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Class 427/489 - Organosilicon containing coating


Subclass of Class 427 - Coating processes
Definition: Processes wherein an organic silicon compound is part of
No. of patents: 241
Last issue date: 10/04/2011


1              
NumberTitleIssue Date
8029870Method of coating fuel cell components for water removal
A method for coating a fuel cell component is provided. The method includes the steps of providing a fuel cell component, and forming a coating on a surface of the fuel cell component with a plasma jet. The step of forming the coating may include applying a coating ...
10/04/2011
7879409Repeatability of CVD film deposition during sequential processing of substrates in a deposition chamber
We have a method of improving the deposition rate uniformity of the chemical vapor deposition (CVD) of films when a number of substrates are processed in series, sequentially in a deposition chamber. The method includes the plasma pre-heating of at least one process...
02/01/2011
7867577Sulfur modified silanes for the elaboration of high refractive index materials
A composition having a polythiol reactant and an alkenyl silane reactant which are combined to form a polysulfide polysilane. In the process, the reactants are combined in a thiol-ene addition process driven by UV radiation. The polysulfide polysilane is then hydrol...
01/11/2011
7422774Method for forming ultra low k films using electron beam
The present invention generally provides a method for depositing a low dielectric constant film using an e-beam treatment. In one aspect, the method includes delivering a gas mixture comprising one or more organosilicon compounds and one or more hydrocarbon compound...
09/09/2008
7404990Non-thermal process for forming porous low dielectric constant films
Low dielectric materials and films comprising same have been identified for improved performance when used as interlevel dielectrics in integrated circuits as well as methods for making same. In certain embodiments of the invention, there is provided a low-temperatu...
07/29/2008
7390573Plasma coating system for non-planar substrates
A non-planar article includes a plasma deposited abrasion resistant coating with a substantially uniform thickness and a substantially uniform abrasion resistance with delta haze (%) in the range between about +/−0.25 of the mean value. ...
06/24/2008
7371487Method of fabricating black matrix of a color filter
A method of fabricating a black matrix of a color filter is provided. In the method, a black matrix layer formed of a hydrophobic organic material is formed on an upper surface of a transparent substrate. A black matrix is formed by patterning the black matrix layer...
05/13/2008
7361608Method and system for forming a feature in a high-k layer
A method for plasma processing a high-k layer includes providing a substrate having a high-k layer formed thereon, on a substrate holder in a process chamber, and creating a plasma in the process chamber to thereby expose the high-k layer to the plasma. RF power is ...
04/22/2008
7354629Method of forming a protective film and a magnetic recording medium having a protective film formed by the method
A method of forming a protective film that restrains gas adsorption while preserving durability and corrosion resistance of a plasma CVD carbon film is disclosed. A protective film of a slide-resistant member is deposited by means of a plasma CVD method using a raw ...
04/08/2008
7341903Method of forming a field effect transistor having a stressed channel region
A semiconductor structure comprises a transistor element formed in a substrate. A stressed layer is formed over the transistor element. The stressed layer has a predetermined compressive intrinsic stress having an absolute value of about 1 GPa or more. Due to this h...
03/11/2008
7329462Reflective article and method for the preparation thereof
A reflective article useful, for example, in automotive headlights includes a substrate, a reflective metal layer, and a haze-prevention layer between the substrate and the reflective metal layer. The substrate includes an amorphous thermoplastic resin having a heat...
02/12/2008
7294357Plasma coated sutures
Suture filaments coated by a plasma polymerization process exhibit a good balance of knot run down and knot security characteristics, superior tissue drag characteristics, and improved fray resistance. ...
11/13/2007
7294205Method for reducing the intrinsic stress of high density plasma films
A layer of reduced stress is formed on a substrate using an HDP-CVD system by delaying or interrupting the application of capacitively coupled RF energy. The layer is formed by introducing a process gas into the HDP system chamber and forming a plasma from the proce...
