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A mouse device for use as an input device of a computer is provided that includes a housing in which recording paper is loadable, and a printer unit provided within the housing for printing on the recording paper print information received from the computer.
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| Number | Title | Issue Date |
| 8431190 | Method for depositing hard metallic coatings A method for depositing a hard metallic chrome coating or similar metal by chemical vapor deposition on a metallic substrate, includes: a) preparing a solution containing, in an oxygen-free solvent, i) a molecular compound of the bis(arene) family that's a precursor... | 04/30/2013 |
| 8404306 | Method for the deposition of a ruthenium containing film The invention concerns the use of the ruthenium containing precursor having the formula (Rn-chd)Ru(CO)3, wherein: (Rn-chd) represents a cyclohexadiene (chd) ligand substituted wi... | 03/26/2013 |
| 8343583 | Method for vaporizing non-gaseous precursor in a fluidized bed Methods and systems for depositing a film on a substrate are disclosed. In one embodiment, a method includes converting a non-gaseous precursor into vapor phase. Converting the precursor includes: forming a fluidized bed by flowing gas at a sufficiently high flow ra... | 01/01/2013 |
| 8277889 | Film formation method and film formation apparatus A film formation method is disclosed for depositing a metal film on a target substrate by supplying a metal carbonyl source in gas phase to a surface of the target substrate and decomposing the source near the surface of the target substrate. The method includes a s... | 10/02/2012 |
| 8202574 | Process for the vapor phase aluminization of a turbomachine metal part and donor liner and turbomachine vane comprising such a liner An aluminization process by vapor phase deposition for high-temperature oxidation protection of a metal turbomachine part. The part including a cavity into which a metal component is introduced and assembled from an opening in the part. A halide is formed by reactio... | 06/19/2012 |
| 7985450 | Method for thin film vapor deposition of a dialkyl amido dihydroaluminum compound A method for the vapor deposition of aluminum films is provided. Such method employs a dialkyl amido dihydroaluminum compound of the formula [H2AlNR1R2]n wherein R1 and R2 are the same or different al... | 07/26/2011 |
| 7645485 | Chromiumm diffusion coatings There is provided a method for applying an improved chromium diffusion coating on an industrial item such as a turbine blade of a gas turbine engine. Chromium and other active metals are combined to form an alloy coating. Active elements include silicon, hafnium, zi... | 01/12/2010 |
| 7553517 | Method of applying a cerium diffusion coating to a metallic alloy A method of applying a cerium diffusion coating to a preferred nickel base alloy substrate has been discovered. A cerium oxide paste containing a halide activator is applied to the polished substrate and then dried. The workpiece is heated in a non-oxidizing atmosph... | 06/30/2009 |
| 7547464 | Organometallic precursor compounds This invention relates to organometallic precursor compounds represented by the formula (L)M(L′)2(NO) wherein M is a Group 6 metal, L is a substituted or unsubstituted anionic ligand and L′ is the same or different and is a π acceptor ligand, a proce... | 06/16/2009 |
| 7442417 | Method for reaction control coating A method for reaction control coating includes: (a) a step of applying a reaction control material to a surface of an Ni-base superalloy before applying aluminum diffusion coating to the Ni-base superalloy, wherein the reaction control material is Co, Cr or Ru, or a... | 10/28/2008 |
| 7439338 | Beta-diketiminate ligand sources and metal-containing compounds thereof, and systems and methods including same The present invention provides metal-containing compounds that include at least one β-diketiminate ligand, and methods of making and using the same. In certain embodiments, the metal-containing compounds include at least one β-diketiminate ligand with at least one... | 10/21/2008 |
| 7429403 | Gas distributor for vapor coating method and container A method for introducing an inert carrier gas into a coating container used to provide a metallic coating on articles. The method includes introducing the inert carrier gas into the coating container as a plurality of carrier gas streams proximate the top of the coa... | 09/30/2008 |
| 7419699 | CVD process for forming a thin film The present invention is a CVD process for forming a thin film which includes a step of recovering an organometallic compound component from an exhaust gas which has been conventionally discarded, and a purifying step of purifying the recovered organometallic compou... | 09/02/2008 |
