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...Daniel Webster invented a "bull plow" to pull out tree stumps. It didn't catch on because it was huge and required four oxen to pull it!
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| Number | Title | Issue Date |
| 8071279 | Plane waves to control critical dimension The present invention describes an aperture including: an opaque plate; two sliver openings located in the opaque plate, the two sliver openings having rectangular shapes, the two sliver openings being parallel to each other. The present invention further des... | 12/06/2011 |
| 8003311 | Integrated circuit system employing multiple exposure dummy patterning technology An integrated circuit system that includes: providing a substrate coated with a photoresist material; exposing the photoresist material to an energy source through a first mask to form a first substrate feature and a second substrate feature therein; and exposing th... | 08/23/2011 |
| 7932020 | Contact or proximity printing using a magnified mask image Improvements in the fabrication of integrated circuits are driven by the decrease of the size of the features printed on the wafers. Current lithography techniques limits have been extended through the use of phase-shifting masks, off-axis illumination, and proximit... | 04/26/2011 |
| 7927783 | Tunable lithography with a refractive mask A method includes exposing a first photoresist layer through a refractive mask to form a first pattern of above-threshold exposure spots in the first layer and exposing a second photoresist layer through the same mask to form a second pattern of above-threshold expo... | 04/19/2011 |
| 7879538 | Frequency division multiplexing (FDM) lithography Systems and methods for generating an image are provided. These systems and methods include generating multiple light beams from a light source by controlling at least one parameter of the light source to be different among each of the multiple light beams. The syst... | 02/01/2011 |
| 7855048 | Wafer assembly having a contrast enhancing top anti-reflecting coating and method of lithographic processing A method of fabricating a semiconductor device using lithography. The method can include providing a wafer assembly having a layer to be processed disposed under a photo resist layer and illuminating the wafer assembly with an exposure dose transmitted through a bir... | 12/21/2010 |
| 7846649 | High resolution printer and a method for high resolution printing The invention provides a method and printer for printing an image that comprises at least one group of highly dense shapes, the method including: (i) determining multiple intermediate schemes such as to allow printing corresponding intermediate images on an object; ... | 12/07/2010 |
| 7799517 | Single/double dipole mask for contact holes A method of forming a feature on a device is disclosed. A photo resist layer is formed over the device and a dipole illuminator having a pole orientation axis in a first direction is used to expose a first geometrical pattern onto the resist layer. The first geometr... | 09/21/2010 |
| 7527920 | Active hardmask for lithographic patterning In an implementation, energy reaching the lower surface of a photoresist may be redirected back into the photoresist material. This may be done by, for example, reflecting and/or fluorescing the energy from a hardmask provided on the wafer surface back into the phot... | 05/05/2009 |
| 7442477 | Exposing apparatus and exposing method, for maskless exposure of substrate to be exposed, and plotter and plotting method for directly plotting on object to be plotted An exposing apparatus for irradiating desired spots on a substrate to be exposed relatively moving with respect to two or more light sources arranged along the direction of the relative movement to form a desired exposure pattern using the light sources comprises a ... | 10/28/2008 |
| 7439001 | Focus blur measurement and control method A method for optimizing imaging and process parameter settings in a lithographic pattern imaging and processing system is disclosed. The method includes correlating the dimensions of a first set of at least one control pattern printed in a lithographic resist layer,... | 10/21/2008 |
| 7435535 | Method for forming patterned insulating elements and methods for making electron source and image display device A method for forming patterned insulating elements on a substrate includes a plurality of exposure steps of exposing a photosensitive paste provided on the substrate through at least one mask having a predetermined pattern; a developing step of developing the expose... | 10/14/2008 |
| 7415694 | Graph based phase shift lithography mapping method and apparatus For phase-shifting micro lithography, a method of assigning phase to a set of shifter polygons in a mask layer separated by a set of target features includes assigning a first phase to a first shifter polygon, identifying a set of target features that touch the firs... | 08/19/2008 |
| 7410736 | Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones A method and system are provided for forming a pattern within an area of a photosensitive surface. An exemplary method includes performing a first exposure of the photosensitive surface in accordance with predetermined image data, wherein the first exposure occurs d... | 08/12/2008 |
| 7402378 | Exposure method and apparatus There is provided an exposure method that includes the steps of forming a phase shift mask having a desired pattern and a cyclic dummy pattern overlaid onto the desired pattern, a part of the desired pattern to be resolved by effects of the dummy pattern being thick... | 07/22/2008 |
| 7399559 | Optical proximity correction method utilizing phase-edges as sub-resolution assist features A photolithography mask for optically transferring a pattern formed in the mask onto a substrate and for negating optical proximity effects. The mask includes a plurality of resolvable features to be printed on the substrate, and at least one non-resolvable optical ... | 07/15/2008 |
| 7389930 | Mask management method and bar code reading apparatus thereof A mask management and bar code reading apparatus thereof are disclosed. The mask management method comprises providing a bar code reading apparatus, scanning a mask bar code on the mask by the bar code reading apparatus, transferring scanned information to a mask ma... | 06/24/2008 |
| 7388216 | Pattern writing and forming method A pattern forming method is proposed for easy correction of a pattern-size variation occurring in an etching process. An energy beam is radiated onto a resist-applied target while the energy beam is adjusted to correct the pattern-size variation occurring in the etc... | 06/17/2008 |
| 7385209 | Micromachining process, system and product Ion beam lithography technique wherein a higher amount of radiation energy is deposited to predetermined regions in the bulk if a suitable substrate. By selecting the radiation nature, its energy and the irradiation parameters a structure can be created in the bulk ... | 06/10/2008 |
