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| Number | Title | Issue Date |
| 7442488 | Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode There is provided a positive type photosensitive paste composition for a plasma display panel (PDP) electrode, including a conductive powder, an inorganic binder, and a photosensitive vehicle. The photosensitive vehicle includes an organic binder represented by form... | 10/28/2008 |
| 7442490 | Positive resist composition and pattern formation method using the positive resist composition A positive resist composition comprising: a resin which increases solubility in an alkali developing solution by an action of an acid and comprises a repeating unit containing a lactone structure and a cyano group and a repeating unit containing a first acid-decompo... | 10/28/2008 |
| 7435530 | Positive type resist composition and resist pattern formation method using same A positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycyclic group on an est... | 10/14/2008 |
| 7435529 | Photosensitive composition and image recording method using the same A photosensitive composition comprising: a sensitizing dye represented by the formula (I) defined herein, in which Z represents a substituted divalent linking group forming a 5-membered or 6-membered ring, provided that a total volume of substituents arranged on the... | 10/14/2008 |
| 7432034 | Negative resist composition A negative resist composition of the present invention comprises: (A) an alkali-soluble resin; (B-1) a cross-linking agent capable of cross-linking with the alkali-soluble resin (A) by the action of an acid, in which the cross-linking agent is a phenol compound cont... | 10/07/2008 |
| 7419759 | Photoresist composition and method of forming a pattern using the same The photoresist composition of the present invention includes a solvent mixture, a resin, a photo acid generator, and a quencher, the solvent mixture comprising a first solvent containing an ether compound and a second solvent having a polarity stronger than the fir... | 09/02/2008 |
| 7416832 | Positive resist composition A positive resist composition capable of forming a resist pattern having excellent shape is provided. This composition is a positive resist composition including a base resin component (A) and an acid generator component (B) generating an acid under exposure, which ... | 08/26/2008 |
| 7413843 | Sulfonamide compound, polymer compound, resist material and pattern formation method A base polymer of a resist material includes a unit represented by a general formula of the following Chemical Formula 3: wherein R1, R2 and R3 are the same or diffe... | 08/19/2008 |
| 7405028 | Polymers based on cinnamic acid as a bottom antireflective coating for 157 NM photolithography A bottom antireflective coating for photolithography at 157 nm or less, where the bottom antireflective coating includes a crosslinkable polymer which contains cinnamic acid derivatives. ... | 07/29/2008 |
| 7402379 | Resist exposure system and method of forming a pattern on a resist A resist exposure system and a method of forming a pattern on a resist are provided and include an exposure source, a photoresist composition, and a mask positioned therebetween. The resist composition comprises a first photoresist X and a second photoresist Y. The ... | 07/22/2008 |
| 7402376 | Photosensitive resin composition and photosensitive dry film containing the same A photosensitive resin composition which gives a dry film having a sand blast proof property and a development property in a well-balanced manner. A photosensitive resin composition containing a carboxy group-containing urethane (meth)acrylate compound having two or... | 07/22/2008 |
| 7402372 | Positive resist composition and method of forming resist pattern A positive resist composition includes a resin (A) that increases alkali solubility due to action of an acid, wherein the resin comprises a copolymer containing a first structural unit (a1) derived from hydroxystyrene, and a second structural unit (a2) derived from ... | 07/22/2008 |
| 7399573 | Method for using negative tone silicon-containing resist for e-beam lithography The negative resist compositions especially suitable for electron beam-based lithographic processes are obtained by using a polymeric component containing first silsesquioxane moieties functionalized with a first reactive group having a first crosslinking reactivity... | 07/15/2008 |
| 7396634 | Photosensitive composition A photosensitive composition comprising: a sensitizing dye represented by the following formula (1): in which A represents an optionally substituted aromatic ring or an optionally substituted hetero ring; X represents an ox... | 07/08/2008 |
