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| Number | Title | Issue Date |
| 8147153 | Rinsing method, developing method, developing system and computer-read storage medium The present invention provides a rinsing method capable of satisfactorily rinsing the surface of a resist film regardless of the condition of the surface of the resist film so that development defects caused by residuals produced by development may be reduced. A rin... | 04/03/2012 |
| 7841787 | Rinsing method, developing method, developing system and computer-read storage medium The present invention provides a rinsing method capable of satisfactorily rinsing the surface of a resist film regardless of the condition of the surface of the resist film so that development defects caused by residuals produced by development may be reduced. A rin... | 11/30/2010 |
| 7387455 | Substrate processing device, substrate processing method, and developing device Rinsing nozzles 310a to 310e are moved on a wafer W while they are discharging rinsing solution 326. At that point, discharging openings 317a to 317e are contacted to developing solution 350 coate... | 06/17/2008 |
| 7361234 | Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines Stepper and/or scanner machines including cleaning devices and methods for cleaning stepper and/or scanner machines are disclosed herein. In one embodiment, a stepper and/or scanner machine includes a housing, an illuminator, a lens, a workpiece support, a cleaning ... | 04/22/2008 |
| 7350906 | Ink supply arrangement incorporating sets of passages for carrying respective types of ink An ink supply arrangement is provided for supplying ink to an inkjet printhead. The ink supply arrangement includes an elongate ink distribution molding, in turn, defining a printhead channel in which the printhead can be received. The ink distribution molding furth... | 04/01/2008 |
| 7332056 | Thin film removing device and thin film removing method A thin film removing device and a thin film removing method are capable of removing straight parts of a thin film formed on a square substrate from corners of the substrate, and of suppressing the formation of mists. An approach stage 20 having flat stage pla... | 02/19/2008 |
| 7315033 | Method and apparatus for reducing biological contamination in an immersion lithography system Disclosed are a method of reducing biological contamination in an immersion lithography system and an immersion lithography system configured to reduce biological contamination. A reflecting element and/or an irradiating element is used to direct radiation to kill b... | 01/01/2008 |
| 7303633 | Apparatus for producing optical information recording medium A method for producing an optical information recording medium includes the steps of: coating a solution for forming a dye recording layer onto a surface of a rotating disc-shaped resin substrate; and discharging a cleaning solution from a nozzle onto a peripheral e... | 12/04/2007 |
| 7300598 | Substrate processing method and apparatus The invention relates to a process including a chemical liquid treatment and a rinse liquid treatment on a substrate, more particularly to a technique for reducing consumption of a chemical liquid while achieving uniform process and preventing particle generation. I... | 11/27/2007 |
| 7287919 | Developing process and apparatus The invention discloses a developing apparatus and a developing process. Wherein the developing process comprises following steps. First, a developing apparatus and a substrate are provided, wherein the developing apparatus comprises a conveyer and a nozzle. Then, t... | 10/30/2007 |
| 7281869 | Coating and developing system and coating and developing method A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist fil... | 10/16/2007 |
| 7275879 | Processing device of photo-sensitive material Disclosed is a processing device of a photo-sensitive material which comprises a conveying device for conveying a photo-sensitive material, a slot die for applying a processing liquid to the photo-sensitive material conveyed by the conveying device, a reservoir tank... | 10/02/2007 |
| 7263240 | Method, system, and software for improving signal quality using pyramidal decomposition A method, system, and software are disclosed for improving the quality of a signal. A base signal is recursively decomposed for a desired number of pyramid levels. The decomposed signal from the lowest level is modified to generate a preprocessed signal. The preproc... | 08/28/2007 |
| 7255975 | Yield and line width performance for liquid polymers and other materials Systems and methods are described for improved yield and line width performance for liquid polymers and other materials. A method for minimizing precipitation of developing reactant by lowering a sudden change in pH includes: developing at least a portion of a polym... | 08/14/2007 |
| 7252778 | Etching method and etching device An etching method and etching device are provided, enabling uniform rendering of the thickness of a film for processing on a wafer regardless of the film thickness profile thereof, and thereby enabling global planarizing of the wafer surface. In an etching method, t... | 08/07/2007 |
| 7241061 | Coating and developing system and coating and developing method A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist fil... | 07/10/2007 |
| 7237967 | Developing apparatus and method A developing apparatus and method is provided in which the use amount of a developing solution can be reduced without deteriorating the accuracy of development. The developing apparatus comprises a new solution tank for storing an unused developing solution and a us... | 07/03/2007 |
| 7229154 | Ink ejection nozzle with a thermal bend actuator An ink ejection nozzle comprises a chamber for holding ink to be ejected, the chamber having an opening defined in a roof structure; and a thermal bend actuator for ejecting droplets of ink from the chamber through the opening. The bend actuator is configured as a c... | 06/12/2007 |
| 7219989 | Overcoat composition for image recording materials The invention relates to an overcoat composition for an imaged image-recording element, the overcoat composition comprising an aqueous carrier, an optional humectant, an optional surfactant, and 0.05 to 20 weight percent, based on the total weight of the overcoat co... | 05/22/2007 |
| 7208263 | Method for manufacturing photosensitive resin printing plate, and developer treatment device A method for making a photosensitive resin printing plate which comprises at least (1) the exposure step of forming a latent image in an aqueous-developable photosensitive resin layer of a printing plate material by irradiating the printing plate material with a ray... | 04/24/2007 |
| 7159968 | Printhead integrated circuit comprising thermal bend actuator A printhead integrated circuit comprising a drive circuitry and a plurality of nozzles is provided. Each nozzle comprises a chamber for holding ink to be ejected, the chamber having an opening defined in a roof structure; and a thermal bend actuator for ejecting dro... | 01/09/2007 |