| 7382959 | Optically oriented three-dimensional polymer microstructures A method and system of creating one or more waveguides and/or patterning these waveguides to form a 3D microstructure that uses mask and collimated light. In one embodiment, the system includes at least one collimated light source selected to produce a collimated li... | 06/03/2008 |
| 7374866 | System and method for exposure of partial edge die According to one embodiment of the present invention, a method of forming a semiconductor device includes forming a photoresist layer on a surface of a wafer. The wafer includes an array of die that includes a plurality of complete die and at least one partial edge ... | 05/20/2008 |
| 7371510 | Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist pattern Provided are a material for forming a resist protecting film which is for use in a liquid immersion lithography process and which is formed on a resist film, wherein the material has the following properties of: being transparent with respect to exposure light; havi... | 05/13/2008 |
| 7372548 | Levitated reticle-masking blade stage A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with res... | 05/13/2008 |
| 7371301 | Multilayer security document and method for the production thereof A multilayer security document is proposed, wherein a printable carrier material (30) is connected to at least one at least partially transparent outer film or one at least partially transparent outer film composite (10). A photopolymer layer composite... | 05/13/2008 |
| 7359037 | Drive for reticle-masking blade stage A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with res... | 04/15/2008 |
| 7358035 | Topcoat compositions and methods of use thereof A topcoat composition that includes a fluorine-containing polymer and a casting solvent selected from the group consisting of α,α,α-trifluorotoluene, 2,2,3,3,4,4,5,5-octafluoropentyl-1,1,2,2-tetrafluoroethyl ether (OFP-TFEE), and a mixture consisting of a hydroph... | 04/15/2008 |
| 7354695 | Producing a substrate having high surface-area texturing A method is provided for preparing high surface-area texturing of a substrate using methods by which material from a substrate is subtracted from or added to the surface of the substrate. In one embodiment, the method is a subtractive lithographic method that involv... | 04/08/2008 |
| 7351523 | Photographic materials having improved keeping properties The use of a red-sensitising trinuclear merocyanine dye and an osmium dopant according to formula (I): [Os(NZ)L5]r wherein Z is sulphur or oxygen, L is a ligand and r is 0, −1, −2 or −3, in photographic silver halide emulsions for use in ... | 04/01/2008 |
| 7349068 | Lithographic apparatus and device manufacturing method A system and method are provided including different moveable lenses within a projection system that can be placed in the path of a radiation beam to change a magnification of the projection system. By changing the magnification of the projection system an area of a... | 03/25/2008 |
| 7329481 | Substrate optical waveguides having fiber-like shape and methods of making the same Substrate optical waveguides having curved major surfaces and methods for making the same are disclosed. In one exemplary embodiment, a photosensitive cladding layer is pattern exposed to actinic radiation through a first gray-scale mask and subsequently developed t... | 02/12/2008 |
| 7326442 | Antireflective composition and process of making a lithographic structure An antireflective composition and a lithographic structure comprising a silicon-metal oxide, antireflective material derived from the composition. The antireflective composition comprises a polymer of formula I, | 02/05/2008 |
| 7320856 | Manufacturing method of pattern formed body A main object of the present invention is to provide a manufacturing method of a plurality of pattern formed bodies which makes it possible that even if the pattern formed bodies are continuously manufactured, their property varied patterns are each made into a targ... | 01/22/2008 |
| 7312020 | Lithography method A lithography method for forming a plurality of patterns in a photoresist layer. A phase shift mask including a plurality of transparent main features, a plurality of first phase shift transparent regions, and a plurality of second phase shift transparent regions is... | 12/25/2007 |
| 7300825 | Customizing back end of the line interconnects Custom connections between pairs of copper wires in a last damascene wiring level are effected by creating openings in an overlying insulating layer which span a distance between portions of the two wires, then filling the openings with aluminum. The openings can be... | 11/27/2007 |
| 7289191 | Illumination optical system, and image display apparatus and image exposure apparatus using the same The illumination optical system includes an illumination light source and a spatial light modulator having a plurality of elements which reflect incident light from the illumination light source to form outgoing light and which flexibly switch a deflecting direction... | 10/30/2007 |
| 7288366 | Method for dual damascene patterning with single exposure using tri-tone phase shift mask A reticle structure and a method of forming a photoresist profile on a substrate using the reticle having a multi-level profile. The reticle comprises (1) a transparent substrate, (2) a partially transmitting 180 degree phase shift film overlying predetermined areas... | 10/30/2007 |
| 7282706 | Advanced optics for rapidly patterned laser profiles in analytical spectrometry The present invention is directed to a novel arrangement of optical devices for the rapid patterning of laser profiles used for desorption and/or ionization sources in analytical mass spectrometry. Specifically, the new optical arrangement provides for a user-define... | 10/16/2007 |
| 7282309 | Photomask, method for producing the same, and method for forming pattern using the photomask A photomask includes a semi-light-shielding portion having a light-shielding property, a light-transmitting portion surrounded by the semi-light-shielding portion and a peripheral portion positioned in a periphery of the light-transmitting portion on a transparent s... | 10/16/2007 |
| 7279253 | Near-field light generating structure, near-field exposure mask, and near-field generating method A near-field exposure mask includes a mask base material and a light blocking layer formed on the base material, the light blocking layer includes a fine metal structure or fine opening formed in the light blocking layer. The size of the metal structure or the size ... | 10/09/2007 |
| 7270921 | Pattern writing and forming method A pattern forming method is proposed for easy correction of a pattern-size variation occurring in an etching process. An energy beam is radiated onto a resist-applied target while the energy beam is adjusted to correct the pattern-size variation occurring in the etc... | 09/18/2007 |
