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| Number | Title | Issue Date |
| 7413843 | Sulfonamide compound, polymer compound, resist material and pattern formation method A base polymer of a resist material includes a unit represented by a general formula of the following Chemical Formula 3: wherein R1, R2 and R3 are the same or diffe... | 08/19/2008 |
| 7410747 | Positive resist composition and pattern forming method using the same A positive resist composition satisfying high sensitivity, high resolution and good line edge roughness at the same time, and a pattern forming method using the composition, are provided, which is a positive resist composition comprising (A) a resin of which solubil... | 08/12/2008 |
| 7402379 | Resist exposure system and method of forming a pattern on a resist A resist exposure system and a method of forming a pattern on a resist are provided and include an exposure source, a photoresist composition, and a mask positioned therebetween. The resist composition comprises a first photoresist X and a second photoresist Y. The ... | 07/22/2008 |
| 7399815 | Fluorine-containing allyl ether compounds, their copolymers, and resist compositions and anti-reflection film materials using such copolymers The invention relates to a fluorine-containing allyl ether compound represented by the formula 1, wherein R represents an organic group containing at least one fluorine atom and an alicyclic structure. The invention further... | 07/15/2008 |
| 7390608 | Photoresists containing Si-polymers In a first aspect, silicon polymers are provided that have controlled ratio of silanol (Si—OH) moieties:Si atoms and/or a controlled amount of alkaline aqueous-solubilizing groups. Si-polymers of the invention are particularly useful as a photoresist resin compone... | 06/24/2008 |
| 7390609 | Polymers and photoresists comprising same New polymers are provided that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more polymer repeat units comprise carbon atom(s). Particularly preferred ... | 06/24/2008 |
| 7385002 | Process for preparing resin binder for toner The present invention relates to a process for preparing a resin binder for toner, comprising the steps of (A) carrying out an addition polymerization reaction of addition polymerization resin monomers including styrene in the presence or absence of an organic solve... | 06/10/2008 |
| 7368220 | Positive resist composition and pattern forming method using the same A positive resist composition, which comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one... | 05/06/2008 |
| 7358302 | Composition for light-scattering film and light-scattering film using the same A composition for a light-scattering film contains fluorine-containing resin fine particles each including a copolymer of a first ethylenically unsaturated monomer containing fluorine with other ethylenically unsaturated monomer component, and having an average part... | 04/15/2008 |
| 7358027 | Copolymer for use in chemical amplification resists A copolymer is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the copolymer is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength less th... | 04/15/2008 |
| 7335585 | Method for preventing the formation of a void in a bottom anti-reflective coating filling a via hole A method for manufacturing a semiconductor device which, on performing a via first Dual Damascene process, inhibits or prevents the formation of a void in a bottom anti-reflective coating filling a via hole. The method typically includes the steps of forming a botto... | 02/26/2008 |
| 7326512 | Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound Provided are a polymer compound having high transparency for use in a photoresist composition for microfabrication of the next generation, a resist composition using the polymer compound as a base polymer, and a dissolution inhibitor agent composed of the polymer co... | 02/05/2008 |
| 7318985 | Block copolymer composition for photosensitive flexographic plate A composition for photosensitive flexographic plates which is capable of forming a sheet having a smooth surface and excellent antiflowing properties and less apt to have trouble caused by sticking and which further has excellent thin-line reproducibility; a block c... | 01/15/2008 |
| 7312016 | Chemically amplified positive resist composition and patterning process A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline developer under the action of acid, and a basic compound has a high s... | 12/25/2007 |
| 7309560 | Composition for forming anti-reflective coating There is provided a composition for forming anti-reflective coating for use in a lithography process with irradiation light from F2 excimer laser (wavelength 157 nm) which has a high effect of inhibiting reflected light and causes no intermixing with resist layers, ... | 12/18/2007 |
| 7297466 | Method of forming a photoresist pattern and method for patterning a layer using a photoresist An organic anti-reflective coating (ARC) is formed over a surface of a semiconductor substrate, and a resist layer including a photosensitive polymer is formed on the ARC. The photoresistive polymer contains a hydroxy group. The resist layer is then subjected to exp... | 11/20/2007 |
| 7291442 | Photosensitive polymeric material for WORM optical data storage with two-photon fluorescent readout Image formation via photoinduced fluorescence changes in a polymeric medium with two-photon fluorescence readout of a multi-layer structure. Fluorophore-containing polymers, possessing one or more basic functional groups, underwent protonation in the presence of a p... | 11/06/2007 |
| 7288363 | Chemically amplified positive resist composition and patterning process A chemically amplified positive resist composition comprising a specific 2,4,6-triisopropylbenzenesulfonate compound as a photoacid generator, a polymer which changes its solubility in an alkaline developer under the action of acid, and a basic compound has a high s... | 10/30/2007 |
| 7288362 | Immersion topcoat materials with improved performance A topcoat material for applying on top of a photoresist material is disclosed. The topcoat material comprises at least one solvent and a polymer which has a dissolution rate of at least 3000 Å/second in aqueous alkaline developer. The polymer contains a hexafluoro... | 10/30/2007 |
| 7276323 | Photoresists, polymers and processes for microlithography Photoresists and associated processes for microlithography in the extreme, far, and near UV are disclosed. The photoresists in some embodiments comprise (a) a fluorine-containing copolymer comprising a repeat unit derived from at least one ethylenically unsaturated ... | 10/02/2007 |
