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| Number | Title | Issue Date |
| 8052419 | Closed loop temperature heat up and control utilizing wafer-to-heater pedestal gap modulation Methods and apparatuses that decouple wafer temperature from pre-heat station residence time, thereby improving wafer-to-wafer temperature uniformity, are provided. The methods involve maintaining a desired temperature by varying the distance between the wafer and a... | 11/08/2011 |
| 7955074 | Apparatus and method for thermally treating semiconductor device capable of preventing wafer from warping A thermal treatment apparatus and method for processing a wafer are provided. The thermal treatment apparatus includes a process chamber for thermally treating the wafer, a heating unit for heating the wafer in the process chamber, and a gas supply unit for supplyin... | 06/07/2011 |
| 7896649 | Heat system, heat method, and program The present invention provides a heating system, a heating method and a program, which can readily control processing temperature. A temperature calculating computer 4 of the heating system includes a device DB 42. The device DB 42 stores therei... | 03/01/2011 |
| 7780440 | Substrate supporting/transferring tray To provide a substrate supporting/transferring tray, which can be placed on a substrate supporting part arranged in a treatment chamber in which the heat treatment is performed to a substrate, especially on a substrate supporting part having a built-in heating means... | 08/24/2010 |
| 7758341 | Utility apparatus and utility method of substrate processing apparatus A utility apparatus supplies a liquid to a substrate processing apparatus having a plurality of blocks of heat treatment apparatus groups. A plurality of supply ports supplies the liquid for each vertical block, horizontal block, or heat treatment apparatus. A plura... | 07/20/2010 |
| 7628612 | Heat treatment apparatus, heat treatment method, and computer readable storage medium In the present invention, a plurality of heat treatment units are arranged side by side in a linear form and a substrate transfer mechanism for transferring the substrate between the heat treatment units is provided in a heat treatment apparatus. The substrate is se... | 12/08/2009 |
| 7503762 | Substrate processing apparatus and substrate processing method A substrate processing apparatus having heat treatment apparatuses for treating a processing target substrate at a predetermined temperature includes: a temperature adjustment mechanism provided in each of the heat treatment apparatuses forming a plurality of heat t... | 03/17/2009 |
| 7445446 | Method for in-line monitoring and controlling in heat-treating of resist coated wafers A method of heat-treating resist coated manufacturing wafers in a processing system by establishing a temperature profile for each of a plurality of hotplates in the processing system, heat-treating the resist coated manufacturing wafers on the hotplates, obtaining ... | 11/04/2008 |
| 7431585 | Apparatus and method for heating substrates An apparatus for processing substrates is disclosed. In one embodiment, the apparatus includes a housing and a plurality of stacked cell structures in the housing. An actuator is adapted to move the plurality of stacked cell structures inside of the housing while su... | 10/07/2008 |
| 7416406 | Furnace framework system with expansion joint Aspects of this invention include a furnace framework system which includes a framework with a first end piece, a second end piece and inter-connecting structural members operatively connecting the first end piece with the second end piece, with a combustion chamber... | 08/26/2008 |
| 7410355 | Method for the heat treatment of substrates A substrate undergoes a semiconductor fabrication process at different temperatures in a reactor without changing the temperature of the reactor. The substrate is held suspended by flowing gas between two heated surfaces of the reactor. Moving the two heated surface... | 08/12/2008 |
| 7393205 | Device and method for heating up extrusion dies prior to their installation in an extruder The invention relates to a device for heating up extrusion dies prior to their installation in an extruder, whereby the dies are heated up to a prescribed temperature and kept at this temperature. The device is characterized in that it comprises a gas-tight and ther... | 07/01/2008 |
| 7392668 | Low heat capacity gas oxy fired burner A front end for a glass forming operation including an open channel and at least one burner. The channel surface has at least one burner port and a burner oriented in the burner port at an acute angle relative to the channel surface. The surface may be a top, side o... | 07/01/2008 |