| 7390612 | Positive type resist composition and resist pattern formation method using same There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycycl... | 06/24/2008 |
| 7390608 | Photoresists containing Si-polymers In a first aspect, silicon polymers are provided that have controlled ratio of silanol (Si—OH) moieties:Si atoms and/or a controlled amount of alkaline aqueous-solubilizing groups. Si-polymers of the invention are particularly useful as a photoresist resin compone... | 06/24/2008 |
| 7390609 | Polymers and photoresists comprising same New polymers are provided that have non-carbon tetravalent species (Si, Ti, Ge, Zr, Sn) and photoimageable compositions that contain such polymers. Preferred polymers are organic, e.g. one or more polymer repeat units comprise carbon atom(s). Particularly preferred ... | 06/24/2008 |
| 7378218 | Polymer, resist composition and patterning process A fluorinated polymer comprising recurring units of formulae (1a) to (1d) and having a Mw of 1,000-500,000 is provided. R1 is an acid labile group, R2 is a single bond or methylene, a1, a2, a3, and a4 are numbers from more than 0 to less than 1... | 05/27/2008 |
| 7374860 | Positive resist composition and pattern forming method using the same The invention provides a positive resist composition for the pattern formation by the use of actinic rays or radiation, ensuring that the sensitivity, resolution and pattern profile are good, the line edge roughness is small and the surface roughness is satisfied, a... | 05/20/2008 |
| 7371505 | Photosensitive composition and method for forming pattern using the same A positive working photosensitive composition which is useful in the manufacturing step of a semiconductor such as IC, the manufacture of a circuit board such as liquid crystals and thermal heads, and other fabrication steps and has an excellent resolution and line ... | 05/13/2008 |
| 7371503 | Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition A sulfonium salt compound excelling in transparency to deep ultraviolet rays at a wavelength of 220 nm or less, exhibiting well-balanced excellent performance such as sensitivity, resolution, pattern form, LER, and storage stability when used as a photoacid generato... | 05/13/2008 |
| 7364833 | Photoresist composition for organic layer of liquid crystal display, spin-less coating method thereof, fabrication method of organic layer pattern and liquid crystal display fabricated using the same The invention relates to a photoresist composition for an organic layer for a liquid crystal display, which may be used for a large-scale substrate, a spin-less coating method using the composition, a method for fabricating an organic layer pattern, and a liquid cry... | 04/29/2008 |
| 7364831 | Positive resist composition and resist pattern formation method A positive resist composition includes a resin component (A) whose alkaline solubility changes by an action of an acid, an acid generator component (B), and polypropylene glycol, wherein the component (A) includes a resin component (A1) including a constitutional un... | 04/29/2008 |
| 7358029 | Low activation energy dissolution modification agents for photoresist applications A photoresist composition including a polymer, a photoacid generator and a dissolution modification agent, a method of forming an image using the photoresist composition and the dissolution modification agent composition. The dissolution modification agent is insolu... | 04/15/2008 |
| 7358028 | Chemically amplified positive photo resist composition and method for forming resist pattern The present invention provides a chemical amplification type positive photoresist composition which is excellent in storage stability as a resist solution in a bottle. A novolak resin or a hydroxystyrenic resin is reacted with a crosslinking agent to give a slightly... | 04/15/2008 |
| 7351515 | Positive resist composition and pattern-forming method using the same A positive resist composition includes: (A) a resin capable of increasing a solubility thereof in an alkali developer by an action of an acid; (B) a compound capable of generating a sulfonic acid represented by the following formula (I) upo... | 04/01/2008 |
| 7344820 | Chemically amplified polymer having pendant group with dicyclohexyl and resist composition comprising the same The present invention relates to a chemically amplified polymer having a pendent group with dicyclohexyl bonded thereto, a process for the preparation thereof, and a resist composition comprising it, and more particularly, to a novel (meth)acrylic or norbornene carb... | 03/18/2008 |
