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| Number | Title | Issue Date |
| 7195679 | Versatile system for wafer edge remediation The present invention provides a system (200, 300) for remediating aberrations along the perimeter of a semiconductor wafer (202). The system includes a cleaning apparatus (204) within which the wafer is spun within a confined area. A chuck (... | 03/27/2007 |
| 7018481 | Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle There is disclosed a substrate treating method comprising supplying a treating solution onto a substrate, and continuously discharging a first cleaning solution to the substrate from a first discharge region disposed in a nozzle, while moving the nozzle and substrat... | 03/28/2006 |
| 6910816 | Digital film processing method A method of developing a latent image on a photographic element (such as imagewise exposed photographic film) by absorbing a dye precursor into the film, applying a developer solution to the film to develop the latent image and form a dye in the film, scanning the f... | 06/28/2005 |
| 6309115 | Method and apparatus for photofinishing a photosensitive media and/or ordering of image products A method and apparatus for developing a portion of a photosensitive media having an exposed undeveloped image thereon. The apparatus includes a transport mechanism for moving the photosensitive media along a processing path; a reservoir containing a proce... | 10/30/2001 |
| 6238108 | Image forming apparatus Water is first applied to a film by an applying device. Next, the film to which water is applied is heated and conveyed by a single heating drum. Plural chemical reactions are conducted in such a manner that a development processing sheet and a fixing pro... | 05/29/2001 |
| 6010254 | Liquid ejection apparatus A liquid ejection apparatus includes an ejection tank disposed above a conveying path and storing an image-forming solvent, a nozzle plate provided at the ejection tank as a bottom wall of the ejection tank and having a plurality of nozzle holes for eject... | 01/04/2000 |
| 5988896 | Method and apparatus for electronic film development An improved developer application method and apparatus for use in electronic film development, wherein the developer is applied to a photographic film using controlled, aerial deposition of one or more stream(s) of droplets of one or more developer agents... | 11/23/1999 |
| 5834155 | Image forming process An image forming process comprising the steps of: imagewise-exposing a heat developable light-sensitive material comprising a support having thereon at least a light-sensitive silver halide, a binder and a dye-donating compound, wherein the dye-donating c... | 11/10/1998 |
| 5701544 | Process for producing color filter A color filter is produced through the steps of: forming a layer of a color filter material including a colorant dispersed in a photosensitive resin on a substrate; and pre-baking, exposing and developing the color filter material layer to leave a color f... | 12/23/1997 |
| 5698382 | Processing method for silver halide color photographic light-sensitive material A method for processing a silver halide color photographic light-sensitive material comprising a color developing process is disclosed. The color developing process comprises the first step of supplying one of a first color developing partial solution con... | 12/16/1997 |
| 5159374 | Water sealing develop ring During development of photoresist on the frontside of a semiconductor wafer, developer solution is prevented from contaminating the backside of a wafer by using a film of de-ionized water to seal the backside. The wafer is mounted to a vacuum chuck, which... | 10/27/1992 |
| 4929975 | Automatic film processor An automatic film processor for passing an exposed film successively through a series of treating liquid vessels respectively containing developing liquid, fixing liquid and rinsing water is provided. The film processor comprises pump means for forming a ... | 05/29/1990 |
| 4922277 | Silicon wafer photoresist developer To provide for improved uniformity of photoresist developing of silicon wafers, developer solution is injected via an inlet port through a set of holes in a surface in a chuck and distributed across the wafer thereby developing the wafer pattern. A second... | 05/01/1990 |
| 4736221 | Method and device for processing photographic film using atomized liquid processing agents Since the prior art photographic film processing methods use a large number of rollers, if the liquid processing agent is adhered an crystallized on such rollers, it often causes uneven processing or damages film surfaces to deteriorate the quality of fin... | 04/05/1988 |
