Did You Know...
...that two musicians were responsible for the invention of color print film? Fascinated by photography, Leopold Godowsky and Leopold Mannes worked together to produce an easy-to-use, practical color film. They worked full time as music teachers and gave concerts while experimenting during their off hours in Mannes' kitchen. Their success earned them full-time, well-paying jobs at Kodak and their efforts resulted in Kodachrome film, which was introduced in 1935.
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| Number | Title | Issue Date |
| 8440268 | Method and apparatus for growing plasma atomic layer Oxygen gas, for example, is introduced into a film forming chamber, and high-frequency power is supplied to a plurality of monopole antennas arranged above a silicon substrate (101) in the film forming chamber to generate a plasma of the introduced oxygen gas... | 05/14/2013 |
| 8435608 | Methods of depositing smooth and conformal ashable hard mask films Provided are plasma enhanced chemical vapor deposition methods of depositing smooth and conformal ashable hard mask films on substrates containing raised or recessed features. The methods involve using precursors having relatively high C:H ratios, such as acetylene ... | 05/07/2013 |
| 8414985 | Plasma deposition of a thin film A plasma deposition apparatus and a method of manufacturing a thin film using the same are disclosed. The method of manufacturing a thin film includes introducing a process gas in a reaction chamber of a plasma deposition device, the reaction chamber including a fir... | 04/09/2013 |
| 8404313 | Synthesis of nanocrystalline diamond fibers Provided herein is a method for the synthesis of nanocrystalline diamond (NCD) wires by depositing nanocrystalline diamond on Si nanowires using chemical vapor deposition methods. Seeding the nanowires in solutions containing nanodiamond powers, NCD wires are fabric... | 03/26/2013 |
| 8389071 | Apparatus and method for forming carbon protective layer An apparatus and method for forming a carbon protective layer on a substrate using a plasma CVD method allows a more uniform in-plane distribution of the carbon protective layer thickness. The apparatus includes an annular anode that generates a plasma beam and a di... | 03/05/2013 |
| 8389070 | Coating of a polymer layer using low power pulsed plasma in a plasma chamber of a large volume A method for depositing a polymeric material onto a substrate, said method comprising introducing an organic monomeric material in a gaseous state into a plasma deposition chamber, igniting a glow discharge within said chamber, and applying a high frequency voltage ... | 03/05/2013 |
| 8383208 | Method of fabricating organic light emitting device Methods of fabricating an organic light emitting device using plasma and/or thermal decomposition are provided. An insulating layer is formed by reacting first and second radicals. The first radical is formed by passing a first gas through a plasma generating region... | 02/26/2013 |
| 8357435 | Flowable dielectric equipment and processes Methods of depositing and curing a dielectric material on a substrate are described. The methods may include the steps of providing a processing chamber partitioned into a first plasma region and a second plasma region, and delivering the substrate to the processing... | 01/22/2013 |
| 8357434 | Apparatus for the deposition of a conformal film on a substrate and methods therefor A method for depositing a conformal film on a substrate in a plasma processing chamber of a plasma processing system, the substrate being disposed on a chuck, the chuck being coupled to a cooling apparatus, is disclosed. The method includes flowing a first gas mixtu... | 01/22/2013 |
| 8343593 | Method of coating inner and outer surfaces of pipes for thermal solar and other applications A method of coating at least one exterior surface of at least one workpiece is disclosed. The method may be used for coating inner and outer surfaces of pipes. A hollow workpiece is positioned within a chamber. A spacing between a multi-dimensional interior surface ... | 01/01/2013 |
| 8343592 | Asymmetrical RF drive for electrode of plasma chamber RF power is coupled to one or more RF drive points (50-56) on an electrode (20-28) of a plasma chamber such that the level of RF power coupled to the RF drive points (51-52, 55-56) on the half (61) of the elect... | 01/01/2013 |
| 8337959 | Method and apparatus to apply surface release coating for imprint mold In imprint lithography, the mold is coated with a surface release layer for a non-sticking separation. Bonding strength of the release layer to the mold depends on the cleanness of the surface and the process of release layer deposition. In accordance with the inven... | 12/25/2012 |