| 7267929 | Negative photosensitive resin composition A negative photosensitive resin composition comprising an alkali-soluble photosensitive resin (A) having acidic groups and having at least three ethylenic double bonds per molecule, an ink repellent (B) made of a polymer having polymerized units (b1) having a C... | 09/11/2007 |
| 7264914 | Fluorinated polymers having polycyclic groups with fused 4-membered carbocyclic rings, useful as photoresists, and processes for microlithography This invention provides novel fluorine containing polymers which comprise at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer with a fused 4-membered carbocyclic ring and, optionally, other components. The polymers are useful f... | 09/04/2007 |
| 7264918 | Resist composition for liquid immersion exposure process and method of forming resist pattern therewith A resist composition for liquid immersion lithography process, which comprises: (A) a polymer comprising (a1) alkali-soluble constitutional units each comprising an alicyclic group having both (i) a fluorine atom or a fluoroalkyl group and (ii) an alcoholic hydroxyl... | 09/04/2007 |
| 7261993 | Photoresists and processes for microlithography Positive photoresists and associated processes for microlithography in the ultraviolet (UV) and violet are disclosed. The photoresists comprise (a) a branched polymer containing protected acid groups and (b) at least one photoacid generator. The photoresists have hi... | 08/28/2007 |
| 7255971 | Positive resist composition A positive resist composition comprising the components of: (A) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation; (B) a resin that is insoluble or slightly soluble in alkalis, but becomes alkali-soluble under an ac... | 08/14/2007 |
| 7255973 | Positive resist compositions and patterning process A polymer comprising units derived from an exo-form ester and units derived from an ester having two hexafluoroisopropanol groups is used as a base resin to formulate a positive resist composition which, when exposed and developed by photolithography, is minimized i... | 08/14/2007 |
| 7244545 | Fluorinated compound, fluoropolymer and process for its production The present invention provides a fluorinated compound having functional groups in a high concentration so that adequate characteristics of the functional groups can be obtained and having high transparency in a wide wavelength region, a fluoropolymer, and a process ... | 07/17/2007 |
| 7241553 | Polymer, resist composition, and patterning process A chemically amplified resist composition using an alternating copolymer of α-trifluoroacrylic acid with norbornene as a base polymer lends itself to ArF laser lithographic micropatterning and is improved in transparency, plasma etching resistance, and line edge ro... | 07/10/2007 |
| 7235341 | Positive resist composition A positive resist composition comprising: (A) a compound capable of generating an acid on exposure to active light rays or a radiation; (B) a resin which is insoluble or sparingly soluble in an alkali and becomes alkali-soluble by an action of an acid; and (D) an ac... | 06/26/2007 |
| 7235344 | Energy harvesting molecules and photoresist technology A composition including a first moiety; and a different second moiety capable of harvesting energy from an external source, wherein the second moiety is positioned such that energy harvested at the second moiety may be transferred to the first moiety. An article of ... | 06/26/2007 |
| 7232648 | Photosensitive resin composition and coating film cured product thereof A photosensitive resin composition comprising a resin (A1) having fluorine atom-containing groups, silicon atom-containing groups and ethylenic double bonds, a radical initiator (B) and an alkali-soluble photosensitive resin (D) having at least three ethylenic doubl... | 06/19/2007 |
| 7232639 | Monomer having fluorine-containing acetal or ketal structure, polymer thereof, and chemical-amplification-type resist composition as well as process for formation of pattern with use of the same As a polymer exhibiting improved transparency which is suitable for a resist resin used in a chemical-amplification-type resist being applicable for photolithography using exposure light at 180 nm or shorter, this invention provides a polymer comprising a repeating ... | 06/19/2007 |
| 7217495 | Fluorinated polymers, photoresists and processes for microlithography Fluorinated polymers, photoresists and associated processes for microlithography are described. These polymers and photoresists are comprised of a fluoroalcohol functional group which simultaneously imparts high ultraviolet (UV) transparency and developability in ba... | 05/15/2007 |
| 7217496 | Fluorinated photoresist materials with improved etch resistant properties A photoresist composition including a polymer is disclosed, wherein the polymer includes at least one monomer having the formula: where R1 represents hydrogen (H), a linear, branched or cyclo alkyl gro... | 05/15/2007 |
| 7211366 | Photoresist composition for deep ultraviolet lithography The present invention relates to a photoresist composition comprising a photoacid generator and at least one polymer comprising at least one unit as described by structure 1, The invention also relates to a process... | 05/01/2007 |
| 7211365 | Negative photoresists for short wavelength imaging New negative-acting photoresist compositions are provided that are particularly useful for imaging at short wavelengths, particularly sub-200 nm wavelengths such as 193 nm. Resists of the invention provide contrast between exposed and unexposed coating layer regions... | 05/01/2007 |
| 7205086 | Multilayer elements containing photoresist compositions and their use in microlithography A photoresist element comprising a substrate; an etch resistant layer; and at least one photoresist layer prepared from a photoresist composition comprising a polymer selected from the group consisting of: (a) a fluorine-containing copolymer comprising a repeat unit... | 04/17/2007 |
| 7202011 | Photosensitive polymer including fluorine and resist composition containing the same Disclosed is a photosensitive polymer comprising pentafluoromethylvinyl ether derivative monomer having the formula: wherein R may be an alkoxy carbonyl, alkylsilane, a fluorine-substituted or unsubstituted C | 04/10/2007 |
| 7202010 | Chemical amplification type positive resist composition A chemical amplification type positive resist composition, which can reduce cost steeply without significantly decreasing basic abilities, is provided, and the chemical amplification type positive resist composition includes (A) a resin having a polymerization unit ... | 04/10/2007 |
| 7202014 | Stimulus-sensitive composition, compound and pattern formation method using the stimulation-sensitive composition A stimulus-sensitive composition comprising a compound (A) that generates one of an acid and a radical by external stimulation, the compound (A) having a specific structure. ... | 04/10/2007 |
