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Actor Marlon Brando has four patents, all named "Drumhead tensioning device and method."
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| Number | Title | Issue Date |
| 8130810 | Lasers A laser apparatus comprises a laser having a lasing chamber an inlet to the lasing chamber for a lasing gas containing a heavy noble gas and an outlet from the lasing chamber for the discharge of a flow of lasing gas, wherein the outlet is able to be paced in commun... | 03/06/2012 |
| 7873093 | Method and apparatus for carrying out a laser operation and use of a quick-change filter in such a laser operation A method and apparatus for carrying out a laser operation, wherein a laser source is provided, wherein lasing gas is supplied from at least one lasing gas source to the laser source for the formation of a laser beam, wherein, with the aid of the laser beam, an opera... | 01/18/2011 |
| 7835414 | Laser gas injection system A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas may comprise: utilizing at least one of a plurality... | 11/16/2010 |
| 7580439 | Gas laser oscillator A gas laser oscillator appropriately detecting a clogging of a laying pipe of a sub ejection apparatus is disclosed. The gas laser oscillator according to the present invention includes a laser gas flow pipe, a driving part, a divide wall, a main ejection apparatus,... | 08/25/2009 |
| 7522650 | Gas discharge laser chamber improvements A method and apparatus if disclosed which may comprise a high power high repetition rate gas discharge laser UV light source which may comprise: a gas discharge chamber comprising an interior wall comprising a vertical wall and an adjacent bottom wall; a gas circula... | 04/21/2009 |
| 7496126 | Gas laser oscillator and method of measuring laser gas replacement amount A gas laser oscillator includes a supply-side valve for regulating a laser gas supply to a gas chamber, an exhaust-side valve for regulating a laser gas exhaust from the gas chamber, a gas pressure measuring device for measuring a pressure in the gas chamber, and a ... | 02/24/2009 |
| 7469000 | Gas lasers including nanoscale catalysts and methods for producing such lasers Gas lasers including nanoscale catalysts and methods for producing such lasers are disclosed herein. In one embodiment, a gas laser includes a gas containment structure having a gas discharge region and a laser gas medium in the gas discharge region. The gas laser a... | 12/23/2008 |
| 7371358 | Catalyst for treatment and control of post-combustion emissions The present invention utilizes two precious metals with two to five different metal-oxides in a layered matrix to convert CO, HCs, and NOx to CO2, and N2 by oxidation of two components and reduction of the other in a moderately high temperature... | 05/13/2008 |
| 7372056 | LPP EUV plasma source material target delivery system An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing opt... | 05/13/2008 |
| 7372887 | Excimer laser device, laser gas exchange method and partial gas exchange quantity calculation method To provide an excimer laser device and method in which the frequency of full gas exchange within the laser chamber is reduced, and more preferably full gas exchange is made unnecessary. The gas supply device and gas exhaust device are controlled so that the l... | 05/13/2008 |
| 7369597 | Laser output light pulse stretcher Providing a high peak power short pulse duration gas discharge laser output pulse comprises a pulse stretcher a laser output pulse optical delay initiating optic diverting a portion of the output laser pulse into an optical delay having an optical delay path and com... | 05/06/2008 |
| 7365349 | EUV light source collector lifetime improvements An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plas... | 04/29/2008 |
| 7355191 | Systems and methods for cleaning a chamber window of an EUV light source Systems and methods are disclosed for cleaning a chamber window of an extreme ultraviolet (EUV) light source. The window may have an inside surface facing a chamber interior and an opposed outside surface and the light source may generate debris by plasma formation.... | 04/08/2008 |
| 7347978 | Electrically heated catalyst support plate and method for starting up water gas shift reactors A heated catalyst support device for a reactor including a reactor vessel containing a bed of catalyst particles. The device includes a permeable support plate having a channel extending therethrough, where the support plate is adapted to contact the bed of catalyst... | 03/25/2008 |
| 7342948 | Blower used for laser oscillator In an laser oscillator (100), a blower (10, 20, 120) for circulating a laser medium between an electric discharge tube (102) and a circulating passage (104) includes: a casing (12) having a suction port (12a) and an e... | 03/11/2008 |
| 7339972 | Laser filament imager An apparatus includes a gas chamber comprising a gas feed nozzle, an exhaust nozzle, and a window. The apparatus also includes a first partial reflector, in the gas chamber, sharing an optical path with the exhaust nozzle, and the window. Optionally, The apparatus i... | 03/04/2008 |
| 7339973 | Electrodes for fluorine gas discharge lasers Fluorine gas discharge laser electrodes and electrode systems that may comprise a plurality of current return tangs extending for less than the respective length of the second elongated gas discharge electrode. In addition electrodes may comprise a first discharge s... | 03/04/2008 |
| 7321607 | External optics and chamber support system A gas discharge laser and method of operating same is disclosed which may comprise a gas discharge laser chamber support structure comprising a first support arm attached to a mounting table; a gas discharge laser chamber slideably engaging the first support arm; an... | 01/22/2008 |
| 7317179 | Systems and methods to shape laser light as a homogeneous line beam for interaction with a film deposited on a substrate Systems and methods are disclosed for shaping and homogenizing a laser beam for interaction with a film. The shaping and homogenizing system may include a lens array and a lens that is positioned to receive laser light from the lens array and produce a respective el... | 01/08/2008 |
