Celebrity Inventors
Glam girl Heddy Lamar may have used her good looks to good effect on the silver screen, but she put her smarts to better use as an inventor. During World War II, she co-patented a frequency-switching system for torpedo guidance that was considered years ahead of its time.
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| Number | Title | Issue Date |
| 7419759 | Photoresist composition and method of forming a pattern using the same The photoresist composition of the present invention includes a solvent mixture, a resin, a photo acid generator, and a quencher, the solvent mixture comprising a first solvent containing an ether compound and a second solvent having a polarity stronger than the fir... | 09/02/2008 |
| 7416832 | Positive resist composition A positive resist composition capable of forming a resist pattern having excellent shape is provided. This composition is a positive resist composition including a base resin component (A) and an acid generator component (B) generating an acid under exposure, which ... | 08/26/2008 |
| 7396899 | Chemical amplification type resist composition The present invention provides a sulfonium salt of the formula (Ia) a polymeric compound comprising a structural unit of the formula (Ib) and a chemical amplification type positiv... | 07/08/2008 |
| 7396633 | Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition With the damascene process in which an interconnection is formed using a conventional chemically amplified positive photoresist composition, there arises a problem that the photoresist within the via hole (as well as in its vicinity) may remain even after the exposu... | 07/08/2008 |
| 7390613 | Photoactive compounds The present application relates to a compound of formula Ai Xi Bi where Ai and Bi are each individually an organic onium cation; and Xi is anion of the formula −O3S—CF2CF2OCF2CF2—SO3 | 06/24/2008 |
| 7390609 | Polymers and photoresists comprising same New polymers are provided that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more polymer repeat units comprise carbon atom(s). Particularly preferred ... | 06/24/2008 |
| 7387865 | Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method A composition containing a photoacid generator monomer and surfactant, and a method for synthesizing a compound on a substrate using the composition are provided. The method includes bonding a layer of first molecules having an acid labile protecting group to a soli... | 06/17/2008 |
| 7381516 | Multiphoton photosensitization system A photoreactive composition comprises (a) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction; and (b) a photoinitiator system comprising photochemically-effective amounts of (1) at least one type of semiconduc... | 06/03/2008 |
| 7368218 | Positive resist compositions and patterning process A polymer which is obtained from a combination of (meth)acrylate having a bridged ring lactone group and (meth)acrylate having an acid leaving group with a hexafluoroalcohol group is used as a base resin to formulate a positive resist composition which when exposed ... | 05/06/2008 |
| 7358029 | Low activation energy dissolution modification agents for photoresist applications A photoresist composition including a polymer, a photoacid generator and a dissolution modification agent, a method of forming an image using the photoresist composition and the dissolution modification agent composition. The dissolution modification agent is insolu... | 04/15/2008 |
| 7354692 | Photoresists for visible light imaging A class of lithographic photoresist combinations is disclosed which is suitable for use with visible light and does not require a post-exposure bake step. The disclosed photoresists are preferably chemical amplification photoresists and contain a photosensitizer hav... | 04/08/2008 |
| 7351515 | Positive resist composition and pattern-forming method using the same A positive resist composition includes: (A) a resin capable of increasing a solubility thereof in an alkali developer by an action of an acid; (B) a compound capable of generating a sulfonic acid represented by the following formula (I) upo... | 04/01/2008 |
| 7344821 | Positive resist composition for use with electron beam, EUV light or X ray, and pattern formation method using the same A positive resist composition for use with an electron beam, an EUV light or an X ray, the positive resist composition comprising: (A) at least one compound that generates an acid upon treatment with one of an actinic ray and radiation; and (B) a resin that increase... | 03/18/2008 |
| 7338748 | Polymerizable composition and planographic printing plate precursor The present invention provides a planographic printing plate precursor including on a support a photosensitive layer that contains a polymerizable composition containing a specific binder polymer having a repeating unit of formula (I), an infrared absorbent, a polym... | 03/04/2008 |
| 7335464 | Water soluble resin composition, method of pattern formation and method of inspecting resist pattern A water-soluble resin composition of the present invention comprises at least a water-soluble resin, an acid generator capable of generating an acid by heating and a solvent containing water. The water-soluble resin composition is applied on a highly water-repellant... | 02/26/2008 |
| 7335454 | Positive resist composition A positive resist composition comprising (A) a fluorine group-containing resin, which has a structure substituted with a fluorine atom in the main chain and/or side chain of polymer skeleton and a group that is decomposed by the action of an acid to increase solubil... | 02/26/2008 |
| 7326517 | Planographic printing plate material and preparing process of planographic printing plate A photosensitive composition containing: (A) a sensitizing dye; (B) a photopolymerization initiator; (c) a polymerizable compound having an ethylenically unsaturated bond; and (D) a polymer binder, wherein the photopolymerization initiator exhibits a reaction rate c... | 02/05/2008 |
| 7314701 | Radiation-sensitive resin composition A positive tone radiation-sensitive resin composition comprising (A) a 1-substituted imidazole, (B) a photoacid generator, and (C-a) a resin protected by an acid-dissociable group, insoluble or scarcely soluble in alkali, but becoming soluble in alkali when the acid... | 01/01/2008 |
| 7303855 | Photoresist undercoat-forming material and patterning process An undercoat-forming material comprising a novolak resin having a fluorene or tetrahydrospirobiindene structure, an organic solvent, an acid generator, and a crosslinker, optionally combined with an intermediate layer having an antireflective effect, has an absorpti... | 12/04/2007 |
| 7303852 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method The invention provides a high-resolution resist material comprising an acid generator that has high sensitivity and high resolution with respect to high-energy rays of 300 nm or less, has small line-edge roughness, and is superior in heat stability and in shelf stab... | 12/04/2007 |
