Did You Know...
...that in the early 1940s GE engineer James Wright was charged with a task of utmost importance to the war effort: develop a cheap substitute for rubber that could be used to produce tires, gas masks and a whole host of military gear. Wright tackled the task diligently -- and wound up inventing Silly Putty.
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| Number | Title | Issue Date |
| 7378223 | Photoresist resin composition The invention provides photoresist resin compositions and in particular, a photoresist resin compositions comprising a) an acrylate monomer having two urethane bonds, b) a crosslinkable urethane monomer having at least two ethylene double bonds, c) an alkali-soluble... | 05/27/2008 |
| 7374861 | Negative photoresist composition The present invention is directed to a negative photoresist composition which mainly is composed of a) a polyimide having pendant carboxyl groups, wherein a portion of the carboxyl groups reacted with glycidyl (meth)acrylate monomers to form covalent bonds. The phot... | 05/20/2008 |
| 7374863 | Polymerizable composition A polymerizable composition comprising: (A) a non-acrylic binder polymer having an ethylenically unsaturated bond on a side chain; (B) a neutrally charged compound capable of generating a radical under light or heat; and (C) a compound having an ethylenically unsatu... | 05/20/2008 |
| 7374857 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition The present invention relates to a novel bisimide compound useful as an acid generator for a chemically amplified resist composition used in manufacturing of semiconductor element and the like or a raw material for synthesizing heat resistant polymers, an acid gener... | 05/20/2008 |
| 7368224 | Photopolymerizable composition The invention provides a photopolymerizable composition having a high photosensitivity, which comprises a metal complex of a squarylium compound, a radical generator, and a compound having at least one ethylenically unsaturated double bond. The photopolymeriz... | 05/06/2008 |
| 7364834 | Functional polymer A polymer having α,β unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking. ... | 04/29/2008 |
| 7303855 | Photoresist undercoat-forming material and patterning process An undercoat-forming material comprising a novolak resin having a fluorene or tetrahydrospirobiindene structure, an organic solvent, an acid generator, and a crosslinker, optionally combined with an intermediate layer having an antireflective effect, has an absorpti... | 12/04/2007 |
| 7300747 | Photobase generator and curable composition The photobase generator of the invention is represented by the following formula 1: wherein Ar, R, A+ and X− are as defined in the specification. Since the photobase generator of the formu... | 11/27/2007 |
| 7261998 | Imageable element with solvent-resistant polymeric binder The present invention provides an imageable element including a lithographic substrate and an imageable layer disposed on the substrate. The imageable layer includes a radically polymerizable component, an initiator system capable of generating radicals sufficient t... | 08/28/2007 |
| 7258962 | Positive-tone radiation-sensitive resin composition A positive-tone radiation-sensitive resin composition comprising: (A) a carbazole derivative shown by the following formula (1), (B) a photoacid generator containing a sulfonimide compound and an iodonium salt compound as essential components, and (C) an acid-dissoc... | 08/21/2007 |
| 7232647 | Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board The present invention provides a photosensitive resin composition for laser scanning exposure, which satisfies the following formula (1): - 25 ... | 06/19/2007 |
| 7220533 | Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, and method for producing printed wiring board The present invention provides a photosensitive resin composition for laser scanning exposure, which satisfies the following formula (1): - 25 ... | 05/22/2007 |
| 7214471 | Photosensitive resin film and cured film made therefrom The photosensitive resin film in an uncured state of the invention comprises (A) a specific alkali-soluble copolymer, (B) a compound having at least one ethylenically unsaturated double bond and (C) a radiation-sensitive radical polymerization initiator by the use o... | 05/08/2007 |
| 7192681 | Positive photosensitive composition A positive photosensitive composition comprising (A) an acid generator that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid ... | 03/20/2007 |
| 7183039 | 1,4-dihydropyridine-containing IR-sensitive composition and use thereof for the production of imageable elements Initiator system comprising: (a) at least one substance capable of absorbing IR radiation, (b) at least one compound capable of forming free radicals, and (c) at least one 1,4-dihydropyridine derivative of the formula (I) ... | 02/27/2007 |
| 7147983 | Dyed photoresists and methods and articles of manufacture comprising same The present invention provides new photoresist compositions that comprise a resin binder, a photoactive component, particularly an acid generator, and a dye material that contains one or more chromophores that can reduce undesired reflections of exposure radiation. ... | 12/12/2006 |
| 7141351 | Basic compound, resist composition and patterning process Resist compositions comprising basic compounds having an imidazole skeleton and a polar functional group have an excellent resolution and an excellent focus margin and are useful in microfabrication using electron beams or deep-UV light. ... | 11/28/2006 |
| 7083893 | Photoresist polymer and photoresist composition containing the same Photoresist polymers and photoresist compositions are disclosed. A photoresist polymer represented by Formula 1 and a photoresist composition containing the same have excellent etching resistance, thermal resistance and adhesive property, and high affinity to an dev... | 08/01/2006 |
| 7081325 | Photoresist polymer and photoresist composition including the same Photoresist polymers and photoresist compositions containing the same are disclosed. A negative photoresist composition containing a photoresist polymer comprising a repeating unit represented by Formula 4 prevents collapse of patterns when photoresist patterns of l... | 07/25/2006 |
| 7022462 | Photosensitive resin composition, photosensitive element using the same, process for producing resist pattern, and process for producing printed wiring board A photosensitive resin composition comprising (A) a carboxyl group-containing binder polymer which contains styrene or a styrene derivative as a copolymerized constituent, (B) a photo-polymerization initiator, and (C) a photo-polymerizable compound which has in its ... | 04/04/2006 |
