Bizarre Patents
Wearable Device For Feeding and Observing Birds and Other Flying Animals
A device for feeding and observing flying animals comprising a hat, a support mounted on the hat and extending outward from the hat, and a feeder mounted on the support.
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| Number | Title | Issue Date |
| 7344821 | Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same A positive resist composition for use with an electron beam, an EUV light or an X ray, the positive resist composition comprising: (A) at least one compound that generates an acid upon treatment with one of an actinic ray and radiation; and (B) a resin that increase... | 03/18/2008 |
| 7282318 | Photoresist composition for EUV and method for forming photoresist pattern using the same The present invention relates to photoresist compositions for EUV and methods for forming photoresist patterns. More specifically, fine photoresist patterns: of less than 50 nm without collapse are formed with EUV (Extreme Ultraviolet) as an exposure light source by... | 10/16/2007 |
| 7214476 | Image forming method using photothermographic material An image forming method applying X-ray exposure to a photothermographic material having, on at least one surface of a support, an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for s... | 05/08/2007 |
| 7198889 | High-speed positive-working photothermographic system comprising an accelerating agent The present invention is directed to a method of forming a positive image in a photothermographic element comprising a potentially negative-working emulsion wherein fog density development is imagewise inhibited in exposed areas of the image upon thermal development... | 04/03/2007 |
| 7198881 | Photoresist composition for EUV and method for forming photoresist pattern using the same The present invention relates to photoresist compositions for EUV and methods for forming photoresist patterns. More specifically, fine photoresist patterns: of less than 50 nm without collapse are formed with EUV (Extreme Ultraviolet) as an exposure light source by... | 04/03/2007 |
| 7183024 | High-speed positive-working photothermographic system The present invention is directed to a method of forming a positive image in a photothermographic element comprising a potentially negative-working emulsion wherein fog density development is imagewise inhibited in exposed areas of the image upon thermal development... | 02/27/2007 |
| 7179579 | Radiation-sensitive composition A radiation-sensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation, and (B) a resin containing a repeating unit having a specific grou... | 02/20/2007 |
| 7179568 | Defect inspection of extreme ultraviolet lithography masks and the like A dark-field imaging method for detecting defects in reflective lithography masks (e.g., extreme ultraviolet (EUV) masks) used, e.g., in processes for the fabrication of microelectronic devices. A mask blank is coated with a photoresist layer having a fluorescent dy... | 02/20/2007 |
| 7169530 | Polymer compound, resist material and pattern formation method The base polymer of a resist material contains a polymer compound including a first unit represented by a general formula of the following Chemical Formula 4 and a second unit represented by a general formula of the following Chemical Formula 5: | 01/30/2007 |
| 7169543 | Blocked aliphatic thiol stabilizers for photothermographic materials Photothermographic materials contain one or more blocked aliphatic thiol compounds in an amount of at least 1 mg/m2 as stabilizers. These compounds have a calculated octanol-water partition coefficient (c log P value) of 2.0 or greater, and an N value equ... | 01/30/2007 |
| 7147982 | Ultrahigh speed imaging assembly for radiography A radiographic imaging assembly comprises a symmetric radiographic silver halide film has an overall system speed of at least 1100 to provide images with improved contrast and sharpness and reduced fog. The imaging assembly includes a symmetric radiographic film hav... | 12/12/2006 |
| 7144692 | Photothermographic material The invention provides a photothermographic material having, on both sides of a support, an image forming layer including at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, which is to be exposed with X... | 12/05/2006 |
| 7129033 | Photothermographic material and image forming method A photothermographic material having, on at least one side of a support, an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, and an X-ray image forming method using the ... | 10/31/2006 |