11/13/2007
7294583Methods for the use of alkoxysilanol precursors for vapor deposition of SiOfilms
A method for depositing conformal dielectric films uses alkoxy silanol or silanediol precursors and oxidizing and/or hydrolyzing agents. The method produces a material with liquid-like flow properties capable of achieving improved high aspect ratio gap fill more eff...
11/13/2007
7288292Ultra low k (ULK) SiCOH film and method
The present invention provides a multiphase, ultra low k film which exhibits improved elastic modulus and hardness as well as various methods for forming the same. The multiphase, ultra low k dielectric film includes atoms of Si, C, O and H, has a dielectric constan...
10/30/2007
7285315Closure in synthetic material for containers
The present invention relates to a closure which is made of synthetic material with characteristics similar to or even better than those of cork and which can therefore be used in all applications in which a cork closure is normally used. In particular, the closure ...
10/23/2007
7264669Scratch resistant gradient coating and coated articles
A gradient coating is comprised of a basecoat derived from a polysiloxane prepolymer obtained from a mixture of one to three alkoxysilane monomers and at least one diepoxide monomer, and a lubricious reactant. The basecoat is applied to a substrate and dried. The lu...
09/04/2007
7259101Nanoparticles and method for making the same
A method for making nanoparticles, nanoparticle inks and device layers therefrom is disclosed. In accordance with the present invention, nanoparticles are isolated from a composite material that is formed by treating a metal oxide precursor to form the metal nanopar...
08/21/2007
7259100Nanoparticles and method for making the same
A method for making nanoparticles, nanoparticle inks and device layers therefrom is disclosed. In accordance with the present invention, nanoparticles are isolated from a composite material that is formed by treating a metal oxide precursor to form the metal nanopar...
08/21/2007
7250236Color filter of liquid crystal display panel and method of fabricating the same
A color filter of liquid crystal display (LCD) panel is described. A surface property of a black matrix is changed by coating with an ink-repellent layer formed of cheap materials, to provide better separation between portions of a colored layer, thus reducing the c...
07/31/2007
7247343Method for manufacturing magnetic recording medium
A method for manufacturing a magnetic recording medium for efficiently and certainly manufacturing a magnetic recording medium. The magnetic recording medium has a recording layer formed to have predetermined concavo-convex pattern and an adequately flat surface. Ac...
07/24/2007
7230337Semiconductor device including ladder-shaped siloxane hydride and method for manufacturing same
The present invention reduces the effective dielectric constant of the interlayer insulating film while inhibiting the decrease of the reliability of the semiconductor device, which otherwise is caused by a moisture absorption. A copper interconnect comprising a Cu ...
06/12/2007
7230143Chromatographic method for the analysis of both in process and finished sevoflurane
A method in which organic matter found in a crude sevoflurane may be separated, identified, and quantified using a CARBOWAX™ (polyethylene glycol) capillary gas chromatographic column or an alkyl polysiloxane capillary gas chromatographic column. Also provided is ...
06/12/2007
7220810Polymer film and method for producing the same
A polymer film having a low dielectric constant is produced polymerizing a raw material gas containing a compound of the formula (1): wherein PCA represents a polycycloaliphatic hydrocarbon group, ALK represents ...
05/22/2007
7220670Method of producing rough polysilicon by the use of pulsed plasma chemical vapor deposition and products produced by same
A method for depositing a rough polysilicon film on a substrate is disclosed. The method includes introducing the reactant gases argon and silane into a deposition chamber and enabling and disabling a plasma at various times during the deposition process. ...
05/22/2007
7211896Semiconductor device and method of manufacturing the same
There is provided a method of manufacturing a semiconductor device in which interconnect capacitance is restrained. The semiconductor device 200 comprises a semiconductor substrate; a second interconnect insulating film 216 constituted of a ladder-type...
