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| Number | Title | Issue Date |
| 7769134 | Measuring strain of epitaxial films using micro x-ray diffraction for in-line metrology In a method for use of x-ray diffraction to measure the strain on the top silicon germanium layer of an SOI substrate, the location of the peak diffraction area of an upper silicon layer of the SOI substrate is determined by first determining the peak diffraction ar... | 08/03/2010 |
| 7412131 | Multilayer optic device and system and method for making same An optic device, system and method for making are described. The optic device includes a first solid phase layer having a first index of refraction with a first photon transmission property and a second solid phase layer having a second index of refraction with a se... | 08/12/2008 |
| 7342665 | System and method for control of paint thickness The invention is directed to a system and method for implementing process control for paint thickness using sonic NDE techniques. The system may, for example, generate ultrasound waves in a test object during the manufacturing process. A detector such as an interfer... | 03/11/2008 |
| 7330279 | Model and parameter selection for optical metrology A profile model for use in optical metrology of structures in a wafer is selected, the profile model having a set of geometric parameters associated with the dimensions of the structure. A set of optimization parameters is selected for the profile model using one or... | 02/12/2008 |
| 7286241 | System and method for high-speed laser detection of ultrasound A system and method for laser light amplification provides amplification of a laser light beam emitted from a laser light source as low-amplification seed laser light signal. The low-amplification seed laser light signal is transmitted to an amplification component.... | 10/23/2007 |
| 7265754 | Method for displaying material characteristic information A system and method for displaying graphical information indicative of a plurality of material characteristics for a portion of a part under test. Energy is directed at the selected portion of the part under test. Resultant energy is detected from the selected porti... | 09/04/2007 |
| 7260178 | Diffractometer and method for diffraction analysis Diffractometer and method for diffraction analysis making use of two Euler cradles, a primary and a secondary Euler cradle. The primary Euler cradle supports a source of a radiation beam, having a collimation axis, and a radiation beam detector, having a reception a... | 08/21/2007 |
| 7258485 | X-ray thin film inspection apparatus and thin film inspection apparatus and method for patterned wafer An X-ray thin film inspection apparatus including a sample table on which an inspection target such as a product wafer or the like is mounted, a positioning mechanism for moving the sample table, a goniometer having first and second swing arms, at least one X-ray ir... | 08/21/2007 |
| 7242744 | X-ray diffraction apparatus and method In accordance with the present invention, an x-ray diffraction apparatus and method are provided in which an x-ray or goniometer head can be adjusted in different directions to allow the head to direct x-rays at a part from various positions. In this manner, measure... | 07/10/2007 |
| 7236566 | In-situ X-ray diffraction system using sources and detectors at fixed angular positions An x-ray diffraction technique for measuring a known characteristic of a sample of a material in an in-situ state. The technique includes using an x-ray source for emitting substantially divergent x-ray radiation—with a collimating optic disposed with respect to t... | 06/26/2007 |
| 7219044 | Method and system for improving a part's resistance to stress induced failure A method and system for designing a part with improved fatigue life and resistance to stress corrosion cracking in which residual stresses existing in the part are accounted for. The performance criteria and operating conditions of the part are assessed and a total ... | 05/15/2007 |
| 7208749 | System and method for locating and positioning an ultrasonic signal generator for testing purposes The invention is directed to an ultrasonic testing system. The system tests a manufactured part for various physical attributes, including specific flaws, defects, or composition of materials. The part can be housed in a gantry system that holds the part stable. An ... | 04/24/2007 |
| 7209542 | Simultaneous measurement of the reflectivity of X-ray with different orders of reflections and apparatus for measurement thereof Disclosed are an apparatus and a method for simultaneously measuring integrated reflectivity of X-rays with different orders of reflections in crystal. Continuous X-rays are incident into the crystal and reflection intensities of the X-rays reflected from the crysta... | 04/24/2007 |
