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| Number | Title | Issue Date |
| 7422839 | Resin for positive resist composition, and positive resist composition using the same, laminate and method for forming resist pattern The use of a positive resist composition that includes a resin with a specific structure improves the resolution and yields a resist pattern with a favorable shape. In addition, when a resist layer is formed on either a magnetic film or a metallic oxidation preventi... | 09/09/2008 |
| 7416832 | Positive resist composition A positive resist composition capable of forming a resist pattern having excellent shape is provided. This composition is a positive resist composition including a base resin component (A) and an acid generator component (B) generating an acid under exposure, which ... | 08/26/2008 |
| 7407734 | Resist composition for electron beam or EUV A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, a... | 08/05/2008 |
| 7396633 | Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition With the damascene process in which an interconnection is formed using a conventional chemically amplified positive photoresist composition, there arises a problem that the photoresist within the via hole (as well as in its vicinity) may remain even after the exposu... | 07/08/2008 |
| 7368224 | Photopolymerizable composition The invention provides a photopolymerizable composition having a high photosensitivity, which comprises a metal complex of a squarylium compound, a radical generator, and a compound having at least one ethylenically unsaturated double bond. The photopolymeriz... | 05/06/2008 |
| 7358028 | Chemically amplified positive photo resist composition and method for forming resist pattern The present invention provides a chemical amplification type positive photoresist composition which is excellent in storage stability as a resist solution in a bottle. A novolak resin or a hydroxystyrenic resin is reacted with a crosslinking agent to give a slightly... | 04/15/2008 |
| 7314701 | Radiation-sensitive resin composition A positive tone radiation-sensitive resin composition comprising (A) a 1-substituted imidazole, (B) a photoacid generator, and (C-a) a resin protected by an acid-dissociable group, insoluble or scarcely soluble in alkali, but becoming soluble in alkali when the acid... | 01/01/2008 |
| 7303855 | Photoresist undercoat-forming material and patterning process An undercoat-forming material comprising a novolak resin having a fluorene or tetrahydrospirobiindene structure, an organic solvent, an acid generator, and a crosslinker, optionally combined with an intermediate layer having an antireflective effect, has an absorpti... | 12/04/2007 |
| 7300747 | Photobase generator and curable composition The photobase generator of the invention is represented by the following formula 1: wherein Ar, R, A+ and X− are as defined in the specification. Since the photobase generator of the formu... | 11/27/2007 |
| 7297464 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide The present invention provides a radiation curing composition comprising (a): a siloxane resin, (b): a photoacid generator or photobase generator, and (c): a solvent capable of dissolving component (a), and (d): a curing acceleration catalyst. ... | 11/20/2007 |
| 7282318 | Photoresist composition for EUV and method for forming photoresist pattern using the same The present invention relates to photoresist compositions for EUV and methods for forming photoresist patterns. More specifically, fine photoresist patterns: of less than 50 nm without collapse are formed with EUV (Extreme Ultraviolet) as an exposure light source by... | 10/16/2007 |
| 7264913 | Antireflective compositions for photoresists The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193 nm. The polymer of t... | 09/04/2007 |
| 7255970 | Photoresist composition for imaging thick films The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, a photoacid generator which produces a stron... | 08/14/2007 |
| 7235349 | Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator A process of forming ultra fine patterns using bottom anti-reflective coating containing acid generator. More particularly, a process of forming vertical patterns using an organic bottom anti-reflective coating containing excessive amount of acid generator, in order... | 06/26/2007 |
| 7232647 | Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board The present invention provides a photosensitive resin composition for laser scanning exposure, which satisfies the following formula (1): - 25 ... | 06/19/2007 |
| 7223518 | Compositions and methods of use thereof Compositions and methods of use thereof are disclosed. One exemplary composition, among others, includes a polymer resin and a photoacid generator. In particular, the composition includes a polymer resin, wherein the polymer resin does not substantially absorb about... | 05/29/2007 |
| 7220532 | Chemical amplification type resist composition The present invention provides a chemical amplification type positive resist composition comprising a nitrogen containing compound of the formula (VIa) or (VIb); resin which contains a... | 05/22/2007 |
| 7220533 | Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, and method for producing printed wiring board The present invention provides a photosensitive resin composition for laser scanning exposure, which satisfies the following formula (1): - 25 ... | 05/22/2007 |
| 7198881 | Photoresist composition for EUV and method for forming photoresist pattern using the same The present invention relates to photoresist compositions for EUV and methods for forming photoresist patterns. More specifically, fine photoresist patterns: of less than 50 nm without collapse are formed with EUV (Extreme Ultraviolet) as an exposure light source by... | 04/03/2007 |
| 7192681 | Positive photosensitive composition A positive photosensitive composition comprising (A) an acid generator that generates an acid upon irradiation of an actinic ray or radiation, (B) a resin that has a monocyclic or polycyclic alicyclic hydrocarbon structure and is decomposed by the action of an acid ... | 03/20/2007 |