| 7297464 | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide The present invention provides a radiation curing composition comprising (a): a siloxane resin, (b): a photoacid generator or photobase generator, and (c): a solvent capable of dissolving component (a), and (d): a curing acceleration catalyst. ... | 11/20/2007 |
| 7297460 | Radiation curable ink compositions suitable for ink-jet printing A radiation curable ink composition comprising at least one initiator and at least one polyhedral oligomeric silsesquioxane (POSS) represented by the following empirical formula [R(SiO1.5)]n wherein n=4, 6, 8, 10, 12, 14, 16 and larger and each... | 11/20/2007 |
| 7294450 | Chemical amplification-type resist composition and production process thereof A production process of a chemical amplification-type resist composition, which is a process for producing a chemical amplification-type composition comprising: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin... | 11/13/2007 |
| 7285375 | Photosensitive composition, photosensitive lithography plate and method for producing lithography plate Disclosed is a light sensitive composition containing a compound A having a group capable of undergoing radical polymerization, a compound B having a group capable of undergoing cationic polymerization, a photopolymerization initiator C, and a polymer binder D, the ... | 10/23/2007 |
| 7282318 | Photoresist composition for EUV and method for forming photoresist pattern using the same The present invention relates to photoresist compositions for EUV and methods for forming photoresist patterns. More specifically, fine photoresist patterns: of less than 50 nm without collapse are formed with EUV (Extreme Ultraviolet) as an exposure light source by... | 10/16/2007 |
| 7282319 | Photoresist composition and method of forming a pattern using same A photoresist composition for preventing exposing failures and a method of forming a pattern using the same are disclosed. The photoresist composition preferably comprises about 0.1% to about 0.5% by weight of a photo acid generator, and about 2% to about 10% by wei... | 10/16/2007 |
| 7279255 | Negative-working radiation-sensitive compositions and imageable materials A radiation-sensitive composition includes a radically polymerizable component and a borate initiator composition capable of generating radicals sufficient to initiate polymerization of the radically polymerizable component upon exposure to imaging radiation. This c... | 10/09/2007 |
| 7270936 | Negative resist composition comprising hydroxy-substituted base polymer and Si-containing crosslinker having epoxy ring and a method for patterning semiconductor devices using the same A negative resist composition and a method for patterning semiconductor devices using the composition are provided. The negative resist composition contains an alkali-soluble hydroxy-substituted base polymer, a silicon-containing crosslinker having an epoxy ring, an... | 09/18/2007 |
| 7270931 | Silicon-containing compositions for spin-on ARC/hardmask materials Antireflective compositions characterized by the presence of an Si-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical an... | 09/18/2007 |
| 7270916 | Recording medium Disclosed is a recording medium comprising a recording layer including a photo-acid generating agent that generates an acid upon irradiation with an actinic radiation and a polymer having a polymerizable substituent group bonded to a main chain of the polymer via a ... | 09/18/2007 |
| 7264918 | Resist composition for liquid immersion exposure process and method of forming resist pattern therewith A resist composition for liquid immersion lithography process, which comprises: (A) a polymer comprising (a1) alkali-soluble constitutional units each comprising an alicyclic group having both (i) a fluorine atom or a fluoroalkyl group and (ii) an alcoholic hydroxyl... | 09/04/2007 |
| 7264913 | Antireflective compositions for photoresists The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193 nm. The polymer of t... | 09/04/2007 |
| 7261993 | Photoresists and processes for microlithography Positive photoresists and associated processes for microlithography in the ultraviolet (UV) and violet are disclosed. The photoresists comprise (a) a branched polymer containing protected acid groups and (b) at least one photoacid generator. The photoresists have hi... | 08/28/2007 |
| 7261994 | Positive resist composition A positive resist composition having excellent mask linearity is provided. This composition is a positive resist composition comprising a base resin component (A) and an acid generator component (B) generating an acid under exposure, wherein the base resin component... | 08/28/2007 |
| 7258962 | Positive-tone radiation-sensitive resin composition A positive-tone radiation-sensitive resin composition comprising: (A) a carbazole derivative shown by the following formula (1), (B) a photoacid generator containing a sulfonimide compound and an iodonium salt compound as essential components, and (C) an acid-dissoc... | 08/21/2007 |
| 7258963 | Photosensitive resin, photoresist composition having the photosensitive resin and method of forming a photoresist pattern by using the photoresist composition In a photosensitive resin, a photoresist composition having the photosensitive resin, and a method of forming a photoresist pattern by using the photoresist, the photosensitive resin includes a blocking group substituted for an acid. The photosensitive resin has a w... | 08/21/2007 |
| 7255973 | Positive resist compositions and patterning process A polymer comprising units derived from an exo-form ester and units derived from an ester having two hexafluoroisopropanol groups is used as a base resin to formulate a positive resist composition which, when exposed and developed by photolithography, is minimized i... | 08/14/2007 |
| 7244545 | Fluorinated compound, fluoropolymer and process for its production The present invention provides a fluorinated compound having functional groups in a high concentration so that adequate characteristics of the functional groups can be obtained and having high transparency in a wide wavelength region, a fluoropolymer, and a process ... | 07/17/2007 |
| 7235342 | Negative photoresist composition including non-crosslinking chemistry A negative photoresist composition and a method of patterning a substrate through use of the negative photoresist composition. The composition includes: a radiation sensitive acid generator; a hydroxy-containing additive; and a resist polymer derived from at least o... | 06/26/2007 |
| 7235344 | Energy harvesting molecules and photoresist technology A composition including a first moiety; and a different second moiety capable of harvesting energy from an external source, wherein the second moiety is positioned such that energy harvested at the second moiety may be transferred to the first moiety. An article of ... | 06/26/2007 |
