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| Number | Title | Issue Date |
| 8445185 | Method of manufacturing piezoelectric vibrating reed, piezoelectric vibrating reed, piezoelectric vibrator, oscillator, electronic apparatus, and radio-controlled timepiece There are provided a method of manufacturing a piezoelectric vibrating reed capable of improving the reliability of a product by sorting out a defective product correctly, a piezoelectric vibrating reed, a piezoelectric vibrator having a piezoelectric vibrating reed... | 05/21/2013 |
| 8399182 | Method of fabricating liquid crystal display device A method of fabricating a transflective type liquid crystal display device includes: forming gate and data lines with a gate insulating layer therebetween on a substrate and crossing each other to define a pixel region that includes a switching region, a reflective ... | 03/19/2013 |
| 8288081 | Method and system for exposure of a phase shift mask The present disclosure provides a method of making a mask. The method includes providing a substrate having a first attenuating layer on the substrate and a first imaging layer on the first attenuating layer; performing a first exposure to the first imaging layer us... | 10/16/2012 |
| 8252516 | Manufacturing a narrow track read head Embodiments of the invention operate to narrow the track width of a read head used in a disk drive. In one embodiment, a magnetic read head has a track width of about 40 nm or less. The read head is fabricated by a method that includes fabricating a film stack from ... | 08/28/2012 |
| 8178287 | Photoresist composition and method of forming a resist pattern A resist material utilized in photolithography patterning includes a first material, and a second material dispersed in the first material. The second material is capable of diffusing to a top surface of the resist material, and has an etch rate different from that ... | 05/15/2012 |
| 8168374 | Method of forming a contact hole A method of forming a contact hole is provided. A pattern is formed in a photo resist layer. The pattern is exchanged into a silicon photo resist layer to form a first opening. Another pattern is formed in another photo resist layer. The pattern is exchanged into a ... | 05/01/2012 |
| 7989147 | Method for fabricating liquid crystal display device Disclosed is a method for fabricating a liquid crystal display device comprising: providing a first substrate having a pixel portion and a pad portion; sequentially laminating a gate insulating layer, a semiconductor layer and a first conductive layer on the first s... | 08/02/2011 |
| 7910289 | Use of dual mask processing of different composition such as inorganic/organic to enable a single poly etch using a two-print-two-etch approach In accordance with the invention, there are methods of making an integrated circuit, an integrated circuit device, and a computer readable medium. A method can comprise forming a first layer over a semiconductor substrate, forming a first mask layer over the semicon... | 03/22/2011 |
| 7799512 | Method for forming ring pattern A method for forming a ring pattern is disclosed. The ring pattern has a first wall and a second wall. The method includes the following steps: (a) providing a substrate; (b) forming a dielectric layer on the substrate; (c) forming a first patterned photoresist laye... | 09/21/2010 |
| 7790360 | Methods of forming multiple lines Some embodiments include formation of polymer spacers along sacrificial material, removal of the sacrificial material, and utilization of the polymer spacers as masks during fabrication of integrated circuitry. The polymer spacer masks may, for example, be utilized ... | 09/07/2010 |
| 7419763 | Near-field exposure photoresist and fine pattern forming method using the same A near-field photoresist for formation of a fine pattern with by near-field exposure includes an alkali-soluble novalac resin, a diazyde-type photosensitizer which is photoreactive by near-field exposure, a photoacid generator which generates acid by the near-field ... | 09/02/2008 |
| 7396475 | Method of forming stepped structures employing imprint lithography The present invention provides a method for forming a stepped structure on a substrate that features transferring, into the substrate, an inverse shape of the stepped structure disposed on the substrate. ... | 07/08/2008 |
| 7384728 | Method of fabricating a semiconductor device A method of fabricating a semiconductor device. A first organic layer, a silicon-containing sacrificial layer, and a second organic layer are sequentially formed on a substrate. A photolithography process is performed for forming a predetermined pattern in the secon... | 06/10/2008 |
