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Dining Table Having Integral Dishwasher
A space-saving dishwasher, which may be installed within a counter top or table, having a dish-carrying rack that is vertically shiftable through the open top of the dishwasher for facilitating loading and unloading of the dishes.
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| Number | Title | Issue Date |
| 8114556 | Photomask blank and production method thereof, and photomask production method, and semiconductor device production method There are provided a photomask blank which is capable of preventing static buildup caused by electron beam pattern drawing for forming a resist pattern, a photomask blank which provides a good pattern accuracy through optimization of the dry etching rate along the d... | 02/14/2012 |
| 8114557 | Method for optical proximity correction Provided is a method for optical proximity correction for use in manufacturing highly resolved semiconductor chips. The method includes setting a target layout; setting a peculiar area; sorting the peculiar area from the target layout; generating a marking layer; re... | 02/14/2012 |
| 8112726 | Phase-shifting masks with sub-wavelength diffractive optical elements The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a first characteristic linear dimension that is 15% or less of a wavelength... | 02/07/2012 |
| 8110321 | Method of manufacture of damascene reticle A method for manufacturing an optical projection reticle employs a damascene process. First feature recesses are etched into a projection reticle mask plate which is transmissive or transparent. Then feature recesses are tilled with a radiation transmissivity modify... | 02/07/2012 |
| 8110323 | Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film The present invention provides an optically semitransmissive film that has a near-zero phase shift, has a desired transmissivity, and is relatively thin; a novel phase-shift mask that uses the optically semitransmissive film; a photomask blank that can [be used to] ... | 02/07/2012 |
| 8110322 | Method of mask forming and method of three-dimensional microfabrication The invention provides a method for forming a selective mask on a surface of a layer of AlXGaYIn1-X-YAsZP1-Z or AlXGaYIn1-X-YNZAs1-Z (0≦X≦1, 0≦Y≦1, ... | 02/07/2012 |
| 8108804 | Short path customized mask correction Embodiments of the present invention provide a method of performing photo-mask correction. The method includes identifying a hot-spot in a photo-mask that violates one or more predefined rules; creating a window area in the photo-mask that surrounds the hot spot; ca... | 01/31/2012 |
| 8105735 | Reflective mask blank for EUV lithography and reflective mask for EUV lithography To provide an EUV mask of which a decrease in the contrast of reflected light at the mask pattern boundary, particularly a decrease in the contrast of reflected light at the boundary on the mask pattern outer edge, is suppressed, and an EUV mask blank to be used for... | 01/31/2012 |
| 8105734 | Titania-doped quartz glass member and making method In a titania-doped quartz glass member having a surface where EUV light of up to 70 nm wavelength is reflected, a refractive index distribution in the surface has only one extreme point within a central 80% region of the member. The titania-doped quartz glass member... | 01/31/2012 |
| 8108806 | Contrast-based resolution enhancement for photolithographic processing A contrast-based resolution enhancing technology (RET) determines a distribution of contrast values for edge fragments in a design layout or portion thereof. Resolution enhancement is applied to the edge fragments in a way that increases the number of edge fragments... | 01/31/2012 |
| 8101324 | Photomask manufacturing method, photomask manufacturing apparatus and photomask A photomask manufacturing method which includes generating data of a main pattern to be transferred onto a substrate, and data of an assist pattern which is arranged adjacent to the main pattern and which assists the transfer of the main pattern without being transf... | 01/24/2012 |
| 8092959 | Means for transferring a pattern to an object A template (10) having a first surface (13, 14), usable for transferring a pattern of the first surface to an object (20) having a second surface (23) covered by a light-sensitive coating (22), by contacting the patterned first sur... | 01/10/2012 |
| 8092960 | Exposing mask and production method therefor and exposing method An exposure mask forms a three-dimensional shape in simple structure and obtainable sufficient number of gray scales by exposure. In an exposure mask (M) for use in an exposure apparatus (S), the present invention is provided such that a plurality of pattern blocks ... | 01/10/2012 |
