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| Number | Title | Issue Date |
| 7381506 | Reimageable paper An image forming medium includes a substrate and a mixture including a photochromic material and a solvent wherein the mixture is coated on the substrate, such that the photochromic material exhibits a reversible homogeneous-heterogeneous transition between a colorl... | 06/03/2008 |
| 7371606 | Manufacturing method of a semiconductor device The yield of a sealing process for a semiconductor device which adopts a flip-chip mounting method is to be improved. In a molding process wherein plural semiconductor chip ICs mounted on a parts mounting surface of a substrate matrix through bump electrodes are to ... | 05/13/2008 |
| 7368343 | Low leakage MIM capacitor Capacitor structures for use in integrated circuits and methods of their manufacture. The capacitor structures include a bottom electrode, a top electrode and a dielectric layer interposed between the bottom electrode and the top electrode. The capacitor structures ... | 05/06/2008 |
| 7361607 | Method for multi-layer resist plasma etch A method for etching a multi-layer resist defined over a substrate in a plasma etch chamber is provided. The method initiates with introducing the substrate having a pattern defined on a first layer of the multi-layer resist into the etch chamber. SO2 gas... | 04/22/2008 |
| 7354787 | Electrode design and positioning for controlled movement of a moveable electrode and associated support structure A MEMS system including a fixed electrode and a suspended moveable electrode that is controllable over a wide range of motion. In traditional systems where an fixed electrode is positioned under the moveable electrode, the range of motion is limited because the supp... | 04/08/2008 |
| 7348104 | System and method for fabrication and replication of diffractive optical elements for maskless lithography A method is disclosed for forming an array of focusing elements for use in a lithography system. The method involves varying an exposure characteristic over an area to create a focusing element that varies in thickness in certain embodiments. In further embodiments,... | 03/25/2008 |
| 7348108 | Design and layout of phase shifting photolithographic masks A method for defining a full phase layout for defining a layer of material in an integrated circuit is described. The method can be used to define, arrange, and refine phase shifters to substantially define the layer using phase shifting. Through the process, comput... | 03/25/2008 |
| 7341355 | Anti-glare optical film and process for preparing the same An anti-glare optical film which reduces in whitening of a screen without sacrificing anti-glare property, and a process for preparing the same. There is provided an anti-glare optical film has an irregular surface, wherein a ratio of areas of the surface having an ... | 03/11/2008 |
| 7316874 | Process and donor elements for transferring thermally sensitive materials to substrates by thermal imaging Methods of forming a patterned semiconducting-dielectric material on a substrate by thermal processes are disclosed, comprising heating a thermally imageable donor element comprising a substrate and a transfer layer of semiconductive material in conjunction with a d... | 01/08/2008 |
| 7314691 | Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device A mask pattern for semiconductor device fabrication comprises a resist pattern formed on a semiconductor substrate, and an interpolymer complex film formd on the resist pattern, wherein the interpolymer complex film includes a network formed by a hydrogen bond betwe... | 01/01/2008 |
| 7311850 | Method of forming patterned thin film and method of fabricating micro device In a method of forming a patterned thin film, first, an etching stopper film and a film to be patterned are formed in this order on a base layer. Next, a patterned first film is formed on the film to be patterned. Next, a second film is formed over an entire surface... | 12/25/2007 |
| 7285363 | Photoactivators, methods of use, and the articles derived therefrom A method for crosslinking one or more molecules comprises crosslinking the one or more molecules with a photactivatable crosslinker by one-photon or multi-photon excitation, wherein the crosslinker comprises at least two photoactive groups linked by a bridging moiet... | 10/23/2007 |
| 7286764 | Reconfigurable modulator-based optical add-and-drop multiplexer An optical add and drop multiplexer system comprising a first module for providing a first signal; a second module for providing a second signal; and a modulator for receiving a channel of the first signal at a first location, the first location configured to actuat... | 10/23/2007 |
