Bizarre Patents
Mouse device with a built-in printer
A mouse device for use as an input device of a computer is provided that includes a housing in which recording paper is loadable, and a printer unit provided within the housing for printing on the recording paper print information received from the computer.
PatentStorm News
Make the Most of Our Site
See this month's Top Inventors and Most Cited Patents.
Stay on top of the latest innovations by subscribing to an RSS feed.
Registered users: Manage your profile.
| Number | Title | Issue Date |
| 8170078 | Laser system A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge... | 05/01/2012 |
| 8116347 | Two-stage laser system for aligners The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser syste... | 02/14/2012 |
| 7885309 | Laser system A method and apparatus may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a laser output light beam of pulses which may comprise a first gas discharge... | 02/08/2011 |
| 7848378 | Apparatus and method for monitoring power of a UV laser An excimer laser includes a chamber for containing laser gas, electrodes in the chamber disposed to excite the laser gas, thereby producing optical emissions, first and second mirrors arranged to form a resonator cavity, and a detector disposed to receive a portion ... | 12/07/2010 |
| 7792176 | Narrow-band laser device for exposure apparatus A narrow-band laser device for exposure apparatus that allows to reduce damage to, and to hence extend the life of, optical elements such as chamber windows, output coupling mirrors or the like. A ring resonator is provided in an amplification stage laser of the nar... | 09/07/2010 |
| 7778302 | Laser system A method/apparatus may comprise a seed laser oscillator producing an output which may comprise: a first gas discharge excimer or molecular fluorine laser chamber; a line narrowing module within a first oscillator cavity; a laser amplification stage receiving the out... | 08/17/2010 |
| 7751461 | Linewidth-narrowed excimer laser cavity An excimer laser cavity is disclosed which includes at least one grating-prism (grism) and a wavelength-selective diffraction grating arranged in sequence. The grism grating surface faces the gain medium and produces an expanded beam which is diffracted on the same ... | 07/06/2010 |
| 7746913 | Laser system An apparatus/method which may comprise a line narrowed pulsed excimer or molecular fluorine gas discharge laser system which may comprise a seed laser oscillator producing an output comprising a seed laser output light beam of pulses which may comprise a first gas d... | 06/29/2010 |
| 7630424 | Laser system A method/apparatus may comprise operating a line narrowed pulsed excimer or molecular fluorine gas discharge laser system by using a seed laser oscillator to produce an output which may comprise a first gas discharge excimer or molecular fluorine laser chamber; a li... | 12/08/2009 |
| 7596164 | Control system for a two chamber gas discharge laser The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam... | 09/29/2009 |
| 7564888 | High power excimer laser with a pulse stretcher An apparatus and method is disclosed which may comprise a high power excimer or molecular fluorine gas discharge laser DUV light source system which may comprise: a pulse stretcher which may comprise: an optical delay path mirror, an optical delay path mirror gas pu... | 07/21/2009 |
| 7561611 | Extended-lifetime elements for excimer lasers The invention is directed to elements used in high power laser lithographic systems operating at below 250 nm, and in particular to elements that have a coating of selected materials to extend lifetime of the elements; and to a method of preparing the extended lifet... | 07/14/2009 |
| 7499482 | Injection locking type or MOPA type of laser device An injection locking type or MOPA type of laser device capable of always providing stable output energy and wavelength is provided. For this purpose, the laser device includes an oscillator for exciting laser gas by oscillator discharge and oscillating seed laser li... | 03/03/2009 |
| 7439530 | LPP EUV light source drive laser system An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive la... | 10/21/2008 |
| 7433372 | Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications A beam mixer for increasing intensity symmetry along a selected axis of a beam (wherein the beam extends from a first edge to a second edge along the axis) is disclosed and may include a plurality of mirrors establishing a spatially inverting path. For the beam mixe... | 10/07/2008 |
| 7426229 | Line narrowing module, light source of exposure apparatus comprising the same, and method of producing exposure light using line narrowing A line narrowing module includes an elliptical mirror, a diffraction grating disposed at a first focus of the mirror for separating an incident beam into different lines, and a laser beam dispersion and extraction unit. The laser beam dispersion and extraction unit ... | 09/16/2008 |
| 7418022 | Bandwidth-limited and long pulse master oscillator power oscillator laser systems Laser systems have a line-narrowed master oscillator and a power oscillator for amplifying the output of the master oscillator. The power oscillator includes optical arrangements for limiting the bandwidth of radiation that can be amplified. The limited amplificatio... | 08/26/2008 |
| 7415056 | Confocal pulse stretcher A gas discharge laser system producing a laser output pulse and a method of operating such a system is disclosed which may comprise a pulse stretcher which may comprise a laser output pulse optical delay initiating optic directing a portion of the laser output pulse... | 08/19/2008 |
| 7408969 | Optical cavity and laser A novel laser cavity structure is disclosed which pertains to laser resonator geometries possessing circular symmetry, such as in the case of disk or spherical lasers. The disclosed invention utilizes a very-high finesse Bragg reflector (VHF-BR) thin film reflectors... | 08/05/2008 |
| 7382816 | Two-stage laser pulse energy control device and two-stage laser system A charging voltage Vosc applied to a main capacitor C0 disposed in an oscillating high-voltage pulse generator 12 of an oscillating laser 100 is subject to constant control such that a pulse energy Posc of the oscillating laser 100 become... | 06/03/2008 |
