Bizarre Patents
Crispy Chip Sandwich and Process of Producing a Sandwich Product
A food product comprising a multilayer cookie or snack having outer layers formed from a crispy type edible food product such as a potato chip or corn chip, etc. with an intermediate marshmallow layer being in contact with the inner surface of each crispy chip and one or more filler substances.
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| Number | Title | Issue Date |
| 7442490 | Positive resist composition and pattern formation method using the positive resist composition A positive resist composition comprising: a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group and a repeating unit containing a first acid-decompo... | 10/28/2008 |
| 7435530 | Positive type resist composition and resist pattern formation method using same A positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an est... | 10/14/2008 |
| 7432034 | Negative resist composition A negative resist composition of the present invention comprises: (A) an alkali-soluble resin; (B-1) a cross-linking agent capable of cross-linking with the alkali-soluble resin (A) by the action of an acid, in which the cross-linking agent is a phenol compound cont... | 10/07/2008 |
| 7419761 | Photoresist monomer having spiro cyclic ketal group, polymer thereof and photoresist composition including the same A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the ... | 09/02/2008 |
| 7419769 | Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same A negative photoresist composition is used for the formation of thick films and includes (A) a novolak resin, (B) a plasticizer, (C) a crosslinking agent and (D) an acid generator. The composition is applied onto a substrate and thereby yields a photoresist film 5 t... | 09/02/2008 |
| 7419760 | Top anti-reflective coating composition, method for forming the pattern of a semiconductor device using the same, and semiconductor device comprising the pattern Disclosed herein is a top anti-reflective coating composition comprising a bissulfone compound, as a photoacid generator, represented by Formula 1 below: wherein R1 and R2 are ... | 09/02/2008 |
| 7416821 | Thermally cured undercoat for lithographic application Thermally curable undercoat composition comprising for producing a bilayer relief image comprising: a) a polymer of Structure I comprising repeating units of Structure II, III, and IV | 08/26/2008 |
| 7413843 | Sulfonamide compound, polymer compound, resist material and pattern formation method A base polymer of a resist material includes a unit represented by a general formula of the following Chemical Formula 3: wherein R1, R2 and R3 are the same or diffe... | 08/19/2008 |
| 7407733 | Polymeric compound containing a repeated unit having a 2-oxatricyclo [4.2.1.0] nonan-3-one ring and photoresist resin composition A polymeric compound of the invention includes at least one monomer unit represented by the following formula (I); wherein Ra is a hydrogen atom, a halogen atom, an alkyl group of 1 to 6 carbon atoms or an haloal... | 08/05/2008 |
| 7405028 | Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography A bottom antireflective coating for photolithography at 157 nm or less, where the bottom antireflective coating includes a crosslinkable polymer which contains cinnamic acid derivatives. ... | 07/29/2008 |
| 7402372 | Positive resist composition and method of forming resist pattern A positive resist composition includes a resin (A) that increases alkali solubility due to action of an acid, wherein the resin comprises a copolymer containing a first structural unit (a1) derived from hydroxystyrene, and a second structural unit (a2) derived from ... | 07/22/2008 |
| 7402379 | Resist exposure system and method of forming a pattern on a resist A resist exposure system and a method of forming a pattern on a resist are provided and include an exposure source, a photoresist composition, and a mask positioned therebetween. The resist composition comprises a first photoresist X and a second photoresist Y. The ... | 07/22/2008 |
| 7390612 | Positive type resist composition and resist pattern formation method using same There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycycl... | 06/24/2008 |
| 7378218 | Polymer, resist composition and patterning process A fluorinated polymer comprising recurring units of formulae (1a) to (1d) and having a Mw of 1,000-500,000 is provided. R1 is an acid labile group, R2 is a single bond or methylene, a1, a2, a3, and a4 are numbers from more than 0 to less than 1... | 05/27/2008 |
| 7374860 | Positive resist composition and pattern forming method using the same The invention provides a positive resist composition for the pattern formation by the use of actinic rays or radiation, ensuring that the sensitivity, resolution and pattern profile are good, the line edge roughness is small and the surface roughness is satisfied, a... | 05/20/2008 |
| 7371505 | Photosensitive composition and method for forming pattern using the same A positive working photosensitive composition which is useful in the manufacturing step of a semiconductor such as IC, the manufacture of a circuit board such as liquid crystals and thermal heads, and other fabrication steps and has an excellent resolution and line ... | 05/13/2008 |
| 7371503 | Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generato... | 05/13/2008 |
| 7368218 | Positive resist compositions and patterning process A polymer which is obtained from a combination of (meth)acrylate having a bridged ring lactone group and (meth)acrylate having an acid leaving group with a hexafluoroalcohol group is used as a base resin to formulate a positive resist composition which when exposed ... | 05/06/2008 |
| 7364831 | Positive resist composition and resist pattern formation method A positive resist composition includes a resin component (A) whose alkaline solubility changes by an action of an acid, an acid generator component (B), and polypropylene glycol, wherein the component (A) includes a resin component (A1) including a constitutional un... | 04/29/2008 |
| 7364833 | Photoresist composition for organic layer of liquid crystal display, spin-less coating method thereof, fabrication method of organic layer pattern and liquid crystal display fabricated using the same The invention relates to a photoresist composition for an organic layer for a liquid crystal display, which may be used for a large-scale substrate, a spin-less coating method using the composition, a method for fabricating an organic layer pattern, and a liquid cry... | 04/29/2008 |
