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Patent No. 5687752

Dining Table Having Integral Dishwasher

A space-saving dishwasher, which may be installed within a counter top or table, having a dish-carrying rack that is vertically shiftable through the open top of the dishwasher for facilitating loading and unloading of the dishes.

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Class 392/388 - For metal vapor deposition


Subclass of Class 392 - Electric resistance heating devices
Definition: Subject matter wherein the heating device is disclosed for
No. of patents: 70
Last issue date: 05/29/2012


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NumberTitleIssue Date
8190006Nozzle-based, vapor-phase, plume delivery structure for use in production of thin-film deposition layer
A vapor deposition source including a crucible configured to hold a quantity of molten constituent material and at least one nozzle to pass vapor evaporated from the molten constituent material out of the crucible. ...
05/29/2012
7760992Nozzle-based, vapor-phase, plume delivery structure for use in production of thin-film deposition layer
A vapor deposition source including a crucible configured to hold a quantity of molten constituent material and at least one nozzle to pass vapor evaporated from the molten constituent material out of the crucible. ...
07/20/2010
7489857Process and apparatus for producing powders of metal compound containing oxygen, and the powders produced by the process
An apparatus for producing powders of metal compound containing oxygen comprising a liquid flow controller, a vaporizer and a reactor, which consists essentially of: means for feeding a gas containing a material and oxygen; means for heating the gas from the side su...
02/10/2009
7429361Method and apparatus for providing precursor gas to a processing chamber
In one embodiment, an apparatus for generating a gaseous chemical precursor used in a vapor deposition processing system is provided which includes a canister comprising a sidewall, a top, and a bottom encompassing an interior volume therein, an inlet port and an ou...
09/30/2008
7319079Container for evaporation of metal and method to manufacture thereof
A refractory container for evaporating metals, having significantly improved useful life and corrosion resistance properties, said container consists essentially of a refractory boride, boron nitride, and about 0.10 to 10 wt. % of a rare earth metal compound selecte...
01/15/2008
7300038Method and apparatus to help promote contact of gas with vaporized material
Structure helps support material in a container with an increased exposed surface area to help promote contact of a gas with vaporized material. For at least one disclosed embodiment, the structure may help support material for vaporization in the same form as when ...
11/27/2007
7291224Covering assembly for crucible used for evaporation of raw materials
The present invention provides an assembly comprising two plates or covers, one of which being an outermost plate or cover, and both, at least in part having a perforation pattern over a surface area covering an open side of a crucible having a bottom and surroundin...
11/06/2007
7204886Apparatus and method for hybrid chemical processing
A method and apparatus for performing multiple deposition processes is provided. In one embodiment, the apparatus includes a chamber body and a gas distribution assembly disposed on the chamber body. In one embodiment, the method comprises positioning a substrate su...
04/17/2007
7194197Nozzle-based, vapor-phase, plume delivery structure for use in production of thin-film deposition layer
A vapor deposition source including a crucible configured to hold a quantity of molten constituent material and at least one nozzle to pass vapor evaporated from the molten constituent material out of the crucible. ...
03/20/2007
7190891Heating-cooling system for a nozzle
A novel nozzle heater design, that facilitates fast thermal response on demand, to achieve rapid reduction in viscosity, allowing fluid to flow through the exit aperture of the nozzle with less pressure, reduced surface tension and elastic behavior at break off. A r...
03/13/2007
7186385Apparatus for providing gas to a processing chamber
An apparatus for generating gas for a processing system is provided. In one embodiment, an apparatus for generating gas for a processing system includes a canister having at least one baffle disposed between two ports and containing a precursor material. The precurs...
03/06/2007
7175713Apparatus for cyclical deposition of thin films
An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases i...
02/13/2007
7141497MOCVD apparatus and method
An MOCVD apparatus includes a raw material supply section configured to supply a process raw material into a process chamber. The raw material supply section includes a bubbling unit that stores an organic metal raw material in a liquid state. A carrier gas line is ...
11/28/2006
7122085Sublimation bed employing carrier gas guidance structures
Preferred embodiments of the present invention provides a sublimation system employing guidance structures including certain preferred embodiments having a high surface area support medium onto which a solid source material for vapor reactant is coated. Preferably, ...
10/17/2006
7070658Vapor deposition apparatus
A vapor deposition apparatus, developed in particular for on-line deposition of phosphor or scintillator material, wherein said vapor deposition apparatus comprises a crucible containing a mixture of raw materials, a chimney having at least one inlet in communicatio...
07/04/2006
7003215Vapor flow controller
A vapor flow controller apparatus for delivery of chemical reagent vapors from a liquid phase source material is provided which includes a source container containing the liquid phase source material, a pump to transport the liquid phase source material to a vaporiz...
02/21/2006
6982005Multiple-nozzle thermal evaporation source
A multiple nozzle thermal evaporation source includes a plurality of nozzles having a tapered shape. The nozzles may comprise a thermally conductive material having a low emissivity material. ...
01/03/2006
6957013Fluid heater
A fluid heater having a first heat exchanger block with a fluid heating tube encased therein, and having a first surface, a second heat exchanger block with a fluid heating tube encased therein and having a second surface adjacent to the first surface. A cavity is f...
10/18/2005
6924003Method of processing a nanotube using a selective solid state reaction
The present invention provides a method of processing a nanotube, comprising the steps of: causing a selective solid state reaction between a selected part of a nanotube and a reactive substance to have the selected part only become a reaction product; and separatin...
08/02/2005
6923867Substrate processing apparatus and method for manufacturing semiconductor device