| 7347900 | Chemical vapor deposition apparatus and method A chemical vapor deposition (CVD) apparatus includes a process chamber where a deposition process is performed on a wafer. A gas supply assembly is mounted in the process chamber for supplying a process gas to the process chamber, and a vacuum pump is mounted in the... | 03/25/2008 |
| 7335019 | Firing container for silicon nitride ceramics A firing container for silicon nitride ceramics, which is a hermetically sealed container having a gas inlet and a gas outlet, characterized in that the interior of the hermetically sealed container is partitioned by a gas supply chamber partition plate into a gas s... | 02/26/2008 |
| 7311520 | Heat treatment apparatus The present invention is a thermal processing unit including: a heating-furnace body whose upper end has an opening; a reaction tube consisting of a single tube contained in the heating-furnace body; a gas-discharging-unit connecting portion formed at an upper porti... | 12/25/2007 |
| 7284980 | Continuous firing furnace, manufacturing method of porous ceramic member using the same, porous ceramic member, and ceramic honeycomb filter A continuous firing furnace of the present invention comprises: a muffle formed into a cylindrical shape so as to ensure a predetermined space; a plurality of heat generators placed at the peripheral direction from the muffle; and a heat insulating layer formed in a... | 10/23/2007 |
| 7251918 | Fixing bracket for joining wooden building components A fixing bracket is described for joining wooden building components to each other and to a substrate, particularly of the kind used for joining boards used to cover balconies and decks outdoors. It is essential that the fixing bracket is a double angle consisting o... | 08/07/2007 |
| 7241140 | Burning oven A burning oven is provided, and has a housing that surrounds a combustion chamber in which material that is to be burned can be introduced after the housing is opened and can be placed upon a combustion chamber base. A deposit element is disposed externally of the c... | 07/10/2007 |
| 7220312 | Methods for treating semiconductor substrates The invention includes a method for treating a plurality of discrete semiconductor substrates. The discrete semiconductor substrates are placed within a reactor chamber. While the substrates are within the chamber, they are simultaneously exposed to one or more of H... | 05/22/2007 |
| 7216464 | Modular oven wall panel assembly A modular oven, such as a batch process oven, includes a standardized set of self supporting, interconnectable panels which, when assembled, from a self-supporting heat containment shell, free of added structural support members. The present invention is also direct... | 05/15/2007 |
| 7183208 | Methods for treating pluralities of discrete semiconductor substrates The invention includes a method for treating a plurality of discrete semiconductor substrates. The discrete semiconductor substrates are placed within a reactor chamber. While the substrates are within the chamber, they are simultaneously exposed to one or more of H... | 02/27/2007 |
| 7150628 | Single-wafer type heat treatment apparatus for semiconductor processing system A single-substrate heat-processing apparatus (2) for a semiconductor processing system includes a process container (4) configured to accommodate a target substrate (W). A support member (6) is disposed in the process container (4) and co... | 12/19/2006 |
| 7141763 | Method and apparatus for rapid temperature change and control An apparatus and a method for controlling the temperature of a substrate during substrate processing. The apparatus comprises a substrate table having a thermal surface supporting the substrate. The apparatus also comprises a first thermal assembly arranged in the s... | 11/28/2006 |
| 7128570 | Method and apparatus for purging seals in a thermal reactor A semiconductor processing reactor comprises a reaction chamber with a gas exhaust and a mechanical seal at one end of the chamber. The seal seals off the chamber from the ambient environment and is purged with gas to prevent diffusion of ambient gases into the reac... | 10/31/2006 |
| 7112544 | Method of atomic layer deposition on plural semiconductor substrates simultaneously The invention includes a method for treating a plurality of discrete semiconductor substrates. The discrete semiconductor substrates are placed within a reactor chamber. While the substrates are within the chamber, they are simultaneously exposed to one or more of H... | 09/26/2006 |
| 7104068 | Turbine component with enhanced stagnation prevention and corner heat distribution Aspects of the invention relate to a system for reducing stagnation between substantially adjacent components while providing enhanced heat distribution properties in the corners and edges of the components. Each component is generally hollow and has two walls dispo... | 09/12/2006 |
