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| Number | Title | Issue Date |
| 7332195 | Chemical vapor deposition method Method for densifying a porous carbon preform (5). The method includes the steps of: (a) providing the apparatus (11); (b) charging the apparatus (11) with a plurality of stacks of annular porous carbon preforms (5), the preforms being se... | 02/19/2008 |
| 7314540 | Diamond-coated electrode and method for producing same A diamond electrode having a sufficiently low resistance is disclosed which is realized by increasing the amount of boron added thereto. A method for producing a high-performance, high-durability electrode is also disclosed by which adhesiveness between a diamond co... | 01/01/2008 |
| 7105360 | Low temperature melt-processing of organic-inorganic hybrid The present invention provides a process for preparing a melt-processed organic-inorganic hybrid material including the steps of maintaining an solid organic-inorganic hybrid material at a temperature above the melting point but below the decomposition temperature o... | 09/12/2006 |
| 7033650 | Method of producing a nanotube layer on a substrate In a method of producing a nanotube layer on a substrate by using a CVD process, the substrate is placed in a reaction chamber, which is flushed with a carbon-containing gas. Subsequently, the substrate is heated by an induction process to a temperature at which car... | 04/25/2006 |
| 7030313 | Thin film solar cell and method of manufacturing the same A thin film solar cell comprises a p-layer, an i-layer and an n-layer formed in this order as a pin junction on a substrate in which the p-layer and the i-layer are thin silicon films each containing a crystalline component, and the p-layer contains p-type impuritie... | 04/18/2006 |
| 7011771 | Method of making carbon nanotubes on a substrate The present invention includes carbon nanotubes whose hollow cores are 100% filled with conductive filler. The carbon nanotubes are in uniform arrays on a conductive substrate and are well-aligned and can be densely packed. The uniformity of the carbon nanotube arra... | 03/14/2006 |
| 6998173 | Cemented carbide tool and method of making A coated cemented carbide tool, and a method for making the same, wherein the as-sintered substrate is formed by sintering in an atmosphere having at least a partial pressure and for a part of the time a nitrogen partial pressure. ... | 02/14/2006 |
| 6855232 | Magnetic disk comprising a first carbon overcoat having a high SP3 content and a second carbon overcoat having a low SP3 content A method for making a magnetic disk comprises forming first and second protective carbon layers on a magnetic layer. The first protective carbon layer is predominantly SP3 carbon. The second protective carbon layer comprises about 50% or less SP3 carbon. The second ... | 02/15/2005 |
| 6593484 | TANTALUM TERTIARY AMYLIMIDO TRIS (DIMETHYLAMIDE), A PROCESS FOR PRODUCING THE SAME, A SOLUTION OF STARTING MATERIAL FOR MOCVD USING THE SAME, AND A METHOD OF FORMING A TANTALUM NITRIDE FILM USING THE SAME A stable compound having a vapor pressure higher by 1 order than that of Ta(NtBu)(NEt2)3 is provided as a starting material for forming a TaN film as a barrier film by the CVD method. There are further provided a process for producin... | 07/15/2003 |
| 6565719 | Magnetic disk comprising a first carbon overcoat having a high SP3 content and a second carbon overcoat having a low SP3 content A method for making a magnetic disk comprises forming first and second protective carbon layers on a magnetic layer. The first protective carbon layer is predominantly SP3 carbon. The second protective carbon layer comprises about 50% or less SP3 carbon. ... | 05/20/2003 |
| 6458719 | LOW DIELECTRIC CONSTANT FILM COMPOSED OF BORON, NITROGEN, AND HYDROGEN HAVING THERMAL RESISTANCE, PROCESS FOR FORMING THE FILM, USE OF THE FILM BETWEEN SEMICONDUCTOR DEVICE LAYERS, AND THE DEVICE FORMED FROM THE FILM There is provided a film, which is excellent in thermal resistance, has low dielectric constant, and is applicable to a semiconductor device or electric appliances. The low dielectric constant film having thermal resistance comprises molecules comprising ... | 10/01/2002 |
| 6451391 | Thin film formation method In a laser ablation method comprising the steps of irradiating a laser beam to target material 107, and depositing ejected species from the target material on a faced substrate 109 to form a thin film, an ambient gas is introduced into reaction chamber 10... | 09/17/2002 |
| 6416824 | Densification A method of deposing a carbon-containing substance in the pores of a porous body comprises establishing an open varying magnetic field flux loop and placing the body such that a magnetic field flux generated by the open magnetic field flux loop passes thr... | 07/09/2002 |
