U.S. patents available from 1976 to present.
U.S. patent applications available from 2005 to present.

Icon_funbox Famous Patents

The first commercial microwave oven was nearly 6 feet tall and weighed in at 750 pounds.

Newsletter  PatentStorm News

Make the Most of Our Site

See this month's Top Inventors and Most Cited Patents.

Stay on top of the latest innovations by subscribing to an RSS feed.

Registered users: Manage your profile.

 

Class 430/916 - Free radical


Subclass of Class 430 - Radiation imagery chemistry: process, composition, or product thereof
Definition: Art collection involving an initiator which releases free
No. of patents: 239
Last issue date: 10/07/2008


1            
NumberTitleIssue Date
7432037Curable resin composition and flexographic plate material using the same
The invention provides a curable resin composition having an addition polymerization-based block copolymer (I) and an ethylenic unsaturated compound (II). Also provided is a flexographic plate material using the curable resin composition as its constituent. The flex...
10/07/2008
7416835Polymerizable composition
A polymerizable composition comprising: (A) a compound which causes at least one of decarboxylation and dehydration by heat; (B) a radical initiator; (C) a compound having at least one ethylenically unsaturated bond; and (D) an infrared ray absorber. ...
08/26/2008
7381516Multiphoton photosensitization system
A photoreactive composition comprises (a) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction; and (b) a photoinitiator system comprising photochemically-effective amounts of (1) at least one type of semiconduc...
06/03/2008
7378223Photoresist resin composition
The invention provides photoresist resin compositions and in particular, a photoresist resin compositions comprising a) an acrylate monomer having two urethane bonds, b) a crosslinkable urethane monomer having at least two ethylene double bonds, c) an alkali-soluble...
05/27/2008
7374861Negative photoresist composition
The present invention is directed to a negative photoresist composition which mainly is composed of a) a polyimide having pendant carboxyl groups, wherein a portion of the carboxyl groups reacted with glycidyl (meth)acrylate monomers to form covalent bonds. The phot...
05/20/2008
7368224Photopolymerizable composition
The invention provides a photopolymerizable composition having a high photosensitivity, which comprises a metal complex of a squarylium compound, a radical generator, and a compound having at least one ethylenically unsaturated double bond. The photopolymeriz...
05/06/2008
7364834Functional polymer
A polymer having α,β unsaturated groups and a group that generates a free radical when exposed to actinic radiation. The polymer may be self-cross-linking. ...
04/29/2008
7361450Photosensitive resins, resin compositions and products of curing thereof
A photosensitive resin (A) consisting substantially of a product obtained by reacting a polyester (c) which is a reaction product of a polyol (a) with a tetrabasic acid dianhydride (b) with a compound (d) having an ethylenically unsaturated group and an epoxy group ...
04/22/2008
7341828Thiol compound, photopolymerization initiator composition and photosensitive composition
A photopolymerization initiator composition containing a thiol compound having a mercapto group-containing group that has at least one substituent on the carbon atoms on carbon atom(s) at the α- and/or β-position with respect to the mercapto group and a photopolym...
03/11/2008
7338748Polymerizable composition and planographic printing plate precursor
The present invention provides a planographic printing plate precursor including on a support a photosensitive layer that contains a polymerizable composition containing a specific binder polymer having a repeating unit of formula (I), an infrared absorbent, a polym...
03/04/2008
7323290Dry film photoresist
A dry film photoresist includes a functional polymer. The functional polymer has α,β-unsaturated groups and groups that generate a free radical upon exposure to actinic radiation. ...
01/29/2008
7312013Photoreactive composition
This invention provides a photoreactive composition in which reaction of a hydrolyzable metal compound takes place by irradiation of light. A photoreactive composition, which comprises a hydrolyzable metal compound (A) comprising a metal atom and a hydrolyzab...
12/25/2007
7309550Photosensitive composition with low yellowing under UV-light and sunlight exposure
This disclosure relates to a photosensitive composition useful in preparing water-developable, relief printing plates and other photosensitive articles. The compositions comprise an unsaturated polyurethane pre-polymer, which is the reaction product of at least one ...
