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...that Kleenex tissue was originally designed to be a gas mask filter? It was developed at the beginning of World War I to replace cotton, which was then in short supply as a surgical dressing.
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| Number | Title | Issue Date |
| 8029274 | Convection oven with laminar airflow and method A convection oven with laminar airflow and/or moisture injection. A radial airflow fan is used to provide a circulating airflow that is substantially even and substantially turbulence free. The circulating airflow is provided to an oven chamber via a plurality of eg... | 10/04/2011 |
| 7758338 | Substrate carrier, port apparatus and facility interface and apparatus including same An apparatus includes a first enclosure, a first door, at least one first valve, at least one inlet diffuser and at least one substrate holder. The first enclosure has a first opening. The first door is configured to seal the first opening. The first valve is couple... | 07/20/2010 |
| 7699604 | Manufacturing apparatus for semiconductor device and manufacturing method for semiconductor device A manufacturing apparatus for a semiconductor includes a reaction chamber into which a wafer is introduced, gas supply unit for supplying a gas to the reaction chamber, gas exhaust unit for exhausting the gas from the reaction chamber, a holder for holding the wafer... | 04/20/2010 |
| 7429174 | Clean atmosphere heat treat for coated turbine components A method for heat treating at least one workpiece, such as a coated turbine engine component, is provided. The method comprises the steps of cleaning a furnace to be used during the heat treating method, which cleaning method comprising injecting a gas at a workpiec... | 09/30/2008 |
| 7427375 | Diffuser for an annealing furnace A diffuser (24) for an annealing furnace has a plurality of radially extending generally and vertically oriented vanes (40) for radially directing furnace gases. The vanes have top edges (42) defining a generally planar support and the top edges... | 09/23/2008 |
| 7335019 | Firing container for silicon nitride ceramics A firing container for silicon nitride ceramics, which is a hermetically sealed container having a gas inlet and a gas outlet, characterized in that the interior of the hermetically sealed container is partitioned by a gas supply chamber partition plate into a gas s... | 02/26/2008 |
| 7264467 | Convection oven with turbo flow air nozzle to increase air flow and method of using same A convection oven that achieves a substantially enhanced degree of air flow through the use of a special nozzle design. Turbo flow air nozzles create an air flow pattern to provide higher velocity airflow with a smaller fan size and ductwork. The turbo flow air nozz... | 09/04/2007 |
| 7192272 | Convection oven with laminar airflow and method A convection oven with laminar airflow and/or moisture injection. A radial airflow fan is used to provide a circulating airflow that is substantially even and substantially turbulence free. The circulating airflow is provided to an oven chamber via a plurality of eg... | 03/20/2007 |
| 7105060 | Method of forming an oxidation-resistant TiSiN film A CVD process of forming a conductive film containing Ti, Si and N includes a first step of supplying gaseous sources of Ti, Si and N simultaneously to grow a conductive film and a second step of supplying the gaseous sources of Ti, Si and N in a state that a flow r... | 09/12/2006 |
| 7044731 | Heat treatment apparatus Exhaust pressure in an exhaust system 15 that evacuates a processing furnace 2 is determined as absolute pressure by using a differential manometer 23, which measures the exhaust pressure as differential pressure, and a barometer, which measures... | 05/16/2006 |
| 6930285 | Firing furnace for plasma display panel and method of manufacturing plasma display panel In a firing furnace of plasma display panel, gas distribution piping and gas exhaust piping each have a circular cross section and a uniform diameter along the longitudinal direction of those pipings. The gas distribution piping has a plurality of circular openings ... | 08/16/2005 |
| 6863732 | Heat treatment system and method The present invention relates generally to a heat treatment system and method for heat-treating an object to be treated. Particularly, the invention relates to a heat treatment system wherein an object to be treated is carried in a reaction vessel, which has been pr... | 03/08/2005 |