| 7112399 | Photothermographic materials with opaque crossover control means Photothermographic materials are coated with thermally developable imaging layers on both sides of the support. Such materials can be arranged in association with one or more phosphor intensifying screens capable of providing emission at a predetermined wavelength i... | 09/26/2006 |
| 7081325 | Photoresist polymer and photoresist composition including the same Photoresist polymers and photoresist compositions containing the same are disclosed. A negative photoresist composition containing a photoresist polymer comprising a repeating unit represented by Formula 4 prevents collapse of patterns when photoresist patterns of l... | 07/25/2006 |
| 7049044 | Nanocomposite negative resists for next generation lithographies The present invention provides new high resolution nanocomposite resists applicable to next generation lithographies, methods of making these novel resists, and methods of using these new resists in lithographic processes to effect state-of-the-art lithographies. Ne... | 05/23/2006 |
| 7041428 | Pattern-forming material and method of forming pattern A pattern formation material of this invention contains a base polymer including a unit represented by Chemical Formula 1 and, and an acid generator: Chemical Formula 1: wherein R1 is a hydrogen... | 05/09/2006 |
| 7029819 | Phosphor screen and imaging assembly A phosphor screen comprises an inorganic phosphor capable of absorbing X-rays and emitting electromagnetic radiation having a wavelength greater than 300 nm. The phosphor is disposed on a support that has a reflective substrate comprising a continuous polyester firs... | 04/18/2006 |
| 7026105 | Photothermographic materials containing silver halide sensitized with combination of compounds Photothermographic materials are designed with increased photospeed by chemical sensitizing the photosensitive silver halide grains with a combination of compounds. A first chemical sensitizer is a specific gold(III)-containing compound and a second chemical sensiti... | 04/11/2006 |
| 7018770 | High speed reflective radiographic material A reflective radiographic material is useful to provide images that can be viewed without a light box. This reflective radiographic material has a reflective support and a silver halide emulsion on one side of the support only. The material can be used with a single... | 03/28/2006 |
| 7014977 | Reflective radiographic material with incorporated developer A reflective radiographic material (at least 200 system speed) is useful especially to provide images that can be viewed without a light box. This reflective radiographic material has a reflective support, a silver halide emulsion on one side of the support only, an... | 03/21/2006 |
| 7008737 | Gray scale x-ray mask The present invention describes a method for fabricating an embossing tool or an x-ray mask tool, providing microstructures that smoothly vary in height from point-to-point in etched substrates, i.e., structure which can vary in all three dimensions. The process use... | 03/07/2006 |
| 7008749 | High resolution resists for next generation lithographies The present invention provides new high resolution resists applicable to next generation lithographies, methods of making these novel resists, and methods of using these new resists in lithographic processes to effect state-of-the-art lithographies. New nanocomposit... | 03/07/2006 |
| 7005237 | Method of making information storage devices by molecular photolithography A photolithographic method of making an information storage device having different storage characteristics at a plurality of discrete memory locations thereon, comprises the steps of: (a) providing a substrate having a surface portion, said surface portion having a... | 02/28/2006 |
| 7005226 | High speed imaging assembly for radiography A radiographic imaging assembly comprises a symmetric radiographic silver halide film has an overall system speed of at least 200 but less than 800 to provide images with improved contrast and sharpness and reduced fog. The imaging assembly includes a symmetric radi... | 02/28/2006 |
| 6989223 | High-speed radiographic film A high-speed (over 700) radiographic silver halide film is useful for radiography to provide images with improved contrast and sharpness and reduced fog. The film includes at least one tabular grain silver halide emulsion layer on each side of a film support which g... | 01/24/2006 |
| 6967071 | High speed radiographic imaging assembly An ultra-high-speed radiographic imaging assembly (at least 900 system speed) is useful especially for pediatric radiography to provide images with improved contrast and sharpness and reduced fog. The imaging assembly includes a symmetric film having a speed of at l... | 11/22/2005 |