| 7202475 | Rapid defect composition mapping using multiple X-ray emission perspective detection scheme Disclosed are methods and apparatus for characterizing defects by using X-ray emission analysis techniques. The X-rays are emitted in response to an impinging beam, such as an electron beam, directed towards the sample surface where a defect resides. It may also be ... | 04/10/2007 |
| 7184517 | Analytical method for determination of crystallographic phases of a sample An analytical method for determining crystallographic phases of a measuring sample comprises the steps of acquiring a diffraction pattern of the measuring sample and qualitative phase analysis of the measured diffraction pattern, acquiring an element spectrum of the... | 02/27/2007 |
| 7159470 | Systems and methods of measuring residual stress in metallic materials Systems and methods of measuring residual stress are disclosed. In one embodiment, a method of measuring residual stress in a material under test includes directing radiation onto a stressed material and detecting the resulting diffraction peaks to measure known res... | 01/09/2007 |
| 7116753 | Method for determination of elastic strains present in single-crystal wafers and device for its realization Action on the tested wafer 1 is rendered with X-ray beam 3 converging in a point located inside the wafer or under it. Determination of relative position of the interference maxima is performed for diffraction reflections from crystallographic planes h... | 10/03/2006 |
| 7116755 | Non-uniform density sample analyzing method, device and system A non-uniform density sample analyzing method for analyzing a distribution state of particle-like matter in a non-uniform density sample, where an actually measured X-ray scattering curve is an in-plane X-ray scattering curve obtained by in-plane diffraction measure... | 10/03/2006 |
| 7075073 | Angle resolved x-ray detection An apparatus for detecting properties of a sample. An electron beam generator produces an electron beam and directs the electron beam at a desired point on the sample. The sample thereby emits characteristic x-rays at takeoff angles. A collimator receives and parall... | 07/11/2006 |
| 7062015 | Method and apparatus for obtaining simultaneously absorption and refraction images by use of a monochromator with integrated radiation detector Apparatus for imaging an object (13) irradiated with an X-ray beam (12) by detecting a transmitted X-ray beam transmitted through the object. A crystal analyser (15) receives the transmitted X-ray beam and emits a first diffracted X-ray beam to ... | 06/13/2006 |
| 7038790 | Method and apparatus for detecting ultrasonic surface displacements using post-collection optical amplification The present invention detects ultrasonic displacements includes a detection laser to generate a first pulsed laser beam to detect the ultrasonic surface displacements on a surface of the target. Collection optics to collect phase modulated light from the first pulse... | 05/02/2006 |
| 7003074 | Stress measurement method using X-ray diffraction A stress of a c-axis-oriented specimen of a tetragonal polycrystal is measured using X-ray diffraction under the assumption of a plane stress state. An X-ray optical system is set in the location of φ=0°, 45° or 90°. An X-ray diffracted at a crystal plane (the d... | 02/21/2006 |
| 6964202 | Detection of rolling contact fatigue The onset of rolling contact fatigue in an object may be detected by measuring the residual stresses in the surface of the object, and monitoring changes in their magnitude or their direction. The values of residual stresses in the surface are those averaged over a ... | 11/15/2005 |
| 6909773 | Portable x-ray diffractometer In one embodiment, a portable apparatus adapted to be battery powered is used to scan an object in situ with x-rays and measure the intensity of the diffracted x-rays. The apparatus includes a scanning head having an x-ray source that is battery powered and an x-ray... | 06/21/2005 |
| 6907107 | Method and apparatus for the analysis of material composition A method is provided of analysing the composition of a semiconductor material (3) comprising irradiating the material with energy from an energy source (1) which energy is diffracted from the material, detecting one or more portions of the diffracted e... | 06/14/2005 |
| 6874369 | Stress measurement method using X-ray diffraction A stress of a c-axis-oriented specimen of a tetragonal polycrystal is measured using X-ray diffraction under the assumption of a plane stress state. An X-ray optical system is set in the location of φ=0°, 45° or 90°. An X-ray diffracted at a crystal plane (the d... | 04/05/2005 |