| 6830449 | Injector robot for replacing a gas injector in a furnace The present invention provides an injector robot for replacing a gas injector in a running furnace, which is still running and without any cooling and reheating action. According to the present invention, the injector robot is arranged and mounted upon a boat elevat... | 12/14/2004 |
| 6814572 | Heat treating method and heat treating device A thermal processing unit of the present invention includes: a reaction container which an object to be processed is conveyed into and from; a process-gas introducing part for introducing a process gas into the reaction container; a replacement-gas introducing part ... | 11/09/2004 |
| 6544034 | Heat treatment equipment for object to be treated and its exhausting method This invention provides a heat treatment equipment for an object to be treated capable of removing the desorption gas effectively, and of ensuring the equality of the temperature in the plane of the object to be treated by controlling preferably the turbu... | 04/08/2003 |
| 6540509 | Heat treatment system and method The present invention relates generally to a heat treatment system and method for heat-treating an object to be treated. Particularly, the invention relates to a heat treatment system wherein an object to be treated is carried in a reaction vessel, which ... | 04/01/2003 |
| 6485297 | Thermal treatment furnace having gas leakage preventing function A thermal treatment furnace is described in which gas leakage does not occur during thermal treatment at a high temperature. A thermal treatment furnace having a reaction tube is provided with an opening at one end and a flange surrounding the opening and... | 11/26/2002 |
| 6454563 | Wafer treatment chamber having thermal reflector A wafer treatment apparatus includes a wafer heating device having a wafer-load region at an upper portion, a shower head opposing the wafer-load region for ejecting/directing a source gas toward the wafer surface, and a reflecting apparatus positioned be... | 09/24/2002 |
| 6347732 | Circuit board component retention A method and implementing system is provided in which a gas, such as oxygen, is injected on to area of a circuit board to which an electronic component is being mounted. The injected gas causes a formation of a coating or surface alloy layer such as tin-o... | 02/19/2002 |
| 6328561 | Method for cooling a furnace, and furnace provided with a cooling device A furnace includes a core tube that has an elongate boundary wall and is configured to accommodate wafers for processing the wafers in a treatment atmosphere. The furnace includes a cooling chamber defined between the elongate boundary wall and an outer c... | 12/11/2001 |
| 6269998 | Process for manufacturing electronic circuits The process for manufacturing an electronic circuit includes disposing an electronic device on a circuit substrate and hot melting a solder formed on the electronic device or the circuit substrate to bond the electronic device and the circuit substrate. T... | 08/07/2001 |
| 6235235 | System for extracting sodium metal from sodium hydroxide and a reductant of natural gas An apparatus and system for its use for a continuous production on an alkali metal, preferably sodium metal, by a reduction of the metal hydroxide with methane or natural gas as a reductant. The invention is preferably utilized with sodium hydroxide as is... | 05/22/2001 |
| 6217319 | Semiconductor manufacturing device and method of processing wafer A hot plate unit includes a cover. The cover includes an inner wall and an outlet. There is provided immediately under the outlet a plate having a ventilation hole. The distance between the plate and a main surface is identical to the distance between the... | 04/17/2001 |
| 6171982 | Method and apparatus for heat-treating an SOI substrate and method of preparing an SOI substrate by using the same An SOI substrate having on the surface thereof a single crystal silicon film formed on an insulator is heat-treated in a hydrogen-containing reducing atmosphere in order to smooth the surface and reduce the boron concentration without damaging the film th... | 01/09/2001 |
| 6110289 | Rapid thermal processing barrel reactor for processing substrates A novel rapid thermal process (RTP) barrel reactor processes a larger batch of semiconductor substrates than was previously possible. The RTP barrel reactor is characterized by a short process cycle time in comparison to the same process cycle time in a c... | 08/29/2000 |
| 6045619 | Horizontal-type silicon-nitride furnace A horizontal-type silicon-nitride furnace (HOSINF) having two tubes is provided. The HOSINF includes an outer tube and an inner tube. One end of the outer tube is coupled to a pump. The other end of the outer tube can be well sealed by a door through a fl... | 04/04/2000 |