| 7365115 | Composition for antireflection coating and method for forming pattern An anti-reflective coating film is formed by applying on a chemically amplified photoresist film an anti-reflective coating composition comprising an alkali-soluble fluorine-containing polymer, an acid, an amine and a solvent capable of dissolving these components a... | 04/29/2008 |
| 7358029 | Low activation energy dissolution modification agents for photoresist applications A photoresist composition including a polymer, a photoacid generator and a dissolution modification agent, a method of forming an image using the photoresist composition and the dissolution modification agent composition. The dissolution modification agent is insolu... | 04/15/2008 |
| 7358033 | Dye-containing curable composition, color filter, and producing process thereof A dye-containing curable composition including a binder and a dye that is soluble in an organic solvent, in which the binder contains a structural unit represented by the following general formula (I) and has a glass transition temperature in a range of 0 to 250° C... | 04/15/2008 |
| 7351515 | Positive resist composition and pattern-forming method using the same A positive resist composition includes: (A) a resin capable of increasing a solubility thereof in an alkali developer by an action of an acid; (B) a compound capable of generating a sulfonic acid represented by the following formula (I) upo... | 04/01/2008 |
| 7344820 | Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same The present invention relates to a chemically amplified polymer having a pendent group with dicyclohexyl bonded thereto, a process for the preparation thereof, and a resist composition comprising it, and more particularly, to a novel (meth)acrylic or norbornene carb... | 03/18/2008 |
| 7341818 | Norbornene-type monomers and polymers containing pendent lactone or sultone groups The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymers and copolymers are useful i... | 03/11/2008 |
| 7341817 | Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition A photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with actinic rays or a radiation; a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation; and a ... | 03/11/2008 |
| 7338745 | Multilayer imageable element with improved chemical resistance Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a polymeric material that is removable using an alkaline developer and comprises a backbone ... | 03/04/2008 |
| 7338755 | Photosensitive composition and method for forming pattern using same The photosensitive composition of the invention contains a polymer material having a group having a structure represented by following general formula (2), and a photo acid generator generating acid with an ultraviolet ray or an ionizing radiation ... | 03/04/2008 |
| 7338748 | Polymerizable composition and planographic printing plate precursor The present invention provides a planographic printing plate precursor including on a support a photosensitive layer that contains a polymerizable composition containing a specific binder polymer having a repeating unit of formula (I), an infrared absorbent, a polym... | 03/04/2008 |
| 7335458 | Chemically amplified positive resist composition and patterning process A chemically amplified positive resist composition is provided comprising (A) a resin containing acid labile groups other than acetal type which changes its solubility in an alkaline developer as a result of the acid labile groups being eliminated under the action o... | 02/26/2008 |
| 7335457 | Positive-tone radiation-sensitive resin composition A positive-tone radiation-sensitive resin composition containing an anthracene-based carboxylic acid component with low sublimation properties and excellent compatibility with other components is provided. The composition exhibits optimum controllability of radiatio... | 02/26/2008 |
| 7332253 | Negative-working radiation-sensitive compositions and imageable materials A radiation-sensitive composition and negative-working imageable element includes a polymeric binder comprising pendant allyl ester groups to provide solvent resistance, excellent digital speed (sensitivity) and can be imaged and developed without a preheat step to ... | 02/19/2008 |
| 7332258 | Positive resist composition and process for forming pattern using the same A positive resist composition comprising (A) a resin that contains a repeating unit represented by formula (1) defined in the specification and a repeating unit represented by formula (2) defined in the specification, and is insoluble or slightly soluble in an alkal... | 02/19/2008 |
| 7326518 | Photoresist compositions Chemically-amplified positive photoresist compositions are provided that contain a resin that comprises acetal and alicyclic groups. Photoresists of the invention can exhibit notably enhanced lithographic properties. Preferred photoresists of the invention comprise ... | 02/05/2008 |
| 7326510 | Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties Mixed carbocycle derivatives containing at least two carbocycles per molecule from the group of anthracenes, adamantanes and steroids with functionalized carbon chains are synthesized and used as modifiers of resist properties and especially etch resistance enhancem... | 02/05/2008 |
| 7326515 | Positive type resist composition and resist pattern formation method using same There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycycl... | 02/05/2008 |
| 7323289 | Bottom anti-reflective coatings derived from small core molecules with multiple epoxy moieties Novel anti-reflective coatings comprising small molecules (e.g., less than about 5,000 g/mole) in lieu of high molecular weight polymers and methods of using those coatings are provided. In one embodiment, aromatic carboxylic acids are used as the chromophores, and ... | 01/29/2008 |
| 7323232 | Resin composition for spacer, spacer, and liquid crystal display device To provide a resin composition for spacer useful for the formation of a pixel-patterned spacer on a substrate in a liquid crystal display device, a spacer using the composition, and a liquid crystal display device that can display high-quality images, a resin compos... | 01/29/2008 |
| 7323287 | Positive type resist composition and resist pattern formation method using same There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycycl... | 01/29/2008 |