| 6853706 | X-ray diffraction apparatus and method In accordance with the present invention, an x-ray diffraction apparatus and method are provided in which an x-ray or goniometer head can be adjusted in different directions to allow the head to direct x-rays at a part from various positions. In this manner, measure... | 02/08/2005 |
| 6782075 | Method of making <200 nm wavelength fluoride crystal lithography/laser optical elements The invention provides for the making of | 08/24/2004 |
| 6751287 | Method and apparatus for x-ray analysis of particle size (XAPS) The apparatus comprises an X-ray source (112), a monochromator (118), a goniometer (170), a position sensitive detector (150), a mechanism to rock or rotate the sample or the X-ray source and computer means (160) for interpreting t... | 06/15/2004 |
| 6721393 | X-ray diffraction apparatus and method An x-ray diffraction apparatus and method are provided in which an x-ray or goniometer head can be adjusted in different directions to allow the head to direct x-rays at a part from various positions. In this manner, stress measurements can be taken from a wider reg... | 04/13/2004 |
| 6697453 | Portable X-ray diffractometer In one embodiment, a portable apparatus adapted to be battery powered is used to scan an object in situ with x-rays and measure the intensity of the diffracted x-rays. The apparatus includes a scanning head having an x-ray source that is battery powered a... | 02/24/2004 |
| 6493420 | Apparatus and method for in-situ measurement of residual surface stresses An apparatus for in-situ measurement of residual surface stresses comprises a compact x-ray tube and a detector. X-rays emitted by the x-ray tube are diffracted from a specimen surface and intercepted by the detector. The intercepted x-rays are converted ... | 12/10/2002 |
| 6449565 | Method and apparatus for determining in real-time the fatigue life of a structure A method and apparatus for determining the fatigue life of a structure calculate, in real time, the values for the magnitudes of the stress forces imposed at a particular location on the structure, from one or more sensed structural parameters. Also, the ... | 09/10/2002 |
| 6430432 | Deriving dimensions of a detail of an object The size of a detail of an object is derived from a data set of data values relating to the object. The data set assigns the data values to positions in a multidimensional space. A direction is selected in the multidimensional space. The spatial resolutio... | 08/06/2002 |
| 6353656 | Radioisotope based x-ray residual stress analysis apparatus A radioisotope based x-ray residual stress analysis apparatus having a shielded, monoenergetic radioisotopic source to emit x rays for measurement of the stress state of a polycrystalline material. The isotropic source is selected from spontaneously emiss... | 03/05/2002 |
| 6238941 | Characterizing of silicon-germanium areas on silicon A method for characterizing a structure including single-crystal silicon-germanium areas on a single-crystal silicon substrate, including the steps of measuring the X-ray diffraction spectrum of the structure, simulating the diffraction spectrum of a sing... | 05/29/2001 |
| 6219404 | Method of determining if an alloy article has any remaining working life A method of determining if an alloy article (28) has any remaining working life comprises taking a sample from an alloy article (28) and removing all metal matrix material from the sample to leave the carbide particles. The carbide particles are analysed ... | 04/17/2001 |
| 6058160 | Photo-sensor fiber-optic stress analysis system An x-ray diffraction system for determining stress in integrated circuit materials includes a source of x-rays (3) that are directed toward a sample holding mechanism for diffracting from the test sample (8). An x-ray detector (14) is arranged for detecti... | 05/02/2000 |
| 5625664 | Methods for the design, quality control, and management of fatigue-limited metal components Improved methods for managing a population of metal components subject to fatigue failure are provided. The residual compressive stress in the critical surfaces of such components, especially in areas of high stress concentration, are measured non-destruc... | 04/29/1997 |
| 5490195 | Method for measuring and extending the service life of fatigue-limited metal components Improved methods for managing a population of metal components subject to fatigue failure are provided. The residual compressive stress in the critical surfaces of such components, especially in areas of high stress concentration, are measured non-destruc... | 02/06/1996 |