| 6402883 | Polishing pad conditioning surface having integral conditioning points A pad conditioner having integral conditioning points. The pad conditioner includes a conditioning surface having a first integral conditioning point extending from the conditioning surface. For one embodiment the conditioning surface is formed of diamond... | 06/11/2002 |
| 6395381 | Vapor deposition material Objects of the invention are to provide a novel vapor deposition material for coating from which a thermal barrier coating film excellent in heat resistance and thermal shock resistance can be satisfactorily formed even by the EB-PVD method, and to provid... | 05/28/2002 |
| 6365495 | Method for performing metallo-organic chemical vapor deposition of titanium nitride at reduced temperature A process for chemical vapor deposition of titanium nitride film using thermal decomposition of a metal-organic compound is disclosed. In particular, the deposition of titanium nitride film from tetrakis dimethylamino-titanium (TDMAT) is performed at a te... | 04/02/2002 |
| 6331362 | Refractory composite materials protected against oxidising at high temperature, precursors of the said materials, their preparation The present invention provides: refractory composite materials protected against oxidation at high temperature; said materials are of the type made by a solid process and include, in characteristic manner, over their entire outside surface, a complex laye... | 12/18/2001 |
| 6329540 | Volatile organogallium compound and deposition of gallium nitride film using same A volatile organogallium compound of formula(I), an azidodialkylgallium complexed with a hydrazine derivative, can form a GaN film having no nitrogen defects by a metal organic chemical vapor deposition(MOCVD): R1 R2 (N3)Ga.(R | 12/11/2001 |
| 6322891 | Thermally-diffused boron diamond and its production A method for treating diamond for improving the oxidation resistance and the mechanical strength of said diamond crystals includes forming a mixture of diamond crystals, a source of boron, and inert particles. This mixture is heated at a temperature of be... | 11/27/2001 |
| 6309702 | Process for the production of improved boron coatings Improved articles of manufacture are disclosed, together with methods for preparing such articles, whereby the surface of a graphite or comparable substrate is first densified with carbon to reduce surface porosity while still retaining sufficient surface... | 10/30/2001 |
| 6303192 | Process to improve adhesion of PECVD cap layers in integrated circuits A method for making a multi-layered integrated circuit structure, includes depositing a methyl compound spin on glass layer over a substrate. The spin on glass layer is treated by plasma-deposition to form a SiO2 skin on the methyl compound spi... | 10/16/2001 |
| 6197391 | Pyrolytic boron nitride container and manufacture thereof There is disclosed a pyrolytic boron nitride container for accommodating a material serving as a source of molecular beams for molecular beam epitaxy, wherein the transmissivity of the pyrolytic boron nitride container with respect to light having a wave ... | 03/06/2001 |
| 6190725 | Coating method for the preparation of coated nuclear fuels with carbides borides or nitrides by using high temperature and high pressure combustion synthesis The present invention relates to a coating method for the preparation of a coated nuclear fuel. Particularly, the present invention relates to the coating method of nuclear fuel surface with more than two coated layers of carbides, borides or nitrides and... | 02/20/2001 |
| 6149779 | Low-k BSG gap fill process using HDP A low dielectric constant gap-fill process using high density plasma (HDP) deposition is provided for depositing a boron-doped silicon oxide layer to eliminate the damaging effects of fluorine on underlying circuitry while still maintaining a low dielectr... | 11/21/2000 |
| 6126792 | Method for the application of a scratch protection layer and an antireflection coating system and apparatus for its execution For the application of a scratch protection layer on plastic substrates, a plasma is produced by the plasma CVD method, away from the individual plastic substrate, in an excitation gas, and this excitation gas is supplied through a tube to the plastic sub... | 10/03/2000 |
| 6117498 | Single source thermal ablation method for depositing organic-inorganic hybrid films In order to form a film of organic-inorganic hybrid material, such as a perovskite material, in a selected stoichiometric ratio upon a surface of a substrate, the proposed method entails a number of simple steps. First, a substrate and a selected quantity... | 09/12/2000 |
| 6071572 | Forming tin thin films using remote activated specie generation In a vapor deposition chamber which holds a substrate for processing, a method including the steps of forming a layer of material on the surface of the substrate, wherein the layer of material is made of Ti atoms; remotely activating a source gas containi... | 06/06/2000 |
