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Patent No. 5377411

Hair Cutting Appliance

A haircutting appliance comprises an enclosed housing having a hollow handle connecting the housing to a vacuum source to carry away cut hairs from a subject's head.

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Class 427/457 - DIRECT APPLICATION OF ELECTRICAL, MAGNETIC, WAVE, OR PARTICULATE ENERGY


Subclass of Class 427 - Coating processes
Definition: Processes wherein a substrate, coated substrate or coating
No. of patents: 150
Last issue date: 03/20/2012


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NumberTitleIssue Date
8137759Gold nanostructures and methods of use
The invention is drawn to novel nanostructures comprising hollow nanospheres and nanotubes for use as chemical sensors, conduits for fluids, and electronic conductors. The nanostructures can be used in microfluidic devices, for transporting fluids between devices an...
03/20/2012
8043664EVA blend compositions suitable for RF welding applications
Disclosed are films obtained from blends of ethylene copolymers with organic acid salt-modified potassium ionomeric copolymers. The films of the present invention can be welded using RF energy. ...
10/25/2011
8007871Electrospray deposition: devices and methods thereof
Disclosed herein are apparatus and methods for selectively depositing molecular ions on nanoscale substrates such as carbon nanotube arrays using electrospray ionization. ...
08/30/2011
7955662Optical multilayer reflective film, and aligned metal particle film and manufacturing process therefor
An aligned metal-particle film, in which metal particles are aligned in a polymer as a layer with a certain interval in parallel with a substrate is disclosed. The aligned metal-particle film is manufactured by forming a polymer film containing a metal component on ...
06/07/2011
7744963Nanolithography methods and products therefor and produced thereby
In one aspect, a method of nanolithography is provided, the method comprising providing a substrate; providing a scanning probe microscope tip; coating the tip with a deposition compound; and subjecting said coated tip to a driving force to deliver said deposition c...
06/29/2010
7405072Acoustic radiation for ejecting and monitoring pathogenic fluids
The invention relates to methods and devices that use focused radiation to handle and/or monitor pathogenic fluids. In particular, a method is provided for dispensing one or more droplets of a fluid containing a pathogen. The method involves providing the pathogen-c...
07/29/2008
7387718Cationic electrodeposition coating composition and method of preparing the same
In a cationic electrodeposition coating composition and a method of preparing the cationic electrodeposition coating composition, a cationic electrodeposition coating composition is prepared by dispersing a cationic electrodeposition resin in an aqueous medium conta...
06/17/2008
7341959Plasma enhanced atomic layer deposition system and method
A method for depositing a film on a substrate using a plasma enhanced atomic layer deposition (PEALD) process includes disposing the substrate in a process chamber configured to facilitate the PEALD process, wherein the process chamber includes a substrate zone prox...
03/11/2008
7335459Phase-change optical recording medium
A phase-change optical recording medium includes a phase-change optical recording film that permits reversible phase change between a crystalline phase and an amorphous phase upon irradiation with light, and an interface film formed of hafnium oxide, or a mixture of...
02/26/2008
7279432System and method for forming an integrated barrier layer
An apparatus and method for forming an integrated barrier layer on a substrate is described. The integrated barrier layer comprises at least a first refractory metal layer and a second refractory metal layer. The integrated barrier layer is formed using a dual-mode ...
10/09/2007
7273660Mixed composition interface layer and method of forming
An interface forming method includes forming a first layer containing a first chemical element and chemisorbing on the first layer an interface layer containing at least one monolayer of the first chemical element intermixed with a second chemical element different ...
09/25/2007
7268317Laser peening process and apparatus using a liquid erosion-resistant opaque overlay coating
The invention relates to a method and apparatus for improving properties of a solid material by providing shockwaves there through. Laser shock processing is used to provide the shockwaves. The method includes applying a liquid energy-absorbing overlay, which is res...
09/11/2007
7250386Quantum limit catalysts and hydrogen storage materials
A quantum limit catalyst. The instant quantum limit catalyst is comprised of atomic aggregations whose dimensions correspond to the quantum limit. In the quantum limit, the atomic aggregations acquire structural configurations and electronic interactions not attaina...