| 7281226 | Incrementally resolved phase-shift conflicts in layouts for phase-shifted features Phase shifting allows generating very narrow features in a printed features layer. Thus, forming a fabrication layout for a physical design layout having critical features typically includes providing a layout for shifters. Specifically, pairs of shifters can be pla... | 10/09/2007 |
| 7276278 | Image covering laminate film and image projection sheet The laminate film for covering of an image carried by a support has a construction comprising a transparent base material and a transparent adhesive layer formed on one side of the base material, wherein the adhesive layer is composed of a pressure-sensitive adhesiv... | 10/02/2007 |
| 7270916 | Recording medium Disclosed is a recording medium comprising a recording layer including a photo-acid generating agent that generates an acid upon irradiation with an actinic radiation and a polymer having a polymerizable substituent group bonded to a main chain of the polymer via a ... | 09/18/2007 |
| 7265067 | Apparatus for making structured paper A papermaking belt for dewatering and imprinting a paper web. The belt comprises two laminae joined together in a face to face relationship to form a unitary laminate. The first lamina comprises a foraminous imprinting member which may serve as a reinforcing structu... | 09/04/2007 |
| 7265554 | Electric potential measuring device and image forming apparatus An electric potential measuring device includes a detection electrode of a conductive material disposed in opposition to an object and a movable structure includes a first solid material portion of another dielectric and a second solid material portion of another di... | 09/04/2007 |
| 7258908 | Anti-glare film, method of producing the same, and display equipped with the same The present invention provides an anti-glare film having rough surface of which R (0) and R (30 or more)/R (0) are 1% or less and 0.001 or less, respectively, wherein R (0) is if the regular reflectance along the regular reflection direction against incidence light ... | 08/21/2007 |
| 7260354 | Image forming method Using an adhesive toner that is lower in a lower-limit temperature of a fixable temperature than an image forming toner, the image forming toner and the adhesive toner are formed on one and the same transfer material. A document is sealed by an adhesive force of the... | 08/21/2007 |
| 7247562 | Semiconductor element, semiconductor device and methods for manufacturing thereof The present invention provides a method of manufacturing a semiconductor element having a miniaturized structure and a semiconductor device in which the semiconductor element having a miniaturized structure is integrated highly, by overcoming reduction of the yield ... | 07/24/2007 |
| 7243601 | Printing plate, press and method of printing, and apparatus and method for manufacturing liquid crystal devices A printing plate includes, on the printing surface of a raised part, grooves passing through from one side to another thereof. Preferably, the grooves are parallel to each other and equally spaced apart. More preferably the raised part is in the shape of a nearly-re... | 07/17/2007 |
| 7241537 | Method for producing an exposed substrate Method for producing an exposed substrate, which has at least two different image areas. The substrate is provided with at least two photoresist layers, which are adjusted to the type of image areas to be produced. ... | 07/10/2007 |
| 7236916 | Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask A structure and method are provided for correcting the optical proximity effects on a tri-tone attenuated phase-shifting mask. An attenuated rim, formed by an opaque region and an attenuated phase-shifting region, can be kept at a predetermined width across the mask... | 06/26/2007 |
| 7223512 | Multilayer body with a laser-sensitive layer The present invention relates to a process for increasing the level of safeguard in respect of forgery of paper documents. For that purpose, applied to the paper document is a transfer film or laminating film having a laser-sensitive layer. This multi-layer body is ... | 05/29/2007 |
| 7216331 | Resolving phase-shift conflicts in layouts using weighted links between phase shifters A method of assigning phases to shifters on a layout is provided. The method includes creating a link between any two shifters within a predetermined distance from each other. In one embodiment, the predetermined distance is larger than a minimum feature size on the... | 05/08/2007 |
