Bizarre Patents
Mouthguard made at least partially from an edible candy
A mouthguard includes a U-shaped upper bite plate which removably fits over upper teeth of a person, with the entire upper bite plate being made from a soft, deformable and edible gummi candy.
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| Number | Title | Issue Date |
| 7601486 | Ultra dark polymer A method and a material for creating an antireflective coating on an integrated circuit. A preferred embodiment comprises applying a dark polymer material on a reflective surface, curing the dark polymer material, and roughening a top surface of the dark polymer mat... | 10/13/2009 |
| 7427467 | Silver salt photothermographic dry imaging material A silver salt photothermographic dry imaging material comprising a support having: (i) a photosensitive layer comprising photosensitive silver halide grains, an organic silver salt and a reducing agent for silver ions on one side of the support; and (ii) a backing l... | 09/23/2008 |
| 7425409 | Photothermographic material The present invention provides a photothermographic material having, on at least one side of a support, an image forming layer including at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, and a non-phot... | 09/16/2008 |
| 7387866 | Photolithography process using multiple anti-reflective coatings A method for fabricating an integrated circuit using a photo-lithographic process includes the steps of placing at least two anti-reflective coating layers between a reflective surface and another material. The indices of refraction, absorptions, and thicknesses of ... | 06/17/2008 |
| 7326527 | Silver salt photothermographic dry imaging material and image forming method by use thereof A method of processing a photothermographic material by a thermal processor is disclosed, wherein the photothermographic material comprises on one side of a support a light-sensitive layer containing an organic silver salt, silver halide grains, a binder and a reduc... | 02/05/2008 |
| 7303858 | Photoacid generating polymer, its preparation method, top anti-reflective coating composition comprising the same, method of forming a pattern in a semiconductor device, and semiconductor device Disclosed herein is a photoacid generating polymer represented by Formula 1 below: wherein R1 is a C1-10 hydrocarbon or a C1-10 hydrocarbon in which the hydrogen atoms are wholly ... | 12/04/2007 |
| 7294445 | Method for simulating spot varnish on a surprint proof A method of forming a glossy area on a pre-press proof is provided, wherein the method includes printing a spot varnish layer, wherein the presence of the spot varnish enhances the glossiness of the overprinted color layers of the image. The method provides a pre-pr... | 11/13/2007 |
| 7276325 | Electrode-forming composition for field emission type of display device, and method using such a composition A composition utilized in and a method for forming an electrode used in field emission type of display devices said composition is a photosensitive copper conductive composition comprising: a mixture of (a) copper powder at least 70 wt % out of 100 wt % copper powde... | 10/02/2007 |
| 7270945 | Image forming method using photothermographic material A method of forming an image using a photothermographic material containing a support having thereon an image forming layer which contains an organic silver salt, silver halide grains, a binder and a reducing agent, the method including the steps of: imagewise expos... | 09/18/2007 |
| 7262001 | Heat-developable photosensitive material and an image forming method A heat-developable photosensitive material comprising a support, providing thereon, an organic silver salt, silver halide, a binder and a reducing agent, wherein a value of Rz(E)/Rz(B) is from 0.1 to 0.7 in which Rz(E) is the ten-point average roughness of the outer... | 08/28/2007 |
| 7250247 | Photolithographic structures using multiple anti-reflecting coatings A method for fabricating an integrated circuit using a photo-lithographic process includes the steps of placing at least two anti-reflective coating layers between a reflective surface and another material. The indices of refraction, absorptions, and thicknesses of ... | 07/31/2007 |
| 7192696 | Image forming method using photothermographic material A method of forming an image using a photothermographic material containing a support having thereon an image forming layer which contains an organic silver salt, silver halide grains, a binder and a reducing agent, the method including the steps of: imagewise expos... | 03/20/2007 |
| 7138218 | Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator A process of forming ultra fine patterns using bottom anti-reflective coating containing acid generator. More particularly, a process of forming vertical patterns using an organic bottom anti-reflective coating containing excessive amount of acid generator, in order... | 11/21/2006 |
| 7132217 | Organic anti-reflective coating composition and pattern forming method using the same Disclosed are an organic anti-reflective coating composition which is introduced to top portion of a photoresist and a pattern forming method using the same, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF or 157 ... | 11/07/2006 |
| 7129030 | Image forming method using photothermographic material A method of forming an image using a photothermographic material containing a support having thereon an image forming layer which contains an organic silver salt, silver halide grains, a binder and a reducing agent, the method including the steps of: imagewise expos... | 10/31/2006 |
| 7129025 | Fabrication method of a three-dimensional microstructure A fabrication method of three-dimensional microstructures is to fabricate a real 3D microstructure. First, a substrate is coated with an anti-reflection layer to absorb reflected exposure light, and then the anti-reflection layer is overlaid with a first thick photo... | 10/31/2006 |
| 7125645 | Composite photoresist for pattern transferring A composite photoresist structure includes an first organic layer located on a substrate, a sacrificial layer located on the first organic layer, and a second organic layer located on the sacrificial layer. The first organic layer is made of materials that can be ea... | 10/24/2006 |
| 7105279 | Method for fabricating a patterned layer on a semiconductor substrate During the patterning of a semiconductor layer, an N-free SiOx layer is produced under an acid-forming photoresist layer in order to prevent a resist degradation. The Si content of the grown SiOx layer being varied in order to set a desired ext... | 09/12/2006 |
