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| Number | Title | Issue Date |
| 7442489 | Photoresist composition and method of forming a photoresist pattern using the same In a photoresist composition for a semiconductor manufacturing process and a method of forming a photoresist pattern using the photoresist composition, the photoresist composition includes an organic dispersing agent for dispersing acid (H+). The photoresist film ma... | 10/28/2008 |
| 7442488 | Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode There is provided a positive type photosensitive paste composition for a plasma display panel (PDP) electrode, including a conductive powder, an inorganic binder, and a photosensitive vehicle. The photosensitive vehicle includes an organic binder represented by form... | 10/28/2008 |
| 7435529 | Photosensitive composition and image recording method using the same A photosensitive composition comprising: a sensitizing dye represented by the formula (I) defined herein, in which Z represents a substituted divalent linking group forming a 5-membered or 6-membered ring, provided that a total volume of substituents arranged on the... | 10/14/2008 |
| 7407734 | Resist composition for electron beam or EUV A resist composition and a method of forming a resist pattern that enable contamination within the exposure apparatus to be prevented in lithography processes using an electron beam or EUV (extreme ultraviolet light). In this method, an organic solvent containing, a... | 08/05/2008 |
| 7402376 | Photosensitive resin composition and photosensitive dry film containing the same A photosensitive resin composition which gives a dry film having a sand blast proof property and a development property in a well-balanced manner. A photosensitive resin composition containing a carboxy group-containing urethane (meth)acrylate compound having two or... | 07/22/2008 |
| 7396634 | Photosensitive composition A photosensitive composition comprising: a sensitizing dye represented by the following formula (1): in which A represents an optionally substituted aromatic ring or an optionally substituted hetero ring; X represents an ox... | 07/08/2008 |
| 7381516 | Multiphoton photosensitization system A photoreactive composition comprises (a) at least one reactive species that is capable of undergoing an acid- or radical-initiated chemical reaction; and (b) a photoinitiator system comprising photochemically-effective amounts of (1) at least one type of semiconduc... | 06/03/2008 |
| 7381517 | Curable composition and image forming material containing the same A curable composition comprising: (A) an infrared absorber which is a cyanine dye having a structure in which hetero rings are bonded to each other via a methine chain and which has at least one substituent having a structure selected from the group consisting of an... | 06/03/2008 |
| 7371506 | Positive photosensitive resin composition A positive photosensitive resin composition comprising (A) a polyamic acid, (B) a 1,4-dihydropyridine derivative represented by the general formula (II): wherein R2 is a monovalent organic group; each of R3 | 05/13/2008 |
| 7335454 | Positive resist composition A positive resist composition comprising (A) a fluorine group-containing resin, which has a structure substituted with a fluorine atom in the main chain and/or side chain of polymer skeleton and a group that is decomposed by the action of an acid to increase solubil... | 02/26/2008 |
| 7326517 | Planographic printing plate material and preparing process of planographic printing plate A photosensitive composition containing: (A) a sensitizing dye; (B) a photopolymerization initiator; (c) a polymerizable compound having an ethylenically unsaturated bond; and (D) a polymer binder, wherein the photopolymerization initiator exhibits a reaction rate c... | 02/05/2008 |
| 7326518 | Photoresist compositions Chemically-amplified positive photoresist compositions are provided that contain a resin that comprises acetal and alicyclic groups. Photoresists of the invention can exhibit notably enhanced lithographic properties. Preferred photoresists of the invention comprise ... | 02/05/2008 |
| 7326511 | Sulfonate derivatives and the use thereof as latent acids Chemically amplified photoresist compositions comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) a compound of the formula (Ia), (Ib), (IIa), (IIb), (IIIa), (IIIb), (Iva),... | 02/05/2008 |
| 7314699 | Radiation-sensitive mixture and recording material produced therewith The present invention relates to a radiation-sensitive mixture which contains an acrylate or methacrylate monomer and/or oligomer capable of free radical polymerization and having at least two acrylate and/or methacrylate groups and at least one photooxidizable grou... | 01/01/2008 |
| 7312013 | Photoreactive composition This invention provides a photoreactive composition in which reaction of a hydrolyzable metal compound takes place by irradiation of light. A photoreactive composition, which comprises a hydrolyzable metal compound (A) comprising a metal atom and a hydrolyzab... | 12/25/2007 |
| 7303852 | Photoacid generating compounds, chemically amplified positive resist materials, and pattern forming method The invention provides a high-resolution resist material comprising an acid generator that has high sensitivity and high resolution with respect to high-energy rays of 300 nm or less, has small line-edge roughness, and is superior in heat stability and in shelf stab... | 12/04/2007 |
| 7297460 | Radiation curable ink compositions suitable for ink-jet printing A radiation curable ink composition comprising at least one initiator and at least one polyhedral oligomeric silsesquioxane (POSS) represented by the following empirical formula [R(SiO1.5)]n wherein n=4, 6, 8, 10, 12, 14, 16 and larger and each... | 11/20/2007 |
| 7267925 | Photosensitive composition and novel compound used therefor A photosensitive composition containing: a sensitizing dye represented by the formula (1) as defined herein; an initiator compound capable of generating a radical, an acid, or a base; and a compound whose physical or chemical characteristic irreversibly changes by a... | 09/11/2007 |
| 7252924 | Positive resist composition and method of pattern formation using the same A positive resist composition comprising: at least two resins which differ in glass transition temperature by at least 5° C.; and a compound which generates an acid upon irradiation with actinic rays or radiation, wherein each of the two resins comprises at least e... | 08/07/2007 |