07/31/2007
7244344Physical vapor deposition plasma reactor with VHF source power applied through the workpiece
A physical vapor deposition plasma reactor includes a vacuum chamber including a sidewall, a ceiling and a wafer support pedestal near a floor of the chamber, and a vacuum pump coupled to the chamber, a process gas inlet coupled to the chamber and a process gas sour...
07/17/2007
7239444Display front plane, display lenticular lens, and display fresnel lens
A display front plane having an anti-reflection film in thickness uniformity and good adhesion between the anti-reflection film and the base material is supplied. Each of a display lenticular lens and a display fresnel lens having a sophisticated anti-reflection fun...
07/03/2007
7214619Method for forming a barrier layer in an integrated circuit in a plasma with source and bias power frequencies applied through the workpiece
A barrier layer is formed in an integrated circuit by providing a metal target near a ceiling of the chamber and a wafer support pedestal facing the target near a floor of the chamber. A process gas is introduced into the vacuum chamber. A target-sputtering plasma i...
05/08/2007
7175888Mischmetal oxide TBC
The present invention is a turbine engine component comprising a superalloy substrate, a bond coat overlying the substrate having a thickness in the range of about 0.0005 inch to about 0.005 inch, a thin alumina scale overlying the bond coat, and a thermal barrier c...
02/13/2007
7160475Fabrication of three dimensional structures
The present disclosure relates to a method for generating a three-dimensional microstructure in an object. In one embodiment, a method for fabricating a microscopic three-dimensional structure is provided. A work piece is provided that includes a target area at whic...
01/09/2007
7157131Prevention of counterfeit markings on semiconductor devices
A lidded semiconductor device has a first layer applied to the lid, which first layer is chosen of a material which fluoresces upon application of non-visible electromagnetic waves thereto, for example, ultraviolet light. A second layer is provided over the first la...
01/02/2007
7144976Coumarin endcapped absorbable polymers
The present invention includes photocurable, liquid polymers incorporating coumarin ester endgroups into their molecular structure, which polymers are crosslinked upon irradiation with ultraviolet light by photochemically allowed [2+2] cycloaddition reactions among ...
12/05/2006
7131189Continuous processing of thin-film batteries and like devices
A system for making a thin-film device includes a substrate-supply station that supplies a substrate having a major surface area. The substrate has a first layer on a first surface area of the substrate's major surface area. Also included is a device for depositing ...
11/07/2006
7094680Formation of a tantalum-nitride layer
A method of forming a tantalum nitride layer for integrated circuit fabrication is disclosed. In one embodiment, the method includes forming a tantalum nitride layer by chemisorbing a tantalum precursor and a nitrogen precursor on a substrate disposed in a process c...
08/22/2006
7090333Focused acoustic energy in the preparation of peptide arrays
The present invention relates to arrays of peptidic molecules and the preparation of peptide arrays using focused acoustic energy. The arrays are prepared by acoustically ejecting peptide-containing fluid droplets from individual reservoirs towards designated sites ...
08/15/2006
7066194Valve design and configuration for fast delivery system
Embodiments of the present invention relate to a method and apparatus for rapid delivery of pulses of one or more reactants to a substrate processing chamber. One embodiment of a valve body includes a first inlet, a second inlet, and an outlet. A valve chamber is in...
06/27/2006
7056806Microfeature workpiece processing apparatus and methods for controlling deposition of materials on microfeature workpieces
The present disclosure provides methods and apparatus useful in depositing materials on batches of microfeature workpieces. One implementation provides a method in which a quantity of a first precursor gas is introduced to an enclosure at a first enclosure pressure....
06/06/2006
7048869Plasma processing apparatus and a plasma processing method
In an oxide film etching process, a plasma having a suitable ratio of CF3, CF2, CF, F is necessary, and there is a problem in that the etching characteristic fluctuates with a temperature fluctuation of the etching chamber. Using a UHF type ECR...
05/23/2006
7041335Titanium tantalum nitride silicide layer
Methods and apparatus of forming titanium tantalum silicon nitride (TixTay(Si)Nz) layers are described. The titanium tantalum silicon nitride (TixTay(Si)Nz) layer may be formed using a cyclical deposi...