| 8095895 | Method for defect diagnosis and management A method for defect diagnosis and management, which is implemented in a process for fabricating an article, comprising the following steps: obtaining an inspection image of the article, wherein the inspection image shows at least one defect of the article; retrievin... | 01/10/2012 |
| 8095897 | Methods and systems for layout and routing using alternating aperture phase shift masks A method of laying out features for alternating aperture phase shift masks. The method includes defining features on a grid of a uniform basic pitch, orienting the features such that those of the features defined, at least in part, by phase shifting shapes are orien... | 01/10/2012 |
| 8092958 | Mask and method for patterning a semiconductor wafer A mask and method for patterning a semiconductor wafer is disclosed. A mask set is fabricated on a transparent substrate. A mask layer comprising mask region elements that transmit light is disposed on the substrate, wherein each mask element is segmented into a plu... | 01/10/2012 |
| 8088538 | Reflective mask blank for EUV lithography Provision of a reflective mask blank for EUV lithography having an absorber layer which has a low reflectance in the wavelength regions of EUV light and pattern inspection light and whose film composition and film thickness are easily controllable to desired ones. | 01/03/2012 |
| 8088545 | Production apparatus and production method of wired member using electrophotographic method Disclosed is a production apparatus of a wired member, including: a mask forming unit that forms a mask on a transfer substrate by using a toner in accordance with an electrophotographic method so as to be transferable to a member to be wired, the mask corresponding... | 01/03/2012 |
| 8084169 | Dual metric OPC A technique for creating mask layout data to print a desired pattern of features via a photolithographic process includes defining one or more subresolution assist features (SRAFs) and performing OPC on printing features and the added SRAF features. ... | 12/27/2011 |
| 8086973 | Pattern management method and pattern management program A pattern management method includes extracting patterns having process margins equal to or below a predetermined value from a chip layout of an integrated circuit, screening a plurality of types of representative patterns from the extracted pattern, extracting patt... | 12/27/2011 |
| 8080349 | Exposure mask and method for manufacturing semiconductor device using the same A method for manufacturing a semiconductor device comprises performing an exposing and developing process using an exposure mask including shading patterns and assistant patterns arranged in parallel to the shading patterns to prevent a scum phenomenon generated whe... | 12/20/2011 |
| 8078995 | Efficient isotropic modeling approach to incorporate electromagnetic effects into lithographic process simulations Modeling of lithographic processes for use in the design of photomasks for the manufacture of semiconductor integrated circuits, and particularly to the modeling of the complex effects due to interaction of the illuminating light with the mask topography, is provide... | 12/13/2011 |
| 8078996 | Method and system for correcting a mask pattern design A pattern verification method includes preparing a desired pattern and a mask pattern forming the desired pattern on a substrate, defining at least one evaluation point on an edge of the desired pattern, defining at least one process parameter to compute the transfe... | 12/13/2011 |
| 8074188 | Method for designing mask including forming a mesh dummy pattern A method for designing a mask is disclosed. A chip region can be defined and reduced to form a parent dummy pattern. A mesh dummy pattern can be formed, and portions where the parent dummy pattern and the mesh dummy pattern overlap each other can be removed to form ... | 12/06/2011 |
| 8071264 | Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask A method of forming a pattern including a first pattern portion having a first minimum dimension and a second pattern portion having a second minimum dimension includes a first exposure step of performing exposure using a Levenson-type mask and a second exposure ste... | 12/06/2011 |
| 8071262 | Reticles with subdivided blocking regions An attenuated phase shift reticle, or photomask, includes radiation blocking regions that are subdivided, by cut lines, into discrete, spaced apart sections with dimensions (e.g., surface area, etc.) that are configured to minimize or eliminate the buildup of electr... | 12/06/2011 |