05/01/2007
7208805Structures comprising a layer free of nitrogen between silicon nitride and photoresist
The invention includes a semiconductor processing method. A first material comprising silicon and nitrogen is formed. A second material is formed over the first material, and the second material comprises silicon and less nitrogen, by atom percent, than the first ma...
04/24/2007
7205224Very low dielectric constant plasma-enhanced CVD films
The present invention provides a method for depositing nano-porous low dielectric constant films by reacting an oxidizable silicon containing compound or mixture comprising an oxidizable silicon component and an oxidizable non-silicon component having thermally liab...
04/17/2007
7205248Method of eliminating residual carbon from flowable oxide fill
Methods of forming an oxide layer such as high aspect ratio trench isolations, and treating the oxide substrate to remove carbon, structures formed by the method, and devices and systems incorporating the oxide material are provided. ...
04/17/2007
7189436Flash evaporation-plasma coating deposition method
The present invention provides a method for the formation of an organic coating on a substrate. The method includes: providing a substrate in a vacuum; providing at least one vaporized organic material comprising at least one component from at least one source, wher...
03/13/2007
7183200Method for fabricating a semiconductor device
A semiconductor device has a multi-layer interconnection structure with a first interlayer insulation film and a second interlayer insulation film that is formed on the first interlayer insulation film and has a hardness and an elastic modulus larger than those of t...
02/27/2007
7183201Selective etching of organosilicate films over silicon oxide stop etch layers
A method of selectively etching organosilicate layers in integrated circuit fabrication processes is disclosed. The organosilicate layers are selectively etched using a hydrogen-containing fluorocarbon gas. The hydrogen-containing fluorocarbon gas may be used to sel...
02/27/2007
7178584Plasma polymerization enhancement of surface of metal for use in refrigerating and air conditioning
According to the present invention, there is provided a plasma polymerization surface modification of a metal for enhancing its applicability for use in refrigerating and air conditioning such as in constructing heat exchanges, by using a DC discharge plasma, compri...
02/20/2007
7164191Low relative permittivity SiOfilm including a porous material for use with a semiconductor device
A low relative permittivity SiOx film excellent in heat resistance without using an alkali metal, fluorine, etc., a method for modifying an SiOx film to accomplish a further reduction of the relative permittivity of the low relative permittivit...
01/16/2007
7163877Method and system for modifying a gate dielectric stack containing a high-k layer using plasma processing
A method and system for modifying a gate dielectric stack by exposure to a plasma. The method includes providing the gate dielectric stack having a high-k layer formed on a substrate, generating a plasma from a process gas containing an inert gas and one of an oxyge...
01/16/2007
7157145Article having a plasmapolymer coating and method for producing the same
An article is described comprising a substrate and a plasma polymer coating comprising silicon, oxygen and carbon bonded to the surface of the substrate, in respect of which coating the following applies in the cas...
01/02/2007
7136707Recordable macros for pacemaker follow-up
A device and method for programming an implantable pulse generator. In one embodiment, commands are entered designating implantable pulse generator programming variables into programmer memory. At least some of the commands are transformed into an executable macro. ...
11/14/2006
7129164Method for forming a multi-layer low-K dual damascene
A damascene structure and method for forming the same in a multi-density dielectric insulating layer the method including providing a substrate; forming at least a first layer comprising silicon oxide according to a first process having a first density; forming at l...
10/31/2006
7125739Method for producing and testing a corrosion-resistant channel in a silicon device
A method for producing a corrosion-resistant channel in a wetted path of a silicon device enables such device to be used with corrosive compounds, such as fluorine. A wetted path of a MEMS device is coated with either (1) an organic compound resistant to attack by a...
10/24/2006
7115310Packaging laminate with gas and aroma barrier properties
A packaging laminate (10) including a substrate film (15) coated with a carbon containing silicon oxide layer (16, 17) on both surfaces is disclosed herein. A method for producing the laminate (10), and blanks and packages fabricated from...
10/03/2006
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