| 7341817 | Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition A photosensitive composition comprising a compound capable of generating a specific sulfonic acid upon irradiation with actinic rays or a radiation; a compound capable of generating a specific sulfonic acid upon irradiation with an actinic ray or a radiation; and a ... | 03/11/2008 |
| 7341816 | Method of controlling the differential dissolution rate of photoresist compositions, polycyclic olefin polymers and monomers used for making such polymers A photoresist composition encompassing a polymer having at least one polycyclic olefin repeat unit having a desired exo mole percent is provided, where the repeat unit is derived from a polycyclic olefin monomer having the desired exo mole percent. Such polymers hav... | 03/11/2008 |
| 7341818 | Norbornene-type monomers and polymers containing pendent lactone or sultone groups The disclosed invention relates to novel norborne-type monomers containing pendent lactone or sultone groups. The invention also relates to norborne-type polymers and copolymers containing pendent lactone or sultone groups. These polymers and copolymers are useful i... | 03/11/2008 |
| 7338755 | Photosensitive composition and method for forming pattern using same The photosensitive composition of the invention contains a polymer material having a group having a structure represented by following general formula (2), and a photo acid generator generating acid with an ultraviolet ray or an ionizing radiation ... | 03/04/2008 |
| 7338745 | Multilayer imageable element with improved chemical resistance Positive-working imageable elements comprise a radiation absorbing compound and inner and outer layers on a substrate having a hydrophilic surface. The inner layer comprises a polymeric material that is removable using an alkaline developer and comprises a backbone ... | 03/04/2008 |
| 7335457 | Positive-tone radiation-sensitive resin composition A positive-tone radiation-sensitive resin composition containing an anthracene-based carboxylic acid component with low sublimation properties and excellent compatibility with other components is provided. The composition exhibits optimum controllability of radiatio... | 02/26/2008 |
| 7335458 | Chemically amplified positive resist composition and patterning process A chemically amplified positive resist composition is provided comprising (A) a resin containing acid labile groups other than acetal type which changes its solubility in an alkaline developer as a result of the acid labile groups being eliminated under the action o... | 02/26/2008 |
| 7335454 | Positive resist composition A positive resist composition comprising (A) a fluorine group-containing resin, which has a structure substituted with a fluorine atom in the main chain and/or side chain of polymer skeleton and a group that is decomposed by the action of an acid to increase solubil... | 02/26/2008 |
| 7329478 | Chemical amplified positive photo resist composition and method for forming resist pattern To provide a chemical amplification type positive photoresist composition, which has high sensitivity, high heat resistance and high resolution (high contrast) and is capable of suppressing an undulation phenomenon, and a method for formation of a resist pattern, a ... | 02/12/2008 |
| 7326514 | Organoelement resists for EUV lithography and methods of making the same Resist compositions containing silicon, boron, or both silicon and boron may be used with ultra-violet lithography processes and extreme ultra-violet (EUV) lithography processes to increase the reactive ion etch resistance of the resist compositions, improve transmi... | 02/05/2008 |
| 7326510 | Polycarbocyclic derivatives for modification of resist, optical and etch resistance properties Mixed carbocycle derivatives containing at least two carbocycles per molecule from the group of anthracenes, adamantanes and steroids with functionalized carbon chains are synthesized and used as modifiers of resist properties and especially etch resistance enhancem... | 02/05/2008 |
| 7326518 | Photoresist compositions Chemically-amplified positive photoresist compositions are provided that contain a resin that comprises acetal and alicyclic groups. Photoresists of the invention can exhibit notably enhanced lithographic properties. Preferred photoresists of the invention comprise ... | 02/05/2008 |
| 7326515 | Positive type resist composition and resist pattern formation method using same There is provided a positive type resin composition comprising (A) a resin component comprising within the principal chain a structural unit derived from a (meth)acrylate ester and incorporating an acid dissociable, dissolution inhibiting group containing a polycycl... | 02/05/2008 |