| 7317536 | Spectral bandwidth metrology for high repetition rate gas discharge lasers A bandwidth meter apparatus and method for measuring the bandwidth of a spectrum of light emitted from a laser input to the bandwidth meter which may comprise an optical bandwidth monitor providing a first output representative of a first parameter which is indicati... | 01/08/2008 |
| 7301980 | Halogen gas discharge laser electrodes A gas discharge laser includes a laser chamber containing a halogen laser gas, two electrode elements defining a cathode and an anode, each having a discharge receiving region defining two longitudinal edges and having a region width defining a width of an electric ... | 11/27/2007 |
| 7291853 | Discharge produced plasma EUV light source An DPP EUV source is disclosed which may comprise a debris mitigation apparatus employing a metal halogen gas producing a metal halide from debris exiting the plasma. The EUV source may have a debris shield that may comprise a plurality of curvilinear shield members... | 11/06/2007 |
| 7277188 | Systems and methods for implementing an interaction between a laser shaped as a line beam and a film deposited on a substrate Systems and methods are disclosed for focusing a beam for an interaction with a film deposited on a substrate wherein the focused beam defines a short axis and a long axis. In one aspect, the system may include a detecting system to analyze light reflected from the ... | 10/02/2007 |
| 7277464 | Method and apparatus for controlling the output of a gas discharge laser system The present invention relates to a fluorine gas discharge laser system and control of replenishment of fluorine gas as the gas discharge laser operates and consumes fluorine. ... | 10/02/2007 |
| 7276103 | Method and device for separating molecules having different excitation spectra The invention relates to a method for the separation of molecules having different excitation spectra, which form components of a gas. The molecules are excited by laser pulses in a way that the molecules to be separated are transferred into a state of excitation du... | 10/02/2007 |
| 7266137 | Laser gas replenishment method Output beam parameters of a gas discharge laser are stabilized by maintaining a molecular fluorine component at a predetermined partial pressure using a gas supply unit and a processor. The molecular fluorine is subject to depletion within the discharge chamber. Gas... | 09/04/2007 |
| 7263116 | Dielectric coupled COslab laser A slab laser includes two elongated electrodes arranged spaced apart and face-to-face. Either one or two slabs of a solid dielectric material extend along the length of the electrodes between the electrodes. A discharge gap is formed either between one of the electr... | 08/28/2007 |
| 7260134 | Dielectric coupled COslab laser An slab CO2 laser includes spaced-apart elongated slab electrodes. A lasing gas fills a discharge gap between the electrodes. An RF power supply is connected across the electrodes and sustains an electrical discharge in the lasing gas in the discharge gap. Either on... | 08/21/2007 |
| 7239656 | Closed-loop purging system for laser A method of minimizing contamination of optical components of a laser resonator is disclosed. The resonator components are located in an enclosure, which may contain contaminants including water vapor and organic favor released by the optical components, mounts of t... | 07/03/2007 |
| 7230959 | Tunable laser with magnetically coupled filter Laser apparatus and methods that permit actuation of a tuning element via a magnetically coupled drive assembly, and which provide for isolation of contamination-sensitive optical surfaces within a hermetically sealed enclosure with a magnetically coupled drive asse... | 06/12/2007 |
| 7230964 | Lithography laser with beam delivery and beam pointing control The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source with a beam delivery to a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam ... | 06/12/2007 |
| 7230965 | Anodes for fluorine gas discharge lasers Electrodes for a fluorine gas discharge laser are disclosed which may comprise a crown straddling the centerline axis between the pair of side walls and the pair of end walls, comprising a first material, forming at least a portion of the discharge region of the ele... | 06/12/2007 |
| 7227881 | Master oscillator—power amplifier excimer laser system A Master Oscillator (MO)—Power Amplifier (PA) configuration (MOPA) can be used advantageously in an excimer laser system for micro-lithography applications, where semiconductor manufacturers demand powers of 40 W or more in order to support the throughput requirem... | 06/05/2007 |
| 7218661 | Line selected Ftwo chamber laser system An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a pa... | 05/15/2007 |
| 7217941 | Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source A system is disclosed for protecting an internal EUV light source component from ions generated at a plasma formation site. In one aspect, the system may comprise a plurality of foil plates and an arrangement for generating a magnetic field to deflect ions into one ... | 05/15/2007 |
| 7212276 | Exposure apparatus An exposure apparatus including a pulse light source, an exposure unit which exposes a substrate to a pattern with light from the pulse light source, a determination unit which determines necessity of maintenance for the pulse light source based on a pulse rate of t... | 05/01/2007 |
| 7208767 | Electron-jump chemical energy converter A method and a device for converting energy uses chemical reactions in close proximity to or on a surface to convert a substantial fraction of the available chemical energy of the shorter lived energized products, such as vibrationally excited chemicals and hot elec... | 04/24/2007 |
| 7209507 | Method and apparatus for controlling the output of a gas discharge MOPA laser system A method and apparatus are disclosed for controlling the output of a two chamber gas discharge laser comprising an oscillator gas discharge laser and an amplifier gas discharge laser that may comprise establishing a multidimensional variable state space comprising a... | 04/24/2007 |
| 7203216 | Timing control for two-chamber gas discharge laser system Feedback timing control equipment and process for an injection seeded modular gas discharge laser. A preferred embodiment is a system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 to... | 04/10/2007 |
| 7196342 | Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV meteorology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a... | 03/27/2007 |