| 7416763 | Process for forming metal layers A process in which a base metal film is formed on the surface of a plastic film using a dry plating process, and a liquid containing an organic monomer is then brought in contact with the base metal film, thereby selectively forming a conductive organic polymer coat... | 08/26/2008 |
| 7378134 | Method of forming high temperature corrosion resistant film Disclosed is a method of forming a high-temperature corrosion-resistant film, which comprises placing a container containing a film-forming fine powder and a target member capable of being heated by an electric current heating process, in an atmosphere-controllable ... | 05/27/2008 |
| 7374701 | Organometallic precursor composition and method of forming metal film or pattern using the same A composition of (i) an organometallic precursor containing a hydrazine compound coordinating with a central metal thereof and (ii) an organometallic compound of a main group metal and a method of forming metal film or pattern using this composition. ... | 05/20/2008 |
| 7371428 | Duplex gas phase coating Method of forming different diffusion aluminide coatings on different surface regions of the same superalloy substrate involves positioning the substrate in a coating chamber having a aluminum-bearing coating gas flowing therein with a first substrate surface region... | 05/13/2008 |
| 7354622 | Method for forming thin film and apparatus for forming thin film A shower head having a plurality of ejection holes for supplying an organic metal gas at uniform density to the surface of a substrate and a plurality of ejection holes for supplying an oxidizing gas at uniform density to the same is provided in a reaction furnace o... | 04/08/2008 |
| 7348042 | Continuous method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD) The present invention relates to an enhanced sequential atomic layer deposition (ALD) technique suitable for deposition of barrier layers, adhesion layers, seed layers, low dielectric constant (low-k) films, high dielectric constant (high-k) films, and other conduct... | 03/25/2008 |
| 7323581 | Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition A metalorganic complex composition comprising a metalorganic complex selected from the group consisting of: metalorganic complexes comprising one or more metal central atoms coordinated to one or more monodentate or multidentate organic ligands, and complexed with o... | 01/29/2008 |
| 7323220 | Gas phase growth system, method of operating the system, and vaporizer for the system A method of operating a gas phase growth system is disclosed. The method includes a processing stage and a stabilizer feeding stage. In a non-limiting embodiment of the disclosure, an organometallic complex is vaporized by a vaporizer, and subsequently fed to a reac... | 01/29/2008 |
| 7323230 | Coating for aluminum component A coated aluminum component for a substrate processing chamber comprises an aluminum component having a surface; a first aluminum oxide layer formed on the surface of the aluminum component, the aluminum oxide layer having a surface comprising penetrating surface fe... | 01/29/2008 |
| 7311946 | Methods for depositing metal films on diffusion barrier layers by CVD or ALD processes A process is described for depositing a metal film on a substrate surface having a diffusion barrier layer deposited thereupon. In one embodiment of the present invention, the process includes: providing a surface of the diffusion barrier layer that is substantially... | 12/25/2007 |
| 7282445 | Multiple seed layers for interconnects One embodiment of the present invention is a method for depositing two or more seed layers over a substrate, the substrate includes a patterned insulating layer which comprises at least one opening surrounded by a field, the at least one opening and the field being ... | 10/16/2007 |
| 7282408 | Surface treatment of an oxide layer to enhance adhesion of a ruthenium metal layer A method for forming a ruthenium metal layer on a dielectric layer comprises forming a silicon dioxide layer, then treating the silicon dioxide with a silicon-containing gas, for example silicon hydrides such as silane, disilane, or methylated silanes. Subsequently,... | 10/16/2007 |
| 7273635 | Method of forming aluminide diffusion coatings Method of forming an outwardly grown aluminide diffusion coating on a superalloy substrate disposed in a coating retort including the steps of heating the substrate to a temperature of 900 to 1200 degrees C., flowing a coating gas comprising aluminum trichloride and... | 09/25/2007 |
| 7271071 | Method of forming a catalytic surface comprising at least one of Pt, Pd, Co and Au in at least one of elemental and alloy forms The invention includes methods of forming a substrate having a surface comprising at least one of Pt, Pd, Co and Au in at least one of elemental and alloy forms. In one implementation, a substrate is provided which has a first substrate surface comprising at least o... | 09/18/2007 |