A substrate processing apparatus and a method for manufacturing a semiconductor device can supply the vapor of the raw material to the substrate without fail. A main heater 22 is prepared outside the outer tube 21, an inner tube 23 is prepared i...
08/02/2005
6905541Method and apparatus of generating PDMAT precursor
A precursor and method for filling a feature in a substrate. The method generally includes depositing a barrier layer, the barrier layer being formed from pentakis(dimethylamido)tantalum having less than about 5 ppm of chlorine. The method additionally may include d...
06/14/2005
6740586Vapor delivery system for solid precursors and method of using same
A vaporizer delivery system including a sublimatable solid precursor material applied to a wire substrate for vaporizing and achieving a continuous uninterrupted delivery of a vaporized precursor to a downstream semiconductor process chamber. The coated wire substra...
05/25/2004
6718126Apparatus and method for vaporizing solid precursor for CVD or atomic layer deposition
An apparatus and method for effectively and controllably vaporizing a solid precursor material is provided. In particular, the present invention provides an apparatus that includes a housing defining a sealed interior volume having an inlet for receiving a carrier g...
04/06/2004
6709524Vapor deposition method and vapor deposition apparatus for forming organic thin films
In order to provide a vapor deposition method for forming an organic thin film, which is advantageous in that a deposition rate can be easily controlled and deposition can be conducted with stable high controllability, there is prepared a crucible which is provided ...
03/23/2004
6562405Multiple-nozzle thermal evaporation source
A multiple nozzle thermal evaporation source includes a plurality of nozzles having a tapered shape. The nozzles may be coated with a thermally conductive material with a low emissivity material....
05/13/2003
6473563Vaporizer and apparatus for vaporizing and supplying
There are disclosed a vaporizer wherein at least a portion of a CVD material feed portion in contact with a CVD material is constituted of a corrosion resistant synthetic resin; and an apparatus for vaporizing and supplying which comprises a cooler and th...
10/29/2002
6471781Method of depositing titanium nitride thin film and CVD deposition apparatus
A CVD apparatus for fabricating a titanium nitride thin film is provided. The apparatus comprises an evacuatable reaction vessel having an interior, a pumping apparatus capable of exhausting the reaction vessel and maintaining the interior of the reaction...
10/29/2002
6466738Material for aging-resistant ceramic vaporizers
A ceramic material is provided containing 45 to 55% by weight TiB2 and 40.5 to 54.7% by weight BN and 0.1-1.5% by weight Ca in the form of a compound selected from the group consisting of the calcium oxides and calcium borates and mixtures ther...
10/15/2002
6444038Dual fritted bubbler
A dual chambered bubbler vessel for use with solid organometallic source material for chemical vapor phase deposition systems, and a method for transporting a carrier gas saturated with source material for delivery into such systems. The bubbler vessel is...
09/03/2002
6424800Bubbler
A bubbler for use in vaporizing a precursor (source) for thin film deposition includes a vaporizer chamber, the vaporizer chamber having defined therein a source inlet hole, an exhaust hole and a carrier gas inlet hole; a source supply unit connected to t...
07/23/2002
6364956Programmable flux gradient apparatus for co-deposition of materials onto a substrate
An apparatus for simultaneously depositing gradients components of two or more target materials onto a substrate is disclosed. The apparatus comprises a first target material source that directs a first target material towards the substrate and a second t...
04/02/2002
6189806Metallizing device for vacuum metallizing
A metallizing device for vacuum metallizing arrangements is disclosed having a vaporizer (3) heated by an electrical heating rod (8). This vaporizer (3) is connected to a nozzle element (1) in the form of a hollow body. For the purpose of vaporizing a sub...
02/20/2001
6101316Evaporation apparatus, organic material evaporation source, and method of manufacturing thin organic film
An inactive gas is introduced into an organic material evaporation source to place a thin organic film material in the organic material evaporation source in an atmosphere having a relatively high pressure, and the temperature of the thin organic film mat...
08/08/2000
6079874Temperature probes for measuring substrate temperature
An apparatus accurately measures a temperature of a substrate in a thermal processing chamber. The apparatus has a support structure to support the substrate within the thermal processing chamber. A first probe is provided with an input end positioned to ...
06/27/2000
5966499System for delivering a substantially constant vapor flow to a chemical process reactor
A vapor delivery system for delivering a vapor-phase reactant to a chemical process reactor at a substantially constant flow rate. The vapor delivery system includes a source of a reactant material, means for converting the reactant material to a vapor an...
10/12/1999
5481086High temperature deformable crucible for use with self-resistively heated specimens
A deformable, inexpensive crucible for use with a dynamic thermo-mechanical physical test or simulating system, specifically for holding a self-resistively heated specimen (250) at liquid temperatures and particularly, though not exclusively, one suited f...
01/02/1996
5455014Liquid deposition source gas delivery system
A liquid deposition source delivery system (22) includes a reactant source (50) of a liquid chemical reactant, a first heater (54) positioned adjacent to the reactant source (50) , and a vapor collection system (56) in communication with the reactant sour...
10/03/1995
5321792Apparatus for the continuous feeding of wire to an evaporator boat
A coating material to be evaporated in an evaporator cell disposed in a vacuum chamber is fed in the form of a wire to the evaporator cell in accordance with the depth of the molten bath, by a wire transport including a motor-driven shaft or roller and a ...
06/14/1994
5266117Apparatus for the evaporative coating of substrates
A vacuum chamber contains means for transferring a substrate for an information disc such as a CD from a loading station to a coating station, where material such as aluminum in wire form is evaporated in order to coat the substrate from above. An evapora...
11/30/1993
5253266MBE effusion source with asymmetrical heaters
An effusion source, for the generation of molecular beams, adapted to be positioned at an angle to the horizontal, within a vacuum chamber, of an MBE system including heating structures around the source to create uniform temperatures across the source in...
10/12/1993
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