| 6071351 | Low temperature chemical vapor deposition and etching apparatus and method An apparatus and method for the growth and etching of materials where a substrate on which a film is being deposited or which is being etched is maintained at a lower temperature than a precursor cracking temperature. The apparatus includes a susceptor wi... | 06/06/2000 |
| 6057031 | Plastic substrate with thin metal-containing layer The invention relates to a composite composed of a plastic substrate and a thin, continuous metal-containing layer, characterised in that the metal-containing layer is ductile, adheres firmly to the plastic substrate, has a thickness of | 05/02/2000 |
| 6033533 | Method of forming films over inner surface of cylindrical member The present invention relates to a method of forming an intermediate film and a hard cabon film over the inner surface of a cylindrical member having a bore, such as a bushing or a cylinder, with the hard carbon film being formed on the intermediate film ... | 03/07/2000 |
| 5858480 | Ceramic-based substrate for coating diamond and method for preparing substrate for coating Ceramic-based substrate for coating, e.g., diamond has a basic irregularities surface having a surface roughness Rz of 2 to 20 μm, with Rz at angle regions of 40% or more of that for other than the angle regions. The basic irregularities surface has micr... | 01/12/1999 |
| 5846611 | Chemical vapor infiltration process of a material within a fibrous substrate with creation of a temperature gradient in the latter The substrate (30) is placed in an enclosure (34) and is heated by direct electromagnetic coupling with an induction winding (38) to enable a temperature gradient to be established within the substrate, so that the substrate has a higher temperature in it... | 12/08/1998 |
| 5803967 | Method of forming diamond devices having textured and highly oriented diamond layers therein A method of forming devices having textured and highly oriented diamond layers includes the steps of forming a plurality of diamond nucleation sites on a substrate and then growing diamond on the sites so merge and form a continuous diamond layer having {... | 09/08/1998 |
| 5783335 | Fluidized bed deposition of diamond A process for coating a substrate with diamond or diamond-like material including maintaining a substrate within a bed of particles capable of being fluidized, the particles having substantially uniform dimensions and the substrate characterized as having... | 07/21/1998 |
| 5747096 | Method for measuring the depositions, densification of etching rate of an electrically conductive body A method for determining the instantaneous and cumulative mass rate of change of a conductive body in a deposition, densification or etching process through the use of a gaseous, liquid or particulate solids precursor. In one application, porous solid str... | 05/05/1998 |
| 5741547 | Method for depositing a film of titanium nitride A method of depositing a film of titanium nitride on a substrate which includes, positioning the substrate within a chemical vapor deposition reactor chamber which is maintained at a predetermined temperature and pressure; combining a gaseous source of ni... | 04/21/1998 |
| 5738951 | Method of manufacturing a composite material with lamellar interphase between reinforcing fibers and matrix, and material obtained The interphase is formed by nanometric scale sequencing of a plurality of different constituents including at least a first constituent that intrinsically presents a lamellar microtexture, and at least a second constituent that is suitable for protecting ... | 04/14/1998 |
| 5718948 | Cemented carbide body for rock drilling mineral cutting and highway engineering The invention relates to a coated cemented carbide body for rock drilling having a substrate containing at least one metal carbide and a binder metal and an at least partly covering coating comprising at least one diamond- or cBN-layer applied by CVD- or ... | 02/17/1998 |
| 5677015 | High dielectric constant material containing tantalum, process for forming high dielectric constant film containing tantalum, and semiconductor device using the same A high dielectric constant material containing tantalum expressed by chemical formula Tax Oy Nz, where x, y, and z are each a value which in total yield 1, z is 0.1 or higher but 0.625 or lower, y is 0 or higher but 0.6 or... | 10/14/1997 |
| 5659057 | Five- and six-coordinate precursors for titanium nitride deposition Improved precursors for use in chemical vapor deposition of thin films of titanium-based materials are provided, which are either 5- or 6-coordinate and thus sterically saturated and protected from attack of the coreactant in the gas phase. Specific precu... | 08/19/1997 |