| 7382815 | Laser spectral engineering for lithographic process An integrated circuit lithography technique called spectral engineering by Applicants, for bandwidth control of an electric discharge laser. In a preferred process, a computer model is used to model lithographic parameters to determine a desired laser spectrum neede... | 06/03/2008 |
| 7379487 | Two phase reactor A two phase reactor includes a source of liquid reactant and a source of gas reactant. A chamber has an inlet coupled to the source of gas reactant and a flat jet nozzle coupled to the source of the liquid reactant. ... | 05/27/2008 |
| 7372887 | Excimer laser device, laser gas exchange method and partial gas exchange quantity calculation method To provide an excimer laser device and method in which the frequency of full gas exchange within the laser chamber is reduced, and more preferably full gas exchange is made unnecessary. The gas supply device and gas exhaust device are controlled so that the l... | 05/13/2008 |
| 7372056 | LPP EUV plasma source material target delivery system An EUV light generation system and method is disclosed that may comprise a droplet generator producing plasma source material target droplets traveling toward the vicinity of a plasma source material target irradiation site; a drive laser; a drive laser focusing opt... | 05/13/2008 |
| 7369597 | Laser output light pulse stretcher Providing a high peak power short pulse duration gas discharge laser output pulse comprises a pulse stretcher a laser output pulse optical delay initiating optic diverting a portion of the output laser pulse into an optical delay having an optical delay path and com... | 05/06/2008 |
| 7365351 | Systems for protecting internal components of a EUV light source from plasma-generated debris Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least ... | 04/29/2008 |
| 7365349 | EUV light source collector lifetime improvements An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plas... | 04/29/2008 |
| 7366219 | Line narrowing module A line narrowing method and module for a narrow band DUV high power high repetition rate gas discharge laser producing output laser light pulse beam pulses in bursts of pulses, the module having a nominal optical path are disclosed which may comprise: a dispersive c... | 04/29/2008 |
| 7366213 | MOPA excimer or molecular fluorine laser system with improved synchronization The relative timing delay between channels of a discharge circuit can be adjusted through application of appropriate control voltages. A control voltage of relatively long duration and relatively small voltage, with respect to a common system pulse, can be applied t... | 04/29/2008 |
| 7361918 | High repetition rate laser produced plasma EUV light source An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interva... | 04/22/2008 |
| 7355191 | Systems and methods for cleaning a chamber window of an EUV light source Systems and methods are disclosed for cleaning a chamber window of an extreme ultraviolet (EUV) light source. The window may have an inside surface facing a chamber interior and an opposed outside surface and the light source may generate debris by plasma formation.... | 04/08/2008 |
| 7348516 | Methods of and laser systems for link processing using laser pulses with specially tailored power profiles A laser pulse with a specially tailored temporal power profile, instead of a conventional temporal shape or substantially square shape, severs an IC link. The specially tailored laser pulse preferably has either an overshoot at the beginning of the laser pulse or a ... | 03/25/2008 |
| 7342235 | Contamination monitoring and control techniques for use with an optical metrology instrument A technique is provided monitoring and removing contaminants from the surface of a sample that is being measured with an optical metrology tool. The monitoring and removing contaminants from the surface of a sample may occur prior to recording an optical response fr... | 03/11/2008 |
| 7339972 | Laser filament imager An apparatus includes a gas chamber comprising a gas feed nozzle, an exhaust nozzle, and a window. The apparatus also includes a first partial reflector, in the gas chamber, sharing an optical path with the exhaust nozzle, and the window. Optionally, The apparatus i... | 03/04/2008 |
| 7339973 | Electrodes for fluorine gas discharge lasers Fluorine gas discharge laser electrodes and electrode systems that may comprise a plurality of current return tangs extending for less than the respective length of the second elongated gas discharge electrode. In addition electrodes may comprise a first discharge s... | 03/04/2008 |
| 7331676 | Apparatus for projecting a reduced image of a photomask using a schwarzschild objective An optical system for projecting an image of a photomask on a substrate, using a Schwarzschild objective includes an excimer laser, beam shaping optics for shaping a laser beam from the laser and a beam-dividing prism. The beam-dividing prism has a dividing-face inc... | 02/19/2008 |
| 7323703 | EUV light source An apparatus and method is described which may comprise a plasma produced extreme ultraviolet (“EUV”) light source multilayer collector which may comprise a plasma formation chamber; a shell within the plasma formation chamber in the form of a collector shape ha... | 01/29/2008 |
| 7321607 | External optics and chamber support system A gas discharge laser and method of operating same is disclosed which may comprise a gas discharge laser chamber support structure comprising a first support arm attached to a mounting table; a gas discharge laser chamber slideably engaging the first support arm; an... | 01/22/2008 |
| 7321468 | Method and optical arrangement for beam guiding of a light beam with beam delay A method for beam guiding of a light beam generated by a light source to a target location along a path distance LS, comprises splitting the light beam on the path distance LS at least once into a first partial beam and a second partial beam, g... | 01/22/2008 |
| 7317739 | Mode-locked laser using a mode-locking wavelength selective reflector In accordance with the invention, a mode-locked laser comprises an optical gain medium disposed within an optical cavity formed by a first reflector and a wavelength selective second reflector to achieve mode-locking operation. Advantageously, the wavelength reflect... | 01/08/2008 |
