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| Number | Title | Issue Date |
| 6953338 | Device for thermal treatment of substrates The aim of the invention is to reduce the formation of scratches in a device for the thermal treatment of substrates, in particular, semiconductor substrates, in a chamber in which the substrate is placed upon support elements. According to the invention, said aim i... | 10/11/2005 |
| 6287111 | Low NOx boilers, heaters, systems and methods A heating system according to the present invention is divided into two interconnected compartments, the first having at least one burner feeder and the second having at least one receiver burner. The thermal output of these units may be equal or unequal ... | 09/11/2001 |
| 5730945 | Purge retention chamber incorporated into RTO inlet manifold A purge retention chamber is incorporated into an inlet manifold for a two heat exchanger RTO system. A bypass valve is mounted into the purge retention chamber adjacent a downstream end, and a purge face valve is mounted in the inlet manifold between ups... | 03/24/1998 |
| 5201653 | Substrate heat-treating apparatus An apparatus for heat-treating substrates includes a plurality of heat-treating units arranged in vertical stages, and at least one hollow column for supporting the heat-treating units. Each heat-treating unit has an exhaust line communicating with the co... | 04/13/1993 |
| 5110338 | Method and apparatus for heating a glass sheet An apparatus (10) is disclosed for treating a glass sheet (22) including a substantially enclosed chamber (14) containing a chamber atmosphere (24) in which the glass sheet (22) may be treated. Apparatus (10) also includes gas turbine engine (12) which ge... | 05/05/1992 |
| 4317290 | Heat treatment apparatus An apparatus for the heat treatment of a material passing through a plurality of treatment zones using a heated gaseous treatment medium conducted in a substantially closed circuit through these zones. A heat exchanger is associated with each treatment zo... | 03/02/1982 |