05/09/2006
7026371Electron beam curable urethane resin for magnetic recording medium, method of manufacturing the same, and magnetic recording medium using the same
An electron-beam curable polyurethane resin for magnetic recording media is produced by modifying a polyurethane resin having active hydrogen in the molecule thereof with a compound having at least two acrylic double bonds, wherein the modification is performed on t...
04/11/2006
7014786Methods and apparatus for forming submicron patterns on films
A method for forming a patterned film on a substrate, the method including: providing a first flowable medium on the substrate and a second flowable medium on the first flowable medium, the first and second flowable media having different dielectric properties and d...
03/21/2006
6998014Apparatus and method for plasma assisted deposition
Embodiments of the present invention relate to an apparatus and method of plasma assisted deposition by generation of a plasma adjacent a processing region. One embodiment of the apparatus comprises a substrate processing chamber including a top shower plate, a powe...
02/14/2006
6975109Method for forming a magnetic sensor that uses a Lorentz force and a piezoelectric effect
A method and apparatus for sensing a presence of a magnetic field and/or a magnitude of a magnetic flux density of the magnetic field. A direct-current voltage is applied across a first layer of a conductive material, so that a direct current flows in a first direct...
12/13/2005
6970154Fringe-field filter for addressable displays
The display kit of the present invention comprises: an addressable display medium configured to exhibit a first aspect under the influence of an addressing vector field in a first direction at an addressing magnitude; and an addressor; where the addressor is configu...
11/29/2005
6958308Deposition of dispersed metal particles onto substrates using supercritical fluids
A method for producing dispersed metal particles on a substrate and the compositions produced is disclosed. A method for producing the particles comprises exposing an organometallic and a particulate substrate to supercritical or near supercritical fluid under condi...
10/25/2005
6955211Method and apparatus for gas temperature control in a semiconductor processing system
A method and apparatus for controlling the temperature of at least one gas flowing into a processing chamber is provided. In one embodiment, a gas temperature control apparatus for semiconductor processing includes a gas delivery line coupled between a processing ch...
10/18/2005
6956098High modulus polyimide compositions useful as dielectric substrates for electronics applications, and methods relating thereto
The substrates of the present invention comprise a polyimide base polymer derived at least in part from collinear monomers together with crankshaft monomers. The resulting polyimide material has been found to provide advantageous properties, particularly for electro...
10/18/2005
6951804Formation of a tantalum-nitride layer
A method of forming a tantalum-nitride layer (204) for integrated circuit fabrication is disclosed. Alternating or co-reacting pulses of a tantalum containing precursor and a nitrogen containing precursor are provided to a chamber (100) to form layers ...
10/04/2005
6949450Method for integrated in-situ cleaning and subsequent atomic layer deposition within a single processing chamber
A system and sequential method for integrated, in-situ modification of a substrate and subsequent atomic layer deposition of a thin film onto the substrate in an evacuated chamber includes introducing at least one feed gas into the chamber; generating a plasma from ...
09/27/2005
6939801Selective deposition of a barrier layer on a dielectric material
A method to selectively deposit a barrier layer on dielectric material that surrounds one or more metal interconnects on a substrate is disclosed. The barrier layer is selectively deposited on the metal film using a cyclical deposition process including a predetermi...
09/06/2005
6929048Laser transfer of organic material from a donor to form a layer in an OLED device
Apparatus for permitting the laser transfer of organic material from a donor onto a substrate to form a layer of organic material on one or more OLED devices, wherein the donor includes a laser light-absorbing layer, and a layer with heat transferable organic materi...
08/16/2005
6923877Method and apparatus for improving material properties
A method and apparatus for improving the properties of a material of a workpiece by laser shock peening in which an overlay which is opaque to a laser beam, and an overlay which is translucent to said laser beam, are applied to a surface of a workpiece. The transluc...
08/02/2005
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