| 7125584 | Method for forming a liquid film on a substrate A liquid film forming method of dropping a liquid adjusted to be spread into a give amount on a substrate to be processed from a dropping nozzle or dropping nozzles of a dropping unit onto the substrate, and then moving the dropping unit and the substrate relatively... | 10/24/2006 |
| 7125454 | Device for selectively moistening envelope flaps This invention relates to a device for moistening envelope flaps, comprising a reservoir of liquid, means for pumping this liquid and, disposed transversely with respect to a direction of advance of the envelopes and inclined with respect to a horizontal plane for s... | 10/24/2006 |
| 7113627 | Location of extended linear defects A method of locating a linear defect on a photographic element, the element having a useful imaging width and the defect aligned with length of the element, includes the steps of: exposing a region of the element to create a latent image which is substantially unifo... | 09/26/2006 |
| 7094522 | Developing method, substrate treating method, and substrate treating apparatus A developing method comprises determining in advance the relation of resist dissolution concentration in a developing solution and resist dissolution speed by the developing solution, estimating in advance the resist dissolution concentration where the resist dissol... | 08/22/2006 |
| 7079701 | Concealed object recognition A method for viewing a first object that is obstructed by a second object. In such a method, the first object has a contrasting color to the second object and the second object is constructed from a material that allows visible light to pass therethrough. The amount... | 07/18/2006 |
| 7067010 | Indexing spray machine The machine is an index spraying machine. The machine has five different stations. The first station is the load/unload station. At this station, work pieces are unloaded after they have been sprayed and new work pieces to be sprayed are loaded on. New pieces then m... | 06/27/2006 |
| 7066576 | Micro-electromechanical drive mechanism arranged to effect rectilinear movement of working member A micro-electromechanical drive mechanism is provided, comprising at least two elongate drive members and associated coupling structures coupled to a working member. The drive members each incorporate an electrical circuit in electrical contact with drive circuitry ... | 06/27/2006 |
| 7041172 | Methods and apparatus for dispensing semiconductor processing solutions with multi-syringe fluid delivery systems Methods and apparatus for controllably dispensing photoresist solutions and other fluids in semiconductor manufacturing equipment from an array of syringe-based fluid dispensers. A multi-syringe fluid dispensing system is provided for photoresist coating within a wa... | 05/09/2006 |
| 7041434 | Technique for enhancing accuracy of critical dimensions of a gate electrode by using characteristics of an ARC layer In an improved technique for adjusting an etch time of a resist trim process, additional measurement data representing an optical characteristic, such as the reflectivity of an anti-reflective coating, is used. Since the initial thickness of the resist mask features... | 05/09/2006 |
| 7033089 | Method of developing a resist film and a resist development processor The present invention provides a resist development processor consisting of a development processing chamber for storing a resist substrate having an exposed resist on the substrate and for developing the exposed resist by means of a development solvent consisting o... | 04/25/2006 |
| 7025514 | Development apparatus for manufacturing semiconductor device A development apparatus for discharging a developer onto a surface of a semiconductor substrate (15) comprises a nozzle pipe (13) for supplying the developer, and a nozzle (14) having a shape of a spoon with a taper and discharging the developer... | 04/11/2006 |
| 7018115 | Washing method and apparatus An apparatus for washing contaminants from a coated surface of a material comprises an inclined substantially planar surface up which the material is passed, an inlet for the introduction of wash solution at the upper part of the planar surface and pressure applying... | 03/28/2006 |
| 7018481 | Substrate treating method, substrate-processing apparatus, developing method, method of manufacturing a semiconductor device, and method of cleaning a developing solution nozzle There is disclosed a substrate treating method comprising supplying a treating solution onto a substrate, and continuously discharging a first cleaning solution to the substrate from a first discharge region disposed in a nozzle, while moving the nozzle and substrat... | 03/28/2006 |
| 7018016 | Fluidic seal for an ink jet nozzle assembly An ink jet nozzle assembly 10 includes a substrate 16. A nozzle 22 is displaceably arranged relative to the substrate 16. The nozzle 22 defines a nozzle opening 24 such that, in use, upon displacement of the nozzle 22 | 03/28/2006 |
| 7020344 | Match blur system and method A method for blurring in signal processing, for example, in digital film processing, is performed with digital artifacts. The digital artifacts are derived, such as by scanning, and include a noisy artifact and a less noisy artifact. The artifacts are subdivided int... | 03/28/2006 |
| 7016080 | Method and system for improving scanned image detail Methods are provided for generating a dynamic image mask for improving image detail in a digital image. An electronic representation of an image is scanned. A dynamic image mask is generated from the electronic representation of the image. The dynamic image mask has... | 03/21/2006 |
| 6965692 | Method and apparatus for improving the quality of reconstructed information Image processing apparatus and methods according to the present invention are described in which data for each color channel are separately processed, on a pixel by pixel basis, such that the data associated with the primary color channel is filtered less than the c... | 11/15/2005 |
| 6963789 | Substrate processing apparatus control system and substrate processing apparatus A controller is connected to a substrate processing apparatus and an exposure apparatus. A pilot substrate subjected to a series of processing as preprocessing is transported to an inspection unit. An inspection result determination part compares inspection results ... | 11/08/2005 |
| 6952294 | Method of reading an image, method of forming a color image, device for forming a color image, silver halide color photosensitive material, and a device for processing a photosensitive material The present invention relates to a method of reading an image, which comprises exposing a color photosensitive material having at least three photosensitive layers containing blue-, green- and red-photosensitive silver halide emulsions, respectively, on a transparen... | 10/04/2005 |