| 8071263 | Reflective mask and manufacturing method for reflective mask A reflective mask comprising: a reflective layer that is arranged on a surface on a side on which EUV light is irradiated and reflects the EUV light; a buffer layer containing Cr that is arranged on a side of the reflective layer on which the EUV light is irradiated... | 12/06/2011 |
| 8071261 | Lithography masks and methods of manufacture thereof Lithography masks and methods of manufacture thereof are disclosed. For example, a method of manufacturing a lithography mask includes forming a stack over a substrate. The stack includes bottom attenuated phase shift material layers, intermediate opaque material la... | 12/06/2011 |
| 8067132 | Photomask and exposure method To provide a photomask capable of preventing a foreign matter generation in using the photomask, and an exposure method using this photomask. The photomask includes a transparent substrate 2; a transfer pattern 4 formed in a main region 3 of a c... | 11/29/2011 |
| 8067133 | Phase shift mask with two-phase clear feature Systems and methods are provided for use in photolithography. In one embodiment, a reticle is provided that comprises a phase shift and transmission control layer, wherein a gap in the phase shift and transmission control layer defines a line. Adjacent to the phase ... | 11/29/2011 |
| 8062812 | Image mask and image mask assembly An image mask and image mask assembly. The image mask includes a glass substrate having a thickness of less than 2 mm and a patterned mask disposed on a surface of the glass substrate. The image mask assembly includes a transparent backer plate coupled to the glass ... | 11/22/2011 |
| 8062813 | Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography In the field of semiconductor device production, a method for manufacturing a surface using two-dimensional dosage maps is disclosed. A set of charged particle beam shots for creating an image on the surface is determined by combining dosage information such as dosa... | 11/22/2011 |
| 8062814 | Optical compensation devices, systems, and methods Photolithographic apparatus, systems, and methods that make use of optical compensation devices are disclosed. In various embodiments, an imaging mask includes an optically transmissive substrate. A first patterned region is formed on the substrate, and a second pat... | 11/22/2011 |
| 8062811 | Mask for manufacturing TFT, TFT, and manufacturing thereof A mask comprises a channel region half-exposure mask structure, a drain mask structure, and a source mask structure, wherein the channel region half-exposure mask structure comprises a channel region peripheral half-exposure mask structure, which extends from a port... | 11/22/2011 |
| 8065638 | Incremental concurrent processing for efficient computation of high-volume layout data Some embodiments of the present invention overcome I/O bottlenecks of an EDA work flow by keeping layout data distributed during handoffs among different processing stages. Specifically, some embodiments leverage a concurrent computation paradigm where data is propa... | 11/22/2011 |
| 8062810 | Method of correcting a mask pattern and method of manufacturing a semiconductor device The method of manufacturing a semiconductor device has deciding an amount of a correction of a mask pattern for a size of an active region of a semiconductor substrate, correcting the mask pattern on the basis of the decided amount of the correction, and exposing a ... | 11/22/2011 |
| 8065636 | System and method for creating a focus-exposure model of a lithography process A system and a method for creating a focus-exposure model of a lithography process are disclosed. The system and the method utilize calibration data along multiple dimensions of parameter variations, in particular within an exposure-defocus process window space. The... | 11/22/2011 |
| 8057968 | Mask and method to pattern chromeless phase lithography contact hole A method of making a mask is disclosed. The method includes providing a first and a second mask layers and disposing a first phase shift region on the first mask layer. A second phase shift region is disposed on the second mask layer, wherein the first and second ph... | 11/15/2011 |
| 8057965 | Mask and method of fabricating the same The invention relates to a mask and a method of fabricating the same. When a mask pattern is formed using E-Beam, the size of the divisional region obtained by a fracturing process can not be formed equally. Therefore, the uniformity of the mask pattern is degraded.... | 11/15/2011 |
| 8057963 | Maskless vortex phase shift optical direct write lithography The present invention provides methods and apparatus for accomplishing a optical direct write phase shift lithography. A lithography system and method are provided wherein a mirror array is configured to generate vortex phase shift optical patterns that are directed... | 11/15/2011 |