| 8329261 | Marine antifoulant coating A protective coating applied to the underwater portion of a marine vessel operable to inhibit the growth of marine foulants. The coating comprises a polymer, a marine biocide, a preservative, and optionally an antimicrobial agent. In certain embodiments, the marine ... | 12/11/2012 |
| 8323753 | Method for deposition using pulsed atmospheric pressure glow discharge Disclosed are methods for deposition of a chemical compound or element using an atmospheric pressure glow discharge plasma in a treatment space comprising two electrodes connected to a power supply for providing electrical power during an on-time (ton). T... | 12/04/2012 |
| 8313812 | Durable transparent coatings for aircraft passenger windows A duplex coating scheme and associated method of formation, which includes a siloxane based soft coating and a plasma based SiOxCy hard coating used in combination to improve the durability of acrylic substrates used in aircraft window applications. ... | 11/20/2012 |
| 8309185 | Nanoparticle film and forming method and application thereof One embodiment of the present invention provides a method for forming a nanoparticle film, which comprises the steps of: preparing a nanoparticle solution, which comprises a solvent and supersaturated nanoparticles with surface ligand molecules; and dip coating a su... | 11/13/2012 |
| 8298624 | Method and apparatus for growing a group (III) metal nitride film and a group (III) metal nitride film A process and apparatus for growing a group (III) metal nitride film by remote plasma enhanced chemical vapor deposition are described. The process comprises heating an object selected from the group consisting of a substrate and a substrate comprising a buffer laye... | 10/30/2012 |
| 8298626 | Methods for selective pre-coating of a plasma processing chamber A method for processing a substrate in a plasma processing system is provided. The method includes disposing a first confinement ring set in a first position. The method also includes depositing a first coating on a first portion of the plasma processing system usin... | 10/30/2012 |
| 8298625 | Multiple phase RF power for electrode of plasma chamber RF power is coupled with different phase offsets to different RF connection points on an electrode of a plasma chamber. Preferably, the number of different RF connection points and corresponding phase offsets is at least four, and the positions of the RF connection ... | 10/30/2012 |
| 8298627 | Method and apparatus of plasma treatment The present invention provides a plasma treatment apparatus and a conditioning method capable of performing a conditioning for the whole vacuum chamber. A plasma treatment apparatus according to an embodiment of the present invention is provided with a moving means ... | 10/30/2012 |
| 8293340 | Plasma deposited microporous analyte detection layer Plasma deposited microporous analyte detection layers, method of forming analyte detection layers, and analyte sensors including the same are disclosed. An analyte sensor includes a substrate and a microporous amorphous random covalent network layer. The microporous... | 10/23/2012 |
| 8277906 | Method of processing a substrate A method of processing a substrate using plasma includes loading a substrate into a chamber, processing the substrate with a first plasma mode and then processing the substrate with a second plasma mode, wherein at least one of the first plasma mode and the second p... | 10/02/2012 |
| 8273419 | Method of forming gas barrier layers including a change in pressure, a gas barrier layer formed by the method, and a gas barrier film A method of forming a gas barrier layer comprises: forming a first layer over a substrate by plasma-enhanced CVD at a first pressure, at least a part of a surface of the substrate being made of an organic material; and forming a second layer on the first layer by pl... | 09/25/2012 |
| 8268410 | Coating system and method for coating, as well as coated articles In the case of CVD methods, comprising PECVD and PICVD methods, the aim of the invention is to improve the impurity-free and, as far as possible, temporally and quantitatively precise feeding of process gases for the targeted layer systems. To this end, the inventio... | 09/18/2012 |
| 8268409 | Plasma-enhanced deposition of metal carbide films Methods of forming a metal carbide film are provided. In some embodiments, methods for forming a metal carbide film in an atomic layer deposition (ALD) type process comprise alternately and sequentially contacting a substrate in a reaction space with vapor phase pul... | 09/18/2012 |
| RE43651 | Surface coatings A method of coating a surface with a polymer layer, which method comprises exposing said surface to a plasma comprising a monomeric unsaturated organic compound which comprises a chain of carbon atoms, which are optionally substituted by halogen; provided that where... | 09/11/2012 |