| 7089683 | Drying device The aim of the present invention is to create an efficient energy rational and consequently economical drying device, particularly the drying compartment unit, which could be used for drying processes for all wood products regardless to dimensions, with the ability ... | 08/15/2006 |
| 7037063 | Substrate floating apparatus and method of manufacturing liquid crystal display apparatus using the same There are provided a substrate floating apparatus for preventing interference between a glass substrate and a floating board when floating and conveying the glass substrate and a method of manufacturing LCD devices using the substrate floating apparatus. The substra... | 05/02/2006 |
| 7022589 | Thermal treatment equipment and method for heat-treating The invention provides a method for activating impurity element added to a semiconductor and performing gettering process in shirt time, and a thermal treatment equipment enabling to perform such the heat-treating. The thermal treatment equipment comprises treatment... | 04/04/2006 |
| 7017370 | Method and device for the homogenous heating of glass and/or glass-ceramic articles using infrared radiation A method for the homogeneous heating of semitransparent and/or transparent glass and/or glass-ceramic articles using infrared radiation so that the glass and/or glass-ceramic articles undergo heat treatment at between 20 and 3000° C., notably at between 20 and 1705... | 03/28/2006 |
| 7000430 | Method of forming glass-ceramic parts and/or glass parts The invention relates to a method of producing glass-ceramic parts and/or glass parts by deformation of a glass-ceramic blank and/or glass blank. The invention is characterized in that forming is carried out using infrared radiation. ... | 02/21/2006 |
| 6994544 | Wafer scale thermal stress fixture and method A fixture for supporting a plurality of semiconductor chips during the thermal cycling of the chips, including a fluid-permeable bottom screen, a chip-cavity-defining plate supported against a top surface of the bottom screen, a lower attaching mechanism for attachi... | 02/07/2006 |
| 6988886 | Thermal treatment system for semiconductors A thermal treatment system for semiconductors comprises an outer tube made of silicon carbide, a base hermetically supporting a lower portion of the outer tube, a lid selectively opening and closing an opening formed in a central portion of the base, and a reactor w... | 01/24/2006 |
| 6953605 | Method for densifying porous substrates by chemical vapour infiltration with preheated gas A method for densification of porous by CVI in which substrates are loaded into a loading zone of an oven and heated to a temperature at which a desired matrix material is formed from a precursor gas(es). A reative gas containing the precursor gas(es) is admitted in... | 10/11/2005 |
| 6949143 | Dual substrate loadlock process equipment One embodiment relates to a loadlock having a first support structure therein to support one unprocessed substrate and a second support structure therein to support one processed substrate. The first support structure is located above the second support structure. T... | 09/27/2005 |
| 6905332 | Modular oven, panel assembly and method of assembling the same A modular oven, such as a batch process oven, having a standardized set of self supporting, interconnectable panels which, when assembled, from a self-supporting heat containment shell, free of added structural support members. Also described are the self-supporting... | 06/14/2005 |
| 6808391 | Baking apparatus for manufacturing a semiconductor device A baking apparatus for manufacturing a semiconductor device remarkably enhances the uniformity of the CD (Critical Dimension) of a wafer by creating a uniform temperature distribution. The apparatus includes a processing having an open upper part, a hot plate dispos... | 10/26/2004 |
| 6802712 | Heating system, method for heating a deposition or oxidation reactor, and reactor including the heating system A heating system, a method for heating a deposition reactor or an oxidation reactor, and a reactor utilizing the heating system are particularly suited for low-pressure chemical vapor deposition or oxidation. A heating system is particularly useful for heating a rea... | 10/12/2004 |
| 6752624 | Soaking apparatus Soaking apparatus to treat materials which require higher accuracy in soaking and improved cleanliness. The soaking apparatus includes a heat treatment apparatus having walls, a ceiling and a floor, each divided into a plurality of sections, a heater block mounted o... | 06/22/2004 |