12/18/2007
7297460Radiation curable ink compositions suitable for ink-jet printing
A radiation curable ink composition comprising at least one initiator and at least one polyhedral oligomeric silsesquioxane (POSS) represented by the following empirical formula [R(SiO1.5)]n wherein n=4, 6, 8, 10, 12, 14, 16 and larger and each...
11/20/2007
7285375Photosensitive composition, photosensitive lithography plate and method for producing lithography plate
Disclosed is a light sensitive composition containing a compound A having a group capable of undergoing radical polymerization, a compound B having a group capable of undergoing cationic polymerization, a photopolymerization initiator C, and a polymer binder D, the ...
10/23/2007
7261998Imageable element with solvent-resistant polymeric binder
The present invention provides an imageable element including a lithographic substrate and an imageable layer disposed on the substrate. The imageable layer includes a radically polymerizable component, an initiator system capable of generating radicals sufficient t...
08/28/2007
7232648Photosensitive resin composition and coating film cured product thereof
A photosensitive resin composition comprising a resin (A1) having fluorine atom-containing groups, silicon atom-containing groups and ethylenic double bonds, a radical initiator (B) and an alkali-soluble photosensitive resin (D) having at least three ethylenic doubl...
06/19/2007
7232651Optical recording materials
A photopolymerisable system is disclosed which can be polymerised by exposure to UV light, for example, to form a solid, light-transmitting sheet material having volume refractive index variations defining an optical diffuser or a hologram, for example. The system i...
06/19/2007
71830391,4-dihydropyridine-containing IR-sensitive composition and use thereof for the production of imageable elements
Initiator system comprising: (a) at least one substance capable of absorbing IR radiation, (b) at least one compound capable of forming free radicals, and (c) at least one 1,4-dihydropyridine derivative of the formula (I) ...
02/27/2007
7179582Radical polymerizable composition and lithographic printing plate precursor using the same
A radical polymerizable composition comprising (A) an alkali-soluble resin containing a radical polymerizable group, (B) a radical polymerizable compound, and (C) a radical initiator, wherein reactivity of a polymerizable group of the polymerizable compound 4B) to a...
02/20/2007
7166412Photosensitive metal nanoparticle and method of forming conductive pattern using the same
A photosensitive metal nanoparticle and a method of forming a conductive pattern using the same, wherein a self-assembled monolayer of a thiol compound or isocyanide compound having a terminal reactive group is formed on a surface of the metal nanoparticle and a pho...
01/23/2007
7129022Photo-polymerization type photo-sensitive electrode paste composition for plasma display panel and fabricating method thereof
This invention relates to a photo-polymerization type photosensitive electrode paste composition for a plasma display panel that is capable of preventing a bubble from occurring on an electrode surface during an electrode paste printing process and a damage of an el...
10/31/2006
7118845Multiphoton photochemical process and articles preparable thereby
A process for fabricating of an article by exposing a photoreactive composition to light under multiphoton absorption conditions. The light passes through an optical system having a final optical element having a numeric aperture in a range of from 0.65 to 1.25, inc...
10/10/2006
7090962Alkali-soluble resin with polyaromatic group and photosensitive composition comprising the resin
An alkali-soluble resin having a polyaromatic group and a photosensitive composition comprising the alkali-soluble resin. The alkali-soluble resin comprises the following recurring units: wherein each of R1
08/15/2006
7078157Photosensitive composition and use thereof
A composition that comprises a photopolymerizable compound containing at least two pendant unsaturated groups; at least one ethylenically unsaturated photopolymerizable polyalkylene oxide hydrophilic monomer; at least one nonionic surfactant; and at least one photoi...
07/18/2006
7026094Substituted oxime derivatives and the use thereof as latent acids
New oxime sulfonate compounds of the formula (I) and (II), wherein R1 is C1-C12alkyl, C1C4haloalkyl, hydrogon, OR9, NR10R11, SR12 or is phenyl which is unsubstituted o...
04/11/2006
6994948Aqueous developable photoimageable thick film compositions