| 6964842 | Black-and-white aqueous photothermographic materials Aqueous-based photothermographic materials comprise a hydrophilic binder, preformed silver halides, an organic silver salt, a reducing agent composition, and one or more benzothiazolium, benzoselenazolium, or benzotellurazolium salts as antifoggants. These photother... | 11/15/2005 |
| 6936411 | Industrial radiographic silver halide material suitable for rapid processing applications A silver halide industrial radiographic material comprising on at least one side of a support a hydrophilic gelatinous non-spectrally sensitized radiation-sensitive emulsion layer, having grains, coated in a total amount in the range from 6 to 20 g, expressed as an ... | 08/30/2005 |
| 6936402 | MONOMERS CONTAINING AN OXEPAN-2-ONE GROUP, PHOTORESIST COMPOSITIONS COMPRISING POLYMERS PREPARED FROM THE MONOMERS, METHODS FOR PREPARING THE COMPOSITIONS, AND METHODS FOR FORMING PHOTORESIST PATTERNS USING THE COMPOSITIONS Disclosed herein is a novel norbornene, acrylate or methacrylate monomer as a photoresist monomer containing an oxepan-2-one group. Further disclosed are photoresist compositions comprising a polymer prepared from the monomer, methods for preparing the photoresist c... | 08/30/2005 |
| 6933095 | Polymers, resist compositions and patterning process A copolymer of an acrylate monomer containing fluorine at α-position with a fluorinated hydroxystyrene derivative is highly transparent to VUV radiation and resistant to plasma etching. A resist composition using the polymer as a base resin is sensitive to high-ene... | 08/23/2005 |
| 6924087 | Polymer microneedles A method for producing microneedles. The method including disposing a first layer of a radiation sensitive polymer on to a working surface and selectively irradiating the first layer such that the first layer has at least one irradiated region and at least one non-i... | 08/02/2005 |
| 6916598 | Ionization radiation imageable photopolymer compositions This invention discloses compositions that can be polymerized/crosslinked imagewise upon exposure to ionization radiation such as x-ray, electron beam, ion beam, and gamma-ray. This invention also discloses methods of use for these compositions for microfabrication ... | 07/12/2005 |
| 6887645 | Negative resist composition A negative resist composition comprises: (A) an alkali-soluble resin; (B) a compound capable of generating an acid upon irradiation with a radiation; (C) a crosslinking agent capable of crosslinking by the action of an acid; and (D) a sol... | 05/03/2005 |
| 6887641 | Mammography imaging method using high peak voltage and rhodium or tungsten anodes A method of mammography imaging includes exposing a patient to a peak voltage greater than 29 kVp using X-radiation generating equipment comprising rhodium or tungsten anodes. The film used in this method comprises a cubic grain silver halide emulsion layer on one s... | 05/03/2005 |
| 6869744 | Chemically amplified positive resist composition A chemically amplified positive resist composition contains as a base a carboxyl or phenolic hydroxyl group-containing resin soluble in aqueous alkaline solution, in which acid labile groups are incorporated into at least some of the hydrogen atoms on the carboxyl o... | 03/22/2005 |
| 6866973 | Photosensitive resin composition, resist composition, fabricating method for patterned substrate, and device There are provided a photosensitive resin composition containing at least a polymer compound having a sugar structure, which has at least two species of functional groups cleavable in the presence of an acid, and a photo acid generator generating an acid by radiatio... | 03/15/2005 |
| 6864045 | Mammography film and imaging assembly for use with rhodium or tungsten anodes A radiographic silver halide film comprises a cubic grain silver halide emulsion layer on one side of the support and a tabular grain silver halide emulsion layer on the other side. The cubic grain silver halide emulsion layer comprises a combination of first and se... | 03/08/2005 |
| 6858372 | Resist composition with enhanced X-ray and electron sensitivity A resist composition with enhanced X-ray and electron sensitivity includes a plurality of chemically inert nanoparticles dispersed throughout a base resist material. The nanoparticles have a higher atomic number than the base resist material and each of the nanopart... | 02/22/2005 |
| 6846606 | Phosphor screen and imaging assembly with poly(lactic acid) support A phosphor screen comprises an inorganic phosphor capable of absorbing X-rays and emitting electromagnetic radiation having a wavelength greater than 300 nm. The phosphor is disposed on a support that has a reflective substrate comprising a continuous poly(lactic ac... | 01/25/2005 |