| 7087366 | Method for chemical sensitization of silver halide for photothermographic use A photothermographic emulsion is prepared by chemically sensitizing silver halide grains formed by oxidative decomposition of a diphenylphosphine sulfide compound on or around the silver halide grains. This procedure uses a unique sequence of steps and provides incr... | 08/08/2006 |
| 7070911 | Structure and method for reducing standing waves in a photoresist A structure and method for reducing standing waves in a photoresist during manufacturing of a semiconductor is presented. Embodiments of the present invention include a method for reducing standing wave formation in a photoresist during manufacturing a semiconductor... | 07/04/2006 |
| 7070914 | Process for producing an image using a first minimum bottom antireflective coating composition Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the ... | 07/04/2006 |
| 7063941 | Method for chemical sensitization of silver halide for photothermographic use A photothermographic emulsion is prepared by chemically sensitizing silver halide grains by oxidative decomposition of an organic sulfur-containing compound on or around the silver halide grains. This procedure uses a unique sequence of steps and provides increased ... | 06/20/2006 |
| 7029821 | Photoresist and organic antireflective coating compositions Methods are provides methods are provided to prepare photoresist and organic antireflective coating composition with a filter having a mean pore size of less than about 0.4 microns. Photoresist compositions and antireflective coatings produced by such methods can pr... | 04/18/2006 |
| 7026101 | Antireflective coating compositions Antireflective compositions are provided that contain a basic additive material. Such use of a basic material can significantly decrease or even completely eliminate notching of an overcoated photoresist relief image. Antireflective formulations of the invention are... | 04/11/2006 |
| 7018779 | Apparatus and method to improve resist line roughness in semiconductor wafer processing A process for prohibiting amino group transport from the top surface of a layered semiconductor wafer to a photoresist layer introduces a thin film oxynitride over the silicon nitride layer using a high temperature step of nitrous oxide (N2O) plus oxygen ... | 03/28/2006 |
| 6998226 | Method of forming patterned photoresist layer A method of forming a patterned photoresist layer. First, an anti-reflection coating layer is formed on a substrate. Next, a first bake is performed. A photoresist layer is then formed on the anti-reflection coating layer. Exposure is performed. A second bake is per... | 02/14/2006 |
| 6962769 | Anti-reflective coating composition with improved spin bowl compatibility Anti-reflective compositions and methods of using those compositions to form circuits are provided. The compositions comprise a polymer dissolved or dispersed in a solvent system. In one embodiment, the compositions comprise less than about 0.3% by weight of a stron... | 11/08/2005 |
| 6936408 | Partially photoexposed positive photoresist layer blocking method for regio-selectively processing a microelectronic layer Within a method for fabricating a microelectronic fabrication there is employed a patterned positive photoresist residue layer as a protective layer within an aperture when processing an upper region of a topographic microelectronic layer having formed therein the a... | 08/30/2005 |
| 6936405 | Organic polymeric antireflective coatings deposited by chemical vapor deposition An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embod... | 08/30/2005 |
| 6919146 | Planar reticle design/fabrication method for rapid inspection and cleaning A reticle has a transparent substrate, mask shapes on the substrate, a transparent material covering the mask shapes and an optional anti-reflective material over the transparent material. ... | 07/19/2005 |
| 6913874 | Highly lubricated imaging element with elastomeric matte A photographic imaging element is disclosed comprising a support having on a front side thereof a silver halide imaging layer and an outermost protective overcoat layer comprising a film-forming binder, and on the backside thereof an outermost protective backcoat la... | 07/05/2005 |
| 6900000 | Organic polymeric antireflective coatings deposited by chemical vapor deposition An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embod... | 05/31/2005 |
| 6894104 | Anti-reflective coatings and dual damascene fill compositions comprising styrene-allyl alcohol copolymers New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a styrene-allyl alcohol polymer and preferably at least one other polymer (e.g., cellulosic polymers) in addition to the styrene-allyl alcohol polymer. T... | 05/17/2005 |
| 6878507 | Semiconductor processing methods In one aspect, the invention includes a semiconductor processing method. An antireflective material layer is formed over a substrate. At least a portion of the antireflective material layer is annealed at a temperature of greater than about 400° C. A layer of photo... | 04/12/2005 |
| 6869747 | Organic polymeric antireflective coatings deposited by chemical vapor deposition An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embod... | 03/22/2005 |
| 6861206 | Method for producing a structured layer on a semiconductor substrate A method for producing a structured layer on a semiconductor substrate includes the steps of creating the layer on the substrate, modifying a surface of the layer to form a chemically neutral surface, creating an acid-forming photoresist layer on the layer on the su... | 03/01/2005 |
| 6855466 | Planarizing antireflective coating compositions The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coa... | 02/15/2005 |
| 6844143 | Sandwich photoresist structure in photolithographic process A photolithographic process that involves building a sandwich photoresist structure. A first photoresist layer is formed over a substrate. An anti-reflection layer is formed over the first photoresist layer. A second photoresist layer is formed over the anti-reflect... | 01/18/2005 |
| 6821712 | Methods of forming resist pattern, forming electrode pattern, and manufacturing surface acoustic wave device Methods of forming a resist pattern, of forming an electrode pattern, and of manufacturing a surface acoustic wave device are provided. The resist-pattern- and the electrode-pattern-forming methods each comprise a step of forming an antireflection film for preventin... | 11/23/2004 |
| 6794099 | High contrast indicator element The invention relates to a material to form an indicator element comprising a base material and at least one photosensitive silver halide layer, wherein the base material comprises at least one specular reflective layer between two polymer layers wherein the polymer... | 09/21/2004 |