A photoimageable composition comprising finely divided particles of inorganic material comprising coated silver particles that are at least partially coated with at least one surfactant and inorganic binder dispersed in organic medium comprising an aqueous developab...
02/07/2006
6936384Infrared-sensitive composition containing a metallocene derivative
The present invention provides an initiator system including an infrared-absorbing compound that exhibits an electronic transition band in the near-infrared region, an initiator, and a metallocene compound. Upon exposure to infrared radiation, the initiator system i...
08/30/2005
6933097Photosensitive composition for manufacturing optical waveguide, production method thereof and polymer optical waveguide pattern formation method using the same
A photosensitive composition for optical waveguides comprising of an organic oligomer, a polymerization initiator and a crosslinking agent, the organic oligomer being a silicone oligomer represented by the following formula (1), wherein X denotes hydrogen, deuterium...
08/23/2005
6929899Fluorinated photopolymer composition and waveguide device
A photosensitive composition having low absorption loss at 1,300-1,610 nm and is suitable for practical waveguide devices. The composition comprises at least one (meth)acrylate prepared from a fluorinated monomer or polymer having minimum two hydroxyl groups, at lea...
08/16/2005
6899994On-press developable IR sensitive printing plates using binder resins having polyethylene oxide segments
The present invention relates to a polymerizable coating composition suitable for the manufacture of printing plates developable on-press. The coating composition comprises (i) a polymerizable compound and (ii) a polymeric binder comprising polyethylene oxide segmen...
05/31/2005
6878505Photosensitive composition
A photosensitive composition comprising (i) a sensitizing dye represented by the following formula (I), (II) or (III) defined in the specification, (ii) a titanocene compound and (iii) a compound of undergoing a reaction with at least one of a radical and an acid to...
04/12/2005
6864040Thermal initiator system using leuco dyes and polyhalogene compounds
The present invention relates to IR-sensitive compositions containing an initator system comprising: (a) at least one compound capable of absorbing IR radiation selected from triarylamine dyes, thiazolium dyes, indolium dyes, oxazo...
03/08/2005
6855480Photoresist composition
Disclosed are photoimageable compositions having improved stripping properties as well as methods for manufacturing printed wiring boards using such photoimageable compositions. ...
02/15/2005
6844135Chemically amplified resist material and patterning method using same
A chemically amplified resist material comprising a base resin and a photo acid generator having sensitivity at the wavelength of patterning exposure; wherein, the chemically amplified resist material further comprising an activator that generates an acid or a radic...
01/18/2005
6838222Photopolymerizable composition
A photopolymerizable composition that is cured with visible light or an infrared laser and is used as a recording layer in a negative planographic printing plate precursor. The photopolymerizable composition is cured by exposure and includes (A) a polymerizable comp...
01/04/2005
6818375Photoresist composition
Disclosed are photoimageable compositions having improved stripping properties including a photoresist strip enhancer. Also disclosed are methods of enhancing the strippability of photoimageable compositions and methods for manufacturing printed wiring boards using ...
11/16/2004
6800420Photosensitive thick film composition
A photosensitive thick film composition. The photosensitive thick film composition can produce electrode material with high resolution and high contrast. The photosensitive thick film composition includes an acrylic copolymer, a photoinitiator, a reactive monomer, a...
10/05/2004
6790596Photoreactive resin composition and method of manufacturing circuit board and ceramic multilayer substrate using the resin composition
A photoreactive resin composition having high sensitivity and causing less gelation, and methods of manufacturing a circuit board and a ceramic multilayer substrate having a high-resolution wiring pattern and via holes by a photolithography process using the photore...
09/14/2004
6787289Radiation sensitive refractive index changing composition and refractive index changing method
A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable opti...
09/07/2004
1            
 
Sign InRegister
Username  
Password   
forgot password?