 | Heating furnace A heating furnace and a method for uniformly thermo-setting a paste applied onto the surface of a substrate, and for manufacturing a high quality substrate. The heating furnace can be installed in a small area. A plurality of up-and-down moving pins are p... | 02/10/1998 |
| 5709543 | Vertical heat treatment apparatus The vertical heat treatment apparatus according to the present invention in which a substrate holder holding a plurality of substrates-to-be-processed at a vertical interval is mounted on the top of a cap for opening and closing the bottom opening (furnac... | 01/20/1998 |
| 5679168 | Thermal processing apparatus and process A thermal treatment boat having a plurality of annular, coaxial, spaced apart bands having substantially the same inner diameters. The bands are separated by a band spacing distance of from about 3.8 to 12.7 mm, each of the bands having a height, Height | 10/21/1997 |
| 5678989 | Heat treatment method using a vertical processing tube An object holder is raised, a mount portion is stopped at a middle stop position higher than a lower stop position, and an object of treatment is preheated. Thereafter, the object holder is further raised, the mount portion is stopped at an upper stop pos... | 10/21/1997 |
| 5662470 | Vertical furnace A vertical furnace for processing wavers positioned on a support structure. The furnace comprises an inner sleeve, heating means and an outer sleeve. To support the inner sleeve on the support structure a support sleeve is provided engaging with its top a... | 09/02/1997 |
| 5662469 | Heat treatment method The present invention relates to a thermal processing method wherein a cylindrical process tube that has at one end an entrance/exit is provided at the other end thereof with a heat source, and thermal processing is performed on a workpiece which has been... | 09/02/1997 |
| 5651670 | Heat treatment method and apparatus thereof The present invention relates to a thermal processing method wherein a cylindrical process tube that has at one end an entrance/exit is provided at the other end thereof with a heat source, and thermal processing is performed on a workpiece which has been... | 07/29/1997 |
| 5639234 | Treatment system and treatment apparatus A treatment system is disclosed, which has a treatment apparatus for performing a predetermined treatment for a planar workpiece contained in a carrier, and an first air-tight carrier storage chamber for storing the carrier. The treatment apparatus may al... | 06/17/1997 |
| 5618351 | Thermal processing apparatus and process Thermal treatment boat comprising a cylinder having a central axis and a plurality of band slots having opposed upper and lower surfaces in planes perpendicular to said central axis and spaced at predetermined locations along said central axis. At least o... | 04/08/1997 |
| 5586880 | Heat treatment apparatus and heat treatment boat A heat treatment boat houses a plurality of semiconductor wafers in a manner separated at intervals for heat-treating the wafers in a heat treatment furnace. The heat treatment boat includes a bottom plate, a first support rod erected on the outer periphe... | 12/24/1996 |
| 5567149 | Exhaust system for high temperature furnace An exhaust system for use with a high temperature furnace used to perform oxidation and/or annealing operations of the type used in semiconductor fabrication. The exhaust system is designed to permit the furnace to be used with a controlled environment ch... | 10/22/1996 |
| 5556275 | Heat treatment apparatus A heat treatment apparatus comprising a holder, a hollow cylindrical cover, a flat plate, and a processing chamber. The holder holds disk-shaped objects, each having an orientation flat portion at circumference. The objects are arranged coaxially and spac... | 09/17/1996 |
| 5525057 | Forced cooling apparatus for heat treatment apparatus A forced cooling apparatus for a heat treatment apparatus comprising a heat treatment furnace having a process tube with one end open at an furnace opening and another end closed at an furnace top portion; and a heater portion which covers the process tub... | 06/11/1996 |
| 5516283 | Apparatus for processing a plurality of circular wafers An apparatus for processing a plurality of circular wafers including a tubular heater, a boat and a plurality of heat transfer bodies. The tubular heater has a heating space inside and radiates heat within the heating space. The boat is loaded inside the ... | 05/14/1996 |
| 5505994 | Fabric-handling equipment Fabric-handling equipment which removes a fabric web from a stack of such webs or from a supporting surface, dries ink printed on a fabric, and removes a porous fabric held onto a surface by a vacuum. To remove a fabric web from a surface, like a stack of... | 04/09/1996 |
| 5477847 | Heating device A heating device including a first exothermic member disposed below a subject to be heated for preventing heat radiation from the subject while heating the subject from below, a second exothermic member disposed above the subject for preventing heat radia... | 12/26/1995 |
| 5445522 | Combustion device This invention relates to a combustion device for feeding hydrogen gas and oxygen gas into a combustion vessel, while heating the same, to generate water vapor. The combustion device comprises a hydrogen gas injection nozzle for feeding hydrogen gas into ... | 08/29/1995 |
| 5429498 | Heat treatment method and apparatus thereof The present invention relates to a thermal processing method wherein a cylindrical process tube that has at one end an entrance/exit is provided at the other end thereof with a heat source, and thermal processing is performed on a workpiece which has been... | 07/04/1995 |
| 5407349 | Exhaust system for high temperature furnace An exhaust system for use with a high temperature furnace used to perform oxidation and/or annealing operations of the type used in semiconductor fabrication. The exhaust system is designed to permit the furnace to be used with a controlled environment ch... | 04/18/1995 |
| 5383783 | Substrate handling apparatus A pusher which pushes up semiconductor wafers has wafer fixing grooves to which they are fixed. Wafer detecting sensors which detect whether the semiconductor wafers are present are positioned in side walls of the wafer fixing grooves. The pusher is compo... | 01/24/1995 |