| 5795148 | Induced draft furnace air addition method and apparatus Method and apparatus for maintaining even heat distribution to each of the tubes contained in a down-fired induced draft furnace by eliminating external atmosphere disturbances such as wind from influencing furnace operation. The top of the furnace is iso... | 08/18/1998 |
| 5772428 | Method and apparatus for heat treatment including H2 /H2 O furnace region control A closed-loop control system controls introduction of either water or hydrogen into a furnace region where a part is subjected to an elevated temperature to accomplish a heat treatment process. The heat treatment process causes the part to participate in ... | 06/30/1998 |
| 5727939 | Deflector system for reducing air infiltration into a furnace A furnace having a molten material holding tank with sidewall and a tuckstone or other structure above the sidewall upper end leaving a gap, or joint, therebetween. A deflector, or diverter, is provided at the upper end of the sidewall to deflect cooling ... | 03/17/1998 |
| 5611685 | Substrate heat treatment apparatus A substrate heat treatment apparatus includes a heat treatment furnace of a flat configuration, and having a cavity in which a substrate is accommodated. The heat treatment furnace includes a gas supply unit at one side end face, an opening for communicat... | 03/18/1997 |
| 5607297 | Moving bed process for carbothermally synthesizing nonoxide ceramic powders Carbothermally reduce a metal oxide to its corresponding metal nitride or metal carbide powder in a vertical gravity flow reactor by adding precursor pellets containing the metal oxide, a thermally decomposed binder material and carbon or a source of carb... | 03/04/1997 |
| 5577908 | Apparatus for process for continuous curing An apparatus and method suitable for the continuous curing of pasted battery plates. The apparatus includes a hydroset oven having an atmospherically controlled hydroset chamber in which a continuous transport conveyor is mounted. Pasted plates are automa... | 11/26/1996 |
| 5513983 | Apparatus for vitrifying soot preform for optical fiber An apparatus for vitrifying a soot preform from which an optical fiber is produced by drawing, is composed of a main vacuum chamber 20 in which a muffle tube 70 for vitrifying the soot preform PF is located, and an auxiliary vacuum chamber 30 mounted on t... | 05/07/1996 |
| 5276309 | Food conditioning chest A food conditioning chest has a generally rectangular tub supported in the housing to define an upwardly opening food well for supporting foodstuffs. Louvered openings are formed in opposite end walls and the front wall and the rear wall of the tub. A ret... | 01/04/1994 |
| 5236353 | Vertical combustion furnace A vertical resistive combustion furnace having a vertically oriented combustion zone in which first and second coaxially aligned tubes depend. The first tube is open at one end and closed at the other. The second tube is open at one end and partially clos... | 08/17/1993 |
| 5064617 | Combustion system A combustion chamber includes an inner cylindrical member concentrically mounted within an outer cylindrical member with a cylindrical space therebetween. The outer cylindrical member is enclosed at one end and both cylindrical members are open at an oppo... | 11/12/1991 |
| 5022853 | Semiconductor processing furnace tube and alignment jig Disclosed is a quartz tube for a furnace for processing semiconductor wafers. The furnace comprises: an elongated hollow body having opposed first and second ends and a longitudinal axis; an injector opening being formed in the first end, the injector opening ... | 06/11/1991 |
| 4968121 | Hermetically sealed apparatus and method for maintaining crystals at a controlled operating temperature An apparatus for maintaining a crystal at a precisely controlled operating temperature over extended periods of time without significant thermal degradation of the crystal. The apparatus has thermally conducting walls. The walls define an inner hermetical... | 11/06/1990 |
| 4963090 | Reverse flow furnace/retort system Reversing the flow of conventional furnace/retort systems prevents damaging exhaust gases from entering the furnace while still maintaining a gas flow through the retort. The gases exit the retort into a treatment system; preventing contamination of any a... | 10/16/1990 |
| 4927359 | Fluid distribution apparatus A two-stage gas distribution nozzle for a muffle furnace includes an inner pipe with spaced apertures for feeding gas at spaced intervals to an outer pipe enclosing the inner pipe. The outer pipe includes spaced apertures facing in a direction such that t... | 05/22/1990 |