| 8257799 | Method for forming thin film using radicals generated by plasma A method for forming a thin film using radicals generated by plasma may include generating radicals of a reactant precursor using plasma; forming a first thin film on a substrate by exposing the substrate to a mixture of the radicals of the reactant precursor and a ... | 09/04/2012 |
| 8227051 | Apparatus and method for carbon fiber surface treatment An apparatus and method for enhancing the surface energy and/or surface chemistry of carbon fibers involves exposing the fibers to direct or indirect contact with atmospheric pressure plasma generated using a background gas containing at least some oxygen or other r... | 07/24/2012 |
| 8227052 | Method and device for plasma-assisted chemical vapour deposition on the inner wall of a hollow body The invention relates to a method for plasma-assisted chemical vapour deposition for coating or material removal on the inner wall of a hollow body (42). The method involves introducing a gas lance (44) into the hollow body (42) and forming a ca... | 07/24/2012 |
| 8221852 | Methods of atomic layer deposition using titanium-based precursors Methods of forming titanium-containing films by atomic layer deposition are provided. The methods comprise delivering at least one precursor to a substrate, wherein the at least one precursor corresponds in structure to Formula I: | 07/17/2012 |
| 8206794 | System and method for applying abrasion-resistant coatings A method for applying an abrasion-resistant coating to a substrate including the steps of generating an atmospheric plasma, introducing a precursor to the atmospheric plasma, the precursor being selected to form the abrasion-resistant coating, and positioning the su... | 06/26/2012 |
| 8197913 | Film forming method for a semiconductor The present invention is a plasma processing method for forming a film on a substrate, the method including the steps of processing a first material gas with plasma having an electron density W and an electron temperature X, processing a second material gas with pla... | 06/12/2012 |
| 8192806 | Plasma particle extraction process for PECVD A plasma-enhanced chemical vapor deposition (PECVD) process including plasma particle extraction is described. Charged particles suspended in discharge volume are moved together with a plasma and can then be flushed away. The particle extraction process reduces unwa... | 06/05/2012 |
| 8192807 | Ring plasma jet method and apparatus for making an optical fiber preform A method and apparatus for making an optical fiber preform, including injecting a plasma gas source into the first end of a tubular member; generating a ring plasma flame with the plasma gas source flowing through a plasma gas feeder nozzle, the plasma gas feeder no... | 06/05/2012 |
| 8187679 | Radical-enhanced atomic layer deposition system and method A radical-enhanced atomic layer deposition (REALD) system and method involves moving a substrate along a circulating or reciprocating transport path between zones that provide alternating exposure to a precursor gas and a gaseous radical species. The radical species... | 05/29/2012 |
| 8178170 | Method for depositing inorganic/organic films The present invention describes a method for applying a hybrid coating to a substrate. A coating according to the invention is formed by an inorganic component and an organic component. As a result, this coating has the hybrid character whereby the advantages of int... | 05/15/2012 |
| 8173228 | Particle reduction on surfaces of chemical vapor deposition processing apparatus A method of reducing the amount of particulates generated from the surface of a processing component used during plasma enhanced chemical vapor deposition of thin films. The body of the processing component comprises an aluminum alloy, and an exterior surface of sai... | 05/08/2012 |
| 8168267 | Method for manufacturing a preform for optical fibres by means of a vapour deposition process A method for manufacturing a preform for optical fibers by a vapor deposition process wherein an intermediate step is carried out between one deposition phase and the next deposition phase(s), wherein the intermediate step includes supplying an etching gas to the su... | 05/01/2012 |
| 8168268 | Thin film deposition via a spatially-coordinated and time-synchronized process A deposition system and process for the formation of thin film materials. In one embodiment, the process includes forming an initial plasma from a first material stream and allowing the plasma to evolve in space and/or time to extinguish species that are detrimental... | 05/01/2012 |
| 8168269 | Plasma, UV and ion/neutral assisted ALD or CVD in a batch tool A batch processing chamber includes a chamber housing, a substrate boat for containing a batch of substrates in a process region, and an excitation assembly for exciting species of a processing gas. The excitation assembly is positioned within the chamber housing an... | 05/01/2012 |