| 7380320 | Piezoelectric device and method of manufacturing the device A piezoelectric device includes a substrate, a buffer layer on the substrate, a lower electrode layer on the buffer layer, a piezoelectric layer on the lower electrode layer, and an upper electrode layer on the piezoelectric layer. The piezoelectric layer has a base... | 06/03/2008 |
| 7371636 | Method for fabricating storage node contact hole of semiconductor device A method for fabricating a storage node contact hole of a semiconductor device includes: forming an inter-layer insulation layer over a substrate; forming a hard mask over the inter-layer insulation layer; etching the inter-layer insulation layer to form a storage n... | 05/13/2008 |
| 7371507 | Methods for fabricating semiconductor devices Methods for fabricating semiconductor devices are disclosed. A disclosed method comprises: forming a conductive layer, depositing a interlayer dielectric layer, forming an anti-reflective coating layer on the interlayer dielectric layer, forming a photoresist patter... | 05/13/2008 |
| 7371485 | Multi-step process for etching photomasks Method and apparatus for etching a metal layer disposed on a substrate, such as a photolithographic reticle, are provided. In one aspect, a method is provided for processing a photolithographic reticle including positioning the reticle on a support member in a proce... | 05/13/2008 |
| 7365408 | Structure for photolithographic applications using a multi-layer anti-reflection coating A bi-layer anti-reflective coating for use in photolithographic applications, and specifically, for use in ultraviolet photolithographic processes. The bi-layered anti-reflective coating is used to minimize pattern distortion due to reflections from neighboring feat... | 04/29/2008 |
| 7364832 | Wet developable hard mask in conjunction with thin photoresist for micro photolithography A novel process for using a hard mask or protective layer in conjunction with an extremely thin photoresist is provided. In this process, a thin film of the protective layer is coated on the surface of a substrate that is to be selectively modified by reactive ion e... | 04/29/2008 |
| 7361453 | Method for creating a pattern in a material and semiconductor structure processed therewith A method of manufacturing a semiconductor device with precision patterning is disclosed. A structure of a small dimension is created in a material, such as a semiconductor material, using a first and a second pattern, the patterns being identical but displaced over ... | 04/22/2008 |
| 7355813 | Method of fabricating a narrow projection such as a write pole extending from a substrate An article is formed as a substrate having a projection extending outwardly therefrom. The article may be a magnetic recording head and the projection a write pole. The projection has a width in a thinnest dimension measured parallel to a substrate surface of no mor... | 04/08/2008 |
| 7351519 | Patterning of indium-tin oxide (ITO) for precision-cutting and aligning a liquid crystal display (LCD) panel A method of improved patterning of indium-tin oxide (ITO) for precision-cutting and aligning a liquid crystal display (LCD) panel includes depositing a transparent ITO layer upon a transparent substrate, depositing a non-transparent plating layer upon the transparen... | 04/01/2008 |
| 7352431 | Liquid crystal display and manufacturing method thereof A method of manufacturing a liquid crystal display panel is provided, which includes: coating a negative organic photoresist on a substrate; performing divisional light exposure with a plurality of shots including first and second shots adjacent to each other; and d... | 04/01/2008 |
| 7348133 | Method of manufacturing solid-state image sensing device The invention provides a manufacturing method of a solid-state image sensing device where light-receiving sensitivity is improved. The manufacturing method of the solid-state image sensing device of the invention has forming an insulating film on a light-receiving r... | 03/25/2008 |
| 7344825 | Method of fabricating semiconductor device, and developing apparatus using the method In a resist pattern forming method in which bake processing is performed at a temperature not lower than a glass transition temperature in order to obtain the desired sidewall angle, resist removable is difficult. Accordingly, in the resist pattern forming method of... | 03/18/2008 |
| 7335517 | Multichip semiconductor device, chip therefor and method of formation thereof A multichip semiconductor device is disclosed in which chips are stacked each of which comprises a semiconductor substrate formed on top with circuit components and an interlayer insulating film formed on the top of the semiconductor substrate. At least one of the c... | 02/26/2008 |
| 7335585 | Method for preventing the formation of a void in a bottom anti-reflective coating filling a via hole A method for manufacturing a semiconductor device which, on performing a via first Dual Damascene process, inhibits or prevents the formation of a void in a bottom anti-reflective coating filling a via hole. The method typically includes the steps of forming a botto... | 02/26/2008 |