| 6942955 | Lithographic printing plate precursor A lithographic printing plate precursor is disclosed, which comprises an image-forming layer which contains a hydrophilic resin, an acid precursor and at least one component selected from fine particles containing a compound having a vinyloxy group and microcapsules... | 09/13/2005 |
| 6902875 | Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof A finely patterned silica type ceramic film suitable as an inter-layer dielectric is formed in a short time by applying, onto a substrate, a positive working radiation sensitive polysilazane composition comprising a modified poly(sil sesquiazane) having a number ave... | 06/07/2005 |
| 6864040 | Thermal initiator system using leuco dyes and polyhalogene compounds The present invention relates to IR-sensitive compositions containing an initator system comprising: (a) at least one compound capable of absorbing IR radiation selected from triarylamine dyes, thiazolium dyes, indolium dyes, oxazo... | 03/08/2005 |
| 6861201 | Near IR sensitive photoimageable/photopolymerizable compositions, media, and associated processes Novel photopolymer compositions are disclosed which contain dyes that absorb strongly in the near infrared (near IR) region of the electromagnetic spectrum. These dyes are useful as photosensitizers for initiating a variety of photoimaging and photopolymerization re... | 03/01/2005 |
| 6844135 | Chemically amplified resist material and patterning method using same A chemically amplified resist material comprising a base resin and a photo acid generator having sensitivity at the wavelength of patterning exposure; wherein, the chemically amplified resist material further comprising an activator that generates an acid or a radic... | 01/18/2005 |
| 6844136 | Photopolymerizable mixture and recording material prepared therewith This present invention discloses a photopolymerisable mixture comprising a polymer binder, a radically photopolymerisable component containing at least one photooxidisable group, a polyethylene glycol di(meth)acrylate containing 2 or more ethylene glycol units, a ph... | 01/18/2005 |
| 6838224 | Chemical amplification, positive resist compositions A chemical amplification, positive resist composition is provided comprising (A) a photoacid generator and (B) a resin which changes its solubility in an alkali developer under the action of acid and has substituents of the formula: C6H11—(CH... | 01/04/2005 |
| 6838222 | Photopolymerizable composition A photopolymerizable composition that is cured with visible light or an infrared laser and is used as a recording layer in a negative planographic printing plate precursor. The photopolymerizable composition is cured by exposure and includes (A) a polymerizable comp... | 01/04/2005 |
| 6833231 | Toughened stereolithographic resin compositions A liquid radiation-curable composition that comprises (A) at least one polymerizing organic substance; (B) at least one free-radical polymerizing organic substance; (C) at least one cationic polyme... | 12/21/2004 |
| 6821705 | Radiation-sensitive resin composition A radiation-sensitive resin composition comprising (A) a compound of the following formula (1), (R1, R2, and R3 is hydrogen, hydroxyl group, or monovalent organic group and R4 | 11/23/2004 |
| 6818375 | Photoresist composition Disclosed are photoimageable compositions having improved stripping properties including a photoresist strip enhancer. Also disclosed are methods of enhancing the strippability of photoimageable compositions and methods for manufacturing printed wiring boards using ... | 11/16/2004 |
| 6797449 | Negative image-recording material and cyanine dye The invention provides a negative image-recording material for heat-mode exposure systems, which comprises (A) an IR absorbent including cyanine dye having a substituent that contains an atom having an atomic weight of at least 28 such as halogen atom, or a substitu... | 09/28/2004 |
| 6709804 | Printed wiring board and semiconductor device and processes to prepare the same A printed wiring board, a substrate for disposing semiconductor chips and a semiconductor device prepared by coating a substrate with a photosensitive resin composition comprising an oxygen sensitizer and a cis-diene-substituted polyamic acid or polyimide and formin... | 03/23/2004 |
| 6696217 | Photosensitive monomer, photosensitive polymer and chemically amplified resist composition comprising lactone group having acid-labile protecting group A photosensitive monomer including a methylene butyrolactone derivative represented by the following formula: ##STR1## wherein R1 is a hydrogen atom or alkyl group, R2 is an acid-labile group, X is a hydrogen atom, or substituted or ... | 02/24/2004 |
| 6613495 | I-line photoresist compositions Negative photoimageable compositions are disclosed which contain a radiation sensitive component for producing an acid when subjected to radiation at wavelengths of 320 to 420 nanometers, a resin binder and a reactive oligomer. The compositions are useful... | 09/02/2003 |
| 6605416 | Compositions and processes for photogeneration of acid Photochemical acid progenitors in combination with dihydroperimidine squarylium dyes have been found to be particularly effective at generating acid upon irradiation with near-infrared radiation. It has been found that dihydroperimidine squarylium dyes th... | 08/12/2003 |
| 6582879 | Reactive photo acid-generating agent and heat-resistant photoresist composition with polyamide precursor The present invention relates to a reactive photo acid-generating agent and a heat-resistant photoresist composition comprising the same. In particularly, the present invention relates to the heat-resistant photoresist composition comprising the photo aci... | 06/24/2003 |
| 6569603 | Light-sensitive composition and method for forming relief image using said composition There are disclosed a light-sensitive composition which comprises (A) a polymer having a phenyl group substituted by a vinyl group at a side chain, (B) a photopolymerization initiator and (C) a sensitizer which sensitizes the photo-polymerization initiato... | 05/27/2003 |
| 6569596 | Negative working chemical amplification type resist compositions A negative working chemical amplification type resist composition, which is capable of giving more improved resolution; and comprises an alkali-soluble resin, a cross-linking agent, a N-substituted succinimide compound represented by the following formula... | 05/27/2003 |
| 6566036 | Chemically amplified resist A chemically amplified resist including base resin represented by a general formula [1], a radiation-sensitive acid generator; polystyrene acting as a filler and a solvent dissolving the resin, the acid generator and the filler; wherein a content of the r... | 05/20/2003 |