| 7265233 | Organometallic iridium compound, process for producing the same and process for preparing film An organometallic iridium compound having low melting point, excellent vaporization characteristic and low film formation temperature on a substrate, a process for producing the compound, and a process for preparing iridium-based films using the organometallic compo... | 09/04/2007 |
| 7253124 | Process for defect reduction in electrochemical plating A pre-ECD surface treatment. After forming the barrier material (110) and seed layer (112), the surface of the seed layer (112) is treated with an H2 plasma to remove surface contamination (122), reduce any CuOx (... | 08/07/2007 |
| 7250220 | Bond strength of coatings to ceramic components An improved component for use in a deposition chamber is constructed from ceramic zirconia and a stabilizing compound. The zirconia is preferably in a partially stabilized form and is coated with a metallic layer such as thermally sprayed aluminum. The surface of th... | 07/31/2007 |
| 7241350 | Corrosion resistant poly-metal diffusion coatings and a method of applying same Diffusion metallic anticorrosive zinc-iron-aluminum coatings of iron and iron-based item surfaces, realized by heating of products at temperatures of 370–450° C. in a saturating powder mixture environment in a closed container. The coating compositions are multip... | 07/10/2007 |
| 7238822 | Ruthenium compound and process for producing a metal ruthenium film A ruthenium compound from which high-quality film-like metal ruthenium can be obtained and a process for producing a metal ruthenium film from the ruthenium compound by chemical vapor deposition. The ruthenium compound as a material for chemical vapor deposit... | 07/03/2007 |
| 7232616 | Organic electroluminescent materials and devices made from such materials A class of organic metal complexes with mixed ligands for organic light emitting diodes are designed and characterized as the formula:(L2L3M)n. In this formula: L2 is a bidentate ligand which has at least one coordinate atom of oxyge... | 06/19/2007 |
| 7226640 | Method of fabricating iridium-based materials and structures on substrates A method of forming an iridium-containing film on a substrate, from an iridium-containing precursor thereof which is decomposable to deposit iridium on the substrate, by decomposing the precursor and depositing iridium on the substrate in an oxidizing ambient enviro... | 06/05/2007 |
| 7202167 | Method of forming a diffusion barrier A barrier limits the diffusion of a metal, such as copper, into an insulating layer. The barrier may take the form of insulating layer made of a silicon carbide type material which has been exposed to ionised hydrogen subsequent to deposition. Preferably the materia... | 04/10/2007 |
| 7199052 | Seed layers for metallic interconnects One embodiment of the present invention is a method for making copper or a copper alloy interconnects, which method includes: (a) forming a patterned insulating layer over a substrate, the patterned insulating layer including at least one opening and a field surroun... | 04/03/2007 |
| 7192624 | Method for obtaining thermal diffusion coating Continuously operating furnace and method for obtaining thermal diffusion coating on the outside surface of metallic articles. The furnace is configured as a tunnel through which in succession are advanced closed containers filled with the processed articles and wit... | 03/20/2007 |
| 7182979 | High efficiency method for performing a chemical vapordeposition utilizing a nonvolatile precursor A method directed to the use of a nonvolatile precursor, either a solid or liquid precursor, suitable for CVD, including liquid source CVD (LSCVD). Using the method of the invention the nonvolatile precursor is dissolved in a solvent. Choice of solvent is typically ... | 02/27/2007 |
| 7166323 | Method of coating catalyst carrier layer of metal-metal oxide, method of depositing active catalyst particles onto metal substrates for preparing metal monolith catalyst modules, and module thereby Disclosed is a method of coating a porous carrier layer of metal-metal oxide and depositing an active catalyst component on metal substrates, and a monolith module useful as a catalytic reactor with low pressure drop prepared using the metal substrate having the dep... | 01/23/2007 |
| 7163718 | Method of selective region vapor phase aluminizing A process for forming diffusion aluminide coatings on an uncoated surface of a substrate, without interdiffusing a sufficient amount of aluminum into a coating layer to adversely affect the coating growth potential and mechanical properties of said coating layer. A ... | 01/16/2007 |