| 7328418 | Iso/nested control for soft mask processing This method includes a method for etch processing that allows the bias between isolated and nested structures/features to be adjusted, correcting for a process wherein the isolated structures/features need to be smaller than the nested structures/features and wherei... | 02/05/2008 |
| 7323292 | Process for using photo-definable layers in the manufacture of semiconductor devices and resulting structures of same A process and related structure are disclosed for using photo-definable layers that may be selectively converted to insulative materials in the manufacture of semiconductor devices, including for example dynamic random access memories (DRAMs), synchronous DRAMs (SDR... | 01/29/2008 |
| 7320855 | Silicon containing TARC/barrier layer A top anti-reflective coating material (TARC) and barrier layer, and the use thereof in lithography processes, is disclosed. The TARC/barrier layer may be especially useful for immersion lithography using water as the imaging medium. The TARC/barrier layer comprises... | 01/22/2008 |
| 7318992 | Lift-off positive resist composition A lift-off positive resist composition capable of forming a fine lift-off pattern is provided. This composition comprises a base resin component (A) and an acid generator component (B) generating an acid under exposure, wherein the base resin component (A) is a sili... | 01/15/2008 |
| 7317227 | Method for forming pattern of stacked film A semiconductor film serving as an active region of a thin film transistor and an upper oxide film protecting the semiconductor film are dry etched to form the active region. In this case, a fluorine-based gas is used as the etching gas, and the etching gas is switc... | 01/08/2008 |
| 7312113 | Method of forming source/drain region of semiconductor device A method of forming a source/drain region of a semiconductor device includes forming a photoresist pattern through which an NMOS region of a semiconductor substrate is exposed, and then performing an ion implant process to form NMOS LDD regions in the semiconductor ... | 12/25/2007 |
| 7306742 | Patterning method, patterning apparatus, patterning template, and method for manufacturing the patterning template A template 1 is brought close to or in contact with a surface to be patterned 111 and patterns are formed with liquid 62 on the surface 111. This method comprises the steps of: bringing the template 1 close to or essentially in con... | 12/11/2007 |
| 7303855 | Photoresist undercoat-forming material and patterning process An undercoat-forming material comprising a novolak resin having a fluorene or tetrahydrospirobiindene structure, an organic solvent, an acid generator, and a crosslinker, optionally combined with an intermediate layer having an antireflective effect, has an absorpti... | 12/04/2007 |
| 7303860 | System and method for performing multi-resolution lithography A micro-fabricated structure and method of forming a micro-fabricated structure are disclosed. The method includes the steps of forming a first pattern in a first photo-resist, transferring the first pattern in the first photo-resist to a mask layer, forming a secon... | 12/04/2007 |
| 7304821 | Magnetic head coil structure and method for manufacturing the same A Damascene process is provided for manufacturing a coil structure for a magnetic head. During the manufacturing process, an insulating layer is initially deposited after which a photoresist layer is deposited. A silicon dielectric layer is then deposited on the pho... | 12/04/2007 |
| 7297468 | Method for forming a structure element on a wafer by means of a mask and a trimming mask assigned hereto A method for forming a structure element in a layer arranged on a wafer by a trimming mask set, a developing step, and an etching step for the transfer of the structure pattern are carried out between the exposure steps carried out by the masks. Consequently, edges ... | 11/20/2007 |
| 7291446 | Method and system for treating a hard mask to improve etch characteristics During pattern transfer to a film stack, the hard mask layer, such as a tunable etch resistant antireflective coating (TERA), is consumed when etching the underling layer(s), leading to reduced etch performance and potential damage to the underlying layer(s), such a... | 11/06/2007 |
| 7291285 | Method and system for line-dimension control of an etch process A method and system for controlling a dimension of an etched feature. The method includes: measuring a mask feature formed on a top surface of a layer on a substrate to obtain a mask feature dimension value; and calculating a mask trim plasma etch time based on the ... | 11/06/2007 |