| 7252926 | Planographic printing plate material and preparing process of planographic printing plate A planographic printing plate material including a support having thereon a photosensitive layer containing: (A) a photopolymerization initiator; (B) a polymer binder; (c) a polymerizable compound having an ethylenically unsaturated bond; and (D) an anionic dye, whe... | 08/07/2007 |
| 7235349 | Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator A process of forming ultra fine patterns using bottom anti-reflective coating containing acid generator. More particularly, a process of forming vertical patterns using an organic bottom anti-reflective coating containing excessive amount of acid generator, in order... | 06/26/2007 |
| 7214467 | Photosensitive resin composition The photosensitive resin composition of the present invention is an excellent photosensitive resin composition: exhibiting significant transmissibility at the use of an exposure light source of 160 nm or less, more specifically F2 excimer laser light, whe... | 05/08/2007 |
| 7195856 | Positive resist composition and pattern formation method using the same A positive resist composition comprising (A) a resin that is decomposed by the action of an acid to increase solubility in an alkali developing solution and includes a specific repeating unit and (B) a compound that generates an acid upon irradiation of an actinic r... | 03/27/2007 |
| 7192685 | Positive resist composition and method of forming resist pattern using the same. A positive resist composition comprising: (A) a fluorine atom-containing resin, wherein the resin comprises at least one group that increases a solubility of the resin in an alkali developer by the action of an acid; and (B) a sulfonium salt compound having a cation... | 03/20/2007 |
| 7179579 | Radiation-sensitive composition A radiation-sensitive composition comprising: (A) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation, and (B) a resin containing a repeating unit having a specific grou... | 02/20/2007 |
| 7172848 | Chemical amplification type positive resist composition There is provided a positive resist composition which enables the formation of a fine resist pattern, enables the angle of the taper shape within that resist pattern to be controlled to a suitable angle, and enables the formation of a resist pattern with an excellen... | 02/06/2007 |
| 7150955 | Light-sensitive sheet comprising support, first and second light-sensitive layers and barrier layer A light-sensitive sheet comprises a support, a first light-sensitive layer, a barrier layer and a second light-sensitive layer in this order. Each of the first and second light sensitive layers independently contains a binder, a polymerizable compound and a photo-po... | 12/19/2006 |
| 7135268 | Amplification type positive resist composition The present invention provides a sulfonate of the formula (I′): wherein Q1, Q2, Q3, Q4 and Q5 each independently represent hydrogen, alkyl having 1 to 16 c... | 11/14/2006 |
| 7118845 | Multiphoton photochemical process and articles preparable thereby A process for fabricating of an article by exposing a photoreactive composition to light under multiphoton absorption conditions. The light passes through an optical system having a final optical element having a numeric aperture in a range of from 0.65 to 1.25, inc... | 10/10/2006 |
| 7060414 | Radiation-sensitive resin composition A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal stru... | 06/13/2006 |
| 7041430 | Information recording media, manufacturing technique and information recording method Problem to be solved is that when an information recording medium is repeatedly subjected to recording of information several hundreds times, the atoms in a protective layer are diffused and dissolved into a recording layer to lower a reflectivity greatly and make t... | 05/09/2006 |
| 7041429 | Light sensitive composition and light sensitive planographic printing plate material Disclosed are a light sensitive composition comprising an addition polymerizable ethylenically unsaturated monomer, a photopolymerization initiator and a polymer binder, and a light sensitive planographic printing plate material comprising a hydrophilic support, and... | 05/09/2006 |
| 7026094 | Substituted oxime derivatives and the use thereof as latent acids New oxime sulfonate compounds of the formula (I) and (II), wherein R1 is C1-C12alkyl, C1C4haloalkyl, hydrogon, OR9, NR10R11, SR12 or is phenyl which is unsubstituted o... | 04/11/2006 |
| 6939662 | Positive-working resist composition A positive-working resist composition comprising: (A1) a resin containing a repeating unit represented by the specific formula, which increases the solubility in an alkali developing solution by the action of an acid, and ... | 09/06/2005 |
| 6919159 | Photopolymerizable composition and recording material using the same The present invention provides a photopolymerizable composition, which is highly sensitive to visible light rays to IR rays and has an excellent raw storage property, and a recording material capable of carrying out highly sensitive image recording and having an exc... | 07/19/2005 |
| 6908722 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition A novel photoacid generator containing a structure of the following formula (I), wherein R is a monovalent organic group with a fluorine content of 50 wt % or less, a nitro group, a cyano group, or a hydrogen atom, and... | 06/21/2005 |
| 6899989 | Radiation-sensitive resin composition A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenze... | 05/31/2005 |
| 6897004 | Intermediate layer material composition for multilayer resist process and pattern formation process using the same The intermediate layer material composition for a multilayer resist process in the present invention, which is soluble in an organic solvent, excellent in storage stability, and has no problem with regard to a footing shape, a pattern separation and a line edge roug... | 05/24/2005 |
| 6897005 | Photosensitive polymer including copolymer of alkyl vinyl ether and resist composition containing the same There are provided a photosensitive polymer having a copolymer of alkyl vinyl ether and a resist composition containing the same. The photosensitive polymer includes a copolymer of alkyl vinyl ether and maleic anhydride, represented by the following structure: | 05/24/2005 |
| 6866981 | Light-sensitive composition There are disclosed a light-sensitive composition which comprises (A) at least one water-soluble polymer selected from a cationic water-soluble polymer having a phenyl group substituted by a vinyl group at a side chain of the polymer and a water-soluble polymer havi... | 03/15/2005 |