| 7212630 | Method and apparatus for encryption using partial information A method and apparatus of encrypting optical images using binarization or phase only information is presented with a number of ways to secure the image also being provided. An image to be encrypted is first multiplied by a random phase function. The Fourier transfor... | 05/01/2007 |
| 7195798 | Method of manufacturing a low temperature polysilicon film A method of manufacturing a low temperature polysilicon film is provided. A first metal layer is formed on a substrate; and openings have been formed in the first metal layer. A second metal layer is formed on the first metal layer: and a hole corresponding to each ... | 03/27/2007 |
| 7195716 | Etching process and patterning process An etching process is described. A material layer having a bottom anti-reflection coating (BARC) and a patterned photoresist layer thereon is provided. An etching step is performed to the BARC using the patterned photoresist layer as a mask. A cleaning step is perfo... | 03/27/2007 |
| 7192804 | Semiconductor device and method for fabricating the same A wafer on which semiconductor elements, a multilevel interconnect layer, a bonding pad, a passivation film, and the like are formed is coated with a buffer coat film. Thereafter, the buffer coat film is patterned by exposure and development so that parts of the buf... | 03/20/2007 |
| 7175966 | Water and aqueous base soluble antireflective coating/hardmask materials A multilayer lithographic structure which includes a substrate, having on a major surface thereof a first layer including a water and/or aqueous base soluble material which includes Ge, O, and H, and optionally X, wherein X is at least one of Si, N, and F; and dispo... | 02/13/2007 |
| 7178128 | Alternating phase shift mask design conflict resolution Methods and apparatuses for preparing layouts and masks that use phase shifting to enable production of subwavelength features on an integrated circuit in close (optical) proximity to other structures are described. One embodiment selects from several strategies for... | 02/13/2007 |
| 7177081 | High contrast grating light valve type device A grating light valve has with a plurality of spaced reflective ribbons are spatially arranged over a substrate with reflective surfaces. The grating light valve is configured to optimized the conditions for constructive and destructive interference with an incident... | 02/13/2007 |
| 7169515 | Phase conflict resolution for photolithographic masks A photolithographic mask used for defining a layer in an integrated circuit, or other work piece, where the layer comprises a pattern including a plurality of features to be implemented with phase shifting in phase shift regions is laid out including for patterns co... | 01/30/2007 |
| 7165234 | Model-based data conversion Shifters on a phase shifting mask (PSM) can be intelligently assigned their corresponding phase. Specifically, the phase of a shifter can be assigned based on simulating the contrast provided by each phase for that shifter. The higher the contrast, the better the li... | 01/16/2007 |
| 7152300 | Method of manufacturing a micromechanical structure A microactuator includes a stationary element, a movable element, and a first microstructure. The stationary element is fixed on a substrate and has a plurality of stationary element electrodes arranged at a predetermined pitch. The movable element has a plurality o... | 12/26/2006 |
| 7145721 | Anti-reflective structures An anti-reflective structure is formed on a surface to transmit incident light with minimal losses. The anti-reflective surface has a plurality of protrusions having a feature size smaller than the wavelength of incident light. The protrusions increase in height in ... | 12/05/2006 |
| 7136228 | Optical system and display apparatus A display apparatus which has a mirror with a free curved reflective surface of which curvature fluctuates with inflection points, a liquid crystal display (LCD), a back light and a polarizer. Light of an image which was modulated by the LCD is reflected by the free... | 11/14/2006 |
| 7132203 | Phase shift masking for complex patterns with proximity adjustments Techniques are provided for extending the use of phase shift techniques to implementation of masks used for complex layouts in the layers of integrated circuits, beyond selected critical dimension features. The method includes identifying features for which phase sh... | 11/07/2006 |
| 7122281 | Critical dimension control using full phase and trim masks To print sub-wavelength features on a wafer, a mask set including a full phase PSM (FPSM) and a corresponding trim mask can be used. Phase assignments on the FPSM can result in some feature definition with the trim mask, particularly in non-critical areas. Unfortuna... | 10/17/2006 |