| 7157204 | Soluble polyimide for photosensitive polyimide precursor and photosensitive polyimide precursor composition comprising the soluble polyimide A soluble polyimide for a photosensitive polyimide precursor and a photosensitive polyimide precursor composition including the soluble polyimide, wherein the soluble polyimide contains hydroxyl and acetyl moieties and at least one reactive end-cap group at one or b... | 01/02/2007 |
| 7135268 | Amplification type positive resist composition The present invention provides a sulfonate of the formula (I′): wherein Q1, Q2, Q3, Q4 and Q5 each independently represent hydrogen, alkyl having 1 to 16 c... | 11/14/2006 |
| 7094709 | Method of synthesizing hybrid metal oxide materials and applications thereof The present invention relates to metal oxide coating materials that can be used as thin film thin film coatings on various substrate surfaces. The invention also concerns a method of making metal oxide material which are stable in aqueous phase and that can be depos... | 08/22/2006 |
| 7083893 | Photoresist polymer and photoresist composition containing the same Photoresist polymers and photoresist compositions are disclosed. A photoresist polymer represented by Formula 1 and a photoresist composition containing the same have excellent etching resistance, thermal resistance and adhesive property, and high affinity to an dev... | 08/01/2006 |
| 7081325 | Photoresist polymer and photoresist composition including the same Photoresist polymers and photoresist compositions containing the same are disclosed. A negative photoresist composition containing a photoresist polymer comprising a repeating unit represented by Formula 4 prevents collapse of patterns when photoresist patterns of l... | 07/25/2006 |
| 7078148 | Radiation sensitive resin composition A radiation-sensitive resin composition comprising: (A) a resin comprising a hydroxyl group or carboxyl group, of which the hydrogen atom has been replaced by an acid-dissociable group possessing an alkali dissolution controlling capability, the resin increasing the... | 07/18/2006 |
| 7026094 | Substituted oxime derivatives and the use thereof as latent acids New oxime sulfonate compounds of the formula (I) and (II), wherein R1 is C1-C12alkyl, C1C4haloalkyl, hydrogon, OR9, NR10R11, SR12 or is phenyl which is unsubstituted o... | 04/11/2006 |
| 7022456 | Positive photoresist composition A positive photoresist composition comprising: (A) an oxime sulfonate compound represented by the specific formula, (B) a resin comprising repeating units including a group represented by the specific formula and w... | 04/04/2006 |
| 7001706 | Sulfonate and a resist composition A sulfonate of the formula (I): wherein Q1, Q2, Q3, Q4 and Q5 each independently represents a certain substituent, and A+ represents a counter ion, | 02/21/2006 |
| 6936401 | Pattern formation material and pattern formation method The pattern formation material of this invention is a chemically amplified resist material including a polymer whose solubility in a developer is changed in the presence of an acid; an acid generator for generating an acid through irradiation with exposing light; an... | 08/30/2005 |
| 6902875 | Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof A finely patterned silica type ceramic film suitable as an inter-layer dielectric is formed in a short time by applying, onto a substrate, a positive working radiation sensitive polysilazane composition comprising a modified poly(sil sesquiazane) having a number ave... | 06/07/2005 |
| 6869744 | Chemically amplified positive resist composition A chemically amplified positive resist composition contains as a base a carboxyl or phenolic hydroxyl group-containing resin soluble in aqueous alkaline solution, in which acid labile groups are incorporated into at least some of the hydrogen atoms on the carboxyl o... | 03/22/2005 |
| 6869746 | Photopolymerizable composition and recording material using the same The present invention provides a photopolymerizable composition comprising a polymerizable compound including an addition-polymerizable unsaturated bond, a photo-radical-generating agent, and an amine compound represented by the following general formula (I) and a r... | 03/22/2005 |
| 6864040 | Thermal initiator system using leuco dyes and polyhalogene compounds The present invention relates to IR-sensitive compositions containing an initator system comprising: (a) at least one compound capable of absorbing IR radiation selected from triarylamine dyes, thiazolium dyes, indolium dyes, oxazo... | 03/08/2005 |
| 6844135 | Chemically amplified resist material and patterning method using same A chemically amplified resist material comprising a base resin and a photo acid generator having sensitivity at the wavelength of patterning exposure; wherein, the chemically amplified resist material further comprising an activator that generates an acid or a radic... | 01/18/2005 |
| 6838224 | Chemical amplification, positive resist compositions A chemical amplification, positive resist composition is provided comprising (A) a photoacid generator and (B) a resin which changes its solubility in an alkali developer under the action of acid and has substituents of the formula: C6H11—(CH... | 01/04/2005 |
| 6830871 | Chemical amplification type resist composition A chemical amplification type resist composition comprising: (a) a resin comprising repeating units having a side chain containing the specific partial structure and which increases the solubility in an alkaline developing solution... | 12/14/2004 |
| 6824954 | Sulfonyloxime compound, and radiation sensitive acid generator, positive type radiation sensitive resin composition and negative type radiation sensitive resin composition using same A sulfonyloxime compound is provided which is represented by a general formula (1): wherein, R1 represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R | 11/30/2004 |
| 6818375 | Photoresist composition Disclosed are photoimageable compositions having improved stripping properties including a photoresist strip enhancer. Also disclosed are methods of enhancing the strippability of photoimageable compositions and methods for manufacturing printed wiring boards using ... | 11/16/2004 |
| 6811961 | Photoacid generator systems for short wavelength imaging New photoacid generator systems that comprise a sensitizer compound and one or more photoacid generator compounds are provided and photoresist compositions that comprise such systems. Photoacid generator systems of the invention are particularly useful as photoactiv... | 11/02/2